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1. 发明授权

US09964673B2 Optical system with aperture device having plurality of aperture elements 有权
公开(公告)号：US09964673B2
公开(公告)日：2018-05-08
申请号：US13021583
申请日：2011-02-04
申请人： Benjamin Sigel , Sascha Bleidistel
发明人： Benjamin Sigel , Sascha Bleidistel
IPC分类号： G03B27/72 , G02B5/00 , G03F7/20
CPC分类号： G02B5/005 , G03F7/70091 , G03F7/7025
摘要： An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening. The aperture edges of aperture elements pivoted into the engagement position do not lie in a common plane.

2. 发明授权

US09030644B2 Projection exposure apparatus for semiconductor lithography including an actuator system 有权
标题翻译：包括致动器系统的用于半导体光刻的投影曝光装置
公开(公告)号：US09030644B2
公开(公告)日：2015-05-12
申请号：US13196239
申请日：2011-08-02
申请人： Benjamin Sigel , Andreas Bertele , Peter Kloesch , Martin Mahlmann , Jochen Weber
发明人： Benjamin Sigel , Andreas Bertele , Peter Kloesch , Martin Mahlmann , Jochen Weber
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7015 , G02B7/008 , G02B13/16 , G03F7/70266 , G03F7/70825 , G03F7/70891 , G03F7/709
摘要： The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
摘要翻译：本公开涉及一种用于半导体光刻的投影曝光装置，其包括用于机械致动投影曝光装置的部件的致动器系统。致动器系统具有至少一个机构，用于减少和/或抑制由于在致动器系统的操作期间产生的热而导致的部件的热量输入。

3. 发明申请

US20110317140A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING AN ACTUATOR SYSTEM 有权
标题翻译：用于包括执行器系统的半导体平台的投影曝光装置
公开(公告)号：US20110317140A1
公开(公告)日：2011-12-29
申请号：US13196239
申请日：2011-08-02
申请人： Benjamin Sigel , Andreas Bertele , Peter Kloesch , Martin Mahlmann , Jochen Weber
发明人： Benjamin Sigel , Andreas Bertele , Peter Kloesch , Martin Mahlmann , Jochen Weber
IPC分类号： G03B27/42
CPC分类号： G03F7/7015 , G02B7/008 , G02B13/16 , G03F7/70266 , G03F7/70825 , G03F7/70891 , G03F7/709
摘要： The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising during the operation of the actuator system.
摘要翻译：本公开涉及一种用于半导体光刻的投影曝光装置，其包括用于机械致动投影曝光装置的部件的致动器系统。致动器系统具有至少一个机构，用于减少和/或抑制由于在致动器系统的操作期间产生的热而导致的部件的热量输入。

4. 发明申请

US20110194089A1 OPTICAL SYSTEM WITH APERTURE DEVICE 有权
标题翻译：光学设备光学系统
公开(公告)号：US20110194089A1
公开(公告)日：2011-08-11
申请号：US13021583
申请日：2011-02-04
申请人： Benjamin Sigel , Sascha Bleidistel
发明人： Benjamin Sigel , Sascha Bleidistel
IPC分类号： G03B27/54 , G02B26/02
CPC分类号： G02B5/005 , G03F7/70091 , G03F7/7025
摘要： An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening. The aperture edges of aperture elements pivoted into the engagement position do not lie in a common plane.
摘要翻译：光学系统具有孔径装置，其具有多个孔径元件，用于限定穿过光学系统的射线束的横截面。光圈装置具有第一光圈元件，该第一光圈元件围绕光学系统的光束路径中的接合位置与光学系统的光束路径外的中性位置之间的第一旋转轴线枢转，并且具有由第一个孔边缘。所述光圈装置还具有至少一个第二光圈元件，所述第二光圈元件可在所述光学系统的光束路径中的接合位置与所述光学系统的光束路径之外的中性位置之间围绕第二旋转轴线枢转，并具有第二孔径开口由第二孔边限定。第二开口开口小于第一开口开口。枢转到接合位置的孔元件形成有效的孔口。枢转到接合位置的孔元件的孔眼边缘不位于公共平面中。

5. 发明申请

US20100128367A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：一种微电脑设备和方法的投影目标
公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译：提供了具有改善的成像特性的微光刻设备的投影物镜。提供了一种用于投影物镜的操纵器。提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。提供了一种用于改善投影物镜的成像特性的方法。

6. 发明申请

US20080117397A1 OPTICAL DEVICES HAVING KINEMTAIC COMPONENTS 审中-公开
标题翻译：具有KINEMTAIC COMPONENTS的光学设备
公开(公告)号：US20080117397A1
公开(公告)日：2008-05-22
申请号：US11935719
申请日：2007-11-06
申请人： Jochen Weber , Klaus Rief , Claudia Matano , Benjamin Sigel , Joachim Siegel
发明人： Jochen Weber , Klaus Rief , Claudia Matano , Benjamin Sigel , Joachim Siegel
IPC分类号： G03B27/42
CPC分类号： G02B7/003 , G02B7/023
摘要： Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.
摘要翻译：公开了具有至少一个光学元件和多个运动部件的光学装置。一种类型的运动部件的数量m超过可以操纵光学元件的自由度的数量n。 n个自由度中的至少一个可以是x位移，y位移，z位移或倾斜。

7. 发明申请

US20130038848A1 OPTICAL DEVICES HAVING KINEMATIC COMPONENTS 审中-公开
标题翻译：具有动力部件的光学装置
公开(公告)号：US20130038848A1
公开(公告)日：2013-02-14
申请号：US13611633
申请日：2012-09-12
申请人： Jochen Weber , Klaus Rief , Claudia Matano , Benjamin Sigel , Joachim Siegel
发明人： Jochen Weber , Klaus Rief , Claudia Matano , Benjamin Sigel , Joachim Siegel
IPC分类号： G03B27/54
CPC分类号： G02B7/003 , G02B7/023
摘要： Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.
摘要翻译：公开了具有至少一个光学元件和多个运动部件的光学装置。一种类型的运动部件的数量m超过可以操纵光学元件的自由度的数量n。 n个自由度中的至少一个可以是x位移，y位移，z位移或倾斜。

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