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1. 发明授权

US08088548B2 Bottom antireflective coating compositions 有权
标题翻译：底部防反射涂料组合物
公开(公告)号：US08088548B2
公开(公告)日：2012-01-03
申请号：US11876793
申请日：2007-10-23
申请人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
发明人： Francis M. Houlihan , Shinji Miyazaki , Mark O. Neisser , Alberto D. Dioses , Joseph E. Oberlander
IPC分类号： G03F7/11 , G03F7/039
CPC分类号： C07C211/05 , C07C55/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： Developable bottom antireflective coating compositions are provided.
摘要翻译：提供可开发的底部抗反射涂料组合物。

2. 发明授权

US07264913B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07264913B2
公开(公告)日：2007-09-04
申请号：US10301462
申请日：2002-11-21
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
IPC分类号： G03C1/825 , G03C1/74 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , G03F7/038 , G03F7/0382 , Y10S430/109 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.
摘要翻译：本发明涉及包含聚合物，交联剂和酸发生剂的新型抗反射涂料组合物。本发明还涉及使用该组合物的方法，特别是在193nm。本发明的聚合物含有至少一种选自结构1,2和3的单元，其中Y是1至约10个碳原子的烃基连接基团，R 1，R 1，R' 和R“独立地为氢，1至约10个碳原子的烃基，卤素，-O（CO）Z，-C（CF 3）2 Z， -C（CF 3）2（CO）OZ，-SO 2 CF 3 - ， - （CO） OZ，-SO 3 Z，-COZ，-OZ，-NZ 2，-SZ，-SO 2 Z，-NHCOZ， - NZCOZ或-SO 2 NZ 2，其中Z为H或1至约10个碳原子的烃基，n = 1-4，X为O，CO， S，COO，CH 2 O，CH 2 COO，SO 2，NH，NL，OWO，OW，W，其中L和 W独立地为1至约10个碳原子的烃基，并且m = 0-3。

3. 发明授权

US5225312A Positive photoresist containing dyes 失效
标题翻译：含正光致抗蚀剂的染料
公开(公告)号：US5225312A
公开(公告)日：1993-07-06
申请号：US739646
申请日：1991-08-02
申请人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
发明人： Sunit S. Dixit , Richard M. Lazarus , Thomas P. Carter , Joseph E. Oberlander , Andreas Goehring , Randall W. Kautz , Grieg Beltramo
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.
摘要翻译：含有碱溶性酚醛清漆树脂和醌二叠氮化物敏化剂的正型光致抗蚀剂含有下列通式的染料：其中R'为低级烷基，R“为H，烷基或CO 2 - 烷基，烷基 - CO 2 - 烷基或烷基-CO 2 - （C 1 -C 3烷基-O）n-烷基（n = 1-3），并且其中所述染料与酚醛清漆树脂/醌二叠氮化合物配方相容至至少0.1phr。染料减少反光缝。优选地，光致抗蚀剂还含有硝基萘酚染料以减少I-Line辐射的影响。

4. 发明授权

US07754414B2 Antireflective coating compositions 失效
标题翻译：防反射涂料组合物
公开(公告)号：US07754414B2
公开(公告)日：2010-07-13
申请号：US11456868
申请日：2006-07-12
申请人： Joseph E. Oberlander
发明人： Joseph E. Oberlander
IPC分类号： G03C1/00 , G03F1/00
CPC分类号： G03F7/091
摘要： Antireflective coating compositions with reduced outgassing are disclosed.
摘要翻译：公开了具有减少的除气的抗反射涂料组合物。

5. 发明授权

US06524775B1 Edge bead remover for thick film photoresists 有权
标题翻译：用于厚膜光刻胶的边缘珠去除器
公开(公告)号：US06524775B1
公开(公告)日：2003-02-25
申请号：US09693215
申请日：2000-10-20
申请人： Joseph E. Oberlander , Craig Traynor , Ernesto S. Sison , Jeff Griffin
发明人： Joseph E. Oberlander , Craig Traynor , Ernesto S. Sison , Jeff Griffin
IPC分类号： G03F716
CPC分类号： G03F7/162
摘要： An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.
摘要翻译：一种用于光刻胶组合物的边缘珠去除剂，其以表面的薄膜的形式设置，其基本上由溶剂混合物组成，所述溶剂混合物包含基于溶剂混合物的重量约50至约80份重量的至少一种二（C1- C3）烷基碳酸酯和约20至约50重量份的基于溶剂混合物的重量的环戊酮。还提供了一种处理设置在表面上的光致抗蚀剂组合物膜的方法，该方法包括使光致抗蚀剂组合物与溶剂混合物接触，其量足以在整个表面上产生基本上均匀的光致抗蚀剂组合物的膜厚度，其中溶剂混合物基于溶剂混合物的重量，包含约50至约80重量份的至少一种碳酸二（C 1 -C 3）烷基酯和约20至约50重量份，基于溶剂的重量混合物，环戊酮。

