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1. 发明授权

US5698942A Field emitter flat panel display device and method for operating same 失效
标题翻译：场致发射体平板显示装置及其操作方法
公开(公告)号：US5698942A
公开(公告)日：1997-12-16
申请号：US681227
申请日：1996-07-22
申请人： Richard F. Greene , Stephen M. Bobbio , Farid M. Tranjan , Kasra Daneshvar , Thomas D. DuBois
发明人： Richard F. Greene , Stephen M. Bobbio , Farid M. Tranjan , Kasra Daneshvar , Thomas D. DuBois
IPC分类号： G09G3/22 , H01J3/02 , H01J1/30
CPC分类号： G09G3/22 , H01J3/022 , G09G2300/08 , H01J2329/00
摘要： A field emitter flat panel display and associated method of operation provides an electron emission path along which a beam of electrons emitted by a microelectronic field emitter travels such that the electrons impinge upon a light emitting element without passing through a mirror. The light emitting element is spaced apart from the microelectronic field emitter and includes a mirror and a luminescence layer on the mirror. The flat panel display can also include a deflector, such as a deflector electrode, which is spaced apart from both the microelectronic field emitter and the associated light emitting element and which controllably deflects the beam of electrons emitted by the microelectronic field emitter toward the luminescent layer of the associated light emitting element and along a curved electron emission path which is independent of the underlying mirror. Since the energy of the electrons is not dissipated by passing through a mirror prior to impinging upon the luminescent layer, the field emitter flat panel display and, more particularly, the microelectronic field emitter can be efficiently driven at relatively low voltage levels while still producing a relatively bright display.
摘要翻译：场发射器平板显示器和相关联的操作方法提供电子发射路径，微电子场发射器发射的电子束沿着该发射路径行进，使得电子撞击在发光元件上而不通过反射镜。发光元件与微电子场发射器间隔开，并且在反射镜上包括反射镜和发光层。平板显示器还可以包括偏转器电极，偏转器电极与微电子场发射器和相关联的发光元件两者间隔开，并且可控地将微电子场发射器发射的电子束偏转到发光层并且沿着独立于下面的反射镜的弯曲电子发射路径。由于在撞击发光层之前电子的能量不会通过反射镜而消散，所以可以在相当低的电压电平下有效地驱动场致发射体平板显示器，更具体地说，微电子场发射器驱动，同时仍然产生比较明亮的显示。

2. 发明授权

US5479061A Pleated sheet microelectromechanical transducer 失效
标题翻译：褶皱片微机电换能器
公开(公告)号：US5479061A
公开(公告)日：1995-12-26
申请号：US999161
申请日：1992-12-31
申请人： Stephen M. Bobbio , Thomas D. DuBois , Bruce W. Dudley , Susan K. Jones , Mark D. Kellam , Farid M. Tranjan
发明人： Stephen M. Bobbio , Thomas D. DuBois , Bruce W. Dudley , Susan K. Jones , Mark D. Kellam , Farid M. Tranjan
IPC分类号： H02N1/00
CPC分类号： H02N1/006
摘要： An electrically and mechanically robust microelectromechanical transducer is formed of a pleated dielectric sheet having patterned electrical conductors on the opposing faces thereof. The pleats define a plurality of spaced apart walls, with each wall including an electrically conductive portion at one side thereof. Positive and negative voltages, applied to opposite faces of the pleated sheet, cause the walls to move towards one another by electrostatic attraction. The walls can also move away from one another by electrostatic repulsion upon application of appropriate voltages. The microelectromechanical transducer may be fabricated by fabricating a sheet with integral pleats or by forming a "self-pleating" flat sheet which forms pleats after conductor fabrication thereon.
摘要翻译：电和机械鲁棒的微电子机械换能器由在其相对面上具有图案化电导体的折叠电介质片形成。褶皱限定多个间隔开的壁，每个壁在其一侧包括导电部分。施加到打褶片的相对面的正电压和负电压导致壁通过静电吸引而相互移动。在施加适当的电压时，壁也可以通过静电排斥而相互远离。微机电换能器可以通过制造具有整体褶皱的片材或者通过形成在其上制造导体之后形成褶皱的“自打褶”平板来制造。

