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1. 发明申请

US20130285158A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20130285158A1
公开(公告)日：2013-10-31
申请号：US13558746
申请日：2012-07-26
申请人： Naomu Kitano , Takashi Minami , Nobuo Yamaguchi , Takuya Seino , Takashi Nakagawa , Heiji Watanabe , Takayoshi Shimura , Takuji Hosoi
发明人： Naomu Kitano , Takashi Minami , Nobuo Yamaguchi , Takuya Seino , Takashi Nakagawa , Heiji Watanabe , Takayoshi Shimura , Takuji Hosoi
IPC分类号： H01L29/49 , H01L21/285
CPC分类号： H01L29/4966 , H01L21/28088 , H01L21/823842 , H01L21/823857 , H01L29/51 , H01L29/78
摘要： Provided are a semiconductor device which enables reduction of diffusion of Si in the manufacturing process of an MIPS element and suppression of an increase in EOT, and a method of manufacturing the same. An embodiment of the present invention is a semiconductor device including a field effect transistor having a gate insulating film provided on a silicon substrate and a gate electrode provided on the gate insulating film. The gate electrode is a stack-type electrode including a conductive layer containing at least Ti, N, and O (oxygen) and a silicon layer provided on the conductive layer, and the concentration of oxygen in the conductive layer is highest in the side of the silicon layer.
摘要翻译：提供一种能够减少MIPS元件的制造工序中Si的扩散，抑制EOT的增加的半导体装置及其制造方法。本发明的实施例是一种半导体器件，其包括具有设置在硅衬底上的栅极绝缘膜和设置在栅极绝缘膜上的栅电极的场效应晶体管。栅电极是包括至少含有Ti，N和O（氧）的导电层和设置在导电层上的硅层的堆叠型电极，导电层中的氧浓度在硅层。

2. 发明授权

US08669624B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08669624B2
公开(公告)日：2014-03-11
申请号：US13558746
申请日：2012-07-26
申请人： Naomu Kitano , Takashi Minami , Nobuo Yamaguchi , Takuya Seino , Takashi Nakagawa , Heiji Watanabe , Takayoshi Shimura , Takuji Hosoi
发明人： Naomu Kitano , Takashi Minami , Nobuo Yamaguchi , Takuya Seino , Takashi Nakagawa , Heiji Watanabe , Takayoshi Shimura , Takuji Hosoi
IPC分类号： H01L21/70 , H01L21/02 , H01L29/78
CPC分类号： H01L29/4966 , H01L21/28088 , H01L21/823842 , H01L21/823857 , H01L29/51 , H01L29/78
摘要： Provided are a semiconductor device which enables reduction of diffusion of Si in the manufacturing process of an MIPS element and suppression of an increase in EOT, and a method of manufacturing the same. An embodiment of the present invention is a semiconductor device including a field effect transistor having a gate insulating film provided on a silicon substrate and a gate electrode provided on the gate insulating film. The gate electrode is a stack-type electrode including a conductive layer containing at least Ti, N, and O (oxygen) and a silicon layer provided on the conductive layer, and the concentration of oxygen in the conductive layer is highest in the side of the silicon layer.
摘要翻译：提供一种能够减少MIPS元件的制造工序中Si的扩散，抑制EOT的增加的半导体装置及其制造方法。本发明的实施例是一种半导体器件，其包括具有设置在硅衬底上的栅极绝缘膜和设置在栅极绝缘膜上的栅电极的场效应晶体管。栅电极是包括至少含有Ti，N和O（氧）的导电层和设置在导电层上的硅层的堆叠型电极，导电层中的氧浓度在硅层。

