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    • 2. 发明申请
    • HIGH THROUGHPUT SEM TOOL
    • 高通量扫描仪刀具
    • US20100320382A1
    • 2010-12-23
    • US12528307
    • 2008-02-22
    • Gilad AlmogyAvishai BartovJürgen FrosienPavel AdamecHelmut Banzhof
    • Gilad AlmogyAvishai BartovJürgen FrosienPavel AdamecHelmut Banzhof
    • G01N23/00H01J37/147
    • H01J37/05H01J37/10H01J37/147H01J37/28H01J2237/0635H01J2237/1508H01J2237/2449H01J2237/2817
    • A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
    • 描述了多光束扫描电子束装置(100)。 具有列的多头扫描电子束装置包括用于发射多个电子束(12,13,14)的多光束发射器(110),至少一个共同的电子束光学元件(130) 用于多个电子束中的至少两个的开口,并适用于共同影响多个电子束中的至少两个,用于单独影响多个电子束的至少一个单独的电子束光学元件(140),共同的目标 透镜组件(150),用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束,并且适于将多个电子束聚焦到样本(20)上以产生多个信号 光束(121,131,141)和检测组件(170),用于分别检测相应检测元件上的每个信号光束。
    • 6. 发明授权
    • Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
    • 用于检查样本的带电粒子束装置的对比度改善的布置和方法
    • US08164067B2
    • 2012-04-24
    • US12701463
    • 2010-02-05
    • Pavel AdamecHelmut BanzhofIvo Liska
    • Pavel AdamecHelmut BanzhofIvo Liska
    • G01N23/22G01N23/00
    • H01J37/244H01J37/28H01J2237/2446
    • It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.
    • 提供了一种用于检查样本的带电粒子束装置,包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置,其包括一个或多个带电粒子检测器,其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束,所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始,第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。
    • 7. 发明授权
    • Multiple electron beam device
    • 多电子束装置
    • US07282711B2
    • 2007-10-16
    • US10491939
    • 2002-10-04
    • Dieter WinklerPavel AdamecAchim GöhlHelmut Banzhof
    • Dieter WinklerPavel AdamecAchim GöhlHelmut Banzhof
    • H01J37/21
    • H01J37/28B82Y10/00B82Y40/00H01J37/21H01J37/304H01J37/3174H01J2237/216H01J2237/2446H01J2237/2826H01J2237/30433H01J2237/3045
    • The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.
    • 本发明提供了用于用具有电子束源阵列(3)的一次电子束(14)探测或构造非透明样品(20)以产生多个一次电子束(14)的电子多光束装置(1), 电子传感器(12),其具有用于检测一次电子束(14)的电子和至少一个阳极(7)的电子传感器段(12a),以将一次电子束(14)引向电子传感器(12)。 电子传感器(12)用于检查一次电子束(14),校准一次电子束(14)的位置,并可能在探测之前或之后校准一次电子束的最终聚焦长度(13)和电流 构造不透明样品(20)的上表面(20a)。 此外,提供了检查一次电子束(14),调整最终聚焦长度(13)和校准多个电子束装置(1)的方法。