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1. 发明专利

JPH0616478B2 失效
公开(公告)号：JPH0616478B2
公开(公告)日：1994-03-02
申请号：JP23910083
申请日：1983-12-19
申请人： NIPPON KOGAKU KK
发明人： TANIMOTO SHOICHI , MATSURA TOSHIO , MURAKAMI SHIGEO , UEHARA MAKOTO , SUWA KYOICHI
IPC分类号： G03B27/53 , B65G1/00 , G03F9/00 , H01L21/027 , H01L21/30

2. 发明专利

JPH0251165B2 失效
公开(公告)号：JPH0251165B2
公开(公告)日：1990-11-06
申请号：JP3436682
申请日：1982-03-04
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , ANZAI AKIRA , SUWA KYOICHI
IPC分类号： G02B13/22 , G02B19/00 , G02B21/08 , G02B27/00 , G03F7/20

3. 发明专利

JPS6292913A ILLUMINATING OPTICAL SYSTEM 失效
公开(公告)号：JPS6292913A
公开(公告)日：1987-04-28
申请号：JP23284685
申请日：1985-10-18
申请人： NIPPON KOGAKU KK
发明人： MATSUMOTO KOICHI , UEHARA MAKOTO , KIKUCHI TETSUO
IPC分类号： G02B27/00 , G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To illuminate an object surface with a uniform illuminance distribution by forming a fly-eye lens with a gathered body where the first element lenses having a positive focal length and the second element lenses having a negative focal length are fixed. CONSTITUTION:A parallel luminous flux 20 made incident on each of the first element lenses 31, 31... is condensed once in an optical path by the lens 31 and passes a condenser lens 40 and is irradiated to an irradiated surface 50. The parallel luminous flux 20 made incident on each of the second element lenses 32, 32... is not condensed by the lens 32 and passes the condenser lens 40 and is irradiated to the irradiated surface 50. Since the gradient of the illumination distribution on the irradiated surface 50 of luminous fluxes passing the first element lenses 31, 31... and that of luminous fluxes passing the second element lenses 32, 32... are opposite to each other, the number of the first element lenses and that of the second element lenses are equalized approximately to illuminate the irradiated surface 50 with a uniform illuminance distribution as the whole.

4. 发明专利

JPS6242112A OPTICAL COMPENSATION SYSTEM FOR LENGTH OF OPTICAL PATH 失效
公开(公告)号：JPS6242112A
公开(公告)日：1987-02-24
申请号：JP18243685
申请日：1985-08-20
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , ENDO KAZUMASA , MORI SUSUMU , TAKAGI SHUHEI , KAKIZAKI YUKIO
IPC分类号： G02B27/00 , G02B26/10 , G03F7/20 , G03F9/00
摘要： PURPOSE:To maintain the conjugate relation between an image and a pupil even when an objective is moved freely in a two-dimensional plane by moving the 2nd reflecting member so that the rear focus position of the 1st objective coincides with the front focus position of the 2nd objective at any time. CONSTITUTION:The quantity OP of movement of a vertical mirror M11 is decomposed into an (x)-directional and a (y)-directional component, the optical path length between a moving mirror M12 and the 1st objective L11 varies by the quantity DELTAx of (x) directional movement, and the optical path length between the moving mirror M12 and the 3rd mirror M13 varies by the quantity of DELTAy of (y)-directional movement, so that the quantity of variation in optical path length between the 1st objective L11 and the 2nd objection L12 is DELTAx+DELTAy. Further, a correction moving device Mv3 moves a couple of mirrors M13 and M14 by delta along the optical axis of the 2nd objective L12, and then the optical path length between the 1st objective L11 and the 2nd objective L12 varies by 2delta. For the purpose, the couple of mirrors M13 and M14 are only moved satisfying and equation so as to hold the optical path length between the 1st objective L11 and the 2nd objective L12 constant.

