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    • 1. 发明授权
    • Position detecting device employing marks and oblique projection
    • 位置检测装置采用标记和倾斜投影
    • US5162656A
    • 1992-11-10
    • US841790
    • 1992-03-02
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • G03F9/00
    • G03F9/7023G03F9/7049
    • A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.
    • 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源,使得入射在第一物体上的光由此偏转,并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸,光接收部分可操作以检测其上的光的入射位置,其中, 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统,用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。
    • 2. 发明授权
    • Device for detecting positional relationship between two objects
    • 用于检测两个物体之间的位置关系的装置
    • US5327221A
    • 1994-07-05
    • US919380
    • 1992-07-29
    • Kenji SaitohMasakazu MatsuguShigeyuki SudaYukichi NiwaRyo KurodaNoriyuki NoseMinoru YoshiiNaoto AbeMitsutoshi Ohwada
    • Kenji SaitohMasakazu MatsuguShigeyuki SudaYukichi NiwaRyo KurodaNoriyuki NoseMinoru YoshiiNaoto AbeMitsutoshi Ohwada
    • G03F9/00G01B9/02
    • G03F9/7023G03F9/7049
    • A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
    • 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括:用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分,用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体,其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置,其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测,检测第一和第二物体之间的位置关系,而不受其倾斜的影响。
    • 3. 发明授权
    • Positioning detecting method and apparatus
    • 定位检测方法及装置
    • US5294980A
    • 1994-03-15
    • US58662
    • 1993-05-10
    • Masakazu MatsuguKenji SaitohYukichi NiwaNoriyuki NoseRyo KurodaShigeyuki Suda
    • Masakazu MatsuguKenji SaitohYukichi NiwaNoriyuki NoseRyo KurodaShigeyuki Suda
    • G03F9/00G01B11/00G01N21/85
    • G03F9/70
    • A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.
    • 用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统,其中第一和第二物体分别设置有第一和第二物理光学元件, 在至少一个方向上具有聚光或发散功能,并且其中所述照明系统照亮所述第一物理光学元件。 光检测系统检测穿过第一物体并从第二物体发出的光,并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光,使得第一和第二物体之间的相对位置关系 基于光检测系统的检测来检测。 第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能,并且在垂直方向和一个方向上具有不同的焦距。
    • 6. 发明授权
    • Position detecting method and apparatus including Fraunhofer diffraction
detector
    • 位置检测方法和装置,包括弗劳恩霍夫衍射检测器
    • US5325176A
    • 1994-06-28
    • US875601
    • 1992-04-28
    • Shigeyuki SudaKenji SaitohMasakazu MatsuguNaoto AbeMinoru YoshiiRyo Kuroda
    • Shigeyuki SudaKenji SaitohMasakazu MatsuguNaoto AbeMinoru YoshiiRyo Kuroda
    • G03F9/00G01B11/02
    • G03F9/7076
    • A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.
    • 公开了一种可用于第一物体和第二物体的装置,其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。 该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分,用于在从第一物体引导之后接收位置检测光束并入射到第二物体上,光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中,以由所述光束检测部分接收,所述衍射光栅有效地将所述位置检测光束衍射至少两次,并且其中所述光束检测部分设置在位置 有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。
    • 9. 发明授权
    • Position detecting method and apparatus
    • 位置检测方法和装置
    • US5235408A
    • 1993-08-10
    • US888434
    • 1992-05-28
    • Masakazu MatsuguKenji SaitohShigeyuki Suda
    • Masakazu MatsuguKenji SaitohShigeyuki Suda
    • G03F9/00
    • G03F9/7049
    • A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.
    • 一种用于检测掩模和晶片之间的位置关系的装置,包括用于将光投射到掩模的光源,用于检测由掩模和晶片偏转的第一光在预定平面上的位置的第一光电检测系统, 其中,所述第一光的第一受光系统上的入射位置可根据所述掩模和所述晶片之间的位置关系而改变;第二光电检测系统,用于检测由所述掩模偏转的第二光在预定平面上的位置的位置; 其特征在于,所述第二光检测系统中的所述入射位置,所述第二光的入射位置可以通过所述掩模和所述光源之间的相对倾斜度而变化;以及位置检测系统,用于基于所述掩模和所述光源检测所述掩模和所述晶片的相对位置 由第一和第二光电检测系统进行检测,其中位置检测系统的检测可以不受 面罩与光源之间的相对倾斜度。