专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08901225B2 Photosensitive resin composition, laminate utilizing same and solid-state imaging device 有权
标题翻译：感光树脂组合物，利用其的层压体和固态成像装置
公开(公告)号：US08901225B2
公开(公告)日：2014-12-02
申请号：US13513464
申请日：2010-10-26
申请人： Yumiko Okuda , Toru Okazawa , Masao Kamogawa , Mitsuhito Suwa
发明人： Yumiko Okuda , Toru Okazawa , Masao Kamogawa , Mitsuhito Suwa
IPC分类号： G03F7/004 , C08F2/48 , C08J3/28 , G03C1/00 , G03F7/09 , G03F7/031 , G03F7/037
CPC分类号： G03F7/037 , G03F7/031 , G03F7/091
摘要： A photosensitive resin composition which can impart insulating properties and light-shielding properties against light having a wavelength lying in an ultra-violet range, a visible range and a near-infrared range to a substrate more readily when applied onto the substrate, wherein the substrate has such properties that the permeability to light having a wavelength of 400 to 900 nm inclusive is less than 3.0% and the maximum value of the permeability to light having a wavelength of longer than 900 nm and not longer than 1300 nm is 3.0% or more. The photosensitive resin composition is characterized by comprising (a) an alkali soluble resin, (b) a specific tungsten oxide and/or a specific composite tungsten oxide, (c) a photopolymerizable compound having at least two polymerizable groups, (d) an oxime-type photopolymerization initiator, and (e) a solvent.
摘要翻译：一种光敏树脂组合物，其能够在施加到基板上时更容易地赋予波长在紫外范围，可见光范围和近红外范围内的光的绝缘性能和遮光性，其中基材具有波长为400〜900nm以上的光的透过率小于3.0％，波长在900nm以上1300nm以下的光的透过率的最大值为3.0％以上的特性。光敏树脂组合物的特征在于包含（a）碱溶性树脂，（b）特定的氧化钨和/或特定的复合氧化钨，（c）具有至少两个可聚合基团的光聚合化合物，（d）肟型光聚合引发剂，和（e）溶剂。

2. 发明授权

US07476476B2 Photosensitive resin composition, electronic component using the same, and display unit using the same 有权
标题翻译：感光性树脂组合物，使用该组合物的电子部件以及使用其的显示装置
公开(公告)号：US07476476B2
公开(公告)日：2009-01-13
申请号：US10558873
申请日：2004-05-27
申请人： Mitsuhito Suwa
发明人： Mitsuhito Suwa
IPC分类号： G03F7/037 , H05B33/10 , H05B33/12 , H05B33/14 , C08L79/08 , C08G73/10
CPC分类号： G03F7/037 , C08G73/101 , Y10S430/107 , Y10S430/11
摘要： This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.
摘要翻译：本发明涉及一种可在碱性显影剂中显影的负性感光性树脂组合物。该感光性树脂组合物包含：（a）在聚合物主链的末端具有至少一个选自羧基，酚羟基，磺酸基和硫醇基的基团的聚酰亚胺; （b）具有包含不饱和双键和/或三键的可聚合官能团的化合物; 和（c）光聚合引发剂。

3. 发明授权

US07374856B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film 有权
标题翻译：正型感光硅氧烷组合物，由组合物形成的固化膜和掺入固化膜的装置
公开(公告)号：US07374856B2
公开(公告)日：2008-05-20
申请号：US11272791
申请日：2005-11-15
申请人： Mitsuhito Suwa , Takenori Fujiwara , Masahide Senoo , Hirokazu Iimori
发明人： Mitsuhito Suwa , Takenori Fujiwara , Masahide Senoo , Hirokazu Iimori
IPC分类号： G03F7/023
CPC分类号： G03F7/0757 , C08K5/42 , G03F7/022 , C08L83/04
摘要： A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 μm of film thickness at a wavelength of 400 nm of 95% or more.
摘要翻译：可以使用具有高光敏性和具有高耐热性，高透明性和低介电常数等性能的正型感光性硅氧烷组合物来形成用于TFT基板，层间电介质或光波导的芯或包层的平坦化膜。正型光敏性硅氧烷组合物包括硅氧烷聚合物，醌二叠氮化合物和溶剂，并且由该组合物形成的固化膜在400nm波长处具有3μm的膜厚的透光率为95％以上。

4. 发明申请

US20060159839A1 Photosensitive resin composition, electronic component using the same, and display using same 有权
标题翻译：感光性树脂组合物，使用其的电子部件和使用其的显示
公开(公告)号：US20060159839A1
公开(公告)日：2006-07-20
申请号：US10558873
申请日：2004-05-27
申请人： Mitsuhito Suwa
发明人： Mitsuhito Suwa
IPC分类号： B05D5/06
CPC分类号： G03F7/037 , C08G73/101 , Y10S430/107 , Y10S430/11
摘要： This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.
摘要翻译：本发明涉及一种可在碱性显影剂中显影的负性感光性树脂组合物。该感光性树脂组合物包含：（a）在聚合物主链的末端具有至少一个选自羧基，酚羟基，磺酸基和硫醇基的基团的聚酰亚胺; （b）具有包含不饱和双键和/或三键的可聚合官能团的化合物; 和（c）光聚合引发剂。

