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1. 发明申请

WO2007148225A2 VEHICLE DRIVE APPARATUS 审中-公开
标题翻译：车辆驱动装置
公开(公告)号：WO2007148225A2
公开(公告)日：2007-12-27
申请号：PCT/IB2007002303
申请日：2007-06-21
申请人： TOYOTA MOTOR CO LTD , MAEDA YOSHINORI , HOSOKAWA AKIHIRO , SUZUKI YOUSUKE , TSUCHIDA MICHITAKA , OKUMURA KAZUYA , OSHIUMI TADAHIRO , YOSHIZUE KENSUKE , SUGIYAMA KOJI
发明人： MAEDA YOSHINORI , HOSOKAWA AKIHIRO , SUZUKI YOUSUKE , TSUCHIDA MICHITAKA , OKUMURA KAZUYA , OSHIUMI TADAHIRO , YOSHIZUE KENSUKE , SUGIYAMA KOJI
IPC分类号： B60W30/045 , B62D9/00 , B60K7/00 , B60L15/20 , B62D11/04
CPC分类号： B60K17/356 , B60G7/008 , B60G17/0195 , B60G21/051 , B60G2200/142 , B60G2200/21 , B60G2200/422 , B60G2204/129 , B60G2204/148 , B60G2204/30 , B60G2206/20 , B60G2300/50 , B60G2800/952 , B60K23/0808 , B60W30/04 , B60W30/045 , B60W2720/14 , B60W2720/30 , Y02T10/7258
摘要： A vehicle drive apparatus (100) independently controls drive forces for a front-right drive wheel (2r), a front-left drive wheel (21), a rear-right drive wheel (3r), and a rear-left drive wheel (31) using a front-right electric motor (10r), a front-left electric motor (101), a rear-right electric motor (11r), and a rear-left electric motor (111), respectively. The drive forces for the drive wheels of a vehicle (1) incorporating the vehicle drive apparatus (100) are determined based on the target moments in the yaw and roll directions of the vehicle (1), the total drive for the drive wheels, and the drive reaction forces at the drive wheels. Thus, the performance desired by the driver can be achieved, and the drivability therefore improves accordingly.
摘要翻译：车辆驱动装置（100）独立地控制前右驱动轮（2r），前左驱动轮（21），后右驱动轮（3r）和后左驱动轮（ 31），分别使用右前电动机（10r），前左电动机（101），后右电动机（11r）和左后电动机（111）。结合车辆驱动装置（100）的车辆（1）的驱动轮的驱动力基于车辆（1）的偏航和滚动方向上的目标力矩，驱动轮的总驱动力和驱动轮上的驱动反作用力。因此，可以实现驾驶员期望的性能，因此相应地提高驾驶性能。

