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    • 6. 发明授权
    • Semiconductor laser device and a method for fabricating the same
    • 半导体激光器件及其制造方法
    • US4025939A
    • 1977-05-24
    • US606053
    • 1975-08-20
    • Kunio AikiHitachi, Ltd.Michiharu NakamuraJun-Ichi Umeda
    • Kunio AikiHitachi, Ltd.Michiharu NakamuraJun-Ichi Umeda
    • H01S5/00H01S5/12H01L33/00H01L29/161
    • H01S5/12H01S5/1215
    • A semiconductor laser device comprises an n-type GaAs layer, an n-type GaAlAs layer disposed on the n-type GaAs layer, an optical confinement region comprising a laser active region consisting of GaAs disposed on the n-type GaAlAs layer, a first p-type GaAlAs region whose aluminum content is less than that of the n-type GaAlAs layer, disposed on said laser active region and a second p-type GaAlAs region whose aluminum content is less than that of the first p-type GaAlAs region, the surface of which opposite that disposed on said first p-type GaAlAs region is a periodically corrugated surface, a p-type GaAlAs layer whose aluminum content is more than that of said first p-type GaAlAs region, disposed on the periodically corrugated surface of the second p-type GaAlAs region, a p-type GaAs layer disposed on said p-type GaAlAs layer, and electrodes disposed on the n-type and p-type GaAs layers, respectively, and which has a very low threshold value for laser oscillation and which is fabricated with a very high yield rate.
    • 一种半导体激光器件包括:n型GaAs层,n型GaAlAs层,设置在n型GaAs层上;光限制区,包括由设置在n型GaAlAs层上的GaAs构成的激光有源区;第一 其铝含量小于位于所述激光有源区上的n型GaAlAs层的p型GaAlAs区域和铝含量小于第一p型GaAlAs区域的第二p型GaAlAs区域, 其表面设置在所述第一p型GaAlAs区域上的表面是周期性波纹状表面,其铝含量大于所述第一p型GaAlAs区域的铝含量的p型GaAlAs层,其设置在 第二p型GaAlAs区域,设置在所述p型GaAlAs层上的p型GaAs层和分别设置在n型和p型GaAs层上的电极,并且具有非常低的激光阈值 振荡,是织物 以非常高的产量率。
    • 7. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US4257011A
    • 1981-03-17
    • US929013
    • 1978-07-28
    • Michiharu NakamuraShigeo YamashitaTakao KurodaJun-ichi Umeda
    • Michiharu NakamuraShigeo YamashitaTakao KurodaJun-ichi Umeda
    • H01S5/12H01S5/223H01S3/19
    • H01S5/12H01S5/2232H01S5/2234
    • A semiconductor laser device has stabilized longitudinal and transverse modes without excess optical noise for a modulated signal generated by mode interaction. The fundamental construction of the semiconductor laser device comprises a structure wherein a first semiconductor layer is sandwiched between second and third semiconductor layers which have a greater band gap and lower index of refraction than the first semiconductor layer. That region of at least one of the second and third semiconductor layers which is remote from the first semiconductor layer corresponds substantially to a radiation region and serves as a light non-absorptive region in the shape of a stripe. A semiconductor layer has portions lying on both sides of the semiconductor layer remote from the first semiconductor layer and has an effective complex refractive-index for laser light discontinuous at both ends of the semiconductor layer remote from the first semiconductor layer. Periodic corrugations which intersect orthogonally to the lengthwise direction of the stripe-shaped light non-absorptive region are formed in at least one interface of the semiconductor layers in a manner to include at least a region corresponding to the light non-absorptive region.
    • 半导体激光器件对于通过模式相互作用产生的调制信号具有稳定的纵向和横向模式而没有过多的光学噪声。 半导体激光器件的基本结构包括其中第一半导体层夹在具有比第一半导体层更大的带隙和较低的折射率的第二和第三半导体层之间的结构。 远离第一半导体层的第二和第三半导体层中的至少一个的区域基本上对应于辐射区域,并且用作条纹形状的光非吸收区域。 半导体层具有位于远离第一半导体层的半导体层的两侧的部分,并且对于远离第一半导体层的半导体层的两端处的不连续的激光具有有效的复合折射率。 以至少包括对应于光非吸收区域的区域的方式,在半导体层的至少一个界面中形成与条形光非吸收区域的长度方向垂直相交的周期波纹。
    • 9. 发明授权
    • High output semiconductor laser device utilizing a mesa-stripe optical
confinement region
    • 利用台面条状光限制区域的高输出半导体激光器件
    • US4602371A
    • 1986-07-22
    • US571578
    • 1984-01-17
    • Toshihiro KawanoTsukuru OhtoshiNaoki ChinoneTakashi KajimuraMichiharu Nakamura
    • Toshihiro KawanoTsukuru OhtoshiNaoki ChinoneTakashi KajimuraMichiharu Nakamura
    • H01S5/20H01S5/227H01S5/32H01S3/19
    • H01S5/227H01S5/2081H01S5/2275H01S5/3213
    • A semiconductor laser device is provided with an optical confinement region constituted by first, second, third and fourth semiconductor layers provided on the upper part of a predetermined semiconductor substrate in contact with each other successively. The first and fourth semiconductor layers are smaller in refractive index than the second and third semiconductor layers, and the third semiconductor layer is larger in refractive index than the second semiconductor layer. On the other hand, the second and fourth semiconductor layers are larger in forbidden bandwidth than the third semiconductor layer. At least the first and fourth semiconductor layers are opposite in conductivity type to each other. In addition to this, the optical confinement region is formed into a mesa-stripe, and both side walls of this mesa-stripe which are substantially parallel to the traveling direction of a laser beam are embedded with a fifth semiconductor layer. Also, the width of the second semiconductor layer in a section perpendicular to the traveling direction of the laser beam and in the direction parallel to a junction within the optical confinement region is made larger than that of the third semiconductor layer. Accordingly, by virtue of this structure, a large output is ensured by this semiconductor laser device.
    • 半导体激光装置设置有由第一,第二,第三和第四半导体层构成的光限制区域,该第一,第二,第三和第四半导体层依次相互接触地设置在预定半导体衬底的上部。 第一和第四半导体层的折射率小于第二和第三半导体层,并且第三半导体层的折射率比第二半导体层大。 另一方面,第二和第四半导体层的禁带宽度大于第三半导体层。 至少第一和第四半导体层的导电类型彼此相反。 除此之外,光限制区域形成为台面条状,并且基本上平行于激光束的行进方向的该台面条的两个侧壁都嵌有第五半导体层。 此外,第二半导体层在与激光束的行进方向垂直的部分的宽度以及与光限制区域内的结的平行方向的宽度大于第三半导体层的宽度。 因此,通过这种结构,通过该半导体激光器件确保了大的输出。