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1. 发明申请

WO2012028660A1 GAS DISTRIBUTION DEVICE FOR VACUUM PROCESSING EQUIPMENT 审中-公开
标题翻译：用于真空加工设备的气体分配装置
公开(公告)号：WO2012028660A1
公开(公告)日：2012-03-08
申请号：PCT/EP2011/065052
申请日：2011-08-31
申请人： OERLIKON SOLAR AG, TRÜBBACH , DESPONT, Laurent , VOVK, Vitaliy , WATKINS, Owan Charles
发明人： DESPONT, Laurent , VOVK, Vitaliy , WATKINS, Owan Charles
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/45574
摘要： The invention relates to a vacuum chamber for accommodating a substrate to be treated in a vacuum process comprising a gas inlet (7) connected to a gas source for receiving gas (A, B) and a gas distribution system (9) for dispensing the gas (A, B) from the gas inlet (7) to a plurality of outlet openings (8) into the vacuum chamber at a plurality of locations towards the substrate, whereby the gas distribution system (9) comprises a first plate (10) and a second plate (5), each plate having a flat side, the first plate (10) exhibits a plurality of bores (4) forming the outlet openings (8), the second plate (5) exhibits a plurality of channels (6a, 6b) arranged on the flat side, the first plate (10) and the second plate (5) are mounted together with their flat sides directly contacting each other such that each bore (4) of the first plate (10) is arranged where a channel (6a, 6b) of the second plate (5) ends such that gas (A, B) is dispensable through the respective channel (6a, 6b) into the bore (4), and the individual channels (6a, 6b) merge into at least one common channel (6a, 6b) connected to the gas inlet (7) thus forming a branching arrangement. The vacuum chamber comprising the gas distribution system (9) provides for a significant improvement of the substrate coating homogeneity, thus in an improved quality of the so manufactured substrate while decreasing the manufacturing costs as well.
摘要翻译：本发明涉及一种用于容纳待处理基板的真空室，该真空室包括连接到用于接收气体的气体源（A，B）的气体入口（7）和用于分配气体的气体分配系统（9）（A，B）从多个位于多个位置的气体入口（7）到多个出口（8）进入真空室，由此气体分配系统（9）包括第一板（10）和第二板（5），每个板具有平坦侧，第一板（10）具有形成出口（8）的多个孔（4），第二板（5）具有多个通道（6a， 6b），第一板（10）和第二板（5）安装在一起，其平坦侧面彼此直接接触，使得第一板（10）的每个孔（4）布置在第二板（5）的通道（6a，6b）结束，使得气体（A，B）通过相应的通道（6a，6b）是可分配的孔（4）和各个通道（6a，6b）合并成连接到气体入口（7）的至少一个公共通道（6a，6b），从而形成分支装置。包括气体分配系统（9）的真空室提供了显着改善基底涂层均匀性，从而提高了如此制造的基板的质量，同时降低了制造成本。

2. 发明申请

WO2012028704A1 SUBSTRATE HEATING DEVICE 审中-公开
标题翻译：基板加热装置
公开(公告)号：WO2012028704A1
公开(公告)日：2012-03-08
申请号：PCT/EP2011/065168
申请日：2011-09-02
申请人： OERLIKON SOLAR AG, TRÜBBACH , DESPONT, Laurent , POPPELLER, Markus , SCHMOLL, Ralph
发明人： DESPONT, Laurent , POPPELLER, Markus , SCHMOLL, Ralph
IPC分类号： H01L21/67
CPC分类号： H01L21/67103 , H01L21/67109
摘要： The invention relates to a susceptor for supporting a substrate (9) within a vacuum process chamber, comprising a flat surface (11) for placing the substrate (9) thereon such that the substrate (9) is in thermally conductive contact with the surface (11), whereby the susceptor (1) comprises at least three adjacent zones (5, 6, 8), an outer zone (8), a middle zone (6) and an inner zone (5), the zones (5, 6, 8) arranged concentrically around each other and extending along the surface (11), the outer zone (8) completely surrounds the middle zone (6) and the middle zone (6) completely surrounds the inner zone (5), the inner zone (5) comprises at least one inner heating element (13) affecting the inner zone (5), the outer zone (8) comprises at least one outer heating element (19) affecting the outer zone (8), the middle zone (6) exhibits a maximal thickness (15) that is smaller than the minimal thickness (12) of the inner zone (5) and smaller than the minimal thickness (16) of the outer zone (8), each thickness (12, 15, 16) extending perpendicular to the surface (11). Thus, the invention allows for providing a smooth temperature profile over the complete surface (11) area resulting in a highly uniform substrate (9) temperature and thus in an improved thickness (12, 15, 16) uniformity of a coating to be provided e.g. in a chemical vapour deposition process.
摘要翻译：本发明涉及一种用于在真空处理室内支撑衬底（9）的感受体，包括用于将衬底（9）放置在其上的平坦表面（11），使得衬底（9）与表面导热接触由此，基座（1）包括至少三个相邻的区域（5,6,8），外部区域（8），中间区域（6）和内部区域（5），所述区域（5,6），8）彼此同心地布置并沿着表面（11）延伸，外部区域（8）完全包围中间区域（6），中间区域（6）完全包围内部区域（5），内部区域（5）包括影响内部区域（5）的至少一个内部加热元件（13），外部区域（8）包括影响外部区域（8）的至少一个外部加热元件（19），中间区域（6））表现出比内部区域（5）的最小厚度（12）更小并且小于外部区域的最小厚度（16）的最大厚度（15） e（8），垂直于表面（11）延伸的每个厚度（12,15,16）。因此，本发明允许在整个表面（11）区域上提供平滑的温度分布，导致高度均匀的基底（9）温度，从而提供例如提供的涂层的厚度（12,15,16）均匀性。在化学气相沉积工艺中。