2. 发明申请

WO2008032180A3 BRAKE FORCE CONTROL DEVICE AND METHOD 审中-公开
标题翻译：制动力控制装置及方法
公开(公告)号：WO2008032180A3
公开(公告)日：2008-05-22
申请号：PCT/IB2007002610
申请日：2007-09-12
申请人： TOYOTA MOTOR CO LTD , OKUMURA KAZUYA , YOSHIZUE KENSUKE , HOSOKAWA AKIHIRO , MAEDA YOSHINORI , MORIGUCHI NAOKI , SUGIYAMA KOUJI
发明人： OKUMURA KAZUYA , YOSHIZUE KENSUKE , HOSOKAWA AKIHIRO , MAEDA YOSHINORI , MORIGUCHI NAOKI , SUGIYAMA KOUJI
IPC分类号： B60L7/26 , B60T13/58
CPC分类号： B60L7/10 , B60L1/00 , B60L7/26 , B60L11/1868 , B60L15/2009 , B60L2220/42 , B60L2220/46 , B60L2240/423 , B60L2240/461 , B60L2260/28 , B60T13/586 , B60T2270/604 , B60T2270/608 , B60W10/08 , B60W10/184 , B60W30/18127 , B60W2510/244 , Y02T10/645 , Y02T10/648 , Y02T10/7005 , Y02T10/7066 , Y02T10/72 , Y02T10/7275 , Y10T477/387 , Y10T477/393
摘要： A braking force control device includes: a brake control device (brake controller 24) that controls a mechanical brake braking torque by operating electric actuators 23FL, 23FR 23RL, 23RR so as to achieve a requested brake braking torque; a motor control device (motor controller 42) that controls a motor torque by operating motors 41FL, 41FR, 41RL, 41RR so as to achieve the requested motor torque; a requested braking torque calculation device 51 a that calculates; the requested braking torques of wheels 10FL, 10FR, 10RL, 10RR; a battery requested electric power calculation device 51c that finds a battery requested electric power based on the target amounts of electricity charged in batteries 31, 32, 34; and an individual braking torque calculation device 51b that finds the requested motor torque and the requested brake braking torque that cause the requested braking torque to be generated based on the battery requested electric power and the requested braking torque.
摘要翻译：制动力控制装置包括：制动控制装置（制动控制器24），其通过操作电致动器23FL，23FR 23RL，23RR来控制机械制动制动转矩，以实现所要求的制动制动转矩; 电动机控制装置（电动机控制器42），其通过操作电动机41FL，41FR，41RL，41RR来控制电动机转矩，以实现所要求的电动机转矩; 计算要求的制动转矩计算装置51a; 车轮10FL，10FR，10RL，10RR的要求制动力矩; 电池请求电力计算装置51c，其基于在电池31,32,34中充电的目标电量来找到电池请求电力; 以及单个制动转矩计算装置51b，其基于所述电池请求电力和所请求的制动转矩，求出所请求的电动机转矩和使所述要求制动转矩产生的请求制动转矩。

3. 发明公开

EP1023645A4 AUTOMATED SUBSTRATE PROCESSING SYSTEMS AND METHODS 审中-公开
标题翻译： VERFAHREN UND VORRICHTUNGEN ZUR自动化BEHANDLUNG VON底座
公开(公告)号：EP1023645A4
公开(公告)日：2004-12-22
申请号：EP98949782
申请日：1998-10-06
申请人： APPLIED KOMATSU TECHNOLOGY INC , HOSOKAWA AKIHIRO
发明人： HOSOKAWA AKIHIRO , DEMARAY RICHARD ERNEST , INAGAWA MAKOTO , MULLAPUDI RAVI , HALSEY HARLAN L , STARR MICHAEL T
IPC分类号： H01L21/68 , G05B19/401 , G05B19/402 , G05B19/418 , G05B11/01 , H01L21/00
CPC分类号： G05B19/41815 , G05B19/401 , G05B19/402 , Y02P90/08
摘要： Automated systems and methods for processing substrates (11) are described. An automated processing system includes: a vacuum chamber (18); a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber. Any substrate misalignment may be compensated for based upon the difference in the recorded substrate positions.
摘要翻译：描述了用于处理衬底的自动化系统和方法。一种自动化处理系统包括：真空室; 位于真空室内的衬底支撑件，并被构造和布置成在加工过程中支撑衬底; 以及基板对准检测器，其被构造和布置成基于系统内的物理状态的变化来检测基板是否不对准，因为基板被转移到真空室中。衬底对准检测器可以包括耦合到衬底支撑件的振动检测器。衬底可以被转移到真空室中。衬底的位置可以在被转移到真空室中时记录。可以检测衬底相对于衬底支撑件的不对准。可以处理衬底。经处理的基板可以从真空室中卸载。被处理基板的位置可以从真空室中卸载来记录。可以基于记录的基板位置的差异补偿任何基板未对准。

