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1. 发明授权

US07466396B2 Lithography apparatus and method utilizing pendulum interferometer system 失效
标题翻译：利用摆锤干涉仪系统的平版印刷设备和方法
公开(公告)号：US07466396B2
公开(公告)日：2008-12-16
申请号：US11546368
申请日：2006-10-12
申请人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
发明人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
IPC分类号： G03B27/74
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70833
摘要： Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要翻译：标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

2. 发明申请

US20070258068A1 Exposure Apparatus, Exposure Method, and Device Fabricating Method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20070258068A1
公开(公告)日：2007-11-08
申请号：US10589679
申请日：2005-02-17
申请人： Hiroto Horikawa
发明人： Hiroto Horikawa
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/70341
摘要： The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding and moving a substrate (P); an exposure station (STE) that exposes, through a projection optical system (PL) and a liquid (LQ), the substrate (P) held by one substrate stage (PST1); and a measuring station (STA) that measures the substrate (P) held by the other substrate stage (PST2) or the abovementioned substrate stage (PST2); and wherein, the measurement performed at the measuring station (STA) is performed in a state wherein the liquid (LQ) is disposed on the substrate stage (PST2) or the substrate (P).
摘要翻译：本发明提供一种能够令人满意地进行测量处理并能够准确地进行曝光处理的曝光装置，即使将液浸法应用于双级曝光装置也是如此。曝光装置（EX）包括：能够保持和移动衬底（P）的两个衬底台（PST 1，PST 2）; 通过投影光学系统（PL）和液体（LQ）曝光由一个基板台（PST1）保持的基板（P）的曝光台（STE）; 以及测量由另一基板载台（PST2）或上述基板台（PST2）保持的基板（P）的测量台（STA）。并且其中，在液体（LQ）设置在基板载台（PST2）或基板（P）上的状态下，在测量站（STA）进行的测量被执行。

3. 发明申请

US20070139635A1 Lithography apparatus and method utilizing pendulum interferometer system 失效
标题翻译：利用摆锤干涉仪系统的平版印刷设备和方法
公开(公告)号：US20070139635A1
公开(公告)日：2007-06-21
申请号：US11546368
申请日：2006-10-12
申请人： Michael Binnard , Douglas Watson , W. Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
发明人： Michael Binnard , Douglas Watson , W. Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
IPC分类号： G03B27/80
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70833
摘要： Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要翻译：标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

4. 发明申请

US20050133732A1 Stage unit, drive table, and scanning exposure apparatus using same 失效
标题翻译：舞台单元，驱动台和使用其的扫描曝光装置
公开(公告)号：US20050133732A1
公开(公告)日：2005-06-23
申请号：US11033130
申请日：2005-01-12
申请人： Toshiya Ohtomo , Hiroto Horikawa
发明人： Toshiya Ohtomo , Hiroto Horikawa
IPC分类号： G03F7/20 , G01N23/00
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70858 , G03F7/70875
摘要： An exposure method for manufacturing a liquid crystal display utilizes a scanning exposure apparatus to expose a pattern of a mask onto a glass plate. The exposure method includes a step of moving a mask stage that holds the mask in a scanning direction by a first electromagnetic actuator. The first electromagnetic actuator moves the mask stage associating with a guide member that extends in the scanning direction. The method also includes the step of moving the mask stage in a non-scanning direction different from the scanning direction by a second electromagnetic actuator. The second electromagnetic actuator moves the mask stage associating with no guide member, and a moving distance in the non-scanning direction by the second electromagnetic actuator is shorter than a moving distance in the scanning direction by the first electromagnetic actuator.
摘要翻译：用于制造液晶显示器的曝光方法利用扫描曝光装置将掩模的图案曝光到玻璃板上。曝光方法包括通过第一电磁致动器移动在扫描方向上保持掩模的掩模台的步骤。第一电磁致动器移动与沿扫描方向延伸的引导构件相关联的掩模台。该方法还包括通过第二电磁致动器沿不同于扫描方向的非扫描方向移动掩模台的步骤。第二电磁致动器移动与无引导构件相关联的掩模台，并且由第二电磁致动器沿非扫描方向的移动距离比由第一电磁致动器沿扫描方向的移动距离短。