5. 发明授权

US5913004A Optical glass fiber coating composition 失效
标题翻译：光学玻璃纤维涂料组合物
公开(公告)号：US5913004A
公开(公告)日：1999-06-15
申请号：US840169
申请日：1997-04-14
申请人： Hideaki Takase , Mitsuhito Suwa , Zen Komiya , Takashi Ukachi
发明人： Hideaki Takase , Mitsuhito Suwa , Zen Komiya , Takashi Ukachi
IPC分类号： C03C25/10 , C08F290/06 , C08G18/10 , C08G18/67 , C09D175/16 , G02B6/02 , G02B6/16
CPC分类号： C09D175/16 , C03C25/106 , C08F290/067 , C08G18/10 , C08G18/672
摘要： Provided is an optical glass fiber coating composition which when coated on an optical glass fiber and suitably cured provides a coating having the combination of properties (i) through (iv):(i) a stable tensile modulus that is low at room temperature and over a broad range of temperatures below room temperature,(ii) an adhesion to the optical glass fiber sufficient to prevent structural defects and microbending in the optical glass fiber,(iii) the capability of being removed by stripping from the optical glass fiber substantially no residue left on the optical glass fiber, and(iv) which satisfies each of the following inequalities (I) and (II),X.ltoreq.0.2 kg/mm.sup.2 (I)X/Y.gtoreq.1/10 (II) wherein X is the tensile modulus (kg/mm.sup.2) measured at 23.degree. C. and Y is the tensile modulus (kg/mm.sup.2) measured at -40.degree. C.,This coating composition comprises:(A) a urethane (meth)acrylate formed from,(a) a diol compound containing at least one structure represented by one of the following formulas (1) and (2), ##STR1## (b) a compound containing two isocyanate groups, and (c) a compound containing a (meth)acrylate group and a hydroxy group;(B) a second (meth)acrylate-containing compound of which the homopolymer has a glass transition temperature of at most about 0.degree. C.; and(C) a polymerization initiator.
摘要翻译：提供了一种光学玻璃纤维涂料组合物，其在光学玻璃纤维上涂覆并适当固化时提供了具有性能（i）至（iv）的组合的涂层：（i）在室温和过高时稳定的拉伸模量低于室温的宽范围的温度，（ii）足以防止光学玻璃纤维中的结构缺陷和微弯曲的光学玻璃纤维的粘附，（iii）通过从光学玻璃纤维剥离而基本上没有残留物的去除能力留下在光学玻璃纤维上，和（iv）满足以下不等式（I）和（II）中的每一个，X <= 0.2kg / mm 2（I）X / Y> / = 1/10（II）其中 X为在23℃下测定的拉伸弹性模量（kg / mm2），Y为在-40℃下测定的拉伸弹性模量（kg / mm2）。该涂料组合物包含：（A）形成的氨基甲酸酯（甲基）由（a）含有由下述式（1）表示的至少一种结构的二醇化合物a nd（2），（b）含有2个异氰酸酯基的化合物，（c）含有（甲基）丙烯酸酯基和羟基的化合物; （B）第二（甲基）丙烯酸酯化合物，其均聚物的玻璃化转变温度为至多约0℃; 和（C）聚合引发剂。

6. 发明授权

US08828642B2 Positive photosensitive resin composition, cured film obtained using same, and optical device 有权
标题翻译：正型感光性树脂组合物，使用其获得的固化膜和光学装置
公开(公告)号：US08828642B2
公开(公告)日：2014-09-09
申请号：US13496717
申请日：2010-09-16
申请人： Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
发明人： Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
IPC分类号： G03F7/004 , G03F7/075 , G03F7/40
CPC分类号： G03F7/0047 , C08K3/22 , C08K3/36 , C08K5/42 , C08L83/06 , G02B1/04 , G03F7/0233 , G03F7/0757 , C08L83/04
摘要： Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.
摘要翻译：公开了一种正型光敏树脂组合物，其特征在于含有（a）通过水解和部分冷凝特定的有机硅烷和有机硅烷低聚物而合成的聚硅氧烷，（b）铝化合物颗粒，锡化合物颗粒，钛化合物颗粒，锆化合物上述化合物的颗粒，复合颗粒或任何上述化合物的复合颗粒和硅化合物，（c）萘醌二叠氮化合物和（d）溶剂。正型感光性树脂组合物的特征还在于，有机硅烷低聚物含有特定的有机硅烷。正型感光性树脂组合物在不劣化高折射率和高透明性的情况下实现了优异的灵敏度和分辨率。