4. 发明申请

WO2007015933A3 METHOD AND APPARATUS FOR SPUTTERING ONTO LARGE FLAT PANELS 审中-公开
标题翻译：用于在大平面板上溅射的方法和装置
公开(公告)号：WO2007015933A3
公开(公告)日：2009-06-11
申请号：PCT/US2006028178
申请日：2006-07-20
申请人： APPLIED MATERIAL INC , LE HIEN-MING HUU , HOSOKAWA AKIHIRO , TEPMAN AVI
发明人： LE HIEN-MING HUU , HOSOKAWA AKIHIRO , TEPMAN AVI
IPC分类号： C23C16/00
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455
摘要： A rectangular magnetron (160) placed at the back of a rectangular sputter target (16) and having magnets (164) of opposed polarities arranged to form a gap therebetween. corresponding to a plasma track adjacent the target to intensify the plasma causing material sputtered from the target to coat a rectangular panel (14). The gap extends in a closed loop having a serpentine or spiral shape. The magnetron has a size only somewhat less than that of the target and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100mm for a 2m target. The scan may follow a double-Z pattern along two links parallel to a target side and the two connecting diagonals. External actuators (416) move the magnetron along a two-dimensional path as it is slidably suspended from a gantry (364) sliding perpendicularly on the chamber walls (276).
摘要翻译：放置在矩形溅射靶（16）的背面并且具有布置成在其间形成间隙的相对极性的磁体（164）的矩形磁控管（160）。对应于邻近靶的等离子体轨道，以加强等离子体，从而使从靶材溅射的材料涂覆矩形面板（14）。间隙在具有蛇形或螺旋形状的闭环中延伸。磁控管的尺寸仅比目标的尺寸略小，并且在目标的两个垂直方向上扫描，对于2m的目标，扫描长度例如为约100mm。扫描可以沿着平行于目标侧的两个链接和两个连接对角线沿着双Z图案。外部致动器（416）沿着可从垂直于室壁（276）上滑动的台架（364）可滑动地悬挂的二维路径移动磁控管。

5. 发明申请

WO2007118204A3 REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES 审中-公开
标题翻译：氧化锌透明导电氧化物对大面积基材的反应性溅射
公开(公告)号：WO2007118204A3
公开(公告)日：2007-12-06
申请号：PCT/US2007066166
申请日：2007-04-06
申请人： APPLIED MATERIALS INC , LAU ALLEN KA-LING , INAGAWA MAKOTO , STIMSON BRADLEY O , HOSOKAWA AKIHIRO , WHITE JOHN M , YE YAN , KADAM ANKUR , LI YANPING
发明人： LAU ALLEN KA-LING , INAGAWA MAKOTO , STIMSON BRADLEY O , HOSOKAWA AKIHIRO , WHITE JOHN M , YE YAN , KADAM ANKUR , LI YANPING
IPC分类号： C23C14/00
CPC分类号： C23C14/564 , C23C14/0063 , C23C14/35 , H01J37/3244 , H01J37/34 , H01J37/3438
摘要： The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.
摘要翻译：本发明通常包括一个或多个阴极一个或多个气体导入管的冷却阳极，其中冷却的阳极和气体引入管都跨越在溅射室内的一个或多个溅射靶和一个或多个衬底之间限定的处理空间。气体导入管可以具有引导从一个或多个基底引入的气体的气体出口。气体导入管可以将诸如氧的反应性气体引入到用于通过反应溅射沉积TCO膜的溅射室中。在多步溅射过程中，可以改变气体流动（即，气体的量和气体的类型），靶和基板之间的间隔以及DC功率，以实现期望的结果。

6. 发明申请

WO9919777A8 AUTOMATED SUBSTRATE PROCESSING SYSTEMS AND METHODS 审中-公开
公开(公告)号：WO9919777A8
公开(公告)日：1999-10-28
申请号：PCT/US9820999
申请日：1998-10-06
申请人： APPLIED KOMATSU TECHNOLOGY INC , HOSOKAWA AKIHIRO
发明人： HOSOKAWA AKIHIRO , DEMARAY RICHARD ERNEST , INAGAWA MAKOTO , MULLAPUDI RAVI , HALSEY HARLAN L , STARR MICHAEL T
IPC分类号： H01L21/68 , G05B19/401 , G05B19/402 , G05B19/418 , G05B11/01
CPC分类号： G05B19/41815 , G05B19/401 , G05B19/402 , Y02P90/08
摘要： Automated systems and methods for processing substrates (11) are described. An automated processing system includes: a vacuum chamber (18); a substrate support located inside the vacuum chamber and constructed and arranged to support a substrate during processing; and a substrate alignment detector constructed and arranged to detect if the substrate is misaligned as the substrate is transferred into the vacuum chamber based upon a change in a physical condition inside the system. The substrate alignment detector may include a vibration detector coupled to the substrate support. A substrate may be transferred into the vacuum chamber. The position of the substrate may be recorded as it is being transferred into the vacuum chamber. Misalignment of the substrate with respect to the substrate support may be detected. The substrate may be processed. The processed substrate may be unloaded from the vacuum chamber. The position of the processed substrate may be recorded as it is being unloaded from the vacuum chamber. Any substrate misalignment may be compensated for based upon the difference in the recorded substrate positions.