5. 发明授权

US06721034B1 Stage unit, drive table, and scanning exposure apparatus using the same 失效
标题翻译：舞台装置，驱动台和使用其的扫描曝光装置
公开(公告)号：US06721034B1
公开(公告)日：2004-04-13
申请号：US09327621
申请日：1999-06-08
申请人： Hiroto Horikawa
发明人： Hiroto Horikawa
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70858 , G03F7/70875
摘要： It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.
摘要翻译：本发明的目的是减轻舞台单元的重量并抑制舞台的驱动单元的发热，从而提高用于测量舞台位置的干涉仪的舞台表面精度或测量精度。掩模版基座，安装在标线片台上并沿扫描方向移动的扫描台以及安装在扫描台上并能够沿X和Y方向以及沿旋转方向微细移动的微调台设置为标线片阶段设置用于沿扫描方向进行驱动的第一电磁致动器和具有比第一电磁致动器小的推力的第二电磁致动器，用于沿与扫描方向垂直的方向进行驱动，作为罚款的驱动单元调整阶段

6. 发明授权

US5991005A Stage apparatus and exposure apparatus having the same 失效
标题翻译：舞台装置和曝光装置具有相同的功能
公开(公告)号：US5991005A
公开(公告)日：1999-11-23
申请号：US826380
申请日：1997-04-09
申请人： Hiroto Horikawa , Yutaka Hayashi
发明人： Hiroto Horikawa , Yutaka Hayashi
IPC分类号： G03F7/20 , G03B27/42 , B23Q16/00 , H01L21/027
CPC分类号： G03F7/70716
摘要： A stage apparatus comprising a support device for supporting a table at its center of gravity and a drive device for driving the table at positions apart from the center of gravity of the table without contacting with the table. The stage apparatus effectively reduces stresses created in the table and/or any thermal deformation of the table. The table is connected to three pairs of table support bars on the stage through three respective plate springs so as to minimize any harmful deformation of the table, which could otherwise occur when the table is driven for motion or displacement in the Z-direction or for adjustment of the tilt of the table. The stage apparatus includes three drive units with respective drive pins for driving the stage. For example, when the three drive pins are driven simultaneously by the associated drive units, the table is caused thereby to translate along the Z-axis. The drive pins are so arranged as to provide support for the table at support points just under respective securing points on the table at which the table is secured to the plate springs and to provide a drive for the, table in the Z-direction at the support points. Thus, when driven by the drive pins, the table is only subject to compression forces acting thereon in the Z-direction and not to any moment.
摘要翻译：一种舞台装置，包括用于在其重心处支撑桌子的支撑装置和驱动装置，用于在与桌子不接触的位置离开桌子的重心的位置驱动桌子。舞台装置有效地减少桌子中产生的应力和/或桌子的任何热变形。桌子通过三个相应的板簧连接到舞台上的三对桌面支撑杆上，以便最小化桌子的任何有害变形，否则当桌子被驱动以在Z方向上移动或移位时调整桌子的倾斜度。舞台装置包括具有用于驱动舞台的相应驱动销的三个驱动单元。例如，当三个驱动销由相关联的驱动单元同时驱动时，由此使工作台沿着Z轴平移。驱动销被布置成为桌子上的支撑点处提供支撑，该支撑点恰好在桌子上的相应的固定点处，其中工作台固定到板簧上，并且在Z方向上为支持点。因此，当由驱动销驱动时，工作台仅在Z方向上作用于其上的压缩力而不是任何时刻。

