专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5633496A Mass spectrometry apparatus 失效
标题翻译：质谱仪
公开(公告)号：US5633496A
公开(公告)日：1997-05-27
申请号：US405767
申请日：1995-03-17
申请人： Minoru Sakairi , Tadao Mimura , Yoichi Ose , Atsumu Hirabayashi , Yasuaki Takada
发明人： Minoru Sakairi , Tadao Mimura , Yoichi Ose , Atsumu Hirabayashi , Yasuaki Takada
IPC分类号： G01N27/62 , G01N27/447 , G01N30/72 , H01J49/04 , H01J49/06 , B01D59/44 , H01J49/00
CPC分类号： H01J49/067 , G01N30/7233
摘要： A mass spectrometry apparatus which includes an ion source which ionizes a sample under atmospheric pressure and outputs the ionized sample, a differential pumping region, provided with apertures, for receiving under vacuum ions in the ionized sample from the ion source and outputting the ions and an ion accelerating and focusing region, having a plurality of ion accelerating electrodes each having applied thereto a voltage, for accelerating and focusing under vacuum the ions from the differential pumping region. The ions from the accelerating and focusing region are introduced under vacuum to a mass spectrometer which detects and analyzes the ions.
摘要翻译：一种质谱装置，其包括离子源，所述离子源在大气压下离子化样品并输出所述离子化样品，具有孔的差分泵浦区，用于在离子源的离子化样品中的真空离子下接收并输出离子，离子加速和聚焦区域，具有多个离子加速电极，每个离子加速电极都施加有电压，用于在真空下加速和聚焦来自差动泵浦区域的离子。来自加速和聚焦区域的离子被真空引入到检测和分析离子的质谱仪中。

2. 发明授权

US5532483A Mass spectrometer and ion source 失效
标题翻译：质谱仪和离子源
公开(公告)号：US5532483A
公开(公告)日：1996-07-02
申请号：US403980
申请日：1995-03-15
申请人： Yoichi Ose , Kiyomi Yoshinari , Masayoshi Yano , Tadao Mimura
发明人： Yoichi Ose , Kiyomi Yoshinari , Masayoshi Yano , Tadao Mimura
IPC分类号： H01J49/06 , H01J49/10
CPC分类号： H01J49/10 , H01J49/06
摘要： An ion beam having a good converging property and a good quality is provided by satisfying the limitations controlling both angle of dispersion and the width of beam at the same time. The voltage 12d of a repeller electrode 1f in an ion source of electron bombardment type is input to an ion source state monitor 11 and the ion source state monitor 11 output a predicted value 12e of the voltage applied to an extractor electrode 1g to an extractor power source 9. As for the extractor electrode system, the width of a slit in the acceleration electrode 1b is made larger than the width of a slit of the extractor electrode 1g, and the extractor electrode 1g is set in a position apart from the acceleration electrode 1b by the distance nearly equal to the distance between the acceleration electrode 1b and the ion generating region 2a. By doing so, the electric field leaked from the slit of the acceleration electrode 1b to the inside of the ionization chamber 1a expands to the vicinity of the ion generating region. As the result, the ion beam 2 is effectively extracted to pass through the slits in the acceleration electrode 1b and the extractor 1g. The amount of the current passing through the slits is measured with an ion current monitor 8a and the voltage 12f of a converging electrode 1d is adjusted so that the value of the current becomes the maximum.
摘要翻译：通过满足同时控制分散角和宽度的限制来提供具有良好的会聚特性和良好质量的离子束。电子轰击型离子源中的斥极电极1f的电压12d被输入到离子源状态监视器11，离子源状态监视器11将施加到抽出电极1g的电压的预测值12e输出到提取电力对于提取器电极系统，使加速电极1b中的狭缝的宽度大于提取电极1g的狭缝的宽度，并且将提取电极1g设置在离开加速电极1的位置 1b的距离几乎等于加速电极1b和离子产生区域2a之间的距离。通过这样做，从加速电极1b的狭缝向电离室1a的内部泄漏的电场扩大到离子产生区域附近。结果，有效地提取离子束2以通过加速电极1b和提取器1g中的狭缝。通过离子电流监视器8a测量通过狭缝的电流量，调节会聚电极1d的电压12f，使得电流值变为最大值。

3. 发明授权

US09293293B2 Electron gun and charged particle beam device having an aperture with flare-suppressing coating 有权
标题翻译：具有带阻燃涂层的孔的电子枪和带电粒子束装置
公开(公告)号：US09293293B2
公开(公告)日：2016-03-22
申请号：US14240333
申请日：2012-05-22
申请人： Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
发明人： Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
IPC分类号： A61N5/00 , H01J37/065
CPC分类号： H01J37/065 , H01J2237/0206 , H01J2237/0213 , H01J2237/026 , H01J2237/045 , H01J2237/06316
摘要： The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.
摘要翻译：本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜，可以减少二次电子的产生量。在引出电极处产生的二次电子减少，结果是减少了耀斑。通过在引出电极上并入两个孔，并且向两个孔施加与引出电极等电位的电位，可以消除从下面到引出电极渗出的电场。当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力，因此发光减少。