7. 发明申请

WO2007059347A3 FLEXIBLE MAGNETRON INCLUDING PARTIAL ROLLING SUPPORT AND CENTERING PINS 审中-公开
标题翻译：灵活的磁铁，包括部分滚动支持和中心引脚
公开(公告)号：WO2007059347A3
公开(公告)日：2009-05-07
申请号：PCT/US2006044915
申请日：2006-11-17
申请人： APPLIED MATERIALS INC , INAGAWA MAKOTO , HOSOKAWA AKIHIRO , LE HIEN-MINH HUU , LAVITSKY ILYA , WHITE JOHN M , MARTIN TODD , STIMSON BRADLEY O
发明人： INAGAWA MAKOTO , HOSOKAWA AKIHIRO , LE HIEN-MINH HUU , LAVITSKY ILYA , WHITE JOHN M , MARTIN TODD , STIMSON BRADLEY O
IPC分类号： C23C14/32
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3435 , H01J37/3452 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron (326) is partially supported from an a support plate (268) in overhead scanning mechanism through multiple springs (330) coupled to different horizontal locations on the magnetron and partially supported from below on sliders or rollers (282) at multiple locations on the target. In one embodiment, the yoke plate is continuous and uniform, hi another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes (220, 224), for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips (262, 264) separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism (350, 358, 362, 368) may align the different magnetron strips.
摘要翻译：磁控管扫描和支撑机构，其中磁控管（326）通过耦合到磁控管上的不同水平位置的多个弹簧（330）从架空扫描机构中的支撑板（268）部分地支撑并且从下方部分地支撑在滑块或滚轮（282）在目标上的多个位置。在一个实施例中，轭板是连续的和均匀的。在另一个实施例中，磁控管的磁轭被分成例如互补蛇形形状的两个柔性轭（220,224）和各极性的每个支撑磁体。在另一个实施例中，靶和磁控管被分成由其他结构分开的各个条（262,264）。每个磁控管从上面部分地从普通扫描板支撑并部分地支撑在相应的目标条上。定心机构（350,358,362,368）可以对准不同的磁控管条。

8. 发明申请

WO2006132806A3 MULTIPLE SCANNING MAGNETRONS 审中-公开
标题翻译：多扫描磁铁
公开(公告)号：WO2006132806A3
公开(公告)日：2007-04-12
申请号：PCT/US2006020087
申请日：2006-05-24
申请人： APPLIED MATERIALS INC , LE HIEN-MINH HUU , HOSOKAWA AKIHIRO
发明人： LE HIEN-MINH HUU , HOSOKAWA AKIHIRO
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/3408
摘要： A sputter reactor configured for magnetron sputtering from a rectangular target (16) onto a rectangular panel (14) and including multiple magnetrons (140A, 140B) independently scannable across the back of the target. In one embodiment, the magnetrons scan only along paths parallel to one axis. A system controller (150) may control actuators (142 A, 142B) providing the mechanical movement and also control the amount of power delivered to the target in synchronism to the mechanical movement. The invention also includes scanning a magnetron in a rectangular path (132, 136, 134, 138) about the back of the rectangular target.
摘要翻译：一种溅射反应器，其被配置用于从长方形靶（16）到矩形板（14）上的磁控溅射，并且包括跨过靶的背面独立扫描的多个磁控管（140A，140B）。在一个实施例中，磁控管仅沿着平行于一个轴的路径扫描。系统控制器（150）可以控制提供机械运动的致动器（142A，142B），并且还与机械运动同步地控制输送到目标的功率量。本发明还包括围绕矩形靶的背面的矩形路径（132,136,134,138）扫描磁控管。