3. 发明授权

US07857946B2 Sputtering film forming method, electronic device manufacturing method, and sputtering system 有权
标题翻译：溅射成膜方法，电子器件制造方法和溅射系统
公开(公告)号：US07857946B2
公开(公告)日：2010-12-28
申请号：US12103813
申请日：2008-04-16
申请人： Naomu Kitano , Naoki Yamada , Takaaki Tsunoda , Nobuo Yamaguchi , Motomu Kosuda
发明人： Naomu Kitano , Naoki Yamada , Takaaki Tsunoda , Nobuo Yamaguchi , Motomu Kosuda
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/16 , C23C14/505
摘要： A sputtering film forming method. which positions a target 4 and 5 at an incline to a surface of a substrate 10 whereupon a film is to be formed, and forms the film upon the surface of the substrate 10 whereupon the film is to be formed in an incline direction while the substrate 10 is rotated about a normal axis, terminates the forming of the film at a predetermined timing from the commencement of the forming of the film, wherein the forming of the film is terminated, when the substrate has rotated by 360 degrees×n+180 degrees+α, where n is a natural number, including 0, and −10 degrees
摘要翻译：溅射成膜方法。其将目标4和5以倾斜方式定位到基板10的表面，然后形成膜，并且在基板10的表面上形成膜，从而在斜面方向上形成膜，而基板 10相对于法线轴线旋转，从薄膜成型开始起的规定时间终止膜的成膜，其中，当基板旋转360度×n + 180度时，成膜为终止 +α，其中n是自然数，包括0和-10度<α<10度。

4. 发明申请

US20080264775A1 SPUTTERING FILM FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND SPUTTERING SYSTEM 有权
标题翻译：溅射膜成型方法，电子设备制造方法和溅射系统
公开(公告)号：US20080264775A1
公开(公告)日：2008-10-30
申请号：US12103813
申请日：2008-04-16
申请人： Naomu Kitano , Naoki Yamada , Takaaki Tsunoda , Nobuo Yamaguchi , Motomu Kosuda
发明人： Naomu Kitano , Naoki Yamada , Takaaki Tsunoda , Nobuo Yamaguchi , Motomu Kosuda
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/16 , C23C14/505
摘要： A sputtering film forming method. which positions a target 4 and 5 at an incline to a surface of a substrate 10 whereupon a film is to be formed, and forms the film upon the surface of the substrate 10 whereupon the film is to be formed in an incline direction while the substrate 10 is rotated about a normal axis, terminates the forming of the film at a predetermined timing from the commencement of the forming of the film, wherein the forming of the film is terminated, when the substrate has rotated by 360 degrees×n+180 degrees+α, where n is a natural number, including 0, and −10 degrees
摘要翻译：溅射成膜方法。其将目标4和5以倾斜方式定位到基板10的表面，然后形成膜，并且在基板10的表面上形成膜，从而在斜面方向上形成膜，而基板 10绕着法线轴线旋转，从薄膜形成开始的预定时刻终止薄膜的成形，其中当薄膜旋转360度+ 180度+α时，薄膜的形成终止，其中n是自然数，包括0和-10度<α<10度。

5. 发明授权

US07134706B2 Unlocking member arranging structure for vehicles 有权
标题翻译：解锁车辆安排结构
公开(公告)号：US07134706B2
公开(公告)日：2006-11-14
申请号：US11037072
申请日：2005-01-19
申请人： Susumu Michisaka , Nobuo Yamaguchi , Kengo Yano
发明人： Susumu Michisaka , Nobuo Yamaguchi , Kengo Yano
IPC分类号： B62D25/00
CPC分类号： B62K19/46 , B62H5/00 , B62J35/00 , B62K2202/00
摘要： In a vehicle wherein a functional part arranged in a body cover is supported by a body frame and a lid which makes it possible to lock a closed state covering the functional part can be openably fitted to the body cover in a position matching the functional part. Thus, the risk of undesirable tampering with the unlocking member is to be minimized and the risk for the unlocking member to be influenced by external disturbance such as unfavorable weather is to be avoided as far as possible. A cover member in which a lid is arranged in a secluded position is openably disposed on a body cover, and an unlocking member for releasing the lid from the locked state is disposed on the body cover so as to be covered by a cover member in a closed state.
摘要翻译：在车身罩中布置的功能部件由车身框架支撑的车辆中，能够将覆盖功能部件的关闭状态锁定的盖子能够与功能部件相匹配的位置可开启地安装在车身罩上。因此，尽可能地避免对解锁构件的不期望的篡改的风险，并且尽可能避免解锁构件受诸如不利天气的外部干扰的影响的风险。盖体设置在隐蔽位置的盖构件可开放地设置在主体盖上，并且用于将盖从锁定状态释放的解锁构件设置在主体盖上，以便被盖构件覆盖关闭状态。

