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    • 2. 发明授权
    • Charged particle beam system and method of operating thereof
    • 带电粒子束系统及其操作方法
    • US09305740B2
    • 2016-04-05
    • US13920284
    • 2013-06-18
    • Jürgen FrosienBenjamin John Cook
    • Jürgen FrosienBenjamin John Cook
    • H01J37/04H01J37/147H01J37/153H01J37/26
    • H01J37/045H01J37/1478H01J37/153H01J37/263H01J2237/1534H01J2237/281H01J2237/2815
    • A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.
    • 描述带电粒子束装置。 一方面,带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两束或更多束束的可切换多孔,该多束光束包括:两个或更多孔径开口,其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置,其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元,该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐,以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。
    • 6. 发明授权
    • Charged particle beam device with aperture
    • 带孔的带电粒子束装置
    • US07763866B2
    • 2010-07-27
    • US10576547
    • 2004-10-19
    • Jürgen FrosienStefan LanioHelmut Banzhof
    • Jürgen FrosienStefan LanioHelmut Banzhof
    • G21K5/00
    • H01J37/09H01J2237/0455
    • The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
    • 本发明涉及一种用于检查或构造包括带电粒子束源(5)以产生带电粒子束(7)的样本(3)的带电粒子束装置(1),聚焦透镜(9) 带电粒子束(7)到样品(3)上,以及孔径系统(13),用于限定带电粒子束(7)的孔(6)。 孔径系统(13)包括阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第一部分(7a)的第一构件(20),第二构件 30)阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第二部分(7b),第一装置(24)用于移动第一构件(20)以调整 带电粒子束(7)的阻挡的第一部分(7a)的尺寸以及用于独立于第一部分(7b)移动第二部件(30)的第二装置(34)。 利用这种孔径系统(13),可以在操作期间自由地调整孔径(6)的尺寸并将其对准光轴(8)。
    • 7. 发明申请
    • Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
    • 用于带电粒子束系统的双级带电粒子束能量减少系统
    • US20070200069A1
    • 2007-08-30
    • US10571347
    • 2004-09-02
    • Jürgen FrosienRalf DegenhardtStefan Lanio
    • Jürgen FrosienRalf DegenhardtStefan Lanio
    • G21K1/08
    • H01J37/26B82Y10/00B82Y40/00H01J37/05H01J37/153H01J37/3174H01J2237/057H01J2237/1534H01J2237/1538
    • The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
    • 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件(110)的第一和第二平面,第二元件( 112),第一四极元件(410)被定位成使得在操作中,第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠,第二四极元件 四极元件(412)被定位成使得在操作中,第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠,第一带电粒子选择元件(618)被定位成束 方向,在第一元件以聚焦和分散方式作用之前,第二带电粒子选择元件(616; 716)在光束方向上位于第一元件作用于第一元件 聚焦和分散的方式。 因此,可以实现没有固有分散限制的虚拟色散源状位置。
    • 9. 发明申请
    • CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING THEREOF
    • 充电颗粒束系统及其操作方法
    • US20140367586A1
    • 2014-12-18
    • US13920284
    • 2013-06-18
    • Jürgen FROSIENBenjamin John COOK
    • Jürgen FROSIENBenjamin John COOK
    • H01J37/04
    • H01J37/045H01J37/1478H01J37/153H01J37/263H01J2237/1534H01J2237/281H01J2237/2815
    • A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.
    • 描述带电粒子束装置。 一方面,带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两个或更多个束束的可切换多孔,其包括:两个或更多个孔口,其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置,其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元,该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐,以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。