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1. 发明授权

US08476609B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置和用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08476609B2
公开(公告)日：2013-07-02
申请号：US13306358
申请日：2011-11-29
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

2. 发明授权

US08093571B2 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

3. 发明申请

US20100078580A1 Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device 有权
标题翻译：极紫外光源装置，用于极紫外光源装置的激光光源装置及用于极紫外光源装置的可饱和吸收器的控制方法
公开(公告)号：US20100078580A1
公开(公告)日：2010-04-01
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02 , G21K1/00
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

4. 发明授权

US08804778B2 Laser apparatus and extreme ultraviolet light source apparatus 有权
标题翻译：激光设备和极紫外光源设备
公开(公告)号：US08804778B2
公开(公告)日：2014-08-12
申请号：US12580523
申请日：2009-10-16
申请人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
发明人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , B82Y20/00 , G03F7/70033 , H01S3/0007 , H01S3/107 , H01S3/2232 , H01S3/235 , H01S5/02284 , H01S5/0654 , H01S5/06837 , H01S5/0687 , H01S5/141 , H01S5/3402 , H01S5/4012 , H01S5/4062 , H01S5/4087
摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
摘要翻译：一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包含波长的纵模式激光，以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

5. 发明申请

US20100193710A1 LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：激光装置和极光超光源光源装置
公开(公告)号：US20100193710A1
公开(公告)日：2010-08-05
申请号：US12580523
申请日：2009-10-16
申请人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
发明人： Osamu Wakabayashi , Akira Endo , Krzysztof Nowak , Takashi Suganuma , Masato Moriya
IPC分类号： H05G2/00 , H01S3/10 , H01S3/22 , H01S3/0941
CPC分类号： H01S3/2316 , B82Y20/00 , G03F7/70033 , H01S3/0007 , H01S3/107 , H01S3/2232 , H01S3/235 , H01S5/02284 , H01S5/0654 , H01S5/06837 , H01S5/0687 , H01S5/141 , H01S5/3402 , H01S5/4012 , H01S5/4062 , H01S5/4087
摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
摘要翻译：一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包含波长的纵模式激光，以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

6. 发明授权

US07903715B2 Slab type laser apparatus 有权
标题翻译：板式激光装置
公开(公告)号：US07903715B2
公开(公告)日：2011-03-08
申请号：US12482824
申请日：2009-06-11
申请人： Krzysztof Nowak , Takashi Suganuma , Osamu Wakabayashi , Akira Endo
发明人： Krzysztof Nowak , Takashi Suganuma , Osamu Wakabayashi , Akira Endo
IPC分类号： H01S3/22
CPC分类号： H01S3/076 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0971 , H01S3/115 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/235 , H01S3/2375 , H01S5/141 , H01S5/4087
摘要： A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.
摘要翻译：平板型激光装置具有板状气体激光介质部，该平板型气体激光介质部形成在由一对电极平板限定的区域中，该对电极平板彼此平行配置，以填充由高频激发的气体激光介质电力。该装置包括：振荡器部分，包括一对谐振器反射镜，该谐振器反射镜与气体激光介质部分的一部分相对设置，并且用于放大激光束以具有预定的光强度以发射激光束，并且放大器部件包括多个的反射镜与气体激光介质部分的一部分相对设置。入射激光束在返回镜之间返回多次，激光束被放大成具有预定的功率。

7. 发明申请

US20090316746A1 SLAB TYPE LASER APPARATUS 有权
标题翻译： SLAB型激光装置
公开(公告)号：US20090316746A1
公开(公告)日：2009-12-24
申请号：US12482824
申请日：2009-06-11
申请人： Krzysztof NOWAK , Takashi Suganuma , Osamu Wakabayashi , Akira Endo
发明人： Krzysztof NOWAK , Takashi Suganuma , Osamu Wakabayashi , Akira Endo
IPC分类号： H01S3/22 , H01S3/08
CPC分类号： H01S3/076 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0971 , H01S3/115 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/235 , H01S3/2375 , H01S5/141 , H01S5/4087
摘要： A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.
摘要翻译：平板型激光装置具有板状气体激光介质部，该平板型气体激光介质部形成在由一对电极平板限定的区域中，该对电极平板彼此平行配置，以填充由高频激发的气体激光介质电力。该装置包括：振荡器部分，包括一对谐振器反射镜，该谐振器反射镜与气体激光介质部分的一部分相对设置，并且用于放大激光束以具有预定的光强度以发射激光束，并且放大器部件包括多个的反射镜与气体激光介质部分的一部分相对设置。入射激光束在返回镜之间返回多次，激光束被放大成具有预定的功率。

8. 发明申请

US20080069157A1 Driver laser for extreme ultra violet light source device 审中-公开
标题翻译：驱动激光器用于极紫外光源装置
公开(公告)号：US20080069157A1
公开(公告)日：2008-03-20
申请号：US11892792
申请日：2007-08-27
申请人： Tatsuya Ariga , Hideo Hoshino , Taisuke Miura , Akira Endo
发明人： Tatsuya Ariga , Hideo Hoshino , Taisuke Miura , Akira Endo
IPC分类号： H01S3/108
CPC分类号： H01S3/2308 , H01S3/005 , H01S3/2232 , H01S3/2366 , H01S2301/02
摘要： A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.
摘要翻译：一种能够抑制自振荡的极紫外光源装置的驱动器激光器，有效地放大激光束并减小器件尺寸。驱动激光器具有用于产生激光束以输出所产生的激光束的振荡器，以及用于放大从振荡器输出的激光束以输出放大的激光束的至少一个放大器。放大器包括：放电单元，其通过使用通过放电激发的激光介质的能量放大激光束;反射镜，其将从放电单元输出的激光束导引到放电单元;偏振器，其将激光束从振荡器进入放电单元并且还将从放电单元输出的激光束反射到预定方向，以及自激振荡滤光器，其衰减从放电单元输出的自振荡光。

9. 发明授权

US08481984B2 Extreme ultra violet light source apparatus 有权
公开(公告)号：US08481984B2
公开(公告)日：2013-07-09
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

10. 发明授权

US08536551B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08536551B2
公开(公告)日：2013-09-17
申请号：US12482796
申请日：2009-06-11
申请人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

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