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1. 发明申请

WO2008111991A3 SPINTRONIC TRANSISTOR 审中-公开
标题翻译：旋转晶体管
公开(公告)号：WO2008111991A3
公开(公告)日：2008-12-11
申请号：PCT/US2007073099
申请日：2007-07-10
申请人： TOKYO ELECTRON LTD , KAUSHAL SANJEEV , SUGISHIMA KENJI , GANGULY SWAROOP
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , GANGULY SWAROOP
IPC分类号： H01L31/00
CPC分类号： H01L29/66984 , H01F10/16 , H01L29/1054
摘要： A semiconductor device Including: a substrate comprising silicon: a channel region formed on the substrate; a spin injector formed on the substrate at a first side of the channel region and configured to diffuse a spin-polarized current into the channel region; a spin detector formed on the substrate at a second side of the channel region and configured to receive said spin polarized current from the channel region; and a gate formed on the substrate in an area of said channel region,
摘要翻译：一种半导体器件包括：包括硅的衬底：形成在衬底上的沟道区; 旋转注入器，其形成在所述沟道区域的第一侧的所述衬底上并且被配置为将自旋极化电流扩散到所述沟道区域中; 自旋检测器，形成在所述沟道区的第二侧的所述衬底上，并被配置为从所述沟道区接收所述自旋极化电流; 以及在所述沟道区域的区域中形成在所述衬底上的栅极，

2. 发明公开

KR20180031698A 공간 왜곡 유사도를 사용하는 툴 오류 분석 审中-公开
标题翻译：使用空间扭曲相似度的工具误差分析
公开(公告)号：KR20180031698A
公开(公告)日：2018-03-28
申请号：KR20187003759
申请日：2016-07-15
申请人： TOKYO ELECTRON LTD
发明人： KAUSHAL SANJEEV , PATEL SUKESH , POLAK WOLFGANG , WOLFE ORION
IPC分类号： G05B19/4065
CPC分类号： G05B19/4065 , G05B2219/37242 , G05B2219/37245 , G05B2219/45031
摘要： 제작프로세스들과연관된툴 오류분석을용이하게하기위한시스템들및 기술들이제시된다. 모니터링컴포넌트는하나이상의제작툴과연관된한 세트의센서들에의해생성된센서데이터에기반하여하나이상의제작툴과연관된후보툴 오류를결정한다. 시그니처컴포넌트는하나이상의제작툴과연관된데이터에기반하여후보툴 오류에대한시그니처데이터세트를생성한다. 비교컴포넌트는시그니처데이터세트및 적어도하나의이전에결정된툴 오류와연관된적어도하나의다른시그니처데이터세트에기반하여후보툴 오류를적어도하나의이전에결정된툴 오류와비교한다.
摘要翻译：系统和技术被提出来促进与生产过程相关的工具错误分析。监控组件基于由与一个或多个生产工具相关联的一组传感器生成的传感器数据来确定与一个或多个生产工具相关联的候选工具错误。签名组件基于与一个或多个生产工具相关联的数据生成用于候选工具错误的一组签名数据。比较部件基于签名数据集和与至少一个先前确定的工具误差相关联的至少一个其他签名数据集，将候选工具误差与至少一个先前确定的工具误差进行比较。

3. 发明申请

WO2012129249A3 BIOLOGICALLY BASED CHAMBER MATCHING 审中-公开
标题翻译：基于生物学的腔室匹配
公开(公告)号：WO2012129249A3
公开(公告)日：2014-05-01
申请号：PCT/US2012029847
申请日：2012-03-20
申请人： TOKYO ELECTRON LTD , KAUSHAL SANJEEV , SUGISHIMA KENJI , PATEL SUKESH JANUBHAI , FILMAN ROBERT , POLAK WOLFGANG , WOLFE ORION , BURGER JESSIE
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , PATEL SUKESH JANUBHAI , FILMAN ROBERT , POLAK WOLFGANG , WOLFE ORION , BURGER JESSIE
IPC分类号： G06F15/18
CPC分类号： G06N99/005 , G05B23/0237 , G06F3/04842
摘要： The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.
摘要翻译：本公开涉及自动学习应用于任意半导体制造工具的多个制造工具参数之间的关系以及至少部分由自主学习系统支持的图形用户界面。图形用户界面可以基于接收到的数据创建一个或多个矩阵，并且可以通过转换一个或多个矩阵来进一步生成附加矩阵。可以输出一系列窗口，其中该系列窗口提供包括聚焦室和参考室之间的匹配的性能分析。在一个方面，聚焦室和参考室可以是不同的室。在另一方面，聚焦室和参考室可以是相同的室，其提供了相同室随时间的性能劣化的分析。

