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    • 1. 发明授权
    • Ion implantation apparatus
    • 离子注入装置
    • US5025167A
    • 1991-06-18
    • US533769
    • 1990-06-06
    • Soichiro OkudaTetsuya NakanishiShigeo SasakiKazuhiko Noguchi
    • Soichiro OkudaTetsuya NakanishiShigeo SasakiKazuhiko Noguchi
    • H01J37/09H01J37/304H01J37/317
    • H01J37/09H01J37/304H01J37/3171
    • An ion implantation apparatus comprises an ion beam measuring device to measure and analyze the shape of a beam projected on a substrate for ion implantation and the quantity of current obtained by the ion beam, an analyzing slit member having an opening whose width is changeable, which is located in the ion beam track to extract only implantation ions, and a shaping slit member having an opening whose width is changeable, which is located behind the analyzing slit member to determine the shape of the beam to be projected on the substrate for ion implantation, wherein the widths of the openings of the analyzing slit member and the shaping slit member are changed on the basis of the shape of the beam and the quantity of current obtained as a result of the measurement by the ion beam measuring device.
    • 离子注入装置包括离子束测量装置,用于测量和分析投影在用于离子注入的基板上的光束的形状和由离子束获得的电流量,分析狭缝部件,其具有宽度可变的开口, 位于离子束轨道中以仅提取注入离子;以及成形狭缝构件,其具有位于分析狭缝构件后面的宽度可变的开口,以确定要投影到用于离子注入的衬底上的光束的形状 其中分析狭缝部件和成形狭缝部件的开口的宽度基于由离子束测量装置测量的结果获得的光束形状和电流量而改变。
    • 3. 发明授权
    • Charged-particle distribution measuring apparatus
    • 带电粒子分布测量装置
    • US4992742A
    • 1991-02-12
    • US436664
    • 1989-11-15
    • Soichiro OkudaShigeo SasakiKazuo YoshidaYoshio YamaneFumiharu Yabunaka
    • Soichiro OkudaShigeo SasakiKazuo YoshidaYoshio YamaneFumiharu Yabunaka
    • G01T1/29
    • G01T1/29
    • A charged-particle distribution measuring apparatus includes a particle passing member having a plurality of through-holes through which portions of a beam of charged particles can pass, a particle trapping member for trapping charged particles that have passed through the through-holes, a recoil particle trapping member disposed between the particle passing member and the particle trapping member, and a mechanism for moving the members to measure the spatial distribution of the charged particle beam. Preferably, the through-holes in the particle passing member are uniformly distributed in a checkerboard pattern. The movement of the members permits measurement of the currents produced by the charged particle beam at various intervals between the locations of the through-holes at the beginning of the measurement. The measurement of the charged particle beam intensity at positions across through the beam, rather than at fixed locations within the beam, improves the resolution of the measured distribution. The apparatus can be employed with positively and negatively charged beams and is useful in ion implantation.
    • 带电粒子分布测量装置包括具有多个通孔的粒子通过部件,带电粒子束的一部分可以通过该通孔,用于捕获穿过通孔的带电粒子的粒子俘获部件,反冲 设置在颗粒通过构件和颗粒捕获构件之间的颗粒捕获构件,以及用于移动构件以测量带电粒子束的空间分布的机构。 优选地,颗粒通过构件中的通孔以棋盘图案均匀分布。 构件的运动允许在测量开始时在通孔的位置之间以各种间隔测量由带电粒子束产生的电流。 通过光束而不是在光束内的固定位置处的位置处的带电粒子束强度的测量提高了测量分布的分辨率。 该装置可以采用带正电荷和带负电荷的束,并且可用于离子注入。