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1. 发明公开

CN108695129A 离子注入装置及离子注入方法有权
公开(公告)号：CN108695129A
公开(公告)日：2018-10-23
申请号：CN201810256674.6
申请日：2018-03-27
申请人：住友重机械离子科技株式会社
发明人：越智秀太 , 二宫史郎 , 高桥裕二 , 香川唯信
IPC分类号： H01J37/317 , H01J37/302
CPC分类号： H01J37/32412 , H01J37/3171 , H01J37/3233 , H01J37/32422 , H01J2237/0045 , H01L21/2236 , H01J37/3023
摘要：本发明提供一种离子注入装置及离子注入方法，能够应对多种射束条件。离子注入装置具备构成为对向晶圆照射的离子束(B)供给电子的等离子体簇射装置(60)。等离子体簇射装置(60)包含：等离子体生成室(62)，具有引出向离子束(B)供给的电子的引出开口(64)；第1电极(71)，具有与引出开口(64)连通的开口(74)，并以等离子体生成室(62)的电位为基准而被施加第1电压；第2电极(72)，配置在隔着离子束(B)而与第1电极(71)相对置的位置，并以等离子体生成室(62)的电位为基准而被施加第2电压；以及控制部(86)，对第1电压及第2电压分别独立地进行控制并切换等离子体簇射装置(60)的动作模式。

2. 发明公开

EP2372743A2 Charged particle beam system with an ion generator 有权
标题翻译：蜂巢TEM TEM。。。。。。
公开(公告)号：EP2372743A2
公开(公告)日：2011-10-05
申请号：EP11172096.7
申请日：2003-09-18
申请人： FEI Company
发明人： Stewart, Diane , Knowles, Ralph , Kimball, Brian
IPC分类号： H01J37/00 , H01J37/244 , H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam (306) system uses an ion generator (302) for charge neutralization on a work piece (307). Secondary or backscattered particles (320) enter a chamber (310) of the ion generator (302) to ionize an ion producing gas there. In some embodiments, the ion generator is configured to maintain an adequate gas pressure in the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber (308), so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束（306）系统使用离子发生器（302）在工件（307）上进行电荷中和。次级或后向散射的颗粒（320）进入离子发生器（302）的室（310），以将离子产生气体离子化。在一些实施例中，离子发生器被配置为在离子发生器中保持足够的气体压力以产生离子，而在真空室（308）的其余部分中减小压力，使得另一个柱可以同时在腔室中操作在疏散过程之后比从离子发生器所需的全部压力排空室所需的工艺要短得多。本发明对于双光束系统中的光刻掩模的修复特别有用。

3. 发明申请

WO2009007668A1 TRANSMISSION ELECTRON MICROSCOPE 审中-公开
标题翻译：传输电子显微镜
公开(公告)号：WO2009007668A1
公开(公告)日：2009-01-15
申请号：PCT/GB2008/001920
申请日：2008-06-05
申请人： MEDICAL RESEARCH COUNCIL , BERRIMAN, John , ROSENTHAL, Peter
发明人： BERRIMAN, John , ROSENTHAL, Peter
IPC分类号： H01J37/02 , H01J37/09 , H01J37/26
CPC分类号： H01J37/026 , H01J37/26 , H01J2237/0045 , H01J2237/0453 , H01J2237/1514
摘要： A transmission electron microscope has a target body position on the electron optical axis of the microscope, and an electrically conductive body off the axis of the microscope. The microscope also has an electron source for producing an axial electron beam. In use, the beam impinges upon a target body located at the target body position. The microscope further has a system for simultaneously producing a separate off-axis electron beam. In use, the off-axis electron beam impinges on the electrically conductive body causing secondary electrons to be emitted therefrom. The electrically conductive body is located such that the emitted secondary electrons impinge on the target body to neutralise positive charge which may build up on the target body.
摘要翻译：透射电子显微镜在显微镜的电子光轴上具有目标体位置，并且离开显微镜轴线的导电体。显微镜还具有用于产生轴向电子束的电子源。在使用中，梁撞击位于目标体位置的目标体。显微镜还具有同时产生单独的离轴电子束的系统。在使用中，离轴电子束照射在导电体上，导致从其发射二次电子。导电体被定位成使得发射的二次电子撞击目标体以中和可能在目标体上累积的正电荷。

