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1. 发明申请

US20100290024A1 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 有权
标题翻译：改进投影目标成像特性的方法及其投影目标
公开(公告)号：US20100290024A1
公开(公告)日：2010-11-18
申请号：US12836176
申请日：2010-07-14
申请人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G03B27/32
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配有第一操纵器（ml，Mn），用于使透镜主动变形，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜在除了第一个镜头。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

2. 发明申请

US20080310029A1 Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective 有权
标题翻译：改进投影目标成像特性的方法，以及这样的投影目标
公开(公告)号：US20080310029A1
公开(公告)日：2008-12-18
申请号：US11915191
申请日：2006-05-24
申请人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G02B17/08 , G02B27/18
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8）平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

3. 发明授权

US09069263B2 Method for improving the imaging properties of a projection objective, and such a projection objective 有权
标题翻译：用于改善投影物镜的成像特性的方法和这种投影物镜
公开(公告)号：US09069263B2
公开(公告)日：2015-06-30
申请号：US12836176
申请日：2010-07-14
申请人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G02B9/00 , G02B17/00 , G03F7/20
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中投影物镜在物平面和像平面之间具有多个透镜，多个透镜中的第一透镜被分配有第一操纵器（ ml，Mn），用于使透镜主动变形，第一透镜变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜另外变形到第一个镜头。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

4. 发明授权

US07777963B2 Method for improving the imaging properties of a projection objective, and such a projection objective 有权
标题翻译：用于改善投影物镜的成像特性的方法和这种投影物镜
公开(公告)号：US07777963B2
公开(公告)日：2010-08-17
申请号：US11915191
申请日：2006-05-24
申请人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G02B9/00 , G02B17/00 , G03B27/68 , G03B27/52
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投射物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8）平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

5. 发明申请

US20100128367A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：一种微电脑设备和方法的投影目标
公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译：提供了具有改善的成像特性的微光刻设备的投影物镜。提供了一种用于投影物镜的操纵器。提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。提供了一种用于改善投影物镜的成像特性的方法。

6. 发明授权

US07448763B2 Optical subassembly and projection objective in semiconductor lithography 有权
标题翻译：半导体光刻中的光学组件和投影物镜
公开(公告)号：US07448763B2
公开(公告)日：2008-11-11
申请号：US10573216
申请日：2003-12-03
申请人： Andreas Frommeyer , G Fraser Morrison , Wolfgang Keller , Yim-Bun Patrick Kwan , Harald Kirchner , Willi Heintel
发明人： Andreas Frommeyer , G Fraser Morrison , Wolfgang Keller , Yim-Bun Patrick Kwan , Harald Kirchner , Willi Heintel
IPC分类号： G02B5/08 , G02B7/02
CPC分类号： G03F7/70825 , G02B7/181 , G02B7/182
摘要： An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).
摘要翻译：具有光学元件（例如镜子元件）的光学子组件具有布置在圆周上的光学表面（9）和支承点（12）。光学元件（7）通过连接元件（14,15,16,17,18）在轴承点（12）处连接到安装件（13）。在光学表面（9）和支承点（12）之间设置有应力分离切口，例如弯曲槽（11）。

7. 发明申请

US20050018311A1 Method of producing aspherical optical surfaces 有权
标题翻译：制造非球面光学表面的方法
公开(公告)号：US20050018311A1
公开(公告)日：2005-01-27
申请号：US10888314
申请日：2004-07-08
申请人： Ernst-Dieter Knohl , Andreas Frommeyer , Hermann Schubert
发明人： Ernst-Dieter Knohl , Andreas Frommeyer , Hermann Schubert
IPC分类号： B24B13/005 , G02B3/00
CPC分类号： B24B13/005 , Y10S425/808
摘要： In the case of a method of producing aspherical optical surfaces of optical elements (1), in particular for use in microlithography for producing semiconductor elements, the optical element (1) is ground for example in the form of a meniscus. In a first method step, the optical element (1) is introduced into a basic form (2), which has a spherical form bed and is being held at a distance over the form bed (3). After that, an intermediate medium (6) is introduced in the basic form (2) between the optical element (1) and the form bed (3) and, subsequently the optical element (1) being removed together with the intermediate medium (6) from the basic form. Then, the spherical form bed (3) of the basic form (2) or a second basic form is transformed into an aspherical form bed (3′) computationally determined in advance. The optical element (1) is then re-introduced with the intermediate medium (6) into the basic form (2) or the second basic form, the intermediate medium (6) being sucked against the form bed (3′) by applying a vacuum. Subsequently, the optical element (1) deformed by the vacuum applied is spherically machined on a surface (7). Finally, after removing the vacuum, the surface (7′) assumes the form of an aspherical surface.
摘要翻译：在制造光学元件（1）的非球面光学表面的方法的情况下，特别是用于制造半导体元件的微光刻中，光学元件（1）例如以弯液面的形式研磨。在第一种方法步骤中，将光学元件（1）引入具有球形床的基本形式（2），并将其保持在成型床（3）的一定距离处。之后，在光学元件（1）和成形床（3）之间的基本形式（2）中引入中间介质（6），随后将光学元件（1）与中间介质（6）一起被去除）从基本形式。然后，将基本形式（2）的球形床（3）或第二基本形状转换成预先计算确定的非球面形床（3'）。然后将光学元件（1）与中间介质（6）重新引入基本形式（2）或第二基本形式，中间介质（6）通过施加一个真空。随后，通过施加的真空变形的光学元件（1）在表面（7）上被球形加工。最后，在去除真空之后，表面（7'）呈现非球面的形式。

