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    • 2. 发明专利
    • Adhesive tape
    • 胶粘带
    • JP2013163775A
    • 2013-08-22
    • JP2012028150
    • 2012-02-13
    • Nitto Denko Corp日東電工株式会社
    • HABU TSUYOSHIKAMEI KATSUTOSHIIKUSHIMA NOBUSUKEASAI FUMITERU
    • C09J7/02C09J123/18
    • PROBLEM TO BE SOLVED: To provide an adhesive tape excellent in balance of adhesive force with peelability and level difference followability, and manufacturable by co-extrusion molding.SOLUTION: An adhesive tape is provided with an adhesive layer composed of a resin composition including an amorphous propylene-(1-butene) copolymer. When the adhesive tape is applied to an adherend having a step of 30 μm, the tape has ≤650 μm of the width of a portion at which the adhesive tape and the adherend do not contact by floating-up of the tape at the vicinity of a step lower portion, and an adhesive force of the tape adhering to a mirror wafer of a silicon-made semiconductor measured by a method based on JIS Z 0237(2000) (sticking condition of one reciprocating by 2-kg roller, peeling rate of 300 mm/min, and peeling angle of 180°) is ≤2.0 N/20 mm.
    • 要解决的问题:提供粘合力与剥离性和水平差跟随性的平衡优异的粘合带,并且可通过共挤出成型制造。粘合带设置有由包含非晶形的 丙烯 - (1-丁烯)共聚物。 当将粘合带施加到具有30μm的台阶的被粘物上时,胶带的宽度不小于带宽和被粘物不接触的部分的宽度, 通过基于JIS Z 0237(2000)的方法(通过2kg辊的一次往复运动的粘附条件)测量的粘合到硅制半导体的镜面晶片的带的粘合力,剥离速度 300mm / min,剥离角度180°)≤2.0N/ 20mm。
    • 3. 发明专利
    • Viscoelastic body and method for producing the same
    • 粘弹体及其制造方法
    • JP2012052037A
    • 2012-03-15
    • JP2010196250
    • 2010-09-01
    • Nitto Denko Corp日東電工株式会社
    • HABU TSUYOSHIASAI FUMITERUTAKAHASHI TOMOKAZUIMOTO EIICHISHIMAZAKI YUTA
    • C08F290/06H01L21/304
    • C08F299/065C08G18/672C08G18/753C08G2170/40H01L21/6836H01L2221/68327H01L2221/6834C08G18/48
    • PROBLEM TO BE SOLVED: To provide a resin material usable for a pressure-sensitive adhesive sheet for semiconductor wafer protection which, even when a semiconductor wafer is ground to an ultrathin thickness or a large diameter wafer is ground, does not cause bending (warpage) to the semiconductor wafer, has excellent followability to a pattern, avoids lifting from the pattern with time, ensures good stress dispersibility in grinding, suppresses wafer cracking and wafer edge chipping, avoids delamination in peeling, and leaves no adhesive residue on a wafer surface.SOLUTION: A viscoelastic body is provided containing a urethane polymer/acrylic polymer copolymer obtained through a monomer having in one molecule a functional group formable of a urethane bond with a urethane polymer and an activated carbon-carbon double bond copolymerizzble with a (meth)acryloyl group.
