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1. 发明授权

US07008609B2 Method for producing hydrogen gas utilizing mechano-corrosive reaction 失效
标题翻译：利用机械腐蚀反应生产氢气的方法
公开(公告)号：US07008609B2
公开(公告)日：2006-03-07
申请号：US10658106
申请日：2003-09-09
申请人： Masao Watanabe , Yoko Watanabe
发明人： Masao Watanabe , Yoko Watanabe
IPC分类号： C01B3/08 , C01F7/42
CPC分类号： B01J7/02 , B01J19/18 , B01J2219/182 , C01B3/08 , Y02E60/36
摘要： There is provided a method of producing hydrogen gas serving as fuel for a portable fuel cell, whereby hydrogen gas can be provided easily, safely, and at a low cost. To that end, the method of producing hydrogen gas comprises the steps of causing friction and mechanical fracture accompanying the friction to occur to a metallic material under water and increasing thereby chemical reactivity of atoms of the metallic material, in close proximity of the surface thereof; wherein water molecules are decomposed by accelerating corrosion reaction of water with the metallic material. Further, for the metallic material, an aluminum or aluminum alloy material is used as industrial waste including refuse and cutting chips (curls) of an industrial aluminum material. Meanwhile, pure water not substantially containing ionic impurities and organic molecules is used for the water.
摘要翻译：提供了一种生产用作便携式燃料电池的燃料的氢气的方法，由此可以容易地，安全地和低成本地提供氢气。为此，制造氢气的方法包括以下步骤：伴随摩擦的摩擦和机械断裂发生在水下的金属材料上，从而增加金属材料的原子在其表面附近的化学反应性; 其中水分子通过加速水与金属材料的腐蚀反应而分解。此外，对于金属材料，使用铝或铝合金材料作为工业废物，包括工业铝材料的垃圾和切割屑（卷曲）。同时，水中不含有离子杂质和有机分子的纯水。

2. 发明授权

US07655377B2 Antireflection film and exposure method 失效
标题翻译：防反射膜和曝光方法
公开(公告)号：US07655377B2
公开(公告)日：2010-02-02
申请号：US11361750
申请日：2006-02-23
申请人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa , Yuko Yamaguchi
发明人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa , Yuko Yamaguchi
IPC分类号： G03F7/20 , G03F7/11 , G03C1/825
CPC分类号： G03F7/091 , G03F7/70341
摘要： An antireflection film wherein, even where exposure light enters obliquely in a liquid immersion lithography technique, a sufficiently reduced reflectance can be achieved at the interface between a resist layer and a silicon substrate. A two-layer antireflection film is used in exposure by an exposure system having a wavelength of 190 to 195 nm and a numerical aperture of 1.0 or less and formed between the resist layer and the silicon substrate. Where complex refractive indices N1 and N2 and film thicknesses of upper and lower layers of the antireflection film are represented by n1-k1i, n2-k2i and d1, d2, respectively, and a predetermined combination of values of [n10, k10, d10, n20, k20, d20] is selected, n1, k1, d1, n2, k2 and d2 satisfy {(n1-n10)/(n1m-n10)}2+{(k1-k10)/(k1m-k10)}2+{(d1-d10)/(d1m-d10)}2+{(n2-n20)/(n2m-n20)}2+{(k2-k20)/(k2m-k20)}2+{(d2-d20)/(d2m-d20)}2≦1.
摘要翻译：一种防反射膜，其中即使在曝光光在液浸光刻技术中倾斜入射时，也可以在抗蚀剂层和硅衬底之间的界面处实现充分降低的反射率。通过具有190〜195nm的波长和1.0以下的数值孔径的曝光系统，在抗蚀剂层和硅基板之间形成双层抗反射膜。复数折射率N1和N2以及防反射膜的上层和下层的膜厚分别由n1-k1i，n2-k2i和d1，d2表示，并且[n10，k10，d10，...， n2，k20，d20]，n1，k1，d1，n2，k2，d2满足{（n1-n10）/（n1m-n10）} 2 + {（k1-k10）/（k1m-k10）} 2 + {（d1-d10）/（d1m-d10）} 2 + {（n2-n20）/（n2m-n20）} 2 + {（k2-k20）/（k2m-k20） d20）/（d2m-d20）} 2 <= 1。

