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1. 发明授权

US08853988B2 Control systems and methods for compensating for effects of a stage motor 有权
标题翻译：用于补偿平台电机的影响的控制系统和方法
公开(公告)号：US08853988B2
公开(公告)日：2014-10-07
申请号：US12406322
申请日：2009-03-18
申请人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
发明人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
IPC分类号： G05B1/06 , G05B19/404 , G03F7/20
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70758 , G05B2219/41128 , G05B2219/41443
摘要： Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.
摘要翻译：本发明的实施例补偿了精密级装置中的级电动机的一个或多个效果。前馈模块接收与电动机的效果相对应的输入信号，并产生可用于修改电动机控制信号以补偿电动机的影响的前馈控制信号。在一些实施例中，提供控制系统以补偿由电动机产生的反电动势，而在其他实施例中，控制系统可以补偿电动机的感应效应。本发明的实施例可用于精密平台装置，例如平版印刷装置，例如步进器和扫描器。

2. 发明申请

US20100237819A1 Control Systems and Methods for Compensating for Effects of a Stage Motor 有权
标题翻译：补偿电动机效果的控制系统和方法
公开(公告)号：US20100237819A1
公开(公告)日：2010-09-23
申请号：US12406322
申请日：2009-03-18
申请人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
发明人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
IPC分类号： G05B11/36
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70758 , G05B2219/41128 , G05B2219/41443
摘要： Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.
摘要翻译：本发明的实施例补偿了精密级装置中的级电动机的一个或多个效果。前馈模块接收与电动机的效果相对应的输入信号，并产生可用于修改电动机控制信号以补偿电动机的影响的前馈控制信号。在一些实施例中，提供控制系统以补偿由电动机产生的反电动势，而在其他实施例中，控制系统可以补偿电动机的感应效应。本发明的实施例可用于精密平台装置，例如平版印刷装置，例如步进器和扫描器。

3. 发明申请

US20100156198A1 SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS 审中-公开
标题翻译：平板电机的屏蔽层加热后备冷却
公开(公告)号：US20100156198A1
公开(公告)日：2010-06-24
申请号：US12643888
申请日：2009-12-21
申请人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
发明人： Alexander Cooper , Scott Coakley , Douglas C. Watson , Alton H. Phillips , Gaurav Keswani , Michael B. Binnard
IPC分类号： H02K9/20 , H02K41/03
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/19 , H02K9/20 , H02K41/031 , H02K2201/18
摘要： According to one aspect of the present invention, a motor arrangement includes at least one coil, a cover plate, and a shield layer. The at least one coil has a first side and a second side. The cover plate is positioned substantially over the first side of the at least one coil at a distance from the at least one coil. The shield layer is positioned between the first side of the at least one coil and the cover plate, and has a top surface. The top surface contacts the cover plate, and includes a liquid and a gas that form a mixture and cause the top surface to have a substantially constant temperature.
摘要翻译：根据本发明的一个方面，电动机装置包括至少一个线圈，盖板和屏蔽层。该至少一个线圈具有第一侧和第二侧。覆盖板基本上位于距离至少一个线圈一定距离的至少一个线圈的第一侧上方。屏蔽层位于至少一个线圈的第一侧和盖板之间，并具有顶面。顶表面接触盖板，并且包括形成混合物的液体和气体，并使顶表面具有基本恒定的温度。

4. 发明申请

US20090033895A1 Lithography apparatus with flexibly supported optical system 审中-公开
标题翻译：平版印刷设备，灵活支持光学系统
公开(公告)号：US20090033895A1
公开(公告)日：2009-02-05
申请号：US11882027
申请日：2007-07-30
申请人： Michael B. Binnard , Douglas C. Watson , Alton H. Phillips , Scott Coakley
发明人： Michael B. Binnard , Douglas C. Watson , Alton H. Phillips , Scott Coakley
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithography apparatus includes a projection optical system that projects an image of a pattern, a first support member, a second support member that is flexibly coupled to the first support member by a first flexible coupling device such that the second support member is suspended from the first support member, and a second flexible coupling device that flexibly couples the projection optical system to the second support structure. This arrangement is capable of improving the vibration characteristics of the projection optical system.
摘要翻译：光刻设备包括投影光学系统，其投影图案的图像，第一支撑构件和第二支撑构件，第二支撑构件通过第一柔性联接装置柔性地联接到第一支撑构件，使得第二支撑构件从第一支撑构件和将投影光学系统柔性地耦合到第二支撑结构的第二柔性耦合装置。这种布置能够改善投影光学系统的振动特性。

5. 发明申请

US20070267995A1 Six Degree-of-Freedom Stage Apparatus 审中-公开
标题翻译：六自由度舞台装置
公开(公告)号：US20070267995A1
公开(公告)日：2007-11-22
申请号：US11750604
申请日：2007-05-18
申请人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips , Scott Coakley
发明人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips , Scott Coakley
IPC分类号： B64C17/06
CPC分类号： G03F7/70716 , G03F7/70766
摘要： Methods and apparatus for providing a fine stage with up to six degrees of freedom are disclosed. According to one aspect of the present invention, a stage apparatus includes a first stage assembly, a second stage assembly, and a countermass arrangement. The first stage assembly including a first component of a first actuator, and supports a second actuator arrangement. The second stage assembly is supported over the first stage assembly such that the second actuator arrangement drives the second stage assembly along a vertical axis. The countermass arrangement includes a second component of the first actuator. The first component cooperates with the second component to allow the first stage assembly to move relative to a first horizontal axis. The countermass arrangement absorbs reaction forces associated with the first and second stage assemblies.
摘要翻译：公开了提供高达六个自由度的精细台阶的方法和装置。根据本发明的一个方面，一种舞台装置包括第一舞台组件，第二舞台组件和反对质量装置。第一级组件包括第一致动器的第一部件，并且支撑第二致动器装置。第二级组件被支撑在第一级组件上，使得第二致动器装置沿着垂直轴驱动第二级组件。反对质量布置包括第一致动器的第二部件。第一部件与第二部件配合以允许第一级组件相对于第一水平轴线移动。反作用装置吸收与第一和第二级组件相关联的反作用力。