6. 发明授权

US06922325B2 Electrostatic attraction mechanism, surface processing method and surface processing device 失效
标题翻译：静电吸引机构，表面处理方法及表面处理装置
公开(公告)号：US06922325B2
公开(公告)日：2005-07-26
申请号：US09895403
申请日：2001-07-02
申请人： Nobuo Yamaguchi
发明人： Nobuo Yamaguchi
IPC分类号： B23Q3/15 , C23C14/34 , C23C16/44 , H01L21/00 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/683 , H01T23/00
CPC分类号： H01L21/6831 , H01L21/6833
摘要： Electrostatic attraction is performed on a plate-shaped object 9 in that an attraction power source 3 applies a voltage to a pair of attraction terminals 23, 24 mounted inside a dielectric block 22, the surface of which is an attraction surface, thereby inducing static electricity in an attraction surface. The attraction power source 3 adjusts the surface potential of a plate-shaped object 9 by independently controlling voltages applied to the respective attraction terminals 23, 24. Processing is carried out on the surface of the plate-shaped object 9 while the injection of charged particles into the plate-shaped object 9 is suppressed. A control part 6 which controls the attraction power source 3 records, in a recording part 62, data obtained by measuring in advance the surface potential of the plate-shaped object 9 while respectively changing the voltage applied to the attraction terminals 23, 24, and controls the attraction power source 3 with a pattern selected in accordance with this data.
摘要翻译：对板状物体9进行静电吸引，因为吸引用电源3向安装在介质块22的内部的一对吸引端子23,24施加电压，其表面是吸引面，从而引起静电在吸引力的表面。吸引电源3通过独立地控制施加到各吸引端子23,24的电压来调整板状物体9的表面电位。在将带电粒子注入板状物体9的同时，在板状物体9的表面上进行加工。控制吸引力源3的控制部6在记录部62中记录通过预先测量板状物体9的表面电位而获得的数据，同时分别改变施加到吸引端子23,24的电压和利用根据该数据选择的图案来控制吸引力源3。

7. 发明授权

US5044646A Scooter type vehicle 失效
标题翻译：滑板车型
公开(公告)号：US5044646A
公开(公告)日：1991-09-03
申请号：US296881
申请日：1989-01-12
申请人： Tsuyoshi Iiga , Yasuji Kitasei , Junji Kikuno , Nobuo Yamaguchi , Yoshio Nakagomi , Takeo Miura
发明人： Tsuyoshi Iiga , Yasuji Kitasei , Junji Kikuno , Nobuo Yamaguchi , Yoshio Nakagomi , Takeo Miura
IPC分类号： B62J1/12 , B62J1/18 , B62K19/46 , B62M7/06 , B62M7/08
CPC分类号： B62J1/18 , B62J1/12 , B62K19/46 , B62M7/06 , B62M7/08
摘要： A motor scooter with an enlarged storage compartment that decreases the overall bulk and weight of the vehicle. The storage compartment is effectively sealed to prevent water or spilled fuel from leaking therein, yet provides easy access to the engine located beneath it for purposes of maintenance and inspection. The contents of the storage compartment are protected from the heat generated by the engine which is in close proximity by an insulating wall construction.
摘要翻译：具有放大储藏室的摩托车减少车辆的整体体积和重量。储存室被有效地密封以防止水或溢出的燃料泄漏在其中，但是为了维护和检查的目的，提供了容易地进入位于其下方的发动机。储存室的内容物被保护免受由绝缘壁结构紧邻的发动机产生的热量。

