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1. 发明申请

WO2012129249A3 BIOLOGICALLY BASED CHAMBER MATCHING 审中-公开
标题翻译：基于生物学的腔室匹配
公开(公告)号：WO2012129249A3
公开(公告)日：2014-05-01
申请号：PCT/US2012029847
申请日：2012-03-20
申请人： TOKYO ELECTRON LTD , KAUSHAL SANJEEV , SUGISHIMA KENJI , PATEL SUKESH JANUBHAI , FILMAN ROBERT , POLAK WOLFGANG , WOLFE ORION , BURGER JESSIE
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , PATEL SUKESH JANUBHAI , FILMAN ROBERT , POLAK WOLFGANG , WOLFE ORION , BURGER JESSIE
IPC分类号： G06F15/18
CPC分类号： G06N99/005 , G05B23/0237 , G06F3/04842
摘要： The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.
摘要翻译：本公开涉及自动学习应用于任意半导体制造工具的多个制造工具参数之间的关系以及至少部分由自主学习系统支持的图形用户界面。图形用户界面可以基于接收到的数据创建一个或多个矩阵，并且可以通过转换一个或多个矩阵来进一步生成附加矩阵。可以输出一系列窗口，其中该系列窗口提供包括聚焦室和参考室之间的匹配的性能分析。在一个方面，聚焦室和参考室可以是不同的室。在另一方面，聚焦室和参考室可以是相同的室，其提供了相同室随时间的性能劣化的分析。

2. 发明申请

WO2014074221A4 AUTONOMOUS TOOL PARAMETER IMPACT IDENTIFICATION FOR SEMICONDUCTOR MANUFACTURING 审中-公开
标题翻译：自动化工具半导体制造的参数影响鉴定
公开(公告)号：WO2014074221A4
公开(公告)日：2014-07-31
申请号：PCT/US2013059715
申请日：2013-09-13
申请人： TOKYO ELECTRON LTD , KAUSHAL SANJEEV
发明人： KAUSHAL SANJEEV , PATEL SUKESH JANUBHAI , POLAK WOLFGANG , WATERMAN AARON ARCHER , WOLFE ORION
IPC分类号： H01L21/02 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32187 , G05B2219/45031 , G06N99/005 , Y02P90/22 , Y02P90/86
摘要： A system and method for autonomously determining the impact of respective tool parameters on tool performance in a semiconductor manufacturing system is provided. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
摘要翻译：提供了一种用于在半导体制造系统中自主确定各个刀具参数对刀具性能的影响的系统和方法。参数冲击识别系统接收半导体制造系统的一个或多个过程运行的工具参数和工具性能数据，并且根据单个工具参数为每个刀具参数生成表征刀具性能指标行为的单独功能。然后根据功能预测刀具性能指标的实际行为，或者根据刀具性能指标对单刀具参数变化的确定灵敏度，对每个功能进行刻痕。然后根据这些分数对工具参数进行排名，并根据排名得出一组关键工具参数。然后，可以基于这组减少的刀具参数来建模刀具性能指标。

3. 发明公开

KR20180031698A 공간 왜곡 유사도를 사용하는 툴 오류 분석 审中-公开
标题翻译：使用空间扭曲相似度的工具误差分析
公开(公告)号：KR20180031698A
公开(公告)日：2018-03-28
申请号：KR20187003759
申请日：2016-07-15
申请人： TOKYO ELECTRON LTD
发明人： KAUSHAL SANJEEV , PATEL SUKESH , POLAK WOLFGANG , WOLFE ORION
IPC分类号： G05B19/4065
CPC分类号： G05B19/4065 , G05B2219/37242 , G05B2219/37245 , G05B2219/45031
摘要： 제작프로세스들과연관된툴 오류분석을용이하게하기위한시스템들및 기술들이제시된다. 모니터링컴포넌트는하나이상의제작툴과연관된한 세트의센서들에의해생성된센서데이터에기반하여하나이상의제작툴과연관된후보툴 오류를결정한다. 시그니처컴포넌트는하나이상의제작툴과연관된데이터에기반하여후보툴 오류에대한시그니처데이터세트를생성한다. 비교컴포넌트는시그니처데이터세트및 적어도하나의이전에결정된툴 오류와연관된적어도하나의다른시그니처데이터세트에기반하여후보툴 오류를적어도하나의이전에결정된툴 오류와비교한다.
摘要翻译：系统和技术被提出来促进与生产过程相关的工具错误分析。监控组件基于由与一个或多个生产工具相关联的一组传感器生成的传感器数据来确定与一个或多个生产工具相关联的候选工具错误。签名组件基于与一个或多个生产工具相关联的数据生成用于候选工具错误的一组签名数据。比较部件基于签名数据集和与至少一个先前确定的工具误差相关联的至少一个其他签名数据集，将候选工具误差与至少一个先前确定的工具误差进行比较。

4. 发明专利

SG193523A1 BIOLOGICALLY BASED CHAMBER MATCHING 未知
公开(公告)号：SG193523A1
公开(公告)日：2013-10-30
申请号：SG2013070180
申请日：2012-03-20
申请人： TOKYO ELECTRON LTD
发明人： KAUSHAL SANJEEV , SUGISHIMA KENJI , PATEL SUKESH JANUBHAI , FILMAN ROBERT , POLAK WOLFGANG , WOLFE ORION , BURGER JESSIE
摘要： The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.

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