4. 发明申请

WO2007112180A3 SEMICONDUCTOR PROCESSING SYSTEM WITH WIRELESS SENSOR NETWORK MONITORING SYSTEM INCORPORATED THEREWITH 审中-公开
标题翻译：具有无线传感器网络监控系统的半导体处理系统
公开(公告)号：WO2007112180A3
公开(公告)日：2008-01-10
申请号：PCT/US2007063462
申请日：2007-03-07
申请人： TOKYO ELECTRON LTD , TOKYO ELECTRON AMERICA INC , KAUSHAL SANJEEV , SUGISHIMA KENJI , RAO DONTHINENI RAMESH KUMAR
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , RAO DONTHINENI RAMESH KUMAR
IPC分类号： H01L21/00
CPC分类号： H01L21/67253 , H01L21/67242 , H01L21/67248 , H01L21/67288 , H01L2924/0002 , H01L2924/00
摘要： A method and system for non-invasive sensing and monitoring of a processing system (100, 200) employed in semiconductor manufacturing. The method allows for detecting and diagnosing drift and failures in the processing system (100, 200) and taking the appropriate correcting measures. The method includes positioning at least one non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906) on an outer surface of a system component of the processing system (200), where the at least one invasive sensor forms a wireless sensor network (902), acquiring a sensor signal from the at least one non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906), where the sensor signal tracks a gradual or abrupt change in a processing state of the system component during flow of a process gas in contact with the system component, and extracting the sensor signal from the wireless sensor network (902) to store and process the sensor signal. In one embodiment, the non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906) can be an accelerometer sensor and the wireless sensor network (902) can be motes-based.
摘要翻译：一种用于半导体制造中使用的处理系统（100,200）的非侵入式感测和监测的方法和系统。该方法允许检测和诊断处理系统（100,200）中的漂移和故障并采取适当的校正措施。该方法包括将至少一个非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）定位在处理系统（200）的系统部件的外表面上，其中至少一个入侵传感器形成无线传感器网络（902），从至少一个非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）获取传感器信号，其中传感器信号跟踪在与系统部件接触的处理气体的流动期间系统部件的处理状态的逐渐或突然的变化，以及从无线传感器网络（902）提取传感器信号以存储和处理传感器信号。在一个实施例中，非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）可以是加速度计传感器，并且无线传感器网络（902）可以是基于空白的。

