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    • 1. 发明授权
    • Field emitter flat panel display device and method for operating same
    • 场致发射体平板显示装置及其操作方法
    • US5698942A
    • 1997-12-16
    • US681227
    • 1996-07-22
    • Richard F. GreeneStephen M. BobbioFarid M. TranjanKasra DaneshvarThomas D. DuBois
    • Richard F. GreeneStephen M. BobbioFarid M. TranjanKasra DaneshvarThomas D. DuBois
    • G09G3/22H01J3/02H01J1/30
    • G09G3/22H01J3/022G09G2300/08H01J2329/00
    • A field emitter flat panel display and associated method of operation provides an electron emission path along which a beam of electrons emitted by a microelectronic field emitter travels such that the electrons impinge upon a light emitting element without passing through a mirror. The light emitting element is spaced apart from the microelectronic field emitter and includes a mirror and a luminescence layer on the mirror. The flat panel display can also include a deflector, such as a deflector electrode, which is spaced apart from both the microelectronic field emitter and the associated light emitting element and which controllably deflects the beam of electrons emitted by the microelectronic field emitter toward the luminescent layer of the associated light emitting element and along a curved electron emission path which is independent of the underlying mirror. Since the energy of the electrons is not dissipated by passing through a mirror prior to impinging upon the luminescent layer, the field emitter flat panel display and, more particularly, the microelectronic field emitter can be efficiently driven at relatively low voltage levels while still producing a relatively bright display.
    • 场发射器平板显示器和相关联的操作方法提供电子发射路径,微电子场发射器发射的电子束沿着该发射路径行进,使得电子撞击在发光​​元件上而不通过反射镜。 发光元件与微电子场发射器间隔开,并且在反射镜上包括反射镜和发光层。 平板显示器还可以包括偏转器电极,偏转器电极与微电子场发射器和相关联的发光元件两者间隔开,并且可控地将微电子场发射器发射的电子束偏转到发光层 并且沿着独立于下面的反射镜的弯曲电子发射路径。 由于在撞击发光层之前电子的能量不会通过反射镜而消散,所以可以在相当低的电压电平下有效地驱动场致发射体平板显示器,更具体地说,微电子场发射器驱动,同时仍然产生 比较明亮的显示。
    • 3. 发明授权
    • Heterojunction Schottky gate MESFET with lower channel ridge barrier
    • 异质结肖特基门MESFET具有较低的沟道脊障
    • US4499481A
    • 1985-02-12
    • US532122
    • 1983-09-14
    • Richard F. Greene
    • Richard F. Greene
    • H01L21/20H01L29/10H01L29/778H01L29/80
    • H01L29/1029H01L21/02395H01L21/02532H01L21/02546H01L21/02609H01L21/0262H01L21/02631H01L29/7781
    • An FET with an extremely short channel formed by the apex of a substrate ridge structure protruding upward through the channel layer toward a Schottky-barrier gate contact. The device is formed by etching a modulation-doped substrate to form an upwardly protruding ridge with the apex modulation-doped. A semiconductor layer is then disposed over the substrate surface with the protruding ridge to obtain an epitaxial interface therebetween. Source and drain regions are doped into the semiconductor layer on opposite sides of the ridge structure. Finally, ohmic contacts are formed on the semiconductor layer over the source and drain regions and a Schottky-barrier metalization is deposited on the semiconductor layer above the ridge structure. This device has a very short channel, a low transit time, a low gate capacitance, and an enhanced transconductance.
    • 具有由衬底脊结构的顶点形成的极短通道的FET,其通过沟道层朝向肖特基势垒栅极接触向上突出。 该器件通过蚀刻掺杂掺杂衬底形成具有顶点调制掺杂的向上突出的脊。 然后将半导体层设置在具有突出脊的衬底表面上,以在它们之间获得外延界面。 源区和漏区被掺杂到脊结构的相对侧上的半导体层中。 最后,在源极和漏极区域上的半导体层上形成欧姆接触,并且在脊结构上方的半导体层上沉积肖特基势垒金属化。 该器件具有非常短的通道,低通常时间,低栅极电容和增强的跨导。
    • 4. 发明授权
    • Method of manufacturing a field-emission cathode structure
    • 场致发射阴极结构的制造方法
    • US4307507A
    • 1981-12-29
    • US185702
    • 1980-09-10
    • Henry F. GrayRichard F. Greene
    • Henry F. GrayRichard F. Greene
    • H01J9/02B01J17/00H01J1/02
    • H01J9/025Y10S148/05
    • A method of manufacturing a field-emitter array cathode structure in which substrate of single crystal material is selectively masked such that the unmasked areas define islands on the underlying substrate. The single crystal material under the unmasked areas is orientation-dependent etched to form an array of holes whose sides intersect at a crystallographically sharp point. Following removal of the mask, the substrate is covered with a thick layer of material capable of emitting electrons which extends above the substrate surface and fills the holes. Thereafter, the material of the substrate underneath the layer of electron-emitting material is etched to expose a plurality of sharp field-emitter tips.
