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1. 发明授权

US5327221A Device for detecting positional relationship between two objects 失效
标题翻译：用于检测两个物体之间的位置关系的装置
公开(公告)号：US5327221A
公开(公告)日：1994-07-05
申请号：US919380
申请日：1992-07-29
申请人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
发明人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
摘要翻译：一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态在预定方向上的物体与第一光不同。基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

2. 发明授权

US5325176A Position detecting method and apparatus including Fraunhofer diffraction detector 失效
$Position detecting method and apparatus including Fraunhofer diffraction detector$
标题翻译：位置检测方法和装置，包括弗劳恩霍夫衍射检测器
公开(公告)号：US5325176A
公开(公告)日：1994-06-28
申请号：US875601
申请日：1992-04-28
申请人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
发明人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7076
摘要： A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.
摘要翻译：公开了一种可用于第一物体和第二物体的装置，其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分，用于在从第一物体引导之后接收位置检测光束并入射到第二物体上，光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中，以由所述光束检测部分接收，所述衍射光栅有效地将所述位置检测光束衍射至少两次，并且其中所述光束检测部分设置在位置有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。

3. 发明授权

US5028797A An alignment system for align first and second objects using alignment marks 失效
标题翻译：对准系统，用于使用对准标记对准第一和第二对象
公开(公告)号：US5028797A
公开(公告)日：1991-07-02
申请号：US413739
申请日：1989-09-28
申请人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
发明人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7096 , G03F9/7049
摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

4. 发明授权

US5340992A Apparatus and method of detecting positional relationship using a weighted coefficient 失效
标题翻译：使用加权系数检测位置关系的装置和方法
公开(公告)号：US5340992A
公开(公告)日：1994-08-23
申请号：US978524
申请日：1992-11-18
申请人： Masakazu Matsugu , Minoru Yoshii , Naoto Abe
发明人： Masakazu Matsugu , Minoru Yoshii , Naoto Abe
IPC分类号： G03F9/00 , G01N21/86 , G01V9/04
CPC分类号： G03F9/7076
摘要： A device for detecting a relative positional relationship between first and second objects is disclosed. The device includes light source for projecting light to the first and second objects; photodetecting system for detecting light from one of the first and second objects illuminated by the light source system, the photodetecting system having a light receiving surface and producing a signal corresponding to the light intensity at each point on the light receiving surface; and position detecting system for detecting the relative position of the first and second objects, on the basis of signals from the photodetecting system, wherein the position detecting system is arranged to adjust signals corresponding to different points on the light receiving surface of the photodetecting system, by using different weight coefficients and to detect the relative position of the first and second objects on the basis of the adjusted signals.
摘要翻译：公开了一种用于检测第一和第二物体之间的相对位置关系的装置。该装置包括用于将光投射到第一和第二物体的光源; 用于检测来自由光源系统照射的第一和第二物体之一的光的光电检测系统，所述光电检测系统具有光接收表面，并且产生与所述光接收表面上的每个点处的光强度相对应的信号; 以及位置检测系统，用于基于来自光电检测系统的信号检测第一和第二物体的相对位置，其中位置检测系统被布置成调节与光检测系统的光接收表面上的不同点对应的信号，通过使用不同的权重系数，并且基于经调整的信号来检测第一和第二对象的相对位置。

5. 发明授权

US5160848A Device for detecting the relative position between opposed first and second objects 失效
标题翻译：用于检测相对的第一和第二物体之间的相对位置的装置
公开(公告)号：US5160848A
公开(公告)日：1992-11-03
申请号：US832612
申请日：1992-02-12
申请人： Kenji Saitoh , Masakazu Matsugu , Naoto Abe
发明人： Kenji Saitoh , Masakazu Matsugu , Naoto Abe
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A device, usable with first and second opposed objects each having at least one diffraction grating, for detecting a positional relationship between those objects in a direction perpendicular to the direction in which they are opposed, is disclosed. The device includes a light source for projecting light to a diffraction grating of one of the first and second objects and a first detecting system for detecting, in a first plane, first light diffracted by diffraction gratings of the first and second objects. The position of incidence of the first light on the first plane is changeable with a change in the relative position of the first and second objects in the perpendicular direction. A second detecting system detects, in a second plane, second light diffracted by a diffraction grating of the first and second objects, wherein a change in the position of incidence of the second light on the second plane due to a change in the relative position of the first and second objects in the perpendicular direction is different from the change in the position of incidence of the first light. A position detecting system detects the relative position of the first and second objects, in accordance with the detection by the first and second detecting systems; wherein the first and second lights are those lights having been diffracted, at different orders, by the same diffraction grating of one of the first and second objects.
摘要翻译：公开了一种可用于具有至少一个衍射光栅的第一和第二相对对象的装置，用于检测这些物体在与它们相对的方向垂直的方向上的位置关系。该装置包括用于将光投射到第一和第二物体之一的衍射光栅的光源和用于在第一平面中检测由第一和第二物体的衍射光栅衍射的第一光的第一检测系统。在第一平面上的第一光的入射位置随着第一和第二物体在垂直方向上的相对位置的变化而变化。第二检测系统在第二平面中检测由第一和第二物体的衍射光栅衍射的第二光，其中由于相对位置的变化，第二平面上的第二光的入射位置的变化垂直方向上的第一和第二物体与第一光的入射位置的变化不同。根据第一和第二检测系统的检测，位置检测系统检测第一和第二物体的相对位置; 其中所述第一和第二光是通过所述第一和第二物体之一的相同衍射光栅以不同的次数衍射的那些光。

