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1. 发明授权

US07070914B2 Process for producing an image using a first minimum bottom antireflective coating composition 有权
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US07070914B2
公开(公告)日：2006-07-04
申请号：US10042878
申请日：2002-01-09
申请人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 ⁢ n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARC）组合物，并且涂覆的基材的最大涂层厚度为 $λ2n其中λ是步骤（c）的光化辐射的波长，n是BARC的折射率组成。$

2. 发明授权

US06844131B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US06844131B2
公开(公告)日：2005-01-18
申请号：US10042532
申请日：2002-01-09
申请人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
发明人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
IPC分类号： G03F7/11 , A61P29/00 , G03F7/004 , G03F7/039 , G03F7/09
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
摘要翻译：本发明涉及一种新颖的吸收光可成像和水性显影正性抗反射涂料组合物，其包含光酸产生剂和包含至少一个具有酸不稳定基团的单元和至少一个具有吸收发色团的单元的聚合物。本发明还涉及一种使用这种组合物的方法。本发明还涉及一种新型的吸收，可光成像和水性碱显影正性抗反射涂料组合物，其包含含有至少一个具有酸不稳定基团的单元，染料和光致酸产生剂的聚合物。本发明还涉及使用这种组合物的方法。本发明还涉及一种用正性光致抗蚀剂形成正像的新方法，以及一种新型可光成像和水性可显影正性抗反射涂料组合物，其中抗反射涂层包含含酸不稳定基团的聚合物。本发明还涉及这种组合物。本发明还涉及一种用于对可光成象抗反射涂层组合物进行成像的方法。

3. 发明授权

US07264913B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07264913B2
公开(公告)日：2007-09-04
申请号：US10301462
申请日：2002-11-21
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
IPC分类号： G03C1/825 , G03C1/74 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , G03F7/038 , G03F7/0382 , Y10S430/109 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.
摘要翻译：本发明涉及包含聚合物，交联剂和酸发生剂的新型抗反射涂料组合物。本发明还涉及使用该组合物的方法，特别是在193nm。本发明的聚合物含有至少一种选自结构1,2和3的单元，其中Y是1至约10个碳原子的烃基连接基团，R 1，R 1，R' 和R“独立地为氢，1至约10个碳原子的烃基，卤素，-O（CO）Z，-C（CF 3）2 Z， -C（CF 3）2（CO）OZ，-SO 2 CF 3 - ， - （CO） OZ，-SO 3 Z，-COZ，-OZ，-NZ 2，-SZ，-SO 2 Z，-NHCOZ， - NZCOZ或-SO 2 NZ 2，其中Z为H或1至约10个碳原子的烃基，n = 1-4，X为O，CO， S，COO，CH 2 O，CH 2 COO，SO 2，NH，NL，OWO，OW，W，其中L和 W独立地为1至约10个碳原子的烃基，并且m = 0-3。

4. 发明申请

US20060199103A1 Process for producing an image using a first minimum bottom antireflective coating composition 审中-公开
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US20060199103A1
公开(公告)日：2006-09-07
申请号：US11416240
申请日：2006-05-02
申请人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ/2n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是第一最小底部抗反射涂层（BARC）组合物，其固体含量高达约8％固体，并且涂覆的基底的最大涂层厚度为λ/ 2n，其中λ为步骤（c）的光化辐射的波长，n是BARC的折射率组成。

5. 发明申请

US20050214674A1 Positive-working photoimageable bottom antireflective coating 审中-公开
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US20050214674A1
公开(公告)日：2005-09-29
申请号：US10808884
申请日：2004-03-25
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03F7/039 , G03F7/09 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

6. 发明申请

US20060063105A1 Negative-working photoimageable bottom antireflective coating 审中-公开
公开(公告)号：US20060063105A1
公开(公告)日：2006-03-23
申请号：US11260761
申请日：2005-10-27
申请人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
发明人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/091
摘要： The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

7. 发明授权

US07008476B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof 有权
标题翻译：海藻酸衍生物的改性海藻酸及其热固性抗反射组合物
公开(公告)号：US07008476B2
公开(公告)日：2006-03-07
申请号：US10459229
申请日：2003-06-11
申请人： Hengpeng Wu , Zhong Xhiang , Shuji Ding-Lee , Jianhui Shan , Eleazar B. Gonzalez
发明人： Hengpeng Wu , Zhong Xhiang , Shuji Ding-Lee , Jianhui Shan , Eleazar B. Gonzalez
IPC分类号： G03F7/11 , C08L5/04 , C08B37/04
CPC分类号： C08B37/0084 , G03F7/091
摘要： Modified alginic acid or alginic acid derivatives and anti-reflective coatings based on thereon are described.
摘要翻译：描述了基于其的改性海藻酸或藻酸衍生物和抗反射涂层。

8. 发明授权

US07691556B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07691556B2
公开(公告)日：2010-04-06
申请号：US11159002
申请日：2005-06-22
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Aritaka Hishida , Jianhui Shan , Hong Zhuang
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/091
摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
摘要翻译：本发明涉及一种包含通过使甘脲化合物与至少一种含有至少一个羟基和/或至少一个酸基团的反应性化合物反应而得到的聚合物的涂层溶液，此外，聚合物可溶于有机溶剂中。本发明还涉及一种用于对涂覆在这种涂料组合物上的光致抗蚀剂和用于涂料组合物的聚合物进行成像的方法。

9. 发明申请

US20050112494A1 Bottom antireflective coatings 失效
标题翻译：底部防反射涂层
公开(公告)号：US20050112494A1
公开(公告)日：2005-05-26
申请号：US10721883
申请日：2003-11-26
申请人： Huirong Yao , Shuji Ding-Lee , Hengpeng Wu , Zhong Xiang
发明人： Huirong Yao , Shuji Ding-Lee , Hengpeng Wu , Zhong Xiang
IPC分类号： C07C231/08 , C07D207/404 , C08F8/30 , C08F220/36 , C08F220/58 , C09D133/14 , C09D133/24 , G03F7/09 , G03C1/76
CPC分类号： G03F7/091 , C07D207/404 , C08F8/30 , C08F20/32
摘要： The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.
摘要翻译：本发明涉及用于制备这种组合物的底部抗反射涂料组合物和聚合物。

10. 发明授权

US07030201B2 Bottom antireflective coatings 失效
标题翻译：底部防反射涂层
公开(公告)号：US07030201B2
公开(公告)日：2006-04-18
申请号：US10721883
申请日：2003-11-26
申请人： Huirong Yao , Shuji Ding-Lee , Hengpeng Wu , Zhong Xiang
发明人： Huirong Yao , Shuji Ding-Lee , Hengpeng Wu , Zhong Xiang
IPC分类号： C08F126/06 , C08F226/06 , C08F122/40 , C08F4/44 , C07C321/00
CPC分类号： G03F7/091 , C07D207/404 , C08F8/30 , C08F20/32
摘要： The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.
摘要翻译：本发明涉及用于制备这种组合物的底部抗反射涂料组合物和聚合物。

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