5. 发明申请

WO2007112181A2 METHOD OF MONITORING A SEMICONDUCTOR PROCESSING SYSTEM USING A WIRELESS SENSOR NETWORK 审中-公开
标题翻译：使用无线传感器网络监测半导体处理系统的方法
公开(公告)号：WO2007112181A2
公开(公告)日：2007-10-04
申请号：PCT/US2007063466
申请日：2007-03-07
申请人： TOKYO ELECTRON LTD , TOKYO ELECTRON AMERICA INC , KAUSHAL SANJEEV , SUGISHIMA KENJI , RAO DONTHINENI RAMESH KUMAR
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , RAO DONTHINENI RAMESH KUMAR
IPC分类号： H01L21/00
CPC分类号： H01L21/67253
摘要： A method and system for non-invasive sensing and monitoring of a processing system (100, 200) employed in semiconductor manufacturing. The method allows for detecting and diagnosing drift and failures in the processing system (100, 200) and taking the appropriate correcting measures. The method includes positioning at least one non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906) on an outer surface of a system component of the processing system (200), where the at least one non- invasive sensor forms a wireless sensor network (902), acquiring a sensor signal from the at least one non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906), where the sensor signal tracks a gradual or abrupt change in a processing state of the system component during flow of a process gas in contact with the system component, and extracting the sensor signal from the wireless sensor network (902) to store and process the sensor signal. In one embodiment, the non-invasive sensor (247a-d, 248a-b, 249a-b, 250a-c, 906) can be an accelerometer sensor and the wireless sensor network (902) can be motes-based.
摘要翻译：一种用于在半导体制造中使用的处理系统（100,200）的无创感测和监测的方法和系统。该方法允许检测和诊断处理系统（100,200）中的漂移和故障并采取适当的校正措施。该方法包括将至少一个非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）定位在处理系统（200）的系统部件的外表面上，其中至少一个非侵入式传感器形成无线传感器网络（902），从所述至少一个非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）获取传感器信号，其中所述传感器信号跟踪在与系统部件接触的过程气体流动期间系统部件的处理状态中的逐渐或突然的变化，并且从无线传感器网络（902）提取传感器信号以存储和处理传感器信号。在一个实施例中，非侵入式传感器（247a-d，248a-b，249a-b，250a-c，906）可以是加速计传感器并且无线传感器网络（902）可以是基于微粒的。

6. 发明申请

WO2006081023A3 METHOD AND APPARATUS FOR MONOLAYER DEPOSITION (MLD) 审中-公开
标题翻译：单层沉积法（MLD）的方法与装置
公开(公告)号：WO2006081023A3
公开(公告)日：2006-11-02
申请号：PCT/US2005046495
申请日：2005-12-21
申请人： TOKYO ELECTRON LTD , TOKYO ELECTRON AMERICA INC , KAUSHAL SANJEEV , PANDEY PRADEEP , SUGISHIMA KENJI
发明人： KAUSHAL SANJEEV , PANDEY PRADEEP , SUGISHIMA KENJI
IPC分类号： C23C16/455 , C23C16/52 , C30B15/16 , C30B25/14
CPC分类号： C23C16/45527 , C23C16/52
摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the Monolayer Deposition (MLD) processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.
摘要翻译：提出了一种包括多变量控制器的自适应实时热处理系统。该方法包括创建单层沉积（MLD）处理系统的动态模型，并将虚拟传感器并入动态模型中。该方法包括使用包括智能设定点，动态模型和/或虚拟传感器的过程配方。

7. 发明申请

WO2014074221A4 AUTONOMOUS TOOL PARAMETER IMPACT IDENTIFICATION FOR SEMICONDUCTOR MANUFACTURING 审中-公开
标题翻译：自动化工具半导体制造的参数影响鉴定
公开(公告)号：WO2014074221A4
公开(公告)日：2014-07-31
申请号：PCT/US2013059715
申请日：2013-09-13
申请人： TOKYO ELECTRON LTD , KAUSHAL SANJEEV
发明人： KAUSHAL SANJEEV , PATEL SUKESH JANUBHAI , POLAK WOLFGANG , WATERMAN AARON ARCHER , WOLFE ORION
IPC分类号： H01L21/02 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/45031 , G06N99/005 , Y02P90/22 , Y02P90/86
摘要： A system and method for autonomously determining the impact of respective tool parameters on tool performance in a semiconductor manufacturing system is provided. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
摘要翻译：提供了一种用于在半导体制造系统中自主确定各个刀具参数对刀具性能的影响的系统和方法。参数冲击识别系统接收半导体制造系统的一个或多个过程运行的工具参数和工具性能数据，并且根据单个工具参数为每个刀具参数生成表征刀具性能指标行为的单独功能。然后根据功能预测刀具性能指标的实际行为，或者根据刀具性能指标对单刀具参数变化的确定灵敏度，对每个功能进行刻痕。然后根据这些分数对工具参数进行排名，并根据排名得出一组关键工具参数。然后，可以基于这组减少的刀具参数来建模刀具性能指标。