3. 发明授权

US5852709A Output method and apparatus 失效
标题翻译：输出方法和装置
公开(公告)号：US5852709A
公开(公告)日：1998-12-22
申请号：US895551
申请日：1997-07-16
申请人： Yoko Watanabe
发明人： Yoko Watanabe
IPC分类号： B41J2/05 , B41J29/38 , G06K15/00 , G06F15/00
CPC分类号： G06K15/00 , G06K2215/0011
摘要： An output method and apparatus are provided for judging whether received data includes image data, a mixture of image data and text data, or text data alone. The output apparatus is controlled to output data in a resolution of the image data if the received data is judged to include image data or a mixture of image and text data. Also disclosed is setting a resolution of the output apparatus to a high value if the received data is judged to include text data. A storage medium for storing a program for performing these operations is also described.
摘要翻译：提供一种输出方法和装置，用于判断所接收的数据是否包括图像数据，图像数据和文本数据的混合，或单独的文本数据。如果接收到的数据被判断为包括图像数据或图像和文本数据的混合，则控制输出装置以图像数据的分辨率输出数据。还公开了如果接收到的数据被判断为包括文本数据，则将输出装置的分辨率设置为高值。还描述了用于存储用于执行这些操作的程序的存储介质。

4. 发明授权

US5343050A Organic electroluminescent device with low barrier height 失效
标题翻译：低阻挡高度的有机电致发光器件
公开(公告)号：US5343050A
公开(公告)日：1994-08-30
申请号：US884
申请日：1993-01-05
申请人： Syun Egusa , Yoko Watanabe
发明人： Syun Egusa , Yoko Watanabe
IPC分类号： H01L51/00 , H01L51/30 , H01L51/50 , H05B33/14 , H05B33/26 , H01L29/28 , H01L33/00
CPC分类号： H05B33/26 , H01L51/005 , H01L51/0053 , H01L51/0059 , H01L51/0062 , H01L51/007 , H01L51/0071 , H01L51/50 , H05B33/14
摘要： There is disclosed an organic electroluminescent device, comprising a multilayered structure of an organic film for electron injection, and an organic film for hole injection, at least one of which consists of a plurality of layers, and an organic film serving as a light-emitting layer interposed therebetween, a first electrode for electron injection formed on the side of the organic film for electron injection of the multilayered structure, and a second electrode for hole injection formed on the side of the organic film for hole injection of the multilayered structure, wherein a barrier height against electron injection at each interface between layers present from the first electrode to the organic film serving as the light-emitting layer is not more than 0.6 eV, and a barrier height against hole injection at each interface between layers present from the second electrode to the organic film serving as the light-emitting layer is not more than 0.6 eV.
摘要翻译：公开了一种有机电致发光器件，其包括用于电子注入的有机膜的多层结构和用于空穴注入的有机膜，其中至少一个由多层构成，有机膜用作发光插入其间的第一电极，形成在用于电子注入多层结构的有机膜侧的电子注入用第一电极和形成在多层结构的空穴注入用有机膜侧的空穴注入用第二电极，其中，在从第一电极到用作发光层的有机膜之间存在的层之间的每个界面处的电子注入的势垒高度不大于0.6eV，并且在从第二电极存在的层之间的每个界面处的空穴注入的势垒高度作为发光层的有机膜的电极为0.6eV以下。

5. 发明申请

US20070097514A1 ANTIREFLECTIVE FILM AND EXPOSURE METHOD 失效
公开(公告)号：US20070097514A1
公开(公告)日：2007-05-03
申请号：US11467983
申请日：2006-08-29
申请人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
发明人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
IPC分类号： G02B21/02
CPC分类号： H01L21/0276 , G03F7/091 , G03F7/2041 , Y10S438/952
摘要： An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a wavelength of 190 nm to 195 nm and a numerical aperture NA of 0.93 to 1.2. Assuming that the complex refractive indexes of upper and lower layers constituting the antireflective film are N1 (=n1−k1i) and N2 (=n2−k2i), respectively, and the thicknesses of both layers are d1 and d2, when a predetermined combination of values of [n10, k10, d10, n20, k20, d20] is selected, n1, k1, d1, n2, k2, and d2 satisfy the relational expression {(n1−n10)/(n1m−n10)}2+{(k1−k10)/(k1m−k10)}2+{(d1− d10)/(d1m−d10)}2+{(n2−n20)/(n2m−n20)}2+{(k2−k20)/(k2m− k20)}2+{(d2−d20)/(d2m−d20)}2≦1.