    • 要解决的问题:为了提供可用于半导体晶片保护用粘合片的树脂材料,即使将半导体晶片研磨成超薄厚度或大直径晶片,也不会引起弯曲 (翘曲)到半导体晶片,具有优异的图案追随性,避免随着时间的推移而从图案中脱离,确保研磨中的良好的应力分散性,抑制晶片裂纹和晶片边缘碎裂,避免剥离时的剥离,并且不会在 晶圆表面。 解决方案:提供一种粘弹性体,其含有通过具有一分子的单体获得的氨基甲酸酯聚合物/丙烯酸类聚合物共聚物,其具有与氨基甲酸酯聚合物形成的氨基甲酸酯键的官能团和与(氨基甲酸酯聚合物)的活性炭 - 碳双键共聚, 甲基)丙烯酰基。 版权所有(C)2012,JPO&INPIT
    • 4. 发明专利
    • Re-releasable adhesive and re-releasable adhesive sheet
    • 可再发胶粘和可再发胶粘片
    • JP2010053346A
    • 2010-03-11
    • JP2009153890
    • 2009-06-29
    • Nitto Denko Corp日東電工株式会社
    • HABU TSUYOSHITAKAHASHI TOMOKAZUASAI FUMITERUHIRAYAMA TAKAMASA
    • C09J4/00C09J7/02
    • C09J133/066C08L2312/06Y10T428/2809
    • PROBLEM TO BE SOLVED: To provide a re-releasable adhesive, in which the adhesiveness can be sufficiently reduced by curing reaction by radiation irradiation, and the reduction of the adhesiveness or the split of the adhesive, and, further, contamination of a semiconductor wafer and the like with liquid and so on can be inhibited as much as possible, by reducing the liquid immersion properties. SOLUTION: A re-releasable adhesive includes a radiation reactive polymer and a radiation polymerization initiator, in which the radiation reactive polymer having a side chain originated from one or more monomers represented by CH 2 =CR 1 COOR 2 (wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkyl group having 6 or more carbon atoms) and a side chain having one carbon-to-carbon double bond, and the monomers are polymerized in the ratio of 50 mol% of the total monomers constituting the main chain of the radiation reactive polymer. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种可再剥离的粘合剂,其中通过辐射照射固化反应可以充分降低粘合性,并且粘合性的降低或粘合剂的分裂,以及另外的污染 可以通过降低液浸性而尽可能地抑制具有液体等的半导体晶片等。 解决方案:可再剥离的粘合剂包括辐射反应性聚合物和辐射聚合引发剂,其中具有源自由CH 2 SBR = CR表示的一种或多种单体的侧链的辐射反应性聚合物 其中R 1 代表氢原子或甲基,R SP 2表示烷基 具有6个或更多个碳原子)和具有一个碳 - 碳双键的侧链,并且单体以构成辐射反应性聚合物的主链的总单体的50摩尔%的比例聚合。 版权所有(C)2010,JPO&INPIT
    • 8. 发明专利
    • Tacky adhesive tape
    • TACKY胶粘带
    • JP2013170197A
    • 2013-09-02
    • JP2012033967
    • 2012-02-20
    • Nitto Denko Corp日東電工株式会社
    • HABU TSUYOSHIKAMEI KATSUTOSHIIKUSHIMA NOBUSUKEMIZUNO KOJIASAI FUMITERU
    • C09J7/00C09J7/02C09J123/14
    • PROBLEM TO BE SOLVED: To provide a tacky adhesive tape which is used at a step of grinding the back surface of a semiconductor wafer and at a step of dicing the semiconductor wafer, has moderate tacky adhesive power and the tacky adhesive of which is prevented from being left over as residues when the tacky adhesive tape is peeled off.SOLUTION: The tacky adhesive tape includes a tacky adhesive layer, the storage modulus G' of which is 1-15 MPa at 23°C, the arithmetic surface roughness Ra of whose tacky adhesive surface side is 0-0.5 μm and which has ≤5 MPa-μm of the product obtained by multiplying the storage modulus G' thereof by the arithmetic surface roughness Ra thereof on the tacky adhesive surface side.
    • 要解决的问题:为了提供在半导体晶片的背面研磨的步骤中使用的粘性胶带,并且在切割半导体晶片的步骤中,具有适度的粘性粘合力,并且其粘合剂被防止 当粘性胶带被剥离时作为残留物残留。解决方案:粘性胶带包括粘性粘合剂层,其储存模量G'在23℃为1-15MPa,其运算表面粗糙度Ra为 粘合剂表面侧为0-0.5μm,并且通过将其储能模量G'乘以粘合剂表面侧的算术表面粗糙度Ra而获得的乘积≤5MPa-μm。