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    • 1. 发明授权
    • Device for detecting positional relationship between two objects
    • 用于检测两个物体之间的位置关系的装置
    • US5327221A
    • 1994-07-05
    • US919380
    • 1992-07-29
    • Kenji SaitohMasakazu MatsuguShigeyuki SudaYukichi NiwaRyo KurodaNoriyuki NoseMinoru YoshiiNaoto AbeMitsutoshi Ohwada
    • Kenji SaitohMasakazu MatsuguShigeyuki SudaYukichi NiwaRyo KurodaNoriyuki NoseMinoru YoshiiNaoto AbeMitsutoshi Ohwada
    • G03F9/00G01B9/02
    • G03F9/7023G03F9/7049
    • A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
    • 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括:用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分,用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体,其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置,其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测,检测第一和第二物体之间的位置关系,而不受其倾斜的影响。
    • 2. 发明授权
    • Position detecting device employing marks and oblique projection
    • 位置检测装置采用标记和倾斜投影
    • US5162656A
    • 1992-11-10
    • US841790
    • 1992-03-02
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • Masakazu MatsuguKenji SaitohShigeyuki SudaRyo KurodaYukichi NiwaNoriyuki Nose
    • G03F9/00
    • G03F9/7023G03F9/7049
    • A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.
    • 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源,使得入射在第一物体上的光由此偏转,并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸,光接收部分可操作以检测其上的光的入射位置,其中, 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统,用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。
    • 3. 发明授权
    • Positioning detecting method and apparatus
    • 定位检测方法及装置
    • US5294980A
    • 1994-03-15
    • US58662
    • 1993-05-10
    • Masakazu MatsuguKenji SaitohYukichi NiwaNoriyuki NoseRyo KurodaShigeyuki Suda
    • Masakazu MatsuguKenji SaitohYukichi NiwaNoriyuki NoseRyo KurodaShigeyuki Suda
    • G03F9/00G01B11/00G01N21/85
    • G03F9/70
    • A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.
    • 用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统,其中第一和第二物体分别设置有第一和第二物理光学元件, 在至少一个方向上具有聚光或发散功能,并且其中所述照明系统照亮所述第一物理光学元件。 光检测系统检测穿过第一物体并从第二物体发出的光,并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光,使得第一和第二物体之间的相对位置关系 基于光检测系统的检测来检测。 第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能,并且在垂直方向和一个方向上具有不同的焦距。
    • 8. 发明授权
    • Distance measuring system
    • 距离测量系统
    • US5000572A
    • 1991-03-19
    • US542656
    • 1990-06-25
    • Noriyuki NoseMinoru YoshiiYukichi NiwaRyo Kuroda
    • Noriyuki NoseMinoru YoshiiYukichi NiwaRyo Kuroda
    • G01D5/38
    • G01D5/38
    • A device for measuring a moving distance of two relatively moving objects includes a first diffraction grating provided on one of the two objects and disposed along the relatively moving direction of the two objects, and a measuring portion provided on the other object. The measuring portion includes a second diffraction grating, a light source and a photodetecting system, wherein the light source provides lights which are projected upon two points on the second diffraction grating so that they emanate from the two points in the form of diffraction lights having different diffraction orders. The diffraction lights are directed to the same point on the first diffraction grating and are diffracted again by the first diffraction grating so that they are emitted in the same direction, and the photodetecting system is operable to detect a change in the light intensity caused due to the interference of the two lights emanating from the first diffraction grating. The device further includes a detecting system for detecting the relative moving distance of the two objects on the basis of the detection by the photodetecting.
    • 用于测量两个相对移动物体的移动距离的装置包括设置在两个物体中的一个物体上并沿两个物体的相对移动方向设置的第一衍射光栅以及设置在另一物体上的测量部分。 测量部分包括第二衍射光栅,光源和光电检测系统,其中光源提供投射在第二衍射光栅上的两个点上的光,使得它们以具有不同的衍射光的形式的两个点发射 衍射指令。 衍射光被引导到第一衍射光栅上的同一点,并被第一衍射光栅再次衍射,使得它们沿相同的方向发射,并且光电检测系统可操作以检测由于 从第一衍射光栅发出的两个光的干涉。 该装置还包括检测系统,用于根据受光检测的检测来检测两个物体的相对移动距离。
    • 10. 发明授权
    • Distance measuring system using superconducting quantum interference
device
    • 使用超导量子干涉装置的距离测量系统
    • US4912408A
    • 1990-03-27
    • US199706
    • 1988-05-27
    • Takeshi SawadaRyo KurodaNoriyuki NoseYukichi Niwa
    • Takeshi SawadaRyo KurodaNoriyuki NoseYukichi Niwa
    • G01B7/00G01D5/14G01D5/18H01L39/00
    • G01D5/145G01D5/18Y10S505/843Y10S505/872
    • Disclosed is a distance measuring system suitably usable in a semiconductor microcircuit manufacturing lithographic apparatus such as an aligner or a stepper, for measuring the position or the distance of movement of a movable object such as a mask stage or a wafer stage. The system includes a magnetic field producing portion such as a magnet for producing a predetermined magnetic field, a superconducting quantum interference device coupled to the mask stage or the wafer stage. Further, there are provided a magnetic flux detecting portion for outputting signals corresponding to changes in the magnetic flux, in the magnetic field, passing through the superconducting quantum interference device and a signal processing unit for processing the output signals of the magnetic flux detecting portion to detect the position or the distance of movement of the mask stage or the wafer stage. Also, a shielding member is provided to shield at least the magnetic field producing portion and the magnetic flux detecting portion against an external magnetic field, by use of a superconductor. The distance measuring system of the present invention assures accurate measurement with a high resolution, for a wide movable range of the movable member such as a range not less than 100 mm.
    • 公开了适用于半导体微电路制造光刻设备(例如对准器或步进器)中的距离测量系统,用于测量诸如掩模台或晶片台之类的可移动物体的位置或距离。 该系统包括磁场产生部分,例如用于产生预定磁场的磁体,连接到掩模台或晶片台的超导量子干涉装置。 此外,提供了一个磁通量检测部分,用于输出与通过超导量子干涉装置的磁场中的磁通量的变化相对应的信号,以及用于处理磁通检测部分的输出信号的信号处理单元 检测掩模台或晶片台的位置或移动距离。 此外,设置屏蔽构件,以通过使用超导体来抵御外部磁场来屏蔽至少磁场产生部分和磁通量检测部分。 本发明的距离测量系统可确保在可移动部件的宽的可移动范围内具有高分辨率的精确测量,例如不小于100mm的范围。