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1. 发明专利

JP2004123517A Method of producing gaseous hydrogen using mechano-corrosive reaction 有权
公开(公告)号：JP2004123517A
公开(公告)日：2004-04-22
申请号：JP2003304105
申请日：2003-08-28
申请人： Masao Watanabe , Yoko Watanabe , 渡辺正夫 , 渡辺洋子
发明人： WATANABE MASAO , WATANABE YOKO
IPC分类号： B01J7/02 , B01J19/18 , C01B3/08
CPC分类号： B01J7/02 , B01J19/18 , B01J2219/182 , C01B3/08 , Y02E60/36
摘要： PROBLEM TO BE SOLVED: To provide a method of producing gaseous hydrogen by which gaseous hydrogen to be fuel for portable fuel cell is easily, safely and inexpensively produced.
SOLUTION: Gaseous hydrogen is produced by causing friction and dynamic destruction in water resulting from the friction on a metallic material to increase the chemical reactivity of atom in the vicinity of the surface of the metallic material to accelerate the corrosion reaction of water on the metallic material to decompose water molecule. As the metallic material, a scrap of industrial aluminum, industrial waste aluminum such as cutting chips (curl) or an aluminum alloy is used. As the water, purified water containing substantially no ionic impurity and no organic molecule is used.
COPYRIGHT: (C)2004,JPO

2. 发明授权

US08153454B2 Fabrication apparatus and fabrication method of semiconductor device produced by heating substrate 失效
标题翻译：通过加热衬底制造的半导体器件的制造装置和制造方法
公开(公告)号：US08153454B2
公开(公告)日：2012-04-10
申请号：US12209397
申请日：2008-09-12
申请人： Masaki Ueno , Toshio Ueda , Yoko Watanabe
发明人： Masaki Ueno , Toshio Ueda , Yoko Watanabe
IPC分类号： H01L21/00
CPC分类号： H01L21/67103 , H01L21/6875 , H01L21/68764
摘要： A fabrication apparatus and fabrication method of a semiconductor device are provided, allowing the temperature distribution of a substrate to be rendered uniform. The fabrication apparatus for a semiconductor device includes a susceptor holding the substrate, a heater arranged at a back side of the susceptor, a support member located between the substrate and susceptor, including a support portion, and a spacer located between the susceptor and support member. The spacer has an opening formed corresponding to the site where said support portion is located, at an opposite face side of the support member.
摘要翻译：提供一种半导体器件的制造装置和制造方法，使基板的温度分布变得均匀。半导体装置的制造装置包括保持基板的基座，设置在基座的背面的加热器，位于基板和基座之间的支撑构件，其包括支撑部，以及位于基座和支撑构件之间的间隔件。间隔件具有对应于所述支撑部分所在位置的开口，位于支撑构件的相对的面侧。

3. 发明授权

US07582411B2 Antireflective film and exposure method 失效
标题翻译：防反射膜和曝光方法
公开(公告)号：US07582411B2
公开(公告)日：2009-09-01
申请号：US11467983
申请日：2006-08-29
申请人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
发明人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
IPC分类号： H01L21/027 , G03F7/20 , G03F7/11
CPC分类号： H01L21/0276 , G03F7/091 , G03F7/2041 , Y10S438/952
摘要： An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a wavelength of 190 nm to 195 nm and a numerical aperture NA of 0.93 to 1.2. Assuming that the complex refractive indexes of upper and lower layers constituting the antireflective film are N1 (=n1−k1i) and N2 (=n2−k2i), respectively, and the thicknesses of both layers are d1 and d2, when a predetermined combination of values of [n10, k10, d10, n20, k20, d20] is selected, n1, k1, d1, n2, k2, and d2 satisfy the relational expression {(n1−n10)/(n1m−n10)}2+{(k1−k10)/(k1m−k10)}2+{(d1−d10)/(d1m−d10)}2+{(n2−n20)/(n2m−n20)}2+{(k2−k20)/(k2m−k20)}2+{(d2−d20)/(d2m−d20)}2≦1.
摘要翻译：在抗蚀剂层和形成在硅衬底的表面上的氧化硅层之间设置防反射膜，用于在波长为190nm至195nm的曝光系统中曝光抗蚀剂层，并将数值孔径NA为0.93至 1.2。假设构成防反射膜的上层和下层的复折射率分别为N1（= n1-k1i）和N2（= n2-k2i），并且两层的厚度分别为d1和d2，选择[n10，k10，d10，n20，k20，d20]的值，n1，k1，d1，n2，k2和d2满足关系式<？in-line-formula description =“In-line Formulas”end =“lead”→> {（n1-n10）/（n1m-n10）} 2 + {（k1-k10）/（k1m-k10）} 2 + {（d1-d10）/（d1m-d10）} 2 + {（n2-n20）/（n2m-n20）} 2 + {（k2-k20）/（k2m-k20）} 2 + {（d2-d20）/（d2m-d20）} 2 < ？in-line-formula description =“In-line Formulas”end =“tail”？>