    • 一种制造场致发射阵列阴极结构的方法,其中单晶材料的衬底被选择性地屏蔽,使得未掩模的区域在下面的衬底上限定岛。 在未掩模区域下的单晶材料是取向依赖蚀刻以形成一组孔,其侧面在结晶学尖锐点处相交。 除去掩模之后,用能够发射电子的厚的材料层覆盖衬底,该材料在衬底表面上延伸并填充孔。 此后,蚀刻在电子发射材料层下面的衬底的材料以暴露多个尖锐的场发射器尖端。
    • 6. 发明授权
    • Method for growing patterned thin films of superconductors
    • 用于生长超导体的图案化薄膜的方法
    • US4843060A
    • 1989-06-27
    • US123629
    • 1987-11-23
    • Howard LessoffRichard F. Greene
    • Howard LessoffRichard F. Greene
    • H01L39/24
    • H01L39/2464H01L39/2425
    • A method for growing a patterned superconductive oxide film of the general formula XZ.sub.2 Cu.sub.3 O.sub.6+x is disclosed, wherein X is yttrium, a lanthanide or a mixture thereof, Z is one or more alkaline earth elements and x is a number between 0 and 1. This patterned superconductive oxide film of XZ.sub.2 Cu.sub.3 O.sub.6+x is formed by preparing an aqueous solutuion of the nitrates of X, Z and Cu in the X:Z:Cu stoichiometric ratio of 1:2:3; spraying the aqueous nitrate solution onto a heated substrate to form on the substrate a thin film of XZ.sub.2 Cu.sub.3 O.sub.y material, wherein y is an undefined number; spot-heating preselected portions of the thin film in an oxygen-rich atmosphere to convert the preselected portions into the patterned superconductive oxide film of XZ.sub.2 Cu.sub.3 O.sub.6+x ; and removing the unheated thin film of XZ.sub.2 Cu.sub.3 O.sub.y material with a solvent.
    • 公开了用于生长通式XZ2Cu3O6 + x的图案化超导氧化物膜的方法,其中X是钇,镧系元素或其混合物,Z是一种或多种碱土金属元素,x是0和1之间的数字。 XZ2Cu3O6 + x的图案超导氧化物膜通过以X:Z:Cu化学计量比为1:2:3制备X,Z和Cu的硝酸盐的水溶液而形成; 将硝酸水溶液喷洒到加热的基底上以在基底上形成XZ2Cu3Oy材料的薄膜,其中y是未定义数; 在富氧气氛中点状加热薄膜的预选部分,以将预选部分转化成XZ2Cu3O6 + x的图案化超导氧化物膜; 并用溶剂除去XZ2Cu3Oy材料的未加热薄膜。
    • 8. 发明授权
    • Field emitter array
    • 场发射器阵列
    • US5150192A
    • 1992-09-22
    • US718034
    • 1991-06-20
    • Richard F. GreeneHenry F. Gray
    • Richard F. GreeneHenry F. Gray
    • H01J1/304H01J9/02
    • H01J1/3042H01J9/025H01J2209/0226
    • A field emitter structure is disclosed which comprises: a substrate selec from the group consisting of a semi-insulating substrate and an insulating substrate, the substrate having first and second surfaces and at least one hole therethrough; a first conducting layer disposed on the first surface of the substrate and having at least one aperture aligned with an associated at least one hole in the substrate, the at least one aperture of the first conducting layer comprising an extraction electrode; and a second conducting layer disposed on the second surface and projecting into the at least one hole in the substrate and into the at least one associated aperture of the first conducting layer and forming at least one associated apex inside the at least one hole, the at least one associated apex comprising an associated electron field emitter. In a second embodiment of the invention, a conducting substrate is substituted for the insulating or semi-insulating substrate, a first insulating layer is disposed between the first surface of the conducting substrate and the first conducting layer, and the second conducting layer disposed on the second surface also projects through at least one associated aperture of the first insulating later.
    • 公开了一种场致发射器结构,其包括:选自由半绝缘衬底和绝缘衬底组成的组的衬底,所述衬底具有第一和第二表面以及穿过其中的至少一个孔; 第一导电层,其设置在所述基板的所述第一表面上,并且具有与所述基板中的相关联的至少一个孔对准的至少一个孔,所述第一导电层的所述至少一个孔包括引出电极; 以及第二导电层,其设置在所述第二表面上并且突出到所述衬底中的所述至少一个孔中并且进入所述第一导电层的所述至少一个相关联的孔中,并且在所述至少一个孔内形成至少一个相关联的顶点, 至少一个相关联的顶点包括相关的电子场发射器。 在本发明的第二实施例中,导电衬底代替绝缘或半绝缘衬底,第一绝缘层设置在导电衬底的第一表面和第一导电层之间,第二导电层设置在第二导电层上 第二表面也突出穿过稍后的第一绝缘体的至少一个相关联的孔。