7. 发明授权

US5850280A Stage unit, drive table, and scanning exposure and apparatus using same 失效
标题翻译：舞台装置，驱动台和扫描曝光以及使用它的装置
公开(公告)号：US5850280A
公开(公告)日：1998-12-15
申请号：US935445
申请日：1997-09-23
申请人： Toshiya Ohtomo , Hiroto Horikawa
发明人： Toshiya Ohtomo , Hiroto Horikawa
IPC分类号： G03F7/20 , G03B27/42 , G03B27/72 , G03B27/58
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70858 , G03F7/70875
摘要： It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.
摘要翻译：本发明的目的是减轻舞台单元的重量并抑制舞台的驱动单元的发热，从而提高用于测量舞台位置的干涉仪的舞台表面精度或测量精度。掩模版基座，安装在标线片台上并沿扫描方向移动的扫描台以及安装在扫描台上并能够沿X和Y方向以及沿旋转方向微细移动的微调台设置为标线片阶段设置用于沿扫描方向进行驱动的第一电磁致动器和具有比第一电磁致动器小的推力的第二电磁致动器，用于沿与扫描方向垂直的方向进行驱动，作为罚款的驱动单元调整阶段

8. 发明授权

US06211946B1 Stage unit, drive table, and scanning exposure apparatus using the same 有权
标题翻译：舞台装置，驱动台和使用其的扫描曝光装置
公开(公告)号：US06211946B1
公开(公告)日：2001-04-03
申请号：US09317854
申请日：1999-05-25
申请人： Toshiya Ohtomo , Hiroto Horikawa
发明人： Toshiya Ohtomo , Hiroto Horikawa
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70858 , G03F7/70875
摘要： It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.
摘要翻译：本发明的目的是减轻舞台单元的重量并抑制舞台的驱动单元的发热，从而提高用于测量舞台位置的干涉仪的舞台表面精度或测量精度。掩模版基座，安装在标线片台上并沿扫描方向移动的扫描台以及安装在扫描台上并能够沿X和Y方向以及沿旋转方向微细移动的微调台设置为标线片阶段设置用于沿扫描方向进行驱动的第一电磁致动器和具有比第一电磁致动器小的推力的第二电磁致动器，用于沿与扫描方向垂直的方向进行驱动，作为罚款的驱动单元调整阶段

9. 发明授权

US06262797B1 Stage unit, drive table, and scanning exposure apparatus using the same 有权
公开(公告)号：US06262797B1
公开(公告)日：2001-07-17
申请号：US09559358
申请日：2000-04-27
申请人： Hiroto Horikawa
发明人： Hiroto Horikawa
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70858 , G03F7/70875
摘要： It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.

10. 发明申请

US20070030467A1 Exposure apparatus, exposure method, and device fabricating method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20070030467A1
公开(公告)日：2007-02-08
申请号：US11543772
申请日：2006-10-06
申请人： Hiroto Horikawa
发明人： Hiroto Horikawa
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F9/7003 , G03F9/7011 , G03F9/7034 , G03F9/7096
摘要： The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding and moving a substrate (P); an exposure station (STE) that exposes, through a projection optical system (PL) and a liquid (LQ), the substrate (P) held by one substrate stage (PST1); and a measuring station (STA) that measures the substrate (P) held by the other substrate stage (PST2) or the abovementioned substrate stage (PST2); and wherein, the measurement performed at the measuring station (STA) is performed in a state wherein the liquid (LQ) is disposed on the substrate stage (PST2) or the substrate (P).
摘要翻译：本发明提供一种能够令人满意地进行测量处理并能够准确地进行曝光处理的曝光装置，即使将液浸法应用于双级曝光装置也是如此。曝光装置（EX）包括：能够保持和移动衬底（P）的两个衬底台（PST 1，PST 2）; 通过投影光学系统（PL）和液体（LQ）曝光由一个基板台（PST1）保持的基板（P）的曝光台（STE）; 以及测量由另一基板载台（PST2）或上述基板台（PST2）保持的基板（P）的测量台（STA）。并且其中，在液体（LQ）设置在基板载台（PST2）或基板（P）上的状态下，在测量站（STA）进行的测量被执行。

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