4. 发明授权

US07496034B2 Packet processing device implementing scheduling and priority for improved efficiency 有权
标题翻译：分组处理设备实现调度和优先级，提高效率
公开(公告)号：US07496034B2
公开(公告)日：2009-02-24
申请号：US11077868
申请日：2005-03-11
申请人： Hideyo Fukunaga , Katsumi Imamura , Yasushi Kurokawa , Hideyuki Kudou , Yoko Watanabe
发明人： Hideyo Fukunaga , Katsumi Imamura , Yasushi Kurokawa , Hideyuki Kudou , Yoko Watanabe
IPC分类号： H04L12/56
CPC分类号： H04L47/6215 , H04L47/50
摘要： A packet transmission device improved in packet transmission efficiency. Each packet input processor generates a pointer and identifies a packet type with respect to a received packet, and generates identification data including the pointer and the packet type identification result. A memory access controller detects a header readout amount of the packet based on the packet type identification result, generates first readout data including the header readout amount and a readout pointer indicative of a storage location of the packet in a shared memory, and adaptively reads out header data of the packet from the shared memory in accordance with the first readout data. A protocol processor analyzes the destination of the read header data, and a packet updater updates the old destination address of the packet to a new one to generate a packet with the updated destination address, and outputs the generated packet.
摘要翻译：分组传输设备提高了分组传输效率。每个分组输入处理器产生指针并且相对于接收到的分组标识分组类型，并且生成包括指针和分组类型识别结果的标识数据。存储器访问控制器基于分组类型识别结果来检测分组的报头读出量，产生包括报头读出量的第一读出数据和表示分组在共享存储器中的存储位置的读出指针，并自适应地读出根据第一读出数据来自共享存储器的分组的报头数据。协议处理器分析读取标题数据的目的地，并且分组更新器将分组的旧目的地地址更新为新的分组，以生成具有更新的目的地地址的分组，并输出生成的分组。

5. 发明授权

US07247410B2 Complementary division mask, method of producing mask, and program 失效
标题翻译：互补分割面具，生产面膜的方法和程序
公开(公告)号：US07247410B2
公开(公告)日：2007-07-24
申请号：US10885822
申请日：2004-07-07
申请人： Yoko Watanabe , Shinji Omori
发明人： Yoko Watanabe , Shinji Omori
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/20 , G03F1/82
摘要： A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.
摘要翻译：一种能够通过湿式洗涤来抑制图案变形的互补分割方法，具有以下步骤：确定在湿洗时的图案变形的确定分割长度，以及假设在弹性极限上的图案变形的图案的宽度和距离通过预先通过湿式洗涤最容易，将长度方向上确定的划分长度的整个线间距图案划分成一个简单的算法，适当地划分线间距图案，并进一步提供一种方法，面具和程序。