6. 发明授权

US5876897A Positive photoresists containing novel photoactive compounds 失效
标题翻译：含有新型光活性化合物的正性光致抗蚀剂
公开(公告)号：US5876897A
公开(公告)日：1999-03-02
申请号：US812542
申请日：1997-03-07
申请人： Dana L. Durham , Ping-Hung Lu , Joseph E. Oberlander , Dinesh N. Khanna
发明人： Dana L. Durham , Ping-Hung Lu , Joseph E. Oberlander , Dinesh N. Khanna
IPC分类号： C08K5/00 , C08L61/06 , C08L101/12 , G03F7/004 , G03F7/022 , G03F7/039 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/022
摘要： A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl,Y is a connecting group such as SO.sub.2, CO, O or NR',Z is a carbon containing organic ballast moiety having a molecular weight greater than about 75 and can form a bond with the connecting group,R is independently H, alkyl, alkoxy, aryl, aralkyl, halo or fluoroalkyl,m=1-3, and n.gtoreq.1;and a solvent or mixture of solvents. The invention further comprises a process for imaging the composition of this invention to give positive image. The light sensitive composition is especially useful as a positive deep-uv photoresist.
摘要翻译：一种光敏正性组合物，其包含碱溶性树脂，由结构表示的新型光敏化合物，其中X为O，S或N-R'，其中R'为H，烷基，取代的烷基，芳基或芳烷基， Y是连接基团，例如SO 2，CO，O或NR'，Z是分子量大于约75的含碳有机镇流器部分，可与连接基团形成键，R独立地为H，烷基，烷氧基，芳基，芳烷基，卤代或氟烷基，m = 1-3，n≥1; 和溶剂或溶剂混合物。本发明还包括用于对本发明的组合物进行成像以给出正像的方法。光敏组合物特别适用于正深紫外光致抗蚀剂。

7. 发明授权

US5866295A Photosensitive quinolone compounds and a process of preparation 失效
标题翻译：光敏喹诺酮类化合物及其制备方法
公开(公告)号：US5866295A
公开(公告)日：1999-02-02
申请号：US813167
申请日：1997-03-07
申请人： Joseph E. Oberlander , Dana L. Durham , Dinesh N. Khanna
发明人： Joseph E. Oberlander , Dana L. Durham , Dinesh N. Khanna
IPC分类号： C07D215/38 , G03F7/022 , G03C1/52 , C08G59/00
CPC分类号： C07D215/38 , G03F7/022
摘要： The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural, amongst others. The invention further relates to a process for making the novel photosensitive 3-diazo 2,4-quinolinedione compounds. These compounds are particularity useful as a photoactive component in a positive working photoresist composition, particularity for use as a deep ultraviolet (UV) photoresist.
摘要翻译：本发明涉及可用于各种应用的新型光敏喹诺酮化合物，特别是新颖的3-重氮2,4-喹啉二酮化合物，例如光敏涂料组合物，药物，农业等。本发明还涉及一种制备新的光敏3-重氮2,4-喹啉二酮化合物的方法。这些化合物是特别用作正性光致抗蚀剂组合物中的光活性组分，特别用作深紫外（UV）光致抗蚀剂。

8. 发明授权

US08039202B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08039202B2
公开(公告)日：2011-10-18
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/26
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

9. 发明申请

US20080014529A1 ANTIREFLECTIVE COATING COMPOSITIONS 失效
标题翻译：抗反射涂料组合物
公开(公告)号：US20080014529A1
公开(公告)日：2008-01-17
申请号：US11456868
申请日：2006-07-12
申请人： Joseph E. Oberlander
发明人： Joseph E. Oberlander
IPC分类号： G03C1/00
CPC分类号： G03F7/091
摘要： Antireflective coating compositions with reduced outgassing are disclosed.
摘要翻译：公开了具有减少的除气的抗反射涂料组合物。

10. 发明申请

US20070270625A1 Treatment of Polysilazane Waste 审中-公开
标题翻译：多硅氮烷废物处理
公开(公告)号：US20070270625A1
公开(公告)日：2007-11-22
申请号：US11419009
申请日：2006-05-18
申请人： Joshua Gurman , Joseph E. Oberlander , Bruce Kiker , Tom Carl
发明人： Joshua Gurman , Joseph E. Oberlander , Bruce Kiker , Tom Carl
IPC分类号： C21B3/06
CPC分类号： C08J11/06 , C08J2383/16 , C08K5/05 , Y02W30/701 , C08L83/16
摘要： The present invention provides for a method for treating polysilazane waste material.
摘要翻译：本发明提供了一种处理聚硅氮烷废料的方法。

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