4. 发明申请

WO1996031898A1 METHOD AND DEVICE FOR CONTROLLING THE ENERGY OF AT LEAST ONE CHARGED SPECIES BOMBARDING A BODY IMMERSED IN A PLASMA 审中-公开
标题翻译：用于控制至少一个充电物质的能量的方法和装置，其中包含等离子体中的体
公开(公告)号：WO1996031898A1
公开(公告)日：1996-10-10
申请号：PCT/FR1996000524
申请日：1996-04-05
申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) , PELLETIER, Jacques, H. , LAGARDE, Thierry, L. , ARNAL, Yves, A. , BURKE, Rudolf, R. , COCAGNE, Jacques, R. , DEVINE, Roderick, A.
发明人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
IPC分类号： H01J37/32
CPC分类号： H01J37/32623 , H01J37/32688 , H01J37/32706 , H01J2237/0045
摘要： A method for controlling the bombardment of a body (2) arranged in a sealed chamber (3) in which means (6) generate a plasma confined by a multipolar magnetic structure (13). The method comprises generating at least one energised electron stream (b1, b2, ..., bn) separately from the plasma generating means (6) so that said stream is confined by the multipolar magnetic structure (13) and bombards the body (2) with a sufficient strength (Ib1, Ib2, ..., Ibn) and energy to control the energy of at least one of the charged species (ions or electrons) bombarding said body (2).
摘要翻译：一种用于控制布置在密封室（3）中的主体（2）的轰击的方法，其中装置（6）产生由多极磁性结构（13）限制的等离子体。该方法包括与等离子体产生装置（6）分开产生至少一个通电电子流（b1，b2，...，bn），使得所述流被多极磁结构（13）限制并且轰击体（2））具有足够的强度（Ib1，Ib2，...，Ibn）和能量，以控制轰击所述主体（2）的至少一种带电物质（离子或电子）的能量。

5. 发明专利

JP2010533352A Transmission electron microscope 有权
公开(公告)号：JP2010533352A
公开(公告)日：2010-10-21
申请号：JP2010515585
申请日：2008-06-05
申请人：メディカルリサーチカウンシル
发明人：ジョンベリマン , ピーターローゼンタール
IPC分类号： H01J37/26 , H01J37/09 , H01J37/20 , H01J37/295
CPC分类号： H01J37/026 , H01J37/26 , H01J2237/0045 , H01J2237/0453 , H01J2237/1514
摘要：透過型電子顕微鏡を提供する。透過型電子顕微鏡は、顕微鏡の電子光軸上のターゲット本体位置と、顕微鏡の軸外の導電性本体とを有する。顕微鏡はまた、軸方向電子ビームを生成するための電子源を有する。使用中に、ビームは、ターゲット本体位置に位置するターゲット本体上に衝突する。顕微鏡は、更に、別の軸外電子ビームを同時に生成するためのシステムを有する。使用中に、軸外電子ビームは、導電性本体に衝突してそこから２次電子を放出させる。導電性本体は、放出２次電子がターゲット本体上に衝突し、ターゲット本体上に蓄積する可能性がある正電荷を中和するように配置される。
【選択図】図２