6. 发明申请

US20090075409A1 FABRICATION APPARATUS AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE PRODUCED BY HEATING SUBSTRATE 失效
标题翻译：通过加热基板生产的半导体器件的制造装置和制造方法
公开(公告)号：US20090075409A1
公开(公告)日：2009-03-19
申请号：US12209397
申请日：2008-09-12
申请人： Masaki UENO , Toshio UEDA , Yoko WATANABE
发明人： Masaki UENO , Toshio UEDA , Yoko WATANABE
IPC分类号： B05C13/00 , H01L21/00
CPC分类号： H01L21/67103 , H01L21/6875 , H01L21/68764
摘要： A fabrication apparatus and fabrication method of a semiconductor device are provided, allowing the temperature distribution of a substrate to be rendered uniform. The fabrication apparatus for a semiconductor device includes a susceptor holding the substrate, a heater arranged at a back side of the susceptor, a support member located between the substrate and susceptor, including a support portion, and a spacer located between the susceptor and support member. The spacer has an opening formed corresponding to the site where said support portion is located, at an opposite face side of the support member.
摘要翻译：提供一种半导体器件的制造装置和制造方法，使基板的温度分布变得均匀。半导体装置的制造装置包括保持基板的基座，设置在基座的背面的加热器，位于基板和基座之间的支撑构件，其包括支撑部，以及位于基座和支撑构件之间的间隔件。间隔件具有对应于所述支撑部分所在位置的开口，位于支撑构件的相对的面侧。

7. 发明申请

US20070097514A1 ANTIREFLECTIVE FILM AND EXPOSURE METHOD 失效
公开(公告)号：US20070097514A1
公开(公告)日：2007-05-03
申请号：US11467983
申请日：2006-08-29
申请人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
发明人： Nobuyuki Matsuzawa , Yoko Watanabe , Boontarika Thunnakart , Ken Ozawa
IPC分类号： G02B21/02
CPC分类号： H01L21/0276 , G03F7/091 , G03F7/2041 , Y10S438/952
摘要： An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a wavelength of 190 nm to 195 nm and a numerical aperture NA of 0.93 to 1.2. Assuming that the complex refractive indexes of upper and lower layers constituting the antireflective film are N1 (=n1−k1i) and N2 (=n2−k2i), respectively, and the thicknesses of both layers are d1 and d2, when a predetermined combination of values of [n10, k10, d10, n20, k20, d20] is selected, n1, k1, d1, n2, k2, and d2 satisfy the relational expression {(n1−n10)/(n1m−n10)}2+{(k1−k10)/(k1m−k10)}2+{(d1− d10)/(d1m−d10)}2+{(n2−n20)/(n2m−n20)}2+{(k2−k20)/(k2m− k20)}2+{(d2−d20)/(d2m−d20)}2≦1.

8. 发明授权

US07008609B2 Method for producing hydrogen gas utilizing mechano-corrosive reaction 失效
标题翻译：利用机械腐蚀反应生产氢气的方法
公开(公告)号：US07008609B2
公开(公告)日：2006-03-07
申请号：US10658106
申请日：2003-09-09
申请人： Masao Watanabe , Yoko Watanabe
发明人： Masao Watanabe , Yoko Watanabe
IPC分类号： C01B3/08 , C01F7/42
CPC分类号： B01J7/02 , B01J19/18 , B01J2219/182 , C01B3/08 , Y02E60/36
摘要： There is provided a method of producing hydrogen gas serving as fuel for a portable fuel cell, whereby hydrogen gas can be provided easily, safely, and at a low cost. To that end, the method of producing hydrogen gas comprises the steps of causing friction and mechanical fracture accompanying the friction to occur to a metallic material under water and increasing thereby chemical reactivity of atoms of the metallic material, in close proximity of the surface thereof; wherein water molecules are decomposed by accelerating corrosion reaction of water with the metallic material. Further, for the metallic material, an aluminum or aluminum alloy material is used as industrial waste including refuse and cutting chips (curls) of an industrial aluminum material. Meanwhile, pure water not substantially containing ionic impurities and organic molecules is used for the water.
摘要翻译：提供了一种生产用作便携式燃料电池的燃料的氢气的方法，由此可以容易地，安全地和低成本地提供氢气。为此，制造氢气的方法包括以下步骤：伴随摩擦的摩擦和机械断裂发生在水下的金属材料上，从而增加金属材料的原子在其表面附近的化学反应性; 其中水分子通过加速水与金属材料的腐蚀反应而分解。此外，对于金属材料，使用铝或铝合金材料作为工业废物，包括工业铝材料的垃圾和切割屑（卷曲）。同时，水中不含有离子杂质和有机分子的纯水。

