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1. 发明授权

US07172493B2 Fine force actuator assembly for chemical mechanical polishing apparatuses 有权
标题翻译：用于化学机械抛光装置的细力致动器组件
公开(公告)号：US07172493B2
公开(公告)日：2007-02-06
申请号：US11252483
申请日：2005-10-18
申请人： W. Thomas Novak , Douglas C. Watson , Pai-Hsueh Yang , Bausan Yuan
发明人： W. Thomas Novak , Douglas C. Watson , Pai-Hsueh Yang , Bausan Yuan
IPC分类号： B24B49/00
CPC分类号： B24B37/042 , B24B37/005 , B24B37/30 , B24B41/068
摘要： A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).
摘要翻译：用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。垫保持器（50）保持抛光垫（48）。致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力垫座（50）。第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

2. 发明申请

US20080275661A1 On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage 有权
标题翻译：用于识别和补偿由多个执行器在多轴平台上产生的力 - 波动和侧力的机上方法
公开(公告)号：US20080275661A1
公开(公告)日：2008-11-06
申请号：US11986314
申请日：2007-11-19
申请人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
发明人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
IPC分类号： G01L25/00
CPC分类号： G03F7/70758 , G03F7/70725
摘要： Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.
摘要翻译：公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法，装置和系统。可以对所识别的力 - 纹波和/或侧向力进行映射，并且获得用于校正相应的位置相关的补偿比的映射。这些方法对于使用多个（冗余）致动器在至少一个自由度中提供运动的阶段特别有用。在示例性方法中，使用至少一个所选择的致动器，在主体致动器的运动范围内的设定距离上移动台架构件多次。每个位移具有预定的轨迹和该范围内的相应起始点。对于每个位移，提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。组合多段补偿比作为该范围内的位移的函数，以提供在整个范围内的致动器的补偿比的图。

3. 发明授权

US07417714B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US07417714B2
公开(公告)日：2008-08-26
申请号：US11258249
申请日：2005-10-24
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的台架组件（220）包括第一台（238），保持工件（200）的第二台（240），第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

4. 发明授权

US08582080B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US08582080B2
公开(公告)日：2013-11-12
申请号：US12178240
申请日：2008-07-23
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的平台组件（220）包括：第一阶段（238）;保持工件（200）的第二阶段（240）;第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

5. 发明授权

US06855032B1 Fine force control of actuators for chemical mechanical polishing apparatuses 有权
标题翻译：用于化学机械抛光装置的致动器的微细力控制
公开(公告)号：US06855032B1
公开(公告)日：2005-02-15
申请号：US10722090
申请日：2003-11-24
申请人： Pai-Hsueh Yang , Bausan Yuan
发明人： Pai-Hsueh Yang , Bausan Yuan
IPC分类号： B24B37/04 , B24B49/00
CPC分类号： B24B37/30
摘要： An actuator assembly (432) for positioning a pad (48) includes a first actuator assembly (440), a second actuator subassembly (442) and a control system (524). In one embodiment, the first actuator subassembly (440) includes a first core (502), and a conductor (504) secured to the first core (502), and the second actuator subassembly (442) includes a second core (506) spaced apart a component gap (444) from the first core (502). Further, the control system (524) directs current to the conductor (504) to attract the second core (506) to the first core (502). In one embodiment, the amount of current directed to the conductor (504) is calculated without measuring the component gap (444).
摘要翻译：用于定位垫（48）的致动器组件（432）包括第一致动器组件（440），第二致动器子组件（442）和控制系统（524）。在一个实施例中，第一致动器子组件（440）包括第一芯（502）和固定到第一芯（502）的导体（504），并且第二致动器子组件（442）包括间隔开的第二芯从第一芯（502）分离组件间隙（444）。此外，控制系统（524）将电流引导到导体（504）以将第二芯（506）吸引到第一芯（502）。在一个实施例中，在不测量部件间隙（444）的情况下，计算导向导体（504）的电流量。

6. 发明授权

US09013134B2 Method for determing a commutation offset and for determining a compensation map for a stage 有权
标题翻译：用于确定换向偏移和用于确定载物台的补偿图的方法
公开(公告)号：US09013134B2
公开(公告)日：2015-04-21
申请号：US13110760
申请日：2011-05-18
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： H02P1/26 , G03F7/20 , H02P6/00
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