7. 发明授权

US08492450B2 Siloxane resin composition and protective film for touch panel using the same 有权
标题翻译：硅氧烷树脂组合物及使用其的触摸屏保护膜
公开(公告)号：US08492450B2
公开(公告)日：2013-07-23
申请号：US13130843
申请日：2009-11-16
申请人： Hitoshi Araki , Mitsuhito Suwa
发明人： Hitoshi Araki , Mitsuhito Suwa
IPC分类号： C09D5/44 , G03F7/031 , C08B37/00 , C08F2/50 , H05B6/68 , B29C71/04
CPC分类号： C09D7/61 , C08F290/148 , C08G77/04 , C08G77/14 , C08G77/442 , C08K7/26 , C08L33/08 , C08L33/10 , C08L83/04 , C08L83/10 , C09D4/00 , C09D151/085 , C09D183/10 , C08F220/26
摘要： A siloxane resin composition is provided which is superior in pattern processability and yields a cured film with high hardness and excellent abrasion resistance by means of UV curing and thermal curing. The siloxane resin composition includes (A) polysiloxane having a carboxyl group and a radical polymerizable group, (B) a photo-radical polymerization initiator and (C) a compound having a radical polymerizable group and not having a Si—O—Si bond.
摘要翻译：提供了图案加工性优异的硅氧烷树脂组合物，通过UV固化和热固化得到具有高硬度和优异耐磨性的固化膜。硅氧烷树脂组合物包含（A）具有羧基和自由基聚合性基团的聚硅氧烷，（B）光自由基聚合引发剂和（C）具有自由基聚合性基团且不具有Si-O-Si键的化合物。

8. 发明申请

US20110230584A1 SILOXANE RESIN COMPOSITION AND PROTECTIVE FILM FOR TOUCH PANEL USING THE SAME 有权
标题翻译：硅氧烷树脂组合物和使用它的触控面板的保护膜
公开(公告)号：US20110230584A1
公开(公告)日：2011-09-22
申请号：US13130843
申请日：2009-11-16
申请人： Hitoshi Araki , Mitsuhito Suwa
发明人： Hitoshi Araki , Mitsuhito Suwa
IPC分类号： C08F2/46 , C08G77/18
CPC分类号： C09D7/61 , C08F290/148 , C08G77/04 , C08G77/14 , C08G77/442 , C08K7/26 , C08L33/08 , C08L33/10 , C08L83/04 , C08L83/10 , C09D4/00 , C09D151/085 , C09D183/10 , C08F220/26
摘要： A siloxane resin composition is provided which is superior in pattern processability and yields a cured film with high hardness and excellent abrasion resistance by means of UV curing and thermal curing. The siloxane resin composition includes (A) polysiloxane having a carboxyl group and a radical polymerizable group, (B) a photo-radical polymerization initiator and (C) a compound having a radical polymerizable group and not having a Si—O—Si bond.
摘要翻译：提供了图案加工性优异的硅氧烷树脂组合物，通过UV固化和热固化得到具有高硬度和优异耐磨性的固化膜。硅氧烷树脂组合物包含（A）具有羧基和自由基聚合性基团的聚硅氧烷，（B）光自由基聚合引发剂和（C）具有自由基聚合性基团且不具有Si-O-Si键的化合物。

9. 发明授权

US07977400B2 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US07977400B2
公开(公告)日：2011-07-12
申请号：US11886339
申请日：2006-03-14
申请人： Ryuichiro Taniguchi , Hiroko Mitsui , Mitsuhito Suwa
发明人： Ryuichiro Taniguchi , Hiroko Mitsui , Mitsuhito Suwa
IPC分类号： C08F2/50
CPC分类号： G03F7/027 , C08G73/101 , G03F7/037 , G03F7/0751 , G03F7/0757
摘要： Using a photosensitive resin composition comprising a polyimide (a) having, at the end of the main chain, at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group, an unsaturated bond-containing polymerizable compound (b1) represented by the general formula (1), and a photopolymerization initiator (c), it is possible to conduct alkaline development and to form a polyimide film having excellent heat resistance, strength and elongation.
摘要翻译：使用包含在主链末端具有选自羧基，酚羟基，磺酸基和硫醇基中的至少一个基团的聚酰亚胺（a）的感光性树脂组合物，由通式（1）表示的含不饱和键的聚合性化合物（b1）和光聚合引发剂（c）可以进行碱显影，形成耐热性，强度和伸长率优异的聚酰亚胺膜。

10. 发明授权

US06187504B1 Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06187504B1
公开(公告)日：2001-02-13
申请号：US08976662
申请日：1997-11-24
申请人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
发明人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group, R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
摘要翻译：一种正色调或负色调辐射敏感性树脂组合物，其包含（A）由下式（1-1）或（1-2）表示的光酸产生剂：其中R1，R2，R5和R6是烷基， R3和R7是羟基或-OR4（其中R4是有机基团），A1-和A2-表示一价阴离子，a和c表示4-7的整数，b和d是0-7的整数。正色调树脂组合物还包含（B1）含有酸分解性基团的树脂或（B2）碱溶性树脂和碱溶性调节剂，负色调辐射敏感性树脂组合物还包含（C）碱溶性树脂和（D）交联剂。树脂组合物高度敏感，表现出优异的分辨率和图案形成性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式