6. 发明申请

WO2004027809A3 CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：充电颗粒光束系统
公开(公告)号：WO2004027809A3
公开(公告)日：2004-07-29
申请号：PCT/US0329447
申请日：2003-09-18
申请人： FEI CO , STEWART DIANE K , KNOWLES RALPH W , KIMBALL BRIAN T
发明人： STEWART DIANE K , KNOWLES RALPH W , KIMBALL BRIAN T
IPC分类号： H01J37/244 , G01N23/00 , G01Q30/20 , G01Q70/10 , H01J20060101 , H01J37/00 , H01J37/28
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束系统使用离子发生器进行电荷中和。在一些实施例中，离子发生器被配置为在离子发生器处保持足够的气体压力以在真空室的其余部分中产生离子而减小压力，使得另一个柱可以同时或在排空之后在腔室中操作该过程远远短于从离子发生器所需的全部压力排空室所需的过程。本发明对于双光束系统中的光刻掩模的修复特别有用。

7. 发明申请

WO2004027809A2 CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：带电粒子束系统
公开(公告)号：WO2004027809A2
公开(公告)日：2004-04-01
申请号：PCT/US2003/029447
申请日：2003-09-18
申请人： FEI COMPANY , STEWART, Diane, K. , KNOWLES, Ralph, W. , KIMBALL, Brian, T.
发明人： STEWART, Diane, K. , KNOWLES, Ralph, W. , KIMBALL, Brian, T.
IPC分类号： H01J
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束系统使用离子发生器来进行电荷中和。在一些实施例中，离子发生器被配置为在离子发生器处维持足够的气体压力以产生离子，但是在真空室的其余部分中减压，使得另一个塔可以同时或在排空之后在腔室中操作该过程比离子发生器所需的全压抽真空所需的过程短得多。本发明对修复双光束系统中的光刻掩模特别有用。

8. 发明公开

US20230245848A1 METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION 审中-公开
公开(公告)号：US20230245848A1
公开(公告)日：2023-08-03
申请号：US18023545
申请日：2021-08-27
申请人： ULVAC-PHI, INCORPORATED
发明人： Scott R. Bryan , Gregory L. Fisher , David H. Narum , Ronald E. Negri
IPC分类号： H01J37/02 , H01J37/28
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0045 , H01J2237/2527
摘要： Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons or secondary ions which are detected and provide the modulated signal for imaging of the sample; and dual polarity flood beams to effect neutralization of surface charge and surface potential variation.

9. 发明授权

US11715618B2 System and method for reducing the charging effect in a transmission electron microscope system 有权
公开(公告)号：US11715618B2
公开(公告)日：2023-08-01
申请号：US17392758
申请日：2021-08-03
申请人： FEI Company
发明人： Yuchen Deng , Alexander Henstra , Peter Tiemeijer
IPC分类号： H01J37/02 , H01J37/244 , H01J37/04
CPC分类号： H01J37/026 , H01J37/045 , H01J37/244 , H01J2237/0045 , H01J2237/2448
摘要： Systems and methods for reducing the buildup of charge during the investigation of samples using charged particle beams, according to the present disclosure include irradiating a first portion of a sample during a first time period, wherein the irradiating the first portion of the sample causes a gradual accumulation of net charge in the first portion of the sample, generating imaging data based on emissions resultant from irradiating the first portion of the sample, and then irradiating a second portion of a sample holder for a second time period. The methods may further includes iteratively repeating the irradiation of the first portion and the second portion during imaging of the sample region. When more than one region of interest on the sample is to be investigated, the method may also include continuing to image additional portions of the sample by iteratively irradiating a region of interest on the sample and a corresponding portion of the sample holder.

10. 发明申请

US20140151554A1 System and Method for Controlling Charge-up in an Electron Beam Apparatus 有权
标题翻译：用于控制电子束装置中电荷的系统和方法
公开(公告)号：US20140151554A1
公开(公告)日：2014-06-05
申请号：US14081465
申请日：2013-11-15
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Zhongwei Chen
IPC分类号： H01J37/26 , H01J37/14 , H01J37/29
CPC分类号： H01J37/026 , H01J37/14 , H01J37/261 , H01J37/28 , H01J2237/0045 , H01J2237/0262 , H01J2237/1405 , H01J2237/2801 , H01J2237/2803
摘要： The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
摘要翻译：本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

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