3. 发明授权

US5248760A Chemically cured low temperature polyimides 失效
标题翻译：化学固化低温聚合物
公开(公告)号：US5248760A
公开(公告)日：1993-09-28
申请号：US646362
申请日：1991-01-25
申请人： Thomas D. DuBois , Farid M. Tranjan , Stephen M. Bobbio
发明人： Thomas D. DuBois , Farid M. Tranjan , Stephen M. Bobbio
IPC分类号： C08G73/10
CPC分类号： C08G73/1028
摘要： The invention comprises curing polyamic acid solutions into polyimide solutions by adding a hydrophilic reagent to a polyamic acid solution. The hydrophilic reagent is selected to have little or no reactivity with amines or carboxylic acids, and is of the type that will react with water to form by-products that shift the equilibrium between polyamic acid as a reactant and polyimide and water as products toward the production of polyimide.
摘要翻译：本发明包括通过向聚酰胺酸溶液中加入亲水性试剂将聚酰胺酸溶液固化成聚酰亚胺溶液。选择亲水试剂与胺或羧酸几乎没有或没有反应性，并且是与水反应以形成副产物的类型，其将作为反应物的聚酰胺酸和聚酰亚胺和水之间的平衡作为产物转移到生产聚酰亚胺。

4. 发明授权

US4968582A Photoresists resistant to oxygen plasmas 失效
标题翻译：耐氧等离子体的光刻胶
公开(公告)号：US4968582A
公开(公告)日：1990-11-06
申请号：US212440
申请日：1988-06-28
申请人： Farid M. Tranjan , Thomas D. DuBois , Rudolf G. Frieser , Stephen M. Bobbio , Susan K. S. Jones
发明人： Farid M. Tranjan , Thomas D. DuBois , Rudolf G. Frieser , Stephen M. Bobbio , Susan K. S. Jones
IPC分类号： G03F7/004 , G03F7/022 , G03F7/36 , H01L21/027
CPC分类号： G03F7/0226 , G03F7/004 , G03F7/36 , Y10S430/136
摘要： The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.

5. 发明授权

US5609290A Fluxless soldering method 失效
标题翻译：无焊接方法
公开(公告)号：US5609290A
公开(公告)日：1997-03-11
申请号：US425864
申请日：1995-04-20
申请人： Stephen M. Bobbio , Thomas D. DuBois , Farid M. Tranjan , George K. Lucey, Jr. , James D. Geis , Robert F. Lipscomb , Timothy Piekarski
发明人： Stephen M. Bobbio , Thomas D. DuBois , Farid M. Tranjan , George K. Lucey, Jr. , James D. Geis , Robert F. Lipscomb , Timothy Piekarski
IPC分类号： B23K1/20 , H05K3/34
CPC分类号： B23K1/20
摘要： A fluxless soldering method utilizing a strongly internally bonded fluorine containing gas such as hydrogen fluoride (HF). The solder surface is exposed to the gas in place of a flux treatment, resulting in a modified surface layer which allows reflow or joining for an extended period.
摘要翻译：利用氟化氢（HF）等强内部结合含氟气体的无助焊剂法。焊料表面暴露于气体代替焊剂处理，从而形成一个经过改良的表面层，允许回流或连续延长一段时间。

