专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08502178B2 Extreme ultraviolet light source apparatus, method for controlling extreme ultraviolet light source apparatus, and recording medium with program recorded thereon 有权
标题翻译：极紫外光源装置，用于控制极紫外光源装置的方法，以及记录有程序的记录介质
公开(公告)号：US08502178B2
公开(公告)日：2013-08-06
申请号：US13349355
申请日：2012-01-12
申请人： Masato Moriya , Hideyuki Hayashi , Tooru Abe
发明人： Masato Moriya , Hideyuki Hayashi , Tooru Abe
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus, in which a target material is irradiated with a laser beam from a laser apparatus and the target material is turned into plasma, thereby emitting extreme ultraviolet light, may include a burst control unit configured to control irradiation of the target material is irradiated with the laser beam outputted successively in pulses from the laser apparatus when the extreme ultraviolet light is emitted successively in pulses. The target material is prevented from being turned into plasma by the laser beam while the laser beam is outputted successively in pulses from the laser apparatus when the successive pulsed emission is paused.
摘要翻译：将来自激光装置的激光束照射的目标材料和目标材料的极紫外光源装置变成等离子体，从而发出极紫外光，可以包括：配置为控制靶的照射的突发控制单元当以脉冲方式连续发射极紫外光时，以激光装置的脉冲连续输出的激光束照射材料。当连续的脉冲发射暂停时，通过激光束防止目标材料变成等离子体，同时激光束以激光装置的脉冲连续输出。

2. 发明授权

US08847181B2 System and method for generating extreme ultraviolet light 有权
标题翻译：用于产生极紫外光的系统和方法
公开(公告)号：US08847181B2
公开(公告)日：2014-09-30
申请号：US13402277
申请日：2012-02-22
申请人： Masato Moriya , Hideyuki Hayashi , Osamu Wakabayashi
发明人： Masato Moriya , Hideyuki Hayashi , Osamu Wakabayashi
IPC分类号： H05G2/00 , G21K5/00
CPC分类号： H05G2/008 , H05G2/003 , H05G2/006
摘要： Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.
摘要翻译：提供了一种系统和方法，其中与激光装置一起使用的极紫外（EUV）光产生装置被配置为检测已经照射靶的激光束的图像。 EUV光发生装置还可以被配置为基于检测结果来控制激光束被聚焦的位置和目标的位置。

3. 发明授权

US09325150B2 Alignment system and extreme ultraviolet light generation system 有权
标题翻译：对准系统和极紫外光发生系统
公开(公告)号：US09325150B2
公开(公告)日：2016-04-26
申请号：US14238405
申请日：2012-09-05
申请人： Masato Moriya , Osamu Wakabayashi
发明人： Masato Moriya , Osamu Wakabayashi
IPC分类号： H05G2/00 , H01S3/101 , H01S3/23 , H01S3/00
CPC分类号： H01S3/101 , H01S3/005 , H01S3/0078 , H01S3/2391 , H05G2/008
摘要： An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
摘要翻译：用于激光装置的对准系统包括：输出导向激光束的导向激光装置，调整引导激光束的行进方向的调节机构和来自激光装置的激光束;光束组合器，控制激光束的行进方向; 所述引导激光束彼此基本一致，从所述光束组合器提供的检测所述激光和引导激光束的第一光学检测单元，基于第一光学检测单元检测结果控制所述调节机构的第一控制器，控制光束路径组合器的下游，控制激光束和引导激光束的行进方向，第二光学检测单元，在检测引导激光束的光束转向单元的下游;以及第二控制器，其基于第二光学检测器控制光束转向单元单位检测结果。

4. 发明授权

US08559099B2 Laser beam amplifier and laser apparatus using the same 有权
公开(公告)号：US08559099B2
公开(公告)日：2013-10-15
申请号：US12685246
申请日：2010-01-11
申请人： Krzysztof Nowak , Masato Moriya , Osamu Wakabayashi
发明人： Krzysztof Nowak , Masato Moriya , Osamu Wakabayashi
IPC分类号： H01S3/082 , H01S3/22
CPC分类号： H01S3/06758 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0064 , H01S3/032 , H01S3/036 , H01S3/0387 , H01S3/041 , H01S3/0971 , H01S3/2232 , H01S3/2308 , H01S3/2325 , H01S3/2341
摘要： A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.

5. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

6. 发明授权

US08173984B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08173984B2
公开(公告)日：2012-05-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

7. 发明授权

US08129700B2 Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source 有权
标题翻译：光学元件污染防治方法和极紫外光源的光学元件污染防治装置
公开(公告)号：US08129700B2
公开(公告)日：2012-03-06
申请号：US12150077
申请日：2008-04-24
申请人： Yoshifumi Ueno , Masato Moriya , Masaki Nakano , Hiroshi Komori
发明人： Yoshifumi Ueno , Masato Moriya , Masaki Nakano , Hiroshi Komori
IPC分类号： H05G2/00
CPC分类号： B08B17/02 , H05G2/003 , H05G2/008
摘要： Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.
摘要翻译：使用固体锡（Sn）作为目标，使用CO 2激光作为靶的激发源，并且在通过激光束激发固体锡后，从等离子体发射的碎片的尺寸减小到纳米或更小的尺寸之后从CO 2激光器输出的纳米尺寸或更小尺寸的发射碎片被作用到不会到达光学元件。根据本发明，在EUV光源装置中，防止了通过用激光束激发室内的目标物而产生的来自等离子体的EUV光一起发射的碎片附着在设置在室内的光学元件，并形成金属膜。结果，可以延长光学元件的使用寿命。

8. 发明授权

US08093571B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

9. 发明授权

US07984744B2 Foldable screen device 有权
标题翻译：可折叠屏幕设备
公开(公告)号：US07984744B2
公开(公告)日：2011-07-26
申请号：US12094274
申请日：2006-11-08
申请人： Shuuji Karasawa , Yoji Kamosawa , Masato Moriya
发明人： Shuuji Karasawa , Yoji Kamosawa , Masato Moriya
IPC分类号： E06B3/94
CPC分类号： E06B9/262 , E06B9/522 , E06B2009/2625
摘要： In a folding screen device pulled in the lateral direction, the widthwise dimension limit of the screen device in the opening and closing direction of the screen is eliminated. A plurality of screen units include movable vertical frame members attached to both ends of a screen expandable in an accordion manner. The vertical frame members are slidable along a lateral frame member of a building opening. Screen guides in the screen units move out and into the interior of the vertical frame member through upper and lower ends thereof in a bent state, and are led along upper and lower ends of the screen in an extended state. A parallel movement mechanism causes the vertical frame members to move in parallel during opening and closing of the screen. The screen units can be arranged in parallel in the building opening by connecting adjacent vertical frame members of the screen units.
摘要翻译：在横向拉伸的折叠屏幕装置中，屏幕装置在屏幕的打开和关闭方向上的宽度尺寸限制被消除。多个屏幕单元包括附接到以手风琴方式可展开的屏幕的两端的可移动的垂直框架构件。垂直框架构件可沿建筑物开口的侧框架构件滑动。屏幕单元中的屏幕导向件通过弯曲状态的上端和下端移出垂直框架构件的内部，并且在延伸状态下沿着屏幕的上端和下端引导。平行移动机构使得垂直框架构件在打开和关闭屏幕期间平行移动。屏幕单元可以通过连接屏幕单元的相邻垂直框架构件而平行地布置在建筑物开口中。

10. 发明授权

US07931070B2 Sliding screen door 有权
标题翻译：滑动筛门
公开(公告)号：US07931070B2
公开(公告)日：2011-04-26
申请号：US10576261
申请日：2004-10-20
申请人： Mitsuhiko Chino , Hirotsugu Toda , Masato Moriya , Yoji Kamosawa
发明人： Mitsuhiko Chino , Hirotsugu Toda , Masato Moriya , Yoji Kamosawa
IPC分类号： E05D15/06 , A47H5/00 , E06B3/48 , E06B3/94 , E06B9/06
CPC分类号： E06B9/52 , E06B2009/543
摘要： In a sliding screen door in which a net is formed to be capable of expansion and contraction, and is formed to be capable of freely opening and closing by horizontal pulling, a net guide forms the net guide into a straight line shape in a condition of being led out from a frame member, and a movement of a net-holding member that follow the net guide is made smooth, and many of the guiding elements form the net guide for guiding the lower end of the net and include an approximately u-shape composed of a bottom portion and rising wall portions, and are formed into a series of guide rails that are serially in contact with each other by means of rising wall portions of the adjoining guiding elements, and a net-holding member which is engaged with the guide rails so as to be movable along the guide rail.
摘要翻译：在其中网形成为能够膨胀和收缩的滑动筛门中，并且通过水平拉动形成为能够自由地打开和关闭，网状引导件在网状引导件形成为直线形状的条件下从框架构件引出，并且沿着网状导向件的网状保持构件的移动变得平滑，并且许多引导元件形成用于引导网的下端的网状引导件，并且包括大致u- 形状由底部和上升壁部构成，并且通过相邻引导元件的上升部分相互串联地形成为一系列的导轨，以及与所述导轨能够沿着所述导轨移动。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式