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1. 发明授权

US06187504B1 Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06187504B1
公开(公告)日：2001-02-13
申请号：US08976662
申请日：1997-11-24
申请人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
发明人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group, R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
摘要翻译：一种正色调或负色调辐射敏感性树脂组合物，其包含（A）由下式（1-1）或（1-2）表示的光酸产生剂：其中R1，R2，R5和R6是烷基， R3和R7是羟基或-OR4（其中R4是有机基团），A1-和A2-表示一价阴离子，a和c表示4-7的整数，b和d是0-7的整数。正色调树脂组合物还包含（B1）含有酸分解性基团的树脂或（B2）碱溶性树脂和碱溶性调节剂，负色调辐射敏感性树脂组合物还包含（C）碱溶性树脂和（D）交联剂。树脂组合物高度敏感，表现出优异的分辨率和图案形成性能。

2. 发明授权

US06322949B2 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06322949B2
公开(公告)日：2001-11-27
申请号：US09739833
申请日：2000-12-20
申请人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
发明人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group , R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
摘要翻译：一种正色调或负色调辐射敏感性树脂组合物，其包含（A）由下式（1-1）或（1-2）表示的光酸产生剂：其中R1，R2，R5和R6是烷基， R3和R7是羟基或-OR4（其中R4是有机基团），A1-和A2-表示一价阴离子，a和c表示4-7的整数，b和d是0-7的整数。正色调树脂组合物还包含（B1）含有酸分解性基团的树脂或（B2）碱溶性树脂和碱溶性调节剂，负色调辐射敏感性树脂组合物还包含（C）碱溶性树脂和（D）交联剂。树脂组合物高度敏感，表现出优异的分辨率和图案形成性能。

3. 发明授权

US06180316B2 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06180316B2
公开(公告)日：2001-01-30
申请号：US09231762
申请日：1999-01-15
申请人： Toru Kajita , Mitsuhito Suwa , Haruo Iwasawa , Masafumi Yamamoto
发明人： Toru Kajita , Mitsuhito Suwa , Haruo Iwasawa , Masafumi Yamamoto
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition which comprises, (A) a polymer containing, (a) a recurring unit (I) of the following formula (1): or a recurring unit (I) of the formula (1) and a recurring unit (II) of the following formula (2), and (b) a recurring unit (III) which is derived from a monomer having at least two polymerizable carbon—carbon double bonds by cleavage of the carbon—carbon double bonds, wherein the monomer has, in addition to said at least two polymerizable carbon—carbon double bonds, at least one acid-decomposable divalent group of the following formula (3) or (4), said at least two polymerizable carbon—carbon double bonds being linked via the least one acid-decomposable divalent group of the formula (3) or (4), and (B) a photoacid generator.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）含有（a）下式（1）的重复单元（I）或式（1）的重复单元（I）的聚合物和重复单元（II）和（b）通过裂解碳 - 碳双键衍生自具有至少两个可聚合碳 - 碳双键的单体的重复单元（III），其中单体除了所述至少两个可聚合碳 - 碳双键之外，还具有至少一个下式（3）或（4）的可酸分解的二价基团，所述至少两个可聚合碳 - 碳双键经由至少一个式（3）或（4）的酸可分解的二价基团，和（B）光酸产生剂。

4. 发明授权

US07473443B2 Composition for forming silicon film and method for forming silicon film 有权
标题翻译：用于形成硅膜的组合物和形成硅膜的方法
公开(公告)号：US07473443B2
公开(公告)日：2009-01-06
申请号：US10515728
申请日：2003-08-15
申请人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
发明人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
IPC分类号： B05D3/06 , B05D3/02
CPC分类号： C23C24/10 , C23C26/02 , C30B7/005 , H01L21/02422 , H01L21/02532 , H01L21/02601 , H01L21/02628 , H01L21/02667 , H01L21/02686
摘要： There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily.
摘要翻译：提供一种含有硅颗粒和分散介质的硅膜形成组合物，以及通过在基片上形成硅膜形成组合物的涂膜并对涂膜进行即时熔合而形成硅膜的方法，热处理或光处理。根据组成和方法，可以有效且容易地形成可用作太阳能电池的硅膜的具有期望厚度的多晶硅膜。

5. 发明申请

US20060159859A1 Silane polymer and method for forming silicon film 审中-公开
标题翻译：硅烷聚合物和形成硅膜的方法
公开(公告)号：US20060159859A1
公开(公告)日：2006-07-20
申请号：US10560527
申请日：2004-06-11
申请人： Haruo Iwasawa
发明人： Haruo Iwasawa
IPC分类号： B05D3/02 , B05D3/06 , C08G77/00 , B32B27/00
CPC分类号： C09D183/16 , C01B33/08 , C09D4/00 , H01L21/02422 , H01L21/02425 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/02628 , C08G77/00
摘要： There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment.
摘要翻译：从涂布在基材上的润湿性，沸点和安全性的观点出发，提供了具有较高分子量的硅烷聚合物，可以容易地形成高质量硅膜的组合物，包含硅烷通过用特定波长范围的光照射光聚合性硅烷化合物而获得的聚合物进行光聚合;以及形成硅膜的方法，其包括将该组合物涂布在基材上，对该涂膜进行热处理和/或光处理。