9. 发明授权

US06738149B2 Method and apparatus for selecting a preferential font 失效
标题翻译：用于选择优先字体的方法和装置
公开(公告)号：US06738149B2
公开(公告)日：2004-05-18
申请号：US08007093
申请日：1993-01-21
申请人： Yoko Watanabe
发明人： Yoko Watanabe
IPC分类号： G06F1500
CPC分类号： G06K15/02 , G06K2215/0008 , G06K2215/002 , G06K2215/0022
摘要： An outputting apparatus such as a laser beam printer comprises a memory to store designation information to designate a selection-impossible font from a plurality of fonts and a selector to select a font which is most adaptive from the fonts other than the selection instructed font in accordance with an input of selection instruction information to instruct so as to select the selection-impossible font that is designated by the designation information stored in the memory. The plurality of fonts include internal fonts provided in the apparatus and fonts which are supplied from the outside.
摘要翻译：诸如激光束打印机的输出装置包括存储器，用于存储指定信息以从多个字体指定不可选择字体，以及选择器，从根据选择指示字体的字体中选择最适合的字体输入选择指示信息以指示以选择由存储在存储器中的指定信息指定的不可选择字体。多个字体包括设备中提供的内部字体和从外部提供的字体。

10. 发明授权

US5344770A Bacillus SP. ferm BP-3376 and a method for its use to produce an alkaline proteinase K-16 失效
标题翻译：芽孢杆菌SP。 ferm BP-3376及其用于产生碱性蛋白酶K-16的方法
公开(公告)号：US5344770A
公开(公告)日：1994-09-06
申请号：US141019
申请日：1993-10-26
申请人： Jun Hitomi , Shigehito Adachi , Yoshihiro Hakamada , Mikio Takaiwa , Tadashi Yoshimatsu , Yoko Watanabe , Tohru Kobayashi , Shuji Kawai , Susumu Ito
发明人： Jun Hitomi , Shigehito Adachi , Yoshihiro Hakamada , Mikio Takaiwa , Tadashi Yoshimatsu , Yoko Watanabe , Tohru Kobayashi , Shuji Kawai , Susumu Ito
IPC分类号： C11D3/386 , C12N9/54 , C12N1/00 , C12N1/20 , C12N9/50
CPC分类号： C12R1/07 , C11D3/386 , C12N9/54 , Y10S435/832
摘要： The present invention relates to a novel enzyme called alkaline proteinase K-16 that is characterized as having an optimum pH in an alkaline range, and stability in the presence of various surface active agents, such as sodium linear alkylbenzene sulfonate, sodium polyoxyethylene alkyl sulfate, sodium dodecyl sulfate, sodium .alpha.-olefin sulfonate, sodium alkyl sulfonate, and .alpha.-sulfo-fatty acid ester. The present invention further provides for the microorganism Bacillus sp. Ferm BP-3376, which is capable of producing the novel alkaline proteinase, and a process for producing the novel alkaline proteinase. Alkaline-proteinase K-16 of the present invention exhibits an excellent action against insoluble proteins and maintains sufficient activity over a wide temperature range and in the presence of surface active agents thus providing a use as an enzyme for detergents.
摘要翻译：本发明涉及一种称为碱性蛋白酶K-16的新型酶，其特征在于在碱性范围内具有最佳pH，并且在各种表面活性剂如线性烷基苯磺酸钠，聚氧乙烯烷基硫酸钠，十二烷基硫酸钠，α-烯烃磺酸钠，烷基磺酸钠和α-磺基脂肪酸酯。本发明还提供了微生物芽孢杆菌属能够生产新型碱性蛋白酶的Ferm BP-3376以及生产新型碱性蛋白酶的方法。本发明的碱性蛋白酶K-16表现出对不溶性蛋白质的优异作用，并且在宽温度范围内和在表面活性剂存在下保持足够的活性，从而提供用作洗涤剂的酶的用途。

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