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1. 发明授权

US07268361B2 Electron emission device 有权
标题翻译：电子发射装置
公开(公告)号：US07268361B2
公开(公告)日：2007-09-11
申请号：US10483114
申请日：2002-07-01
申请人： Pavel Adamec , Dieter Winkler
发明人： Pavel Adamec , Dieter Winkler
IPC分类号： H01L29/06 , H01L21/00
CPC分类号： H01J1/3044 , H01J2201/319
摘要： The invention provides an electron beam device 1 comprising at least one field emission cathode 3 and at least one extracting electrode 5, whereby the field emission cathode 5 comprises a p-type semiconductor region 7 connected to an emitter tip 9 made of a semiconductor material, an n-type semiconductor region 11 forming a pn-diode junction 13 with the p-type semiconductor region 7 a first electric contact 15 on the p-type semiconductor region 7 and a second electric contact 17 on the n-type semiconductor region 11. The p-type semiconductor region 7 prevents the flux of free electrons to the emitter unless electrons are injected into the p-type semiconductor region 7 by the pn-diode junction 13. This way, the field emission cathode 3 can generate an electron beam where the electron beam current is controlled by the forward biasing second voltage V2 across the pn-diode junction. Such electron beam current has an improved current value stability. In addition the electron beam current does not have to be stabilized anymore by adjusting, the voltage between emitter tip 9 and extracting electrode 5 which would interfere with the electric field of electron beam optics. The present invention further provides the field emission cathode as described above and an array of field emission cathodes. The invention further provides a method to generate at least one electron beam.
摘要翻译：本发明提供一种包括至少一个场发射阴极3和至少一个提取电极5的电子束装置1，由此场发射阴极5包括连接到由半导体材料制成的发射极尖端9的p型半导体区域7，在p型半导体区域7上形成p型二极管结13的n型半导体区域11，p型半导体区域7上的第一电接触15和n型半导体区域11上的第二电接触17。 p型半导体区域7防止自由电子束流到发射极，除非电子被pn二极管结13注入到p型半导体区域7中。这样，场发射阴极3可以产生电子束，其中电子束电流由跨越pn二极管结的正向偏置第二电压V 2控制。这种电子束电流具有改善的电流值稳定性。此外，电子束电流不必通过调节发射极尖端9和提取电极5之间的电压，这将干扰电子束光学器件的电场。本发明还提供如上所述的场致发射阴极和场发射阴极阵列。本发明还提供了一种产生至少一个电子束的方法。

2. 发明申请

US20060192145A1 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US20060192145A1
公开(公告)日：2006-08-31
申请号：US11396751
申请日：2006-04-03
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： G21G5/00
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

3. 发明授权

US07638777B2 Imaging system with multi source array 有权
标题翻译：具有多源阵列的成像系统
公开(公告)号：US07638777B2
公开(公告)日：2009-12-29
申请号：US10564752
申请日：2004-05-17
申请人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
发明人： Hans-Peter Feuerbaum , Jürgen Frosien , Uli Hoffmann , Dieter Winkler , Pavel Adamec
IPC分类号： H01J1/50
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/047 , H01J2237/0635
摘要： The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.
摘要翻译：本发明提供一种带电粒子束装置。该装置包括用于发射多个带电粒子束的发射极阵列。多个带电粒子束用透镜成像。提供电极单元用于加速多个带电粒子束。第一控制单元和第二控制单元控制发射极阵列的第一电位与电极单元的第二电位和第三电位之间的电位差。因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

4. 发明授权

US06943349B2 Multi beam charged particle device 有权
标题翻译：多光束带电粒子装置
公开(公告)号：US06943349B2
公开(公告)日：2005-09-13
申请号：US10258869
申请日：2001-04-27
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： G01Q30/02 , H01J37/04 , H01J37/09 , H01J37/26 , G21K1/08 , G01N23/00 , H01J3/14 , H01J37/28
CPC分类号： H01J37/04 , H01J37/09 , H01J37/266
摘要： The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.
摘要翻译：本发明提供了一种用于带电粒子束装置的改进的柱。柱包括具有多个孔的孔板，以产生多个带电粒子束和偏转器，以影响带电粒子束，使得每个束似乎来自不同的源。此外，使用物镜以将带电粒子束聚焦到样本上。由于偏转器，在样品的表面上产生了源的多个图像，从而所有图像可以用于并行数据采集。因此，数据采集的速度增加。关于物镜的聚焦特性，带电粒子束基本上可以被视为不会相互影响的独立的粒子束。因此，每个光束基本上提供与常规带电粒子束装置的光束相同的分辨率。

5. 发明授权

US07045781B2 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US07045781B2
公开(公告)日：2006-05-16
申请号：US10759392
申请日：2004-01-16
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： H01J37/28
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的主束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主光束的准直之间切换适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度，用于聚集所述带电粒子的一次束的聚光透镜，用于偏转所述带电粒子的一次束的扫描装置用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

6. 发明授权

US07282711B2 Multiple electron beam device 有权
标题翻译：多电子束装置
公开(公告)号：US07282711B2
公开(公告)日：2007-10-16
申请号：US10491939
申请日：2002-10-04
申请人： Dieter Winkler , Pavel Adamec , Achim Göhl , Helmut Banzhof
发明人： Dieter Winkler , Pavel Adamec , Achim Göhl , Helmut Banzhof
IPC分类号： H01J37/21
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J37/3174 , H01J2237/216 , H01J2237/2446 , H01J2237/2826 , H01J2237/30433 , H01J2237/3045
摘要： The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.
摘要翻译：本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1），电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流构造不透明样品（20）的上表面（20a）。此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