6. 发明授权

US06738149B2 Method and apparatus for selecting a preferential font 失效
标题翻译：用于选择优先字体的方法和装置
公开(公告)号：US06738149B2
公开(公告)日：2004-05-18
申请号：US08007093
申请日：1993-01-21
申请人： Yoko Watanabe
发明人： Yoko Watanabe
IPC分类号： G06F1500
CPC分类号： G06K15/02 , G06K2215/0008 , G06K2215/002 , G06K2215/0022
摘要： An outputting apparatus such as a laser beam printer comprises a memory to store designation information to designate a selection-impossible font from a plurality of fonts and a selector to select a font which is most adaptive from the fonts other than the selection instructed font in accordance with an input of selection instruction information to instruct so as to select the selection-impossible font that is designated by the designation information stored in the memory. The plurality of fonts include internal fonts provided in the apparatus and fonts which are supplied from the outside.
摘要翻译：诸如激光束打印机的输出装置包括存储器，用于存储指定信息以从多个字体指定不可选择字体，以及选择器，从根据选择指示字体的字体中选择最适合的字体输入选择指示信息以指示以选择由存储在存储器中的指定信息指定的不可选择字体。多个字体包括设备中提供的内部字体和从外部提供的字体。

7. 发明授权

US5344770A Bacillus SP. ferm BP-3376 and a method for its use to produce an alkaline proteinase K-16 失效
标题翻译：芽孢杆菌SP。 ferm BP-3376及其用于产生碱性蛋白酶K-16的方法
公开(公告)号：US5344770A
公开(公告)日：1994-09-06
申请号：US141019
申请日：1993-10-26
申请人： Jun Hitomi , Shigehito Adachi , Yoshihiro Hakamada , Mikio Takaiwa , Tadashi Yoshimatsu , Yoko Watanabe , Tohru Kobayashi , Shuji Kawai , Susumu Ito
发明人： Jun Hitomi , Shigehito Adachi , Yoshihiro Hakamada , Mikio Takaiwa , Tadashi Yoshimatsu , Yoko Watanabe , Tohru Kobayashi , Shuji Kawai , Susumu Ito
IPC分类号： C11D3/386 , C12N9/54 , C12N1/00 , C12N1/20 , C12N9/50
CPC分类号： C12R1/07 , C11D3/386 , C12N9/54 , Y10S435/832
摘要： The present invention relates to a novel enzyme called alkaline proteinase K-16 that is characterized as having an optimum pH in an alkaline range, and stability in the presence of various surface active agents, such as sodium linear alkylbenzene sulfonate, sodium polyoxyethylene alkyl sulfate, sodium dodecyl sulfate, sodium .alpha.-olefin sulfonate, sodium alkyl sulfonate, and .alpha.-sulfo-fatty acid ester. The present invention further provides for the microorganism Bacillus sp. Ferm BP-3376, which is capable of producing the novel alkaline proteinase, and a process for producing the novel alkaline proteinase. Alkaline-proteinase K-16 of the present invention exhibits an excellent action against insoluble proteins and maintains sufficient activity over a wide temperature range and in the presence of surface active agents thus providing a use as an enzyme for detergents.
摘要翻译：本发明涉及一种称为碱性蛋白酶K-16的新型酶，其特征在于在碱性范围内具有最佳pH，并且在各种表面活性剂如线性烷基苯磺酸钠，聚氧乙烯烷基硫酸钠，十二烷基硫酸钠，α-烯烃磺酸钠，烷基磺酸钠和α-磺基脂肪酸酯。本发明还提供了微生物芽孢杆菌属能够生产新型碱性蛋白酶的Ferm BP-3376以及生产新型碱性蛋白酶的方法。本发明的碱性蛋白酶K-16表现出对不溶性蛋白质的优异作用，并且在宽温度范围内和在表面活性剂存在下保持足够的活性，从而提供用作洗涤剂的酶的用途。

8. 发明申请

US20050008948A1 Complementary division mask, method of producing mask, and program 失效
标题翻译：互补分割面具，生产面膜的方法和程序
公开(公告)号：US20050008948A1
公开(公告)日：2005-01-13
申请号：US10885822
申请日：2004-07-07
申请人： Yoko Watanabe , Shinji Omori
发明人： Yoko Watanabe , Shinji Omori
IPC分类号： B08B3/04 , G03F1/20 , G03F1/68 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F1/20 , G03F1/82
摘要： A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.
摘要翻译：一种能够通过湿式洗涤来抑制图案变形的互补分割方法，具有以下步骤：确定在湿洗时的图案变形的确定分割长度，以及假设在弹性极限上的图案变形的图案的宽度和距离通过预先通过湿式洗涤最容易，将长度方向上确定的划分长度的整个线间距图案划分成一个简单的算法，适当地划分线间距图案，并进一步提供一种方法，面具和程序。