6. 发明授权

US07172493B2 Fine force actuator assembly for chemical mechanical polishing apparatuses 有权
标题翻译：用于化学机械抛光装置的细力致动器组件
公开(公告)号：US07172493B2
公开(公告)日：2007-02-06
申请号：US11252483
申请日：2005-10-18
申请人： W. Thomas Novak , Douglas C. Watson , Pai-Hsueh Yang , Bausan Yuan
发明人： W. Thomas Novak , Douglas C. Watson , Pai-Hsueh Yang , Bausan Yuan
IPC分类号： B24B49/00
CPC分类号： B24B37/042 , B24B37/005 , B24B37/30 , B24B41/068
摘要： A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).
摘要翻译：用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。垫保持器（50）保持抛光垫（48）。致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力垫座（50）。第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

7. 发明授权

US08705170B2 High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations 有权
标题翻译：高NA反射折射成像光学器件用于将掩模版成像到一对成像位置
公开(公告)号：US08705170B2
公开(公告)日：2014-04-22
申请号：US12547086
申请日：2009-08-25
申请人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
发明人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B27/1066 , G02B27/143 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70833
摘要： New and useful concepts for an imaging optical system configured to simultaneously image a reticle to a pair of imaging locations are provided, where the imaging optics comprise a pair of arms, each of which includes catadioptric imaging optics. In addition, the imaging optics are preferably designed to image a reticle simultaneously to the pair of imaging locations, at a numerical aperture of at least 1.3, and without obscuration of light by the imaging optics.
摘要翻译：提供了一种被配置为将掩模版同时成像到一对成像位置的成像光学系统的新的和有用的概念，其中成像光学器件包括一对臂，每个臂包括反射折射成像光学元件。此外，成像光学器件优选地设计成在至少为1.3的数值孔径同时成像成对位置的成对位置成像，并且不会由成像光学元件遮挡光。

8. 发明授权

US07466396B2 Lithography apparatus and method utilizing pendulum interferometer system 失效
标题翻译：利用摆锤干涉仪系统的平版印刷设备和方法
公开(公告)号：US07466396B2
公开(公告)日：2008-12-16
申请号：US11546368
申请日：2006-10-12
申请人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
发明人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
IPC分类号： G03B27/74
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70833
摘要： Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要翻译：标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

9. 发明申请

US20080285003A1 Linear motor driven automatic reticle blind 审中-公开
标题翻译：线性电机驱动自动掩模版盲
公开(公告)号：US20080285003A1
公开(公告)日：2008-11-20
申请号：US11803595
申请日：2007-05-15
申请人： Michael B. Binnard , Douglas C. Watson , Yoichi Arai
发明人： Michael B. Binnard , Douglas C. Watson , Yoichi Arai
IPC分类号： G03B27/42
CPC分类号： G03F7/70066
摘要： A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle blind assemblies designed to cooperate with one another to control the passing of a laser beam of an exposure system onto a work piece, such as a semiconductor wafer or flat panel display. Each reticle blind assembly includes a linear motor having a mover and a blind configured to be positioned between a first position and a second position by the mover. Each reticle blind assembly also includes a counter mass assembly including a portion of a guide mechanism having at least one guide bar and a stator of the linear motor. The stator of the linear motor and the guide bar are integrated to form the counter mass which is configured to absorb reaction forces that are created when the blind is moved. In various embodiments, the blinds can be configured to operate in the vertical or horizontal orientation.
摘要翻译：能够以相对较高的速度打开和关闭且不引起机械干扰或反作用力的掩模版盲板。掩模版盲包括两个掩模版盲组件，其设计成彼此配合以控制曝光系统的激光束通过诸如半导体晶片或平板显示器的工件。每个掩模版盲组件包括具有移动器的线性电动机和被构造成由移动器定位在第一位置和第二位置之间的盲板。每个掩模版盲组件还包括反质量组件，其包括具有至少一个引导杆和线性电动机的定子的引导机构的一部分。线性电动机和引导杆的定子被整合以形成相对质量块，其被构造成吸收当盲人移动时产生的反作用力。在各种实施例中，百叶窗可被配置成在垂直或水平取向上操作。

10. 发明申请

US20080105069A1 Fine Stage Z Support Apparatus 审中-公开
标题翻译：精细级Z支持装置
公开(公告)号：US20080105069A1
公开(公告)日：2008-05-08
申请号：US11666858
申请日：2005-11-04
申请人： Michael B. Binnard , Andrew J. Hazelton , Douglas C. Watson , Yoichi Arai
发明人： Michael B. Binnard , Andrew J. Hazelton , Douglas C. Watson , Yoichi Arai
IPC分类号： A47J43/08 , B65H1/00 , F16M11/00 , H01L21/00
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

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