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    • 2. 发明申请
    • DAMPING DEVICE
    • 阻尼装置
    • US20120138401A1
    • 2012-06-07
    • US13185177
    • 2011-07-18
    • Alexander VoglerKlaus RiefAndreas FrommeyerAlan L. Brydon
    • Alexander VoglerKlaus RiefAndreas FrommeyerAlan L. Brydon
    • F16F7/10
    • G02B7/00F16F7/104G02B7/02G03F7/70825G03F7/709
    • A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106). Using a set of at least two replaceable spacer elements (94; 94′) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94′) can be removed or a spacer element (94; 94′) can be added while the coupling of the first coupling end (46; 46′) to the carrying structure (38; 38′) and the coupling of the second coupling end (54a; 54′) to the optical element (34; 34′) are maintained. As an alternative, a hexapod system having six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) is provided, in which each supporting structure (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) comprises at least one monolithic articulation (60, 76; 60′, 76′). By means of a set of at least two replaceable spacer elements (94), the working length of at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. A method for aligning an optical element in semiconductor clean rooms or in a vacuum by means of a hexapod system is furthermore provided.
    • 用于对准半导体洁净室或真空中的光学元件的六足系统,特别是用于微光刻EUV投影曝光设备的照明装置中,包括六个六足支撑结构(42,44,46,94; 42',44', 46',94',106)。 使用一组至少两个在至少一个方向上具有不同程度的可替换间隔元件(94; 94'),所述六个支撑结构(42,44,46,94; 42',44',46)中的至少一个 ',94',106)可以调整。 后者适于使得可以移除间隔元件(94; 94'),或者可以在第一联接端(46; 46')与承载结构(46; 94')的连接 38; 38'),并且保持第二联接端(54a; 54')与光学元件(34; 34')的联接。 作为替代方案,提供了具有六个六足支撑结构(42,44,46,94; 42',44',46',94',106)的六足系统,其中每个支撑结构(42,44,46, 94; 42',44',46',94',106)包括至少一个单片铰接(60,76; 60',76')。 通过一组至少两个可更换的间隔元件(94),六个支撑结构(42,44,46,94; 42',44',46',94',106中的至少一个的工作长度 )可以调整。 还提供了一种通过六足系统将半导体洁净室或真空中的光学元件对准的方法。