8. 发明申请

US20120138401A1 DAMPING DEVICE 有权
标题翻译：阻尼装置
公开(公告)号：US20120138401A1
公开(公告)日：2012-06-07
申请号：US13185177
申请日：2011-07-18
申请人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
发明人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
IPC分类号： F16F7/10
CPC分类号： G02B7/00 , F16F7/104 , G02B7/02 , G03F7/70825 , G03F7/709
摘要： A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106). Using a set of at least two replaceable spacer elements (94; 94′) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94′) can be removed or a spacer element (94; 94′) can be added while the coupling of the first coupling end (46; 46′) to the carrying structure (38; 38′) and the coupling of the second coupling end (54a; 54′) to the optical element (34; 34′) are maintained. As an alternative, a hexapod system having six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) is provided, in which each supporting structure (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) comprises at least one monolithic articulation (60, 76; 60′, 76′). By means of a set of at least two replaceable spacer elements (94), the working length of at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. A method for aligning an optical element in semiconductor clean rooms or in a vacuum by means of a hexapod system is furthermore provided.
摘要翻译：用于对准半导体洁净室或真空中的光学元件的六足系统，特别是用于微光刻EUV投影曝光设备的照明装置中，包括六个六足支撑结构（42,44,46,94; 42'，44'， 46'，94'，106）。使用一组至少两个在至少一个方向上具有不同程度的可替换间隔元件（94; 94'），所述六个支撑结构（42,44,46,94; 42'，44'，46）中的至少一个 '，94'，106）可以调整。后者适于使得可以移除间隔元件（94; 94'），或者可以在第一联接端（46; 46'）与承载结构（46; 94'）的连接 38; 38'），并且保持第二联接端（54a; 54'）与光学元件（34; 34'）的联接。作为替代方案，提供了具有六个六足支撑结构（42,44,46,94; 42'，44'，46'，94'，106）的六足系统，其中每个支撑结构（42,44,46， 94; 42'，44'，46'，94'，106）包括至少一个单片铰接（60,76; 60'，76'）。通过一组至少两个可更换的间隔元件（94），六个支撑结构（42,44,46,94; 42'，44'，46'，94'，106中的至少一个的工作长度）可以调整。还提供了一种通过六足系统将半导体洁净室或真空中的光学元件对准的方法。

9. 发明申请

US20070014037A1 Optical subassembly and projection objective in semiconductor lithography 有权
标题翻译：半导体光刻中的光学组件和投影物镜
公开(公告)号：US20070014037A1
公开(公告)日：2007-01-18
申请号：US10573216
申请日：2003-12-03
申请人： Andreas Frommeyer , G. Morrison , Wolfgang Keller , Yim-Bun Kwan , Harald Kirchner , Willi Heintel
发明人： Andreas Frommeyer , G. Morrison , Wolfgang Keller , Yim-Bun Kwan , Harald Kirchner , Willi Heintel
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/181 , G02B7/182
摘要： An optical subassembly with an optical element, for example a mirror element (7), has an optical surface (9) and bearing points (12) arranged on the circumference. The optical element (7) is connected to a mount (13) at the bearing points (12) via connecting elements (14, 15, 16, 17, 18). Stress-decoupling cutouts, for example curved slots (11), are provided between the optical surface (9) and the bearing points (12).
摘要翻译：具有光学元件（例如镜子元件）的光学子组件具有布置在圆周上的光学表面（9）和支承点（12）。光学元件（7）通过连接元件（14,15,16,17,18）在轴承点（12）处连接到安装件（13）。在光学表面（9）和支承点（12）之间设置有应力分离切口，例如弯曲槽（11）。

10. 发明授权

US09513452B2 Damping device 有权
标题翻译：阻尼装置
公开(公告)号：US09513452B2
公开(公告)日：2016-12-06
申请号：US13185177
申请日：2011-07-18
申请人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
发明人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
IPC分类号： F16F7/10 , G02B7/00 , F16F7/104 , G02B7/02 , G03F7/20
CPC分类号： G02B7/00 , F16F7/104 , G02B7/02 , G03F7/70825 , G03F7/709
摘要： A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.
摘要翻译：投影曝光机的光学元件的阻尼装置包括至少两个彼此隔开布置的质量阻尼器，每个振动吸收器具有至少一个阻尼器质量和至少一个阻尼元件，并且至少两个阻尼器块质量阻尼器通过至少一个连接元件相互连接。光学元件可以是投影曝光机的一部分。

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