7. 发明申请

US20120127447A1 METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE 有权
标题翻译：用于确定报告偏移和用于确定阶段的补偿地图的方法
公开(公告)号：US20120127447A1
公开(公告)日：2012-05-24
申请号：US13110760
申请日：2011-05-18
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

8. 发明申请

US20120113405A1 METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE 有权
标题翻译：用于确定报告偏移量和确定阶段补偿地图的方法
公开(公告)号：US20120113405A1
公开(公告)日：2012-05-10
申请号：US13101264
申请日：2011-05-05
申请人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
发明人： Pai-Hsueh Yang , Scott Coakley , Michael B. Binnard , Kazuhiro Hirano , Bausan Yuan , Shiang-Lung Koo
IPC分类号： G03B27/58 , G05B1/06
CPC分类号： G03F7/70758 , G03F7/70516 , G03F7/70775 , H02P6/006
摘要： A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis and along a second axis with the stage (220A) levitated above the stage base (220B). The method also includes the steps of (i) directing current to a coil array (240) of the mover assembly (220C) so that the mover assembly (220C) imparts a disturbance on the stage (220A); and (ii) evaluating one or more forces generated by the mover assembly (220C) as a result of the disturbance on the stage (220A) created by the mover (250A). Further, a method for generating a compensation map (1402) includes sequentially directing a plurality of excitation signals to the control of the mover assembly (220C) and determining the control commands that result from the plurality of excitation signals.
摘要翻译：用于确定相对于台架（220B）移动和定位平台（220A）的移动器组件（220C）的移动器（250A）的换向偏移的方法包括以闭环方式控制所述动子组件（220C）以使台架（220A）沿着第一轴线并且沿着第二轴线保持台架（220A）的位置，台架（220A）悬浮在平台底座（220B）上方。该方法还包括以下步骤：（i）将电流引导到移动器组件（220C）的线圈阵列（240），使得移动器组件（220C）在平台（220A）上施加干扰; 以及（ii）评估由所述移动器组件（220C）产生的由所述移动器（250A）产生的所述平台（220A）上的干扰所产生的一个或多个力。此外，用于产生补偿图（1402）的方法包括将多个激励信号顺序地引导到移动器组件（220C）的控制，并且确定由多个激励信号产生的控制命令。

9. 发明授权

US08140288B2 On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage 有权
标题翻译：用于识别和补偿由多个执行器在多轴平台上产生的力 - 波动和侧力的机上方法
公开(公告)号：US08140288B2
公开(公告)日：2012-03-20
申请号：US11986314
申请日：2007-11-19
申请人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
发明人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
IPC分类号： G01L25/00
CPC分类号： G03F7/70758 , G03F7/70725
摘要： Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.
摘要翻译：公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法，装置和系统。可以对所识别的力 - 纹波和/或侧向力进行映射，并且获得用于校正相应的位置相关的补偿比的映射。这些方法对于使用多个（冗余）致动器在至少一个自由度中提供运动的阶段特别有用。在示例性方法中，使用至少一个所选择的致动器，在主体致动器的运动范围内的设定距离上移动台架构件多次。每个位移具有预定的轨迹和该范围内的相应起始点。对于每个位移，提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。组合多段补偿比作为该范围内的位移的函数，以提供在整个范围内的致动器的补偿比的图。

10. 发明授权

US07989756B2 Active-isolation mounts for optical elements 有权
标题翻译：用于光学元件的主动隔离支架
公开(公告)号：US07989756B2
公开(公告)日：2011-08-02
申请号：US12262115
申请日：2008-10-30
申请人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
发明人： Shiang-Lung Koo , Yi-Ping Hsin , Hideyuki Hashimoto , Bausan Yuan , Pai-Hsueh Yang
IPC分类号： G02B7/00
CPC分类号： G02B27/646 , G03F7/70825 , G03F7/709
摘要： Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.
摘要翻译：特别地，公开了包括光学元件（例如，反射镜）和将光学元件安装到框架（例如，光学镜筒或光学框架）的至少三个主动隔离安装件的光学部件。主动隔离安装件具有将光学元件上的相应位置连接到框架的非接触致动器，并且在至少一个方向上提供相对于框架的相应位置的可移动性。至少一个位移传感器与光学元件上的每个相应位置相关联。位移传感器对至少一个相应方向上各个位置的位移敏感，并将位移引用为绝对参考。执行器和传感器连接到伺服控制回路以提供反馈控制。

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