9. 发明授权

US06805494B2 Optical module and optical device 失效
标题翻译：光模块和光器件
公开(公告)号：US06805494B2
公开(公告)日：2004-10-19
申请号：US10295034
申请日：2002-11-15
申请人： Atsushi Miki , Hiroyuki Yabe , Kazuhiro Tanida , Yoko Watanabe , Jiro Shinkai , Toshio Takagi , Goro Sasaki
发明人： Atsushi Miki , Hiroyuki Yabe , Kazuhiro Tanida , Yoko Watanabe , Jiro Shinkai , Toshio Takagi , Goro Sasaki
IPC分类号： G02B636
CPC分类号： H01S5/02438 , H01S5/02216 , H01S5/02248 , H01S5/02284 , H01S5/02415 , H01S5/0687
摘要： A main portion 10 of an optical module 1 includes a thermoelectric cooler 21, and a chip carrier 22b placed on the cooler 21. A semiconductor light-emitting device 31, a lens 32, photodetectors 33a, 33b, and an etalon 34 are directly or indirectly mounted on the chip carrier 22b. Supporting members 36a and 36b are also fixed on the chip carrier 22b. A roof 35 is supported by the supporting members 36a, 36b and positioned above the etalon 34. The roof 35, supporting members 36a, 36b and chip carrier 22b are maintained at substantially equal temperatures by the cooler 21. As a result, the temperature of the etalon 34 is stabilized, and therefore the variation in the lock wavelength is suppressed.
摘要翻译：光学模块1的主要部分10包括热电冷却器21和放置在冷却器21上的芯片载体22b。半导体发光器件31，透镜32，光电检测器33a，33b和标准具34是直接或间接地安装在芯片载体22b上。支撑构件36a和36b也固定在芯片载体22b上。屋顶35由支撑构件36a，36b支撑并且定位在标准具34之上。顶部35，支撑构件36a，36b和芯片载体22b通过冷却器21保持在基本相同的温度。结果，标准具34稳定，因此抑制了锁定波长的变化。

10. 发明授权

US5990118A Purine compounds and xanthine oxidase inhibitors 失效
标题翻译：嘌呤化合物和黄嘌呤氧化酶抑制剂
公开(公告)号：US5990118A
公开(公告)日：1999-11-23
申请号：US894474
申请日：1997-08-20
申请人： Tomohisa Nagamatsu , Yoko Watanabe , Kazuki Endo , Masahiro Imaizumi
发明人： Tomohisa Nagamatsu , Yoko Watanabe , Kazuki Endo , Masahiro Imaizumi
IPC分类号： C07D473/18 , C07D473/32 , C07D473/34 , C07D487/14 , A61K31/52
CPC分类号： C07D487/14 , C07D473/18 , C07D473/32 , C07D473/34
摘要： Purine or triazolopurine compounds are disclosed represented by formula (I) or (II): ##STR1## wherein R.sup.1 and R.sup.4 represent each hydrogen, halogeno, hydroxy, mercapto, or amino; R.sup.2 represents alkyl or aryl; and R.sup.3 and R.sup.5 represent each hydrogen, alkyl, or aryl; and pharmaceutical compositions comprising these compounds as xanthine oxidase inhibitors, remedies for hyperuricemia, or remedies or preventive agents for gout.
摘要翻译： PCT No.PCT / JP96 / 00391 Sec。 371日期1997年8月20日 102（e）日期1997年8月20日PCT 1996年2月21日PCT PCT。 WO96 / 26208 PCT出版物日期：1996年8月29日公开了由式（I）或（II）表示的嘌呤或三唑并嘌呤化合物：其中R1和R4代表各自的氢，卤代，羟基，巯基或氨基; R2代表烷基或芳基; 并且R 3和R 5表示各自的氢，烷基或芳基; 以及包含这些化合物作为黄嘌呤氧化酶抑制剂的药物组合物，高尿酸血症的补救措施，或痛风的补救措施或预防剂。

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