8. 发明授权

US4223244A Fluorescent display device with position selecting and column/row selecting grids 失效
标题翻译：具有位置选择和列/行选择网格的荧光显示设备
公开(公告)号：US4223244A
公开(公告)日：1980-09-16
申请号：US951388
申请日：1978-10-16
申请人： Takao Kishino , Kishio Kawasaki , Nobuo Yamaguchi
发明人： Takao Kishino , Kishio Kawasaki , Nobuo Yamaguchi
IPC分类号： H01J31/15 , H01J1/46 , H01J1/90 , H01J63/06
CPC分类号： H01J31/15
摘要： A fluorescent display device having pattern display sections each composed of phosphor-coated anodes arranged in the form of a matrix, at least a filament for emitting electrons when heated, the anodes being selectively bombarded with electrons emitted from the cathode to produce a visual display, position-selecting grids provided between the filament and the pattern display sections, column-selecting grids or row-selecting grids provided opposite to the columns or rows of the anodes, and a frame member provided, on its surface facing the filament, with the position-selecting grids and on its surface facing the pattern display section with the column-selecting grids or the row-selecting grids, the frame member being made of insulating material at least where necessary. With the provision of the frame member, the device of the present invention can be assembled easily, securely and correctly, and can produce a high-quality display.
摘要翻译：一种荧光显示装置，具有图案显示部分，每个图案显示部分由以矩阵形式布置的磷光体涂覆的阳极组成，至少一个在加热时发射电子的灯丝，阳极被从阴极发射的电子选择性地轰击以产生视觉显示，提供在灯丝和图案显示部分之间的选择栅格，与阳极列或行相对设置的列选择栅格或行选择栅格，以及在其面向灯丝的表面上设置的框架构件， - 选择栅格，并且在其具有列选择栅格或行选择栅格的图案显示部分的表面上，框架构件至少在必要时由绝缘材料制成。通过设置框架构件，可以容易地，可靠地和正确地组装本发明的装置，并且可以产生高质量的显示。

9. 发明授权

US09090974B2 Electronic device manufacturing method and sputtering method 有权
标题翻译：电子器件制造方法和溅射法
公开(公告)号：US09090974B2
公开(公告)日：2015-07-28
申请号：US13596734
申请日：2012-08-28
申请人： Nobuo Yamaguchi , Kazuaki Matsuo
发明人： Nobuo Yamaguchi , Kazuaki Matsuo
IPC分类号： C23C14/34 , C23C14/50 , H01J37/34
CPC分类号： H01J37/3441 , C23C14/0068 , C23C14/3407 , C23C14/35 , C23C14/50 , C23C14/505 , C23C14/564 , H01J37/3405 , H01J37/3447 , H01J2237/3323
摘要： An electronic device manufacturing method includes a first step of moving a substrate holder close to a first shield member and locating a first projecting portion formed on the first shield member and having a ring shape and a second projecting portion having a ring shape and formed on a second shield member installed on the surface of the substrate holder at the outer peripheral portion of a substrate at a position to engage with each other in a noncontact state, a second step of, after the first step, sputtering a target while maintaining the first projecting portion and the second projecting portion at the position to engage with each other in the noncontact state, and a third step of, after the second step, setting the first shield member in an open state and sputtering the target to perform deposition on the substrate.
摘要翻译：一种电子设备制造方法，包括：第一步骤，使基板保持器靠近第一屏蔽部件移动，并且定位形成在第一屏蔽部件上的具有环形的第一突出部分和具有环形的第二突出部分，并形成在第二屏蔽构件，其安装在基板保持件的表面上，在基板的外周部分处于非接触状态下彼此接合的位置;第二步骤，在第一步骤之后，溅射靶，同时保持第一突出部分和第二突出部分在非接触状态下彼此接合的位置，以及第三步骤，在第二步骤之后，将第一屏蔽构件设置在打开状态，并溅射靶以在基板上进行沉积。

10. 发明授权

US09034152B2 Reactive sputtering apparatus 有权
标题翻译：反应溅射装置
公开(公告)号：US09034152B2
公开(公告)日：2015-05-19
申请号：US13310230
申请日：2011-12-02
申请人： Nobuo Yamaguchi , Kazuaki Matsuo , Susumu Akiyama , Satoshi Uchino , Yoshimitsu Shimane
发明人： Nobuo Yamaguchi , Kazuaki Matsuo , Susumu Akiyama , Satoshi Uchino , Yoshimitsu Shimane
IPC分类号： H01J37/34 , C23C14/00
CPC分类号： H01J37/3244 , C23C14/0063 , C23C14/0068 , H01J37/3405 , H01J37/3411 , H01J37/3441 , H01J37/3447 , H01J2237/3328
摘要： A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.
摘要翻译：反应性溅射装置包括室，设置在室中的基板保持器，设置在室中并构造成保持目标的目标保持器，设置在室中的沉积屏蔽板，以在第二区域之间形成溅射空间，目标保持架和基板支架，防止溅射粒子附着在室内壁;反应性气体引入管，被配置为将溅射空间引入反应气体;将惰性气体引入到惰性气体导入口落在溅射空间内部和室内的空间，以及防止溅射颗粒从溅射中安装在靶保持体上的靶的溅射粒子附着在反应性气体导入管的导入口上的屏蔽部件。

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