5. 发明专利

JPS61289632A EXPOSING DEVICE 失效
公开(公告)号：JPS61289632A
公开(公告)日：1986-12-19
申请号：JP13265485
申请日：1985-06-18
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO
IPC分类号： H01L21/30 , G03B27/32 , G03F7/20 , H01L21/027
摘要： PURPOSE:To set the exposure time as long as a reduced component of the illuminance and to enable to stably control the shutter by a method wherein the optical member for attenuating a quantity of light is disposed at the prescribed position the optical system and illuminance is reduced. CONSTITUTION:An optical member 1 for attenuating a quantity of light is constituted of a metal thin plate (opaque substrate) 1a, which is made of such a metal as stainless steel and phosphor bronze and wherein small opening parts (light-transmitting parts) 1b are formed at random is large numbers. The optical member 1 for attenuating of quantity of light can be inserted in some position of positions 10, 20 or 30 to correspond to the vicinities of the conjugate positions to each light source image. Or the optical member 1 for attenuating a quantity of light can be disposed at a position, where is closer to the light source from a fly-eye lens L2 and is excluded from an incidence side end surface L2a which is the conjugate position to a reticle R and a wafer W, such as at either position of insertion positions (a) and (b).

6. 发明专利

JPS59149317A Alignment optical system of projection type exposure device 失效
标题翻译：投影型曝光装置对准光学系统
公开(公告)号：JPS59149317A
公开(公告)日：1984-08-27
申请号：JP2420283
申请日：1983-02-16
申请人： Nippon Kogaku Kk
发明人： UEHARA MAKOTO , ANZAI AKIRA , SUWA KIYOUICHI
IPC分类号： H01L21/30 , G02B13/22 , G02B19/00 , G02B21/08 , G02B27/18 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： PURPOSE:To align a reticle and a wafer with a high precision even if the reticle size is changed, by providing a rectangular aperture in a light source means and making the lengthwise direction of the rectangular aperture coincident with the direction in which the reticle-side focus of a reticle-side positive lens group can be moved on the reticle. CONSTITUTION:A rectangular aperture 70a formed with a slit-shaped rectangular diaphragm 70 provided in a light source part is so arranged that its lengthwise direction corresponds to the direction of movement of the focus position of the first positive lens group L10, namely, the radial direction of a reticle R; and when an object lens barrel 10 and a focus barrel 20 in an alignment system are moved in accordance with the change of the reticle size, a rectangular aperture image 70a' of the light source part is moved in the lengthwise direction to an entrance pupil IE on the entrance pupil plane of a projection object lens L50, and an entrance pupil image IE' of the projection object lens L50 is moved in the lengthwise direction of the rectangular aperture 70a on the rectangular aperture 70a on the aperture plane of the light source part. Therefore, the state where an alignment mark Wm on a wafer W is illuminated through the projection object lens L50 is hardly changed.
摘要翻译：目的：即使标线尺寸改变，也可以高精度地对准标线片和晶片，通过在光源装置中设置矩形孔并使矩形孔的长度方向与标线片侧的方向一致标线片侧正透镜组的焦点可以在光罩上移动。构成：设置在光源部中的形成有狭缝状矩形膜片70的矩形孔70a的长度方向与第一正透镜组L10的聚焦位置的移动方向对应，即径向标线片R的方向; 并且当对准系统中的物镜镜筒10和聚焦镜筒20根据标线尺寸的变化而移动时，光源部分的矩形孔径图像70a'沿长度方向移动到入射光瞳IE 在投影物镜L50的入射光瞳面上，投影物镜L50的入射光瞳图像IE'沿着光源部的孔径面上的矩形孔70a的矩形孔70a的长度方向移动。因此，通过投影物镜L50照射晶片W上的对准标记Wm的状态几乎不变化。

7. 发明专利

JPS58162039A PROJECTION TYPE EXPOSING APPARATUS 失效
公开(公告)号：JPS58162039A
公开(公告)日：1983-09-26
申请号：JP4583782
申请日：1982-03-23
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , ANZAI AKIRA
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027
摘要： PURPOSE:To realize higly accurate positioning with a simplified structure by providing a first reflecting material in the opposite side of the projection objective and an inclined second reflecting material in the same side thereof, thereby reflecting the light beam transmitting the pattern surface of reticule, and by observing or measuring reflected light beam which transmits again the pattern surface. CONSTITUTION:A reflector M1 is arranged at the upper part of reticule R, mamely in the opposite side of projection objective L10 and an inclined reflector M2 is provided in the side of projection objective L10. A light beam 20 sent from the alignment mark Ra' on the wafer W and is irradiated to the projection objective L10 passes the reticule pattern surface Rp and is then reflected by the reflector M1 and again passes the reticule pattern surface Rp and again reflected in such a direction as becoming far from the light axis A1 by the refelctor M2. A picture of alignment mark Ra' on the wafer W is also focused at the position of the alignment mark Ra'' and a positional relation between the wafer W and reticule R can be observed from the picture positions of them.

