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    • 7. 发明授权
    • Measurement system and measurement processing method
    • 测量系统和测量处理方法
    • US08456621B2
    • 2013-06-04
    • US13595013
    • 2012-08-27
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • G01N21/00
    • G01B11/25
    • This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
    • 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时,将测量对象的散射特性一起提取。 为了实现这一点,测量系统包括用点阵图形光照射测量对象的照明单元,以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量,测量对象的表面的倾斜度,并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。
    • 8. 发明授权
    • Measurement system and measurement processing method
    • 测量系统和测量处理方法
    • US08274646B2
    • 2012-09-25
    • US12816069
    • 2010-06-15
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • G01N21/00
    • G01B11/25
    • This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
    • 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时,将测量对象的散射特性一起提取。 为了实现这一点,测量系统包括用点阵图形光照射测量对象的照明单元,以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量,测量对象的表面的倾斜度,并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。
    • 9. 发明申请
    • MEASUREMENT SYSTEM AND MEASUREMENT PROCESSING METHOD
    • 测量系统和测量处理方法
    • US20120327400A1
    • 2012-12-27
    • US13595013
    • 2012-08-27
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • G01B11/25G01N21/47
    • G01B11/25
    • This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
    • 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时,将测量对象的散射特性一起提取。 为了实现这一点,测量系统包括用点阵图形光照射测量对象的照明单元,以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量,测量对象的表面的倾斜度,并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。
    • 10. 发明申请
    • MEASUREMENT SYSTEM AND MEASUREMENT PROCESSING METHOD
    • 测量系统和测量处理方法
    • US20100328649A1
    • 2010-12-30
    • US12816069
    • 2010-06-15
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • Kazuyuki OtaMasakazu MatsuguKenji Saitoh
    • G01B11/24G01B11/30
    • G01B11/25
    • This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
    • 本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时,将测量对象的散射特性一起提取。 为了实现这一点,测量系统包括用点阵图形光照射测量对象的照明单元,以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元 基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量,测量对象的表面的倾斜度,并将点阵图案光的反射光的亮度值和点直径提取为 关于散射特性的信息。