6. 发明授权

US06531260B2 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权
标题翻译：聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物
公开(公告)号：US06531260B2
公开(公告)日：2003-03-11
申请号：US09824224
申请日：2001-04-03
申请人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
发明人： Haruo Iwasawa , Tsutomu Shimokawa , Akihiro Hayashi , Satoru Nishiyama
IPC分类号： G03C172
CPC分类号： C08L83/08 , C07F7/0838 , C08G77/14 , C08G77/24 , C08L83/06 , G03F7/0045 , G03F7/0757
摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
摘要翻译：一种具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A1和A2是酸解离的一价有机基团，R 1是氢，一价（卤代）烃，卤素，或氨基，R 2为单价（卤代）烃基或卤素。还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异等等

7. 发明授权

US07718228B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same 有权
标题翻译：用于形成硅 - 钴膜的组合物，硅 - 钴膜及其形成方法
公开(公告)号：US07718228B2
公开(公告)日：2010-05-18
申请号：US10575478
申请日：2004-10-06
申请人： Yasuo Matsuki , Daohai Wang , Tatsuya Sakai , Haruo Iwasawa
发明人： Yasuo Matsuki , Daohai Wang , Tatsuya Sakai , Haruo Iwasawa
IPC分类号： B05D3/02
CPC分类号： H01L21/28518 , C07F17/02 , C23C18/1204 , C23C18/14
摘要： There are provided a composition and method for forming a silicon-cobalt film at low production cost without expensive vacuum equipment and high-frequency generator. The composition is a silicon-cobalt film forming composition comprising a silicon compound and a cobalt compound. A silicon-cobalt film is formed by applying this composition on a substrate and subjecting the resulting substrate to a heat treatment and/or a light treatment.
摘要翻译：提供了一种低成本的用于形成硅 - 钴膜的组合物和方法，而不需要昂贵的真空设备和高频发生器。该组合物是包含硅化合物和钴化合物的硅 - 钴膜形成组合物。通过将该组合物涂布在基板上并使所得到的基板进行热处理和/或光处理而形成硅 - 钴膜。

8. 发明授权

US07223802B2 High order silane composition, and method of forming silicon film using the composition 有权
标题翻译：高级硅烷组合物，以及使用该组合物形成硅膜的方法
公开(公告)号：US07223802B2
公开(公告)日：2007-05-29
申请号：US10420521
申请日：2003-04-22
申请人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Kateuchi
发明人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Kateuchi
IPC分类号： C08F2/46 , H01L21/20
CPC分类号： C08G77/60 , C01B33/04 , C09D183/16 , H01L21/02422 , H01L21/02532 , H01L21/02628
摘要： It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.
摘要翻译：本发明的目的是提供一种高分子量硅烷组合物，其含有比常规高的分子量的聚硅烷，这是从涂布在基材上的润湿性，沸点和安全性的观点出发的，因此特别地使能容易形成的高质量硅膜，以及使用该组合物形成优异的硅膜的方法。本发明通过提供通过光可聚合硅烷或可光聚合的类似液体硅烷的溶液用紫外光照射而通过光聚合获得的含有聚硅烷的高级硅烷组合物达到该目的。此外，本发明提供一种形成硅膜的方法，其包括将这种高级硅烷组合物施加到基底上的步骤。

9. 发明申请

US20050145163A1 Composition for forming silicon film and method for forming silicon film 有权
标题翻译：用于形成硅膜的组合物和形成硅膜的方法
公开(公告)号：US20050145163A1
公开(公告)日：2005-07-07
申请号：US10515728
申请日：2003-08-15
申请人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
发明人： Yasuo Matsuki , Haruo Iwasawa , Hitoshi Kato
IPC分类号： C23C24/10 , C23C26/02 , H01L21/208 , C30B7/00 , H01L21/44
CPC分类号： C23C24/10 , C23C26/02 , C30B7/005 , H01L21/02422 , H01L21/02532 , H01L21/02601 , H01L21/02628 , H01L21/02667 , H01L21/02686
摘要： There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily.
摘要翻译：提供一种含有硅颗粒和分散介质的硅膜形成组合物，以及通过在基片上形成硅膜形成组合物的涂膜并对涂膜进行即时熔合而形成硅膜的方法，热处理或光处理。根据组成和方法，可以有效且容易地形成可用作太阳能电池的硅膜的具有期望厚度的多晶硅膜。

10. 发明申请

US20070190265A1 High order silane composition, and method of forming silicon film using the composition 审中-公开
公开(公告)号：US20070190265A1
公开(公告)日：2007-08-16
申请号：US11787445
申请日：2007-04-16
申请人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Takeuchi
发明人： Takashi Aoki , Masahiro Furusawa , Yasuo Matsuki , Haruo Iwasawa , Yasumasa Takeuchi
IPC分类号： C08J3/28
CPC分类号： C08G77/60 , C01B33/04 , C09D183/16 , H01L21/02422 , H01L21/02532 , H01L21/02628
摘要： It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.

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