6. 发明授权

US5393642A Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions 失效
标题翻译：有机树脂和光致抗蚀剂的离子改性以产生光敏抗蚀组合物
公开(公告)号：US5393642A
公开(公告)日：1995-02-28
申请号：US999208
申请日：1992-12-31
申请人： Thomas D. DuBois , Farid M. Tranjan , Stephen M. Bobbio
发明人： Thomas D. DuBois , Farid M. Tranjan , Stephen M. Bobbio
IPC分类号： G03F7/016 , G03F7/09
CPC分类号： G03F7/0163 , Y10S430/115 , Y10S430/126
摘要： A photoresist composition is disclosed that comprises an organic resin that is thermoset by acid catalysis and a photoactive, etch-resistant ionic modifier formed of an anion and a cation. The modifier is present in the organic resin in an amount effective to produce substantial photoreactivity and etch resistance in a mixture of the resin and the modifier. The cation will, upon exposure to electromagnetic radiation, produce a species that is weakly basic or neutral, and the anion will, upon exposure to electromagnetic radiation, produce an acid precursor that will form a relatively strong acid in an acid-base solvent system. As a result, the relatively strong acid will catalyze the organic resin upon exposure to an appropriate frequency of electromagnetic radiation and the relatively weak base or neutral species formed by the cation will not substantially neutralize the acid or interfere with the acid catalyzed reaction of the organic resin.
摘要翻译：公开了一种光致抗蚀剂组合物，其包含通过酸催化热固性的有机树脂和由阴离子和阳离子形成的光敏抗蚀刻离子改性剂。改性剂以有效产生在树脂和改性剂的混合物中的显着的光反应性和耐蚀刻性的量存在于有机树脂中。阳离子在暴露于电磁辐射时会产生弱碱性或中性的物质，阴离子在暴露于电磁辐射时会产生在酸碱溶剂体系中形成较强酸的酸前体。结果，相对较强的酸将在暴露于适当频率的电磁辐射时催化有机树脂，并且由阳离子形成的相对弱的碱或中性物质基本上不会中和酸或干扰有机酸的酸催化反应树脂。

7. 发明授权

US5434464A Unidirectional supporting structure for microelectromechanical transducers 失效
标题翻译：微机电换能器的单向支撑结构
公开(公告)号：US5434464A
公开(公告)日：1995-07-18
申请号：US247562
申请日：1994-05-23
申请人： Stephen M. Bobbio , Thomas D. DuBois , Farid M. Tranjan , Youssef Bousaba , James D. Jacobson , Scott H. Goodwin-Johansson , Kerstin McKay
发明人： Stephen M. Bobbio , Thomas D. DuBois , Farid M. Tranjan , Youssef Bousaba , James D. Jacobson , Scott H. Goodwin-Johansson , Kerstin McKay
IPC分类号： H02N1/00
CPC分类号： H02N1/008
摘要： A microelectromechanical transducer including a plurality of parallel electrically conductive strips maintained in closely spaced relation by a plurality of spacers can generate useful displacements and forces. The transducer can be strengthened by arranging the conductive strips in cells surrounded by unidirectional cell stiffening members and unidirectional displacement limiting members. The unidirectional cell stiffening members may include notches. The unidirectional displacement limiting members may include unidirectional buckling straps or flexible arches. The cells of electrically conductive strips can be organized in modular or fractal arrays.
摘要翻译：包括由多个间隔物保持紧密间隔关系的多个平行导电条的微机电换能器可产生有用的位移和力。可以通过将导电条布置在由单向电池加强构件和单向位移限制构件包围的电池中来加强换能器。单向电池加强构件可以包括凹口。单向位移限制构件可以包括单向弯曲带或柔性拱形。导电条的细胞可以以模块化或分形阵列组织。

8. 发明授权

US5114827A Photoresists resistant to oxygen plasmas 失效
标题翻译：耐氧等离子体的光刻胶
公开(公告)号：US5114827A
公开(公告)日：1992-05-19
申请号：US585708
申请日：1990-09-20
申请人： Farid M. Tranjan , Thomas D. DuBois , Rudolf G. Frieser , Stephen M. Bobbio , Susan K. S. Jones
发明人： Farid M. Tranjan , Thomas D. DuBois , Rudolf G. Frieser , Stephen M. Bobbio , Susan K. S. Jones
IPC分类号： G03F7/004 , G03F7/022 , G03F7/36
CPC分类号： G03F7/004 , G03F7/0226 , G03F7/36
摘要： The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.
摘要翻译：本发明是一种改进的有机光致抗蚀剂，其耐氧蚀等离子体中的蚀刻性能，因此特别适用于在VLSI和高级封装应用中掩蔽和蚀刻有机聚合物材料。本发明包括向常规光致抗蚀剂中加入含磷化合物。含磷化合物的类型和数量有效地基本上防止在含氧等离子体中蚀刻改性光致抗蚀剂而基本上不利地影响光致抗蚀剂的光敏性或弹性或在其中形成的耐蚀刻膜的粘附性含氧等离子体暴露于待图案化和蚀刻的下层材料。

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