9. 发明申请

WO2006127221A3 SPUTTERING TARGET TILES HAVING STRUCTURED EDGES SEPARATED BY A GAP 审中-公开
标题翻译：具有由GAP分离的结构化边缘的溅射目标台
公开(公告)号：WO2006127221A3
公开(公告)日：2007-02-01
申请号：PCT/US2006016939
申请日：2006-05-02
申请人： APPLIED MATERIALS INC , LE HIEN-MINH , STIMSON BRADLEY , HOSOKAWA AKIHIRO
发明人： LE HIEN-MINH , STIMSON BRADLEY , HOSOKAWA AKIHIRO
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3435 , H01J37/3491
摘要： A target assembly composed of multiple target tiles (30) bonded in an array to a backing plate (24) of another material. The edges of the tile within the interior of the array are formed with complementary structure edges to form a gap (36) between the tiles having at least a portion that is inclined to the target normal. The gap may be simply beveled and slant at an angle of between 10° and 55°, preferably 15° and 50°, with respect to the target normal or they may be convolute with one portion horizontal (74) or otherwise inclined to prevent a line of sight from the bottom to top. The facing sides (30, 32) of tiles may be roughened by bead blasting, for both perpendicular and sloping gaps. The area of the backing plate underlying the gap may be roughened or may be coated or overlain with a foil (54) of the material of the target, for both perpendicular and sloping gaps and have a polymeric foil (52) preventing entry of bonding material into the gap.
摘要翻译：由多个目标瓦片（30）组成的目标组件，所述目标瓦片（30）以阵列的形式结合到另一材料的背板（24）上。在阵列内部的瓦片的边缘形成有互补的结构边缘，以在具有至少一部分倾斜于目标法线的瓦片之间形成间隙（36）。间隙可以简单地倾斜并相对于目标法线倾斜10°至55°，优选15°和50°之间的角度，或者它们可以与一部分水平（74）卷曲或以其他方式倾斜以防止从底部到顶部的视线。对于垂直和倾斜的间隙，瓷砖的面对侧（30,32）可以通过珠粒喷砂而粗糙化。在间隙下面的背板的区域可以被粗糙化，或者可以对于垂直和倾斜的间隙而用靶材料的箔（54）涂覆或覆盖，并且具有防止粘合材料进入的聚合物箔（52）进入差距。

10. 发明申请

WO2007032855A3 THERMALLY CONDUCTIVE DIELECTRIC BONDING OF SPUTTERING TARGETS USING DIAMOND POWDER FILLER OR THERMALLY CONDUCTIVE CERAMIC FILLERS 审中-公开
标题翻译：使用钻石粉末填料或导热陶瓷填料的溅射靶材的导热导电粘接
公开(公告)号：WO2007032855A3
公开(公告)日：2009-04-30
申请号：PCT/US2006031989
申请日：2006-08-15
申请人： APPLIED MATERIALS INC , YE YAN , WHITE JOHN M , LE HIEN-MINH HUU , HOSOKAWA AKIHIRO , NISPEROS ELPIDIO C
发明人： YE YAN , WHITE JOHN M , LE HIEN-MINH HUU , HOSOKAWA AKIHIRO , NISPEROS ELPIDIO C
IPC分类号： C23C14/34 , C09J163/00
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/352 , H01J37/3414 , H01J37/3435 , Y10T156/109
摘要： A sputtering target assembly and method for bonding a sputtering target to a backing plate is disclosed. When insulatively bonding a sputtering target to a backing plate, it is necessary to ensure that the bonding material has good thermal conductivity so that the temperature of the target can be effectively controlled. It is also important to not have electrical conductivity through the bonding materials. In order to achieve both goals, it is beneficial to utilize an elastomer with diamond powder filler. Diamond power has very good thermal conductivity, and it also has very good dielectric strength. Diamond is a thermally effective and cost effective substitute for silver in insulative bonding.
摘要翻译：公开了一种用于将溅射靶结合到背板的溅射靶组件和方法。当将溅射靶绝缘接合到背板时，需要确保接合材料具有良好的导热性，从而能够有效地控制靶的温度。通过接合材料不具有导电性也是重要的。为了实现这两个目标，使用具有金刚石粉末填料的弹性体是有益的。金刚石功率具有非常好的导热性，并且也具有非常好的介电强度。金刚石是绝缘粘合中银的热效应和成本效益的替代品。

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