6. 发明授权

US5379108A Alignment system 失效
标题翻译：校准系统
公开(公告)号：US5379108A
公开(公告)日：1995-01-03
申请号：US91959
申请日：1993-07-15
申请人： Noriyuki Nose , Naoto Abe
发明人： Noriyuki Nose , Naoto Abe
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/70
摘要： An alignment system includes an alignment detector for detecting a relative deviation of the mask and the wafer from a predetermined positional relationship, a stage mechanism for moving the mask relative to the wafer, an interferometer device for producing information related to the movement by the stage mechanism, and a controller for determining an input to be applied to the stage mechanism so as to bring the mask and the wafer into the predetermined positional relationship, on the basis of a detected value obtained through the alignment detector and a measured value obtained through the interferometer device, both being uptaken at the same timing, and for controlling the stage mechanism on the basis of the thus determined input.
摘要翻译：对准系统包括用于检测掩模和晶片与预定位置关系的相对偏离的对准检测器，用于使掩模相对于晶片移动的平台机构，用于产生与平台机构的移动有关的信息的干涉仪装置以及控制器，用于基于通过对准检测器获得的检测值和通过干涉仪获得的测量值，确定要施加到舞台机构的输入以使掩模和晶片达到预定位置关系的控制器装置，两者都在相同的定时被吸收，并且基于这样确定的输入来控制舞台机构。

7. 发明授权

US5114235A Method of detecting positional deviation 失效
标题翻译：检测位置偏差的方法
公开(公告)号：US5114235A
公开(公告)日：1992-05-19
申请号：US553315
申请日：1990-07-17
申请人： Shigeyuki Suda , Naoto Abe
发明人： Shigeyuki Suda , Naoto Abe
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A method of detecting relative positional deviation of first and second substrates, wherein first and second marks with optical powers are formed on the first and second substrates. A radiation beam is projected to the first substrate and, as a result, the first and second marks produce a signal beam whose position of incidence upon a predetermined plane is changeable with the relative positional deviation of the first and second substrates. A sensor is disposed adjacent to the predetermined plane and receives the signal beam to produce an output signal corresponding to the position of incidence of the signal beam upon the sensor. Here, a reference mark is provided to produce, when irradiated with a radiation beam, a reference beam so that it advances along a light path substantially the same as the light path for the signal beam to the sensor when the first and second substrates are in a predetermined positional relation. The produced reference beam is received by the sensor, whereby a reference signal corresponding to the position of incidence of the reference beam upon the sensor is obtained. The relative position of the first and second substrates can be detected on the basis of the output signal and the reference signal.

8. 发明授权

US5459573A Light quantity controlling apparatus 失效
标题翻译：光量控制装置
公开(公告)号：US5459573A
公开(公告)日：1995-10-17
申请号：US291747
申请日：1994-08-17
申请人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
发明人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G01B11/00 , G01D5/26 , G03F9/00 , H01L21/68 , H01L31/12 , H01L33/00 , H01S5/06 , H01S5/062 , H01S5/0683 , G01N21/86
CPC分类号： G03F9/7088 , G03F9/7049 , H01L21/68 , H01L21/682 , H01S5/06835 , H01S5/06216
摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.
摘要翻译：一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。为了获得适当的标记信号，控制入射在累积传感器上的光量。在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。由积累传感器产生的标记检测信号是精确的。

9. 发明授权

US5148038A Device for detecting positional relationship between two objects 失效
标题翻译：用于检测两个对象之间的位置关系的设备
公开(公告)号：US5148038A
公开(公告)日：1992-09-15
申请号：US804514
申请日：1991-12-10
申请人： Noriyuki Nose , Naoto Abe
发明人： Noriyuki Nose , Naoto Abe
IPC分类号： G03F9/00
CPC分类号： G03F9/7076 , G03F9/7023
摘要： A device for detecting a positional relationship between opposed first and second objects. The device includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.

10. 发明授权

US5291023A Position detecting system utilizing a weight coefficient to determine a gravity center of light 失效
标题翻译：位置检测系统利用重量系数来确定重心
公开(公告)号：US5291023A
公开(公告)日：1994-03-01
申请号：US21480
申请日：1993-02-22
申请人： Masanobu Hasegawa , Minoru Yoshii , Naoto Abe
发明人： Masanobu Hasegawa , Minoru Yoshii , Naoto Abe
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , G01N21/86
CPC分类号： G03F9/70
摘要： A position detecting system for detecting the relative position of two objects is disclosed wherein: light is projected to the two objects so that the light from the two objects is received by a position detector; to an output signal from the detector is applied a weight coefficient corresponding to the position to determine a gravity center of the light incident; a region of the position detector is set on the basis of the determination; the gravity center of the light incident is determined again on the basis of the set region; and the relative position of the two objects is determined on the basis of the second determination.
摘要翻译：公开了一种用于检测两个物体的相对位置的位置检测系统，其中：将光投射到两个物体上，使得来自两个物体的光由位置检测器接收; 对来自检测器的输出信号施加与该位置对应的加权系数，以确定入射光的重心; 基于该确定设置位置检测器的区域; 基于设定区域再次确定光入射的重心; 并且基于第二确定来确定两个对象的相对位置。

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