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    • 7. 发明申请
    • Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel
    • 成膜源,成膜装置,成膜方法,有机EL面板以及制造有机EL面板的方法
    • US20070292610A1
    • 2007-12-20
    • US11723242
    • 2007-03-19
    • Hirosi AbikoDaisuke MasudaShigehiro Umetsu
    • Hirosi AbikoDaisuke MasudaShigehiro Umetsu
    • C23C16/448
    • C23C14/24C23C14/545
    • It is an object of the invention to continuously perform, under a desired condition and for a long time period, a film formation process capable of producing a high quality film. A film formation apparatus comprises: a discharge outlet disposed within a film formation chamber and facing a film formation surface of a substrate; a material accommodating section disposed outside the film formation chamber and having material containers each containing a film formation material; a heating device for heating the film formation material contained within the material-containers; discharge passages which are air-tightly communicated with the discharge outlet and the material accommodating section; escape passages branching from the discharge passages for diverting the film formation material flowing towards the discharge outlet. On the downstream side of the branching positions of the discharge passages as well as on the escape passages, there are provided flow restricting valves capable of shutting off or passing the film formation material or variably adjusting the flow of the film formation material.
    • 本发明的目的是在期望的条件下和长时间内连续地进行能够生产高质量薄膜的成膜方法。 一种成膜装置,包括:排出口,其配置在成膜室内,面对基板的成膜面; 材料容纳部,其设置在成膜室的外侧,并且具有各自容纳成膜材料的材料容器; 用于加热容纳在所述材料容器内的成膜材料的加热装置; 与排出口和材料容纳部气密地连通的排出通路; 从排放通道分支的排出通路用于转移朝向排出口流动的成膜材料。 在排出通道的分支位置的下游侧以及排出通道上,设置有能够切断或通过成膜材料或可变地调节成膜材料的流动的流动限制阀。