8. 发明专利

JPS58112330A PROJECTION TYPE EXPOSURE DEVICE 失效
公开(公告)号：JPS58112330A
公开(公告)日：1983-07-04
申请号：JP21479581
申请日：1981-12-25
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , ANZAI AKIRA
IPC分类号： H01L21/30 , G01B11/00 , G03F7/22 , G03F9/00 , H01L21/027
摘要： PURPOSE:To maintain excellent alignment precision with a simple constitution regardless of the color aberration of projected object lens by a method wherein both the lighting optical system supplying the projected object lens with the second wave length light and the observational optical system observing focussed images of Fresnel zone patterns as well as alignment marks are provided. CONSTITUTION:The light lambda2 from a light source 20 supplied for the projected object lens 10 is focussed on an imaginary focus 13 of the wave length lambda2 by means of the convergence of the first lens group 11 in said projected object lens 10 to be projected into wafer 2 as parallel light flux by means of the second lens group 12. The Fresnel zone pattern P forms focussed images F on the point different from the wafer 2 by the distance DELTA the project said focussed images F on a reticle 1 by means of said lens 10. A specified alignment mark is provided on the reticle 1 while the images of said focussed images F and the alignment mark on the reticle 1 are formed on the picking up face of pick up device 28 such as ITV by means of the first object lens 24, half mirror 23, mirror 26, the second object lens 27. The radiated light of the wave length (lambda2) for alignment and the observed light are respectively indicated by dotted lines and solid lines.

9. 发明专利

JPS57125302A Automatic measuring device of radius of curvature 失效
标题翻译：曲率半自动测量装置
公开(公告)号：JPS57125302A
公开(公告)日：1982-08-04
申请号：JP1010881
申请日：1981-01-28
申请人： Nippon Kogaku Kk
发明人： UEHARA MAKOTO , NOUDA MASAO , NAKABARAI SHIYUUICHI
IPC分类号： G01B11/24 , A61B3/10 , G01B11/255 , G01B21/20
CPC分类号： G01B11/255
摘要： PURPOSE:To measure the curvature of a body to be checked automatically by projecting indexes on the body to be checked by parallel luminous fluxes in the directions which are symmetrical with respect to an optical axis of an objective lens, focusing the index images on an image sensor by the specified objective lens, detecting the interval, and performing computation and processing. CONSTITUTION:Point light sources 10a and 10b are arranged at the symmetrical positions with respect to the optical axis of the objective lens system comprising a front lens 1, a rear lens 2 whose front focal point is the rear focal point of the lens 1, and a stop 3 which is arranged at the focal point. The bright points 10a and 10b are projected on the body to be checked 100 by the parallel luminous fluxes in the directions which form an equal angle theta with the optical axis of the objective lens from projecting lenses 11a and 11b. The reflected image are focused on an image sensor 14 and a reticle 13 through the objective lens and a beam splitter 12. Focusing is performed by an eyepiece lense 13', and the output from the sensor 14 is inputted into a computor 17, through a waveform shaping circuit 16. Then the curvature of the body to be checked 100 is computed and displayed 18. Thus the curvature can be automatically measured.
摘要翻译：目的：通过将物体上的索引投射到要被检查的平行光束上，以相对于物镜的光轴对称的方向来自动测量要被检查的身体的曲率，将索引图像聚焦在图像上传感器通过指定的物镜，检测间隔，并执行计算和处理。构成：点光源10a和10b相对于包括前透镜1，前焦点是透镜1的后焦点的后透镜2的物镜系统的光轴布置在对称位置，以及设置在焦点处的停止件3。亮点10a和10b通过与投影透镜11a和11b的物镜的光轴形成等角度θ的方向上的平行光束投射到要检查的物体100上。反射图像通过物镜和分束器12聚焦在图像传感器14和光罩13上。通过目镜透镜13'进行聚焦，将传感器14的输出输入计算机17，通过波形整形电路16.然后计算并显示要检查的物体100的曲率。因此，可以自动测量曲率。

10. 发明专利

JPH0669014B2 失效
公开(公告)号：JPH0669014B2
公开(公告)日：1994-08-31
申请号：JP3885286
申请日：1986-02-24
申请人： NIPPON KOGAKU KK
发明人： MATSUMOTO KOICHI , SUENAGA YUTAKA , UEHARA MAKOTO , MURAMATSU MICHUKI
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68

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