3. 发明申请

WO2010022530A1 METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE OXIDE (TCO) FILMS; PROPERTIES AND APPLICATIONS OF SUCH FILMS 审中-公开
标题翻译：制造透明导电氧化物（TCO）膜的方法; 这种膜的性质和应用
公开(公告)号：WO2010022530A1
公开(公告)日：2010-03-04
申请号：PCT/CH2009/000291
申请日：2009-08-28
申请人： OERLIKON SOLAR IP AG, TRÜBBACH , DIMITRY, Zimin , ZINDEL, Arno , TEREN, Andrew , WATKINS, Owan Charles , DESPONT, Laurent , WIDER, Joachim , RAMOINO, Luca , GOSSLA, Mario , VOGLER, Benjamin , KERSCHBAUMER, Joerg , SCHNEIDER, Stefan , MARK, Andreas , POPPELLER, Markus , KUHN, Hansjoerg , BORRELLO, Daniel , BENAGLI, Stefano , MEIER, Johannes , KROLL, Ulrich , VALLAT-SAUVAIN, Evelyne
发明人： DIMITRY, Zimin , ZINDEL, Arno , TEREN, Andrew , WATKINS, Owan Charles , DESPONT, Laurent , WIDER, Joachim , RAMOINO, Luca , GOSSLA, Mario , VOGLER, Benjamin , KERSCHBAUMER, Joerg , SCHNEIDER, Stefan , MARK, Andreas , POPPELLER, Markus , KUHN, Hansjoerg , BORRELLO, Daniel , BENAGLI, Stefano , MEIER, Johannes , KROLL, Ulrich , VALLAT-SAUVAIN, Evelyne
IPC分类号： C23C16/40 , C23C16/44 , H01L31/0224 , H01L31/0392 , H01L31/18 , H01L21/365
CPC分类号： C23C16/407 , C23C16/44 , H01L21/02422 , H01L21/02554 , H01L21/02573 , H01L21/0262 , H01L31/022483 , H01L31/075 , H01L31/1884 , Y02E10/548
摘要： A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wherein the gas flow ratio of diethylzinc and water is kept between 0.87 and 1.3 and the gas flow ratio of diborane and diethylzinc is being kept between 0.05 and 0.4. The haze of such manufactured layer, measured as ratio of diffuse transmittance to total transmittance at 600nm, is between 10 and 25%.
摘要翻译：公开了一种从衬底上制造硼掺杂的透明导电氧化锌层的方法。该层在沉积系统的处理室中通过低压化学气相沉积（LPCVD）从至少二乙基锌，水和乙硼烷沉积，其中二乙基锌和水的气体流量比保持在0.87和1.3之间，气流乙硼烷和二乙基锌的比例保持在0.05和0.4之间。以600nm处的扩散透射率与总透射率的比率测量的这种制造层的雾度在10％和25％之间。

4. 发明公开

EP2612351A1 SUBSTRATE HEATING DEVICE 审中-公开
标题翻译： DEVICE FOR加热用基板
公开(公告)号：EP2612351A1
公开(公告)日：2013-07-10
申请号：EP11764119.1
申请日：2011-09-02
申请人： Oerlikon Solar AG, Trübbach
发明人： DESPONT, Laurent , POPPELLER, Markus , SCHMOLL, Ralph
IPC分类号： H01L21/67
CPC分类号： H01L21/67103 , H01L21/67109
摘要： The invention relates to a susceptor for supporting a substrate (9) within a vacuum process chamber, comprising a flat surface (11) for placing the substrate (9) thereon such that the substrate (9) is in thermally conductive contact with the surface (11), whereby the susceptor (1) comprises at least three adjacent zones (5, 6, 8), an outer zone (8), a middle zone (6) and an inner zone (5), the zones (5, 6, 8) arranged concentrically around each other and extending along the surface (11), the outer zone (8) completely surrounds the middle zone (6) and the middle zone (6) completely surrounds the inner zone (5), the inner zone (5) comprises at least one inner heating element (13) affecting the inner zone (5), the outer zone (8) comprises at least one outer heating element (19) affecting the outer zone (8), the middle zone (6) exhibits a maximal thickness (15) that is smaller than the minimal thickness (12) of the inner zone (5) and smaller than the minimal thickness (16) of the outer zone (8), each thickness (12, 15, 16) extending perpendicular to the surface (11). Thus, the invention allows for providing a smooth temperature profile over the complete surface (11) area resulting in a highly uniform substrate (9) temperature and thus in an improved thickness (12, 15, 16) uniformity of a coating to be provided e.g. in a chemical vapour deposition process.

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