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1. 发明授权

US07070914B2 Process for producing an image using a first minimum bottom antireflective coating composition 有权
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US07070914B2
公开(公告)日：2006-07-04
申请号：US10042878
申请日：2002-01-09
申请人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 ⁢ n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARC）组合物，并且涂覆的基材的最大涂层厚度为 $λ2n其中λ是步骤（c）的光化辐射的波长，n是BARC的折射率组成。$

2. 发明授权

US06844131B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US06844131B2
公开(公告)日：2005-01-18
申请号：US10042532
申请日：2002-01-09
申请人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
发明人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
IPC分类号： G03F7/11 , A61P29/00 , G03F7/004 , G03F7/039 , G03F7/09
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
摘要翻译：本发明涉及一种新颖的吸收光可成像和水性显影正性抗反射涂料组合物，其包含光酸产生剂和包含至少一个具有酸不稳定基团的单元和至少一个具有吸收发色团的单元的聚合物。本发明还涉及一种使用这种组合物的方法。本发明还涉及一种新型的吸收，可光成像和水性碱显影正性抗反射涂料组合物，其包含含有至少一个具有酸不稳定基团的单元，染料和光致酸产生剂的聚合物。本发明还涉及使用这种组合物的方法。本发明还涉及一种用正性光致抗蚀剂形成正像的新方法，以及一种新型可光成像和水性可显影正性抗反射涂料组合物，其中抗反射涂层包含含酸不稳定基团的聚合物。本发明还涉及这种组合物。本发明还涉及一种用于对可光成象抗反射涂层组合物进行成像的方法。

3. 发明授权

US07264913B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07264913B2
公开(公告)日：2007-09-04
申请号：US10301462
申请日：2002-11-21
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
IPC分类号： G03C1/825 , G03C1/74 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , G03F7/038 , G03F7/0382 , Y10S430/109 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.
摘要翻译：本发明涉及包含聚合物，交联剂和酸发生剂的新型抗反射涂料组合物。本发明还涉及使用该组合物的方法，特别是在193nm。本发明的聚合物含有至少一种选自结构1,2和3的单元，其中Y是1至约10个碳原子的烃基连接基团，R 1，R 1，R' 和R“独立地为氢，1至约10个碳原子的烃基，卤素，-O（CO）Z，-C（CF 3）2 Z， -C（CF 3）2（CO）OZ，-SO 2 CF 3 - ， - （CO） OZ，-SO 3 Z，-COZ，-OZ，-NZ 2，-SZ，-SO 2 Z，-NHCOZ， - NZCOZ或-SO 2 NZ 2，其中Z为H或1至约10个碳原子的烃基，n = 1-4，X为O，CO， S，COO，CH 2 O，CH 2 COO，SO 2，NH，NL，OWO，OW，W，其中L和 W独立地为1至约10个碳原子的烃基，并且m = 0-3。

4. 发明授权

US08039202B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08039202B2
公开(公告)日：2011-10-18
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/26
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

5. 发明授权

US08088548B2 Bottom antireflective coating compositions 有权
标题翻译：底部防反射涂料组合物
公开(公告)号：US08088548B2
公开(公告)日：2012-01-03
申请号：US11876793
申请日：2007-10-23
申请人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
发明人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
IPC分类号： G03F7/11 , G03F7/039
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Developable bottom antireflective coating compositions are provided.
摘要翻译：提供可开发的底部抗反射涂料组合物。

6. 发明授权

US07824837B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US07824837B2
公开(公告)日：2010-11-02
申请号：US11876332
申请日：2007-10-22
申请人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/095 , G03F7/039 , G03F7/11
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

7. 发明申请

US20090104559A1 Bottom Antireflective Coating Compositions 有权
标题翻译：底部防反射涂料组合物
公开(公告)号：US20090104559A1
公开(公告)日：2009-04-23
申请号：US11876793
申请日：2007-10-23
申请人： Francis M. Houlihan , Shinjl Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
发明人： Francis M. Houlihan , Shinjl Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
IPC分类号： G03C1/73 , C07C55/02 , C07C59/245 , C07C59/305 , G03F7/20 , C07C61/08 , C07C63/14 , C07C63/337
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Developable bottom antireflective coating compositions are provided.
摘要翻译：提供可开发的底部抗反射涂料组合物。

8. 发明授权

US07824844B2 Solvent mixtures for antireflective coating compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射涂料组合物的溶剂混合物
公开(公告)号：US07824844B2
公开(公告)日：2010-11-02
申请号：US11624744
申请日：2007-01-19
申请人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
发明人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
IPC分类号： G03F7/40 , G03F7/30 , G03F7/11 , C08F8/30 , H01L21/027
CPC分类号： G03F7/091 , C09D7/20 , G03F7/0048
摘要： The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
摘要翻译：本发明涉及一种抗反射涂料组合物，其能够涂覆在光致抗蚀剂层下面，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少一种主要有机溶剂和至少一种选择的二级有机溶剂其中R 1，R 3和R 4选自H和C 1 -C 6烷基，R 2，R 5，R 6，R 7，R 8和R 9选自C 1 -C 6烷基， n = 1-5。本发明还涉及能够涂覆在光致抗蚀剂层下面的抗反射涂料组合物，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少2种有机溶剂，并且其中抗反射涂料组合物具有在加速老化后，0.2微米的液体颗粒数小于100 / ml。

9. 发明申请

US20070298349A1 Antireflective Coating Compositions Comprising Siloxane Polymer 审中-公开
标题翻译：包含硅氧烷聚合物的抗反射涂料组合物
公开(公告)号：US20070298349A1
公开(公告)日：2007-12-27
申请号：US11425813
申请日：2006-06-22
申请人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
发明人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
IPC分类号： G03C1/00
CPC分类号： C09D183/04 , G03F7/038 , G03F7/0757 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
摘要翻译：本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团，其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合包括将环醚与聚合物的硅连接的脂环族连接基团。本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。

10. 发明授权

US5795685A Simple repair method for phase shifting masks 失效
标题翻译：相位掩模的简单修复方法
公开(公告)号：US5795685A
公开(公告)日：1998-08-18
申请号：US783631
申请日：1997-01-14
申请人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
发明人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
IPC分类号： G03F1/26 , G03F1/72 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26 , G03F1/72
摘要： A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
摘要翻译：一种用于校正用于光刻中的相移掩模中的缺陷的方法和装置。更具体地，本发明的方法包括创建包含移相器的第二修复掩模。围绕第一掩模上的缺陷的区域变得不透明。位于这些缺陷区域中的设计电路被复制到第二掩模上。在第二曝光期间，将设计电路放置在半导体晶片上。因此，该方法和装置为困难的问题提供了便宜的解决方案。

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