7. 发明授权

US07274018B2 Charged particle beam apparatus and method for operating the same 有权
标题翻译：带电粒子束装置及其操作方法
公开(公告)号：US07274018B2
公开(公告)日：2007-09-25
申请号：US11396751
申请日：2006-04-03
申请人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
发明人： Pavel Adamec , Ralf Degenhardt , Hans-Peter Feuerbaum , Harry Munack , Dieter Winkler
IPC分类号： H01J37/28
CPC分类号： H01J37/285 , H01J37/265 , H01J37/28 , H01J2237/0435 , H01J2237/049 , H01J2237/2855 , H01J2237/2857
摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.
摘要翻译：提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

8. 发明授权

US06943507B2 Device and method for controlling focussed electron beams 有权
标题翻译：用于控制聚焦电子束的装置和方法
公开(公告)号：US06943507B2
公开(公告)日：2005-09-13
申请号：US10474464
申请日：2002-04-08
申请人： Dieter Winkler , Pavel Adamec
发明人： Dieter Winkler , Pavel Adamec
IPC分类号： H01J37/073 , H01J37/304 , H01J29/52
CPC分类号： H01J37/073 , H01J37/304 , H01J2237/06316 , H01J2237/0635 , H01J2237/31774
摘要： The invention provides a focussing electron beam device with a single or an array of field emitter beam sources to generate electron beams with field emitter beam sources, at least one anode capable of accelerating the electrons of the electron beams towards a specimen, focussing components capable of focussing the electron beams onto the specimen and a control circuit that a) senses for deviations of the actual current values of the electron beams from desired current values; b) controls first voltages V1 to adjust the actual current values of the electron beams to the desired current values and c) controls second voltages V2 to adjust the actual focus positions of the electron beams to the desired focus positions. The voltage control circuit adjusts the actual current values of the electron beams to the desired current values and makes it possible to adjust the current values of an array of electron beams to a single value. Furthermore, a focussing electron beam device is disclosed with an array of field emitter beam sources integrated onto a substrate, which makes it possible to have arrays of field emitter beam sources with thousands or even millions of field emitter beam sources. With the integration of the control circuits for each field emitter beam source it is possible to adjust the current values and focus positions of each electron beam individually. Furthermore, methods are disclosed describing the operation of a single field emitter beam source or an array of field emitter beam sources.
摘要翻译：本发明提供一种聚焦电子束装置，其具有单个或阵列的场致发射束源，以产生具有场致发射束源的电子束，至少一个阳极，能够将电子束的电子加速朝向检体，将电子束聚焦到样本上，以及控制电路，其a）感测电子束的实际电流值与期望电流值的偏差; b）控制第一电压V 1以将电子束的实际电流值调整到期望的电流值，并且c）控制第二电压V 2以将电子束的实际焦点位置调整到期望的焦点位置。电压控制电路将电子束的实际电流值调整到期望的电流值，并且可以将电子束阵列的电流值调整为单个值。此外，公开了一种聚焦电子束器件，其集成在衬底上的场发射器束源的阵列，这使得可以具有数千甚至数百万场发射器束源的场发射器束源的阵列。通过对每个场发射器束源的控制电路的集成，可以单独地调整每个电子束的电流值和聚焦位置。此外，公开了描述单个场发射器束源或场发射器束源的阵列的操作的方法。

9. 发明授权

US09153413B2 Multi-beam scanning electron beam device and methods of using the same 有权
标题翻译：多光束扫描电子束装置及其使用方法
公开(公告)号：US09153413B2
公开(公告)日：2015-10-06
申请号：US12528307
申请日：2008-02-22
申请人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
发明人： Gilad Almogy , Avishai Bartov , Juergen Frosien , Pavel Adamec , Helmut Banzhof
IPC分类号： G21K7/00 , H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置（100）。具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130）用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

10. 发明授权

US08878148B2 Method and apparatus of pretreatment of an electron gun chamber 有权
标题翻译：电子枪室预处理方法及装置
公开(公告)号：US08878148B2
公开(公告)日：2014-11-04
申请号：US12888978
申请日：2010-09-23
申请人： Pavel Adamec , Ivo Li{hacek over (s)}ka , Gennadij Gluchman , Milan Snabl
发明人： Pavel Adamec , Ivo Li{hacek over (s)}ka , Gennadij Gluchman , Milan Snabl
IPC分类号： G21K5/00 , H01J37/06
CPC分类号： H01J37/06 , H01J2237/022 , H01J2237/06316 , H01J2237/06341
摘要： A method of pre-treating an ultra high vacuum charged particle gun chamber by ion stimulated desorption is provided. The method includes generating a plasma for providing a plasma ion source, and applying a negative potential to at least one surface in the gun chamber, wherein the negative potential is adapted for extracting an ion flux from the plasma ion source to the at least one surface for desorbing contamination particles from the at least one surface by the ion flux impinging on the at least one surface.
摘要翻译：提供了一种通过离子刺激解吸预处理超高真空带电粒子枪室的方法。该方法包括产生用于提供等离子体离子源的等离子体，以及向枪室中的至少一个表面施加负电位，其中负电位适于将离子通量从等离子体离子源提取到至少一个表面用于通过撞击在至少一个表面上的离子通量从至少一个表面解吸污染颗粒。

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