8. 发明申请

WO2005076075A3 ADAPTIVE REAL TIME CONTROL OF A RETICLE/MASK SYSTEM 审中-公开
标题翻译：自适应/掩蔽系统的自适应实时控制
公开(公告)号：WO2005076075A3
公开(公告)日：2006-04-27
申请号：PCT/US2005002064
申请日：2005-01-19
申请人： TOKYO ELECTRON LTD , TOKYO ELECTRON AMERICA INC , KAUSHAL SANJEEV , PANDEY PRADEEP , SUGASHIMA KENJI
发明人： KAUSHAL SANJEEV , PANDEY PRADEEP , SUGASHIMA KENJI
IPC分类号： G03F1/00 , F23N1/00 , G03F20060101 , G03F1/14 , G03F7/20
CPC分类号： G03F1/68 , G03F1/78 , H01L21/67248
摘要： An adaptive real time thermal processing system is presented that includes a multivariable controller (260). Generally, the method (1600) includes creating a dynamic model of the thermal processing system (1630); incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints (1650); creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time.
摘要翻译：提出了一种包括多变量控制器（260）的自适应实时热处理系统。通常，方法（1600）包括创建热处理系统（1630）的动态模型; 在动态模型中结合掩模/掩模曲率; 将扩散扩增模型耦合到动态热模型中; 创建一个多变量控制器; 将标称设定值参数化为智能设定值的向量（1650）; 创建一个过程敏感性矩阵; 使用有效的优化方法和过程数据创建智能设定点; 并建立在运行期间选择合适的模型和设定值的配方。

9. 发明专利

DE60219903T2 未知
公开(公告)号：DE60219903T2
公开(公告)日：2008-01-17
申请号：DE60219903
申请日：2002-03-20
申请人： TOKYO ELECTRON LTD
发明人： MAKIYA TOSHIYUKI , SAITO TAKANORI , EICKMANN KARUKI , KAUSHAL SANJEEV , DIP ANTHONY , O'MEARA DAVID L
IPC分类号： G01K7/02 , H01L21/31 , C23C16/46 , G01K1/20 , G01K7/04 , H01L21/22
摘要： A antireflective film 50 is formed on a thermocouple 42 arranged in a processing vessel 1 of a heat treatment apparatus in order to improve the transient response characteristics of the thermocouple 42. In a typical embodiment, the thermocouple 42 is made by connecting a platinum wire 43A and a platinum-rhodium alloy wire 43B, and the antireflective film. 50 is composed by stacking a silicon nitride layer 50C, silicon layer 50B and a silicon nitride layer 50A in that order.

10. 发明专利

SG192019A1 IMPROVING TOOL PERFORMANCE BY LINKING SPECTROSCOPIC INFORMATION WITH TOOL OPERATIONAL PARAMETERS AND MATERIAL MEASUREMENTS 未知
公开(公告)号：SG192019A1
公开(公告)日：2013-08-30
申请号：SG2013054796
申请日：2012-01-17
申请人： TOKYO ELECTRON LTD
发明人： KAUSHAL SANJEEV , PATEL SUKESH JANUBHAI , SUGISHIMA KENJI
摘要： System(s) and method(s) are provided for adjustment and analysis of performance of a tool through integration of tool operational data and spectroscopic data related to the tool. Such integration results in consolidated data that enable, in part, learning at least one relationship amongst selected portions of the consolidated data. Learning is performed autonomously without human intervention. Adjustment of performance of the tool relies at least in part on a learned relationship and includes generation of process recipe parameter(s) that can adjust a manufacturing process in order to produce a satisfactory tool performance in response to implementation of the manufacturing process. A process recipe parameter can be generated by solving an inverse problem based on the learned relationship. Analysis of performance of the tool can include assessment of synthetic performance scenarios, identification of spectroscopic condition(s) that affect performance, and extraction of endpoints based at least on time dependence spectroscopic data.

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