4. 发明申请

US20140197336A1 ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：电子枪和充电颗粒光束装置
公开(公告)号：US20140197336A1
公开(公告)日：2014-07-17
申请号：US14240333
申请日：2012-05-22
申请人： Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
发明人： Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
IPC分类号： H01J37/065
CPC分类号： H01J37/065 , H01J2237/0206 , H01J2237/0213 , H01J2237/026 , H01J2237/045 , H01J2237/06316
摘要： The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.
摘要翻译：本申请的目的是抑制耀斑的发生和减少在设置到电子枪的引出电极的孔处产生的二次电子的量。通过在电子枪中最接近电子源的引出电极的孔径上涂布碳二次电子发射率低的薄膜，可以减少二次电子的产生量。在引出电极处产生的二次电子减少，结果是减少了耀斑。通过在引出电极上并入两个孔，并且向两个孔施加与引出电极等电位的电位，可以消除从下面到引出电极渗出的电场。当电子束撞击引出电极时产生的二次电子停止从引出电极通过的方向上产生力，因此发光减少。

5. 发明申请

US20140124664A1 DEVICE FOR CORRECTING DIFFRACTION ABERRATION OF ELECTRON BEAM 有权
标题翻译：用于校正电子束的衍射脱落的装置
公开(公告)号：US20140124664A1
公开(公告)日：2014-05-08
申请号：US13977139
申请日：2011-12-26
申请人： Muneyuki Fukuda , Yoichi Ose , Mitsugu Sato , Hiroyuki Ito , Hiroshi Suzuki , Naomasa Suzuki
发明人： Muneyuki Fukuda , Yoichi Ose , Mitsugu Sato , Hiroyuki Ito , Hiroshi Suzuki , Naomasa Suzuki
IPC分类号： H01J37/10 , H01J37/26 , H01J37/147
CPC分类号： H01J37/10 , H01J37/147 , H01J37/153 , H01J37/26 , H01J2237/1534 , H01J2237/2614
摘要： A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.
摘要翻译：由电磁线圈环的多极形成的衍射像差校正器，具有调整矢量电势相对于光束轴线的正交性或轴向移动的功能的功能。为了产生相位差，在物镜孔附近设置衍射像差校正器，该衍射像差校正器垂直于光束轴并且在相对于光束轴线的正交平面内具有对称分布的矢量电位，镜片。在从光束轴倾斜的状态下行进的衍射波通过磁通的环。由于由于向量电位而使光束直径内的相位差增加了Aharonov-Bohm效应，所以抑制了样品上电子束的强度。

6. 发明授权

US07566892B2 Electron beam apparatus and method for production of its specimen chamber 有权
标题翻译：电子束装置及其试样室的制造方法
公开(公告)号：US07566892B2
公开(公告)日：2009-07-28
申请号：US11907375
申请日：2007-10-11
申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
发明人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
IPC分类号： G01N23/00
CPC分类号： H01J37/09 , H01J37/16 , H01J2237/1405 , H01J2237/16 , H01J2237/2614 , H01J2237/2617 , H01J2237/28
摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
摘要翻译：提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料桶和样品室的主体。用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

7. 发明申请

US20090152462A1 Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method 审中-公开
标题翻译：气田电离离子源，扫描带电粒子显微镜，光轴调整法和标本观察法
公开(公告)号：US20090152462A1
公开(公告)日：2009-06-18
申请号：US12314553
申请日：2008-12-12
申请人： Tohru Ishitani , Yoichi Ose , Hiroyasu Shichi , Shinichi Matsubara , Tomihiro Hashizume , Muneyuki Fukuda
发明人： Tohru Ishitani , Yoichi Ose , Hiroyasu Shichi , Shinichi Matsubara , Tomihiro Hashizume , Muneyuki Fukuda
IPC分类号： G01N23/00 , H01T23/00
CPC分类号： H01J37/285 , B82Y15/00 , H01J27/024 , H01J27/26 , H01J37/08 , H01J37/09 , H01J37/18 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/0458 , H01J2237/061 , H01J2237/0807 , H01J2237/0835 , H01J2237/1501 , H01J2237/188 , H01J2237/24514
摘要： It is an object of the present invention to improve the stability of a gas field ionization ion source.A GFIS according to the present invention is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. According to the present invention, it is possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it is possible to reduce the physical vibration of the cooling means. Consequently, it is possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS.
摘要翻译：本发明的目的是提高气田电离离子源的稳定性。根据本发明的GFIS的特征在于，可以将引出电极的孔径设置为至少两个不同的值中的任一个，或者可以将发射极顶端到提取电极的距离设置为至少两个不同的值。此外，固体氮用于冷却。根据本发明，不仅允许发散的离子通过提取电极的孔径，而且代表差分泵送也可以减小孔径。此外，可以减少冷却装置的物理振动。因此，可以提供具有这种GFIS的高度稳定的GFIS和扫描带电粒子显微镜。

8. 发明申请

US20070114409A1 Electron beam apparatus with aberration corrector 有权
标题翻译：具有像差校正器的电子束装置
公开(公告)号：US20070114409A1
公开(公告)日：2007-05-24
申请号：US11655946
申请日：2007-01-22
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要翻译：提供具有使用多极透镜的像差校正器的电子束装置。电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得物镜的物体在任一种扫描模式下都不会改变。如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

9. 发明申请

US20060219946A1 Electron beam apparatus and method for production of its specimen chamber 有权
公开(公告)号：US20060219946A1
公开(公告)日：2006-10-05
申请号：US11356438
申请日：2006-02-17
申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
发明人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
IPC分类号： G21K7/00 , G21G5/00
CPC分类号： H01J37/09 , H01J37/16 , H01J2237/1405 , H01J2237/16 , H01J2237/2614 , H01J2237/2617 , H01J2237/28
摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

10. 发明授权

US07087899B2 Sample electrification measurement method and charged particle beam apparatus 有权
标题翻译：样品充电测量方法和带电粒子束装置
公开(公告)号：US07087899B2
公开(公告)日：2006-08-08
申请号：US11077130
申请日：2005-03-11
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式