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    • 2. 发明授权
    • Method of making an electrostatic chuck with reduced plasma penetration and arcing
    • 制造具有降低的等离子体穿透和电弧放电的静电卡盘的方法
    • US08108981B2
    • 2012-02-07
    • US11888327
    • 2007-07-31
    • Dmitry LubomirskyKadthala Ramaya NarendranathXinglong ChenSudhir GondhalekarMuhammad RasheedTony Kaushal
    • Dmitry LubomirskyKadthala Ramaya NarendranathXinglong ChenSudhir GondhalekarMuhammad RasheedTony Kaushal
    • B23P17/00
    • H02N13/00H01L21/6833Y10T29/49117Y10T29/49885
    • A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum.
    • 一种制造静电卡盘的方法,包括将板定位在主体中的通道中以形成气室,并将电介质部件插入板中的开口中,其中介电部件限定了来自气室的通道的一部分。 此后,沉积覆盖主体的至少一部分和板的至少一部分以形成支撑表面的电介质层。 将电介质层抛光至规定的厚度。 在一个实施例中,抛光工艺形成通过介电层的开口,以使得介质部件能够在支撑表面和集气室之间限定通道。 在另一个实施例中,电介质层的至少一部分在绝缘元件附近是多孔的,使得多孔介电层和电介质元件在支撑表面和增压室之间形成通道。 在另一实施例中,穿过电介质层形成孔,并且电介质层中的孔和电介质元件在支撑表面和气室之间形成通道。
    • 3. 发明申请
    • Method of making an electrostatic chuck with reduced plasma penetration and arcing
    • 制造具有降低的等离子体穿透和电弧放电的静电卡盘的方法
    • US20090034148A1
    • 2009-02-05
    • US11888327
    • 2007-07-31
    • Dmitry LubomirskyXinglong ChenSudhir GondhalekarKadthala Ramaya NarendrnathMuhammad RasheedTony Kaushal
    • Dmitry LubomirskyXinglong ChenSudhir GondhalekarKadthala Ramaya NarendrnathMuhammad RasheedTony Kaushal
    • H02N13/00
    • H02N13/00H01L21/6833Y10T29/49117Y10T29/49885
    • A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum.
    • 一种制造静电卡盘的方法,包括将板定位在主体中的通道中以形成气室,并将电介质部件插入板中的开口中,其中介电部件限定了来自气室的通道的一部分。 此后,沉积覆盖主体的至少一部分和板的至少一部分以形成支撑表面的电介质层。 将电介质层抛光至规定的厚度。 在一个实施例中,抛光工艺形成通过介电层的开口,以使得介质部件能够在支撑表面和集气室之间限定通道。 在另一个实施例中,电介质层的至少一部分在绝缘元件附近是多孔的,使得多孔介电层和电介质元件在支撑表面和增压室之间形成通道。 在另一实施例中,穿过电介质层形成孔,并且电介质层中的孔和电介质元件在支撑表面和气室之间形成通道。