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1. 发明申请

US20050214674A1 Positive-working photoimageable bottom antireflective coating 审中-公开
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US20050214674A1
公开(公告)日：2005-09-29
申请号：US10808884
申请日：2004-03-25
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03F7/039 , G03F7/09 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

2. 发明申请

US20080090184A1 Positive -Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面工作的Photoimageable底部防反射涂层
公开(公告)号：US20080090184A1
公开(公告)日：2008-04-17
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03F7/20
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

3. 发明申请

US20080038666A1 Positive-Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面照相底部防反射涂层
公开(公告)号：US20080038666A1
公开(公告)日：2008-02-14
申请号：US11876332
申请日：2007-10-22
申请人： Hengpeng Wu , Mark Neisser , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Hengpeng Wu , Mark Neisser , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

4. 发明申请

US20060199103A1 Process for producing an image using a first minimum bottom antireflective coating composition 审中-公开
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US20060199103A1
公开(公告)日：2006-09-07
申请号：US11416240
申请日：2006-05-02
申请人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ/2n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是第一最小底部抗反射涂层（BARC）组合物，其固体含量高达约8％固体，并且涂覆的基底的最大涂层厚度为λ/ 2n，其中λ为步骤（c）的光化辐射的波长，n是BARC的折射率组成。

5. 发明申请

US20060063105A1 Negative-working photoimageable bottom antireflective coating 审中-公开
公开(公告)号：US20060063105A1
公开(公告)日：2006-03-23
申请号：US11260761
申请日：2005-10-27
申请人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
发明人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/091
摘要： The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

6. 发明授权

US08841062B2 Positive working photosensitive material 有权
标题翻译：正面感光材料
公开(公告)号：US08841062B2
公开(公告)日：2014-09-23
申请号：US13693496
申请日：2012-12-04
申请人： Weihong Liu , Ping-Hung Lu , Medhat Toukhy , SookMee Lai , Yoshiharu Sakurai , Aritaka Hishida
发明人： Weihong Liu , Ping-Hung Lu , Medhat Toukhy , SookMee Lai , Yoshiharu Sakurai , Aritaka Hishida
IPC分类号： G03F7/00 , G03F7/26 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
摘要翻译：本文公开了包含杂环硫醇化合物或其互变异构形式的光敏组合物及其在底物上的使用方法，其可以包括亲合性底物。

7. 发明申请

US20080032229A1 BOTTOM ANTIREFLECTIVE COATINGS 审中-公开
标题翻译：底部抗反射涂层
公开(公告)号：US20080032229A1
公开(公告)日：2008-02-07
申请号：US11873522
申请日：2007-10-17
申请人： Medhat Toukhy , Joseph Oberlander
发明人： Medhat Toukhy , Joseph Oberlander
IPC分类号： G03C1/76
CPC分类号： G03F7/091
摘要： The present invention relates to bottom antireflective coatings.
摘要翻译：本发明涉及底部抗反射涂层。

8. 发明申请

US20070105040A1 Developable undercoating composition for thick photoresist layers 审中-公开
标题翻译：用于厚光致抗蚀剂层的可显影底涂层组合物
公开(公告)号：US20070105040A1
公开(公告)日：2007-05-10
申请号：US11271775
申请日：2005-11-10
申请人： Medhat Toukhy , Joseph Oberlander , Salem Mullen
发明人： Medhat Toukhy , Joseph Oberlander , Salem Mullen
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/095
摘要： The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the exposure radiation. The invention also relates to a process for imaging the undercoating composition.
摘要翻译：本发明涉及一种用于光致抗蚀剂的底涂组合物，其包含不溶于碱性显影剂水溶液但在显影前变得可溶的聚合物，以及在暴露于辐射时产生强酸的光致酸产生剂，此外，聚合物是透明的在曝光辐射下。本发明还涉及底涂组合物成像的方法。

9. 发明申请

US20050074688A1 Bottom antireflective coatings 审中-公开
标题翻译：底部防反射涂层
公开(公告)号：US20050074688A1
公开(公告)日：2005-04-07
申请号：US10677318
申请日：2003-10-03
申请人： Medhat Toukhy , Joseph Oberlander
发明人： Medhat Toukhy , Joseph Oberlander
IPC分类号： G03F7/09 , G03F7/00
CPC分类号： G03F7/091
摘要： The present invention relates to bottom antireflective coatings.
摘要翻译：本发明涉及底部抗反射涂层。

10. 发明授权

US08906594B2 Negative-working thick film photoresist 有权
标题翻译：负性厚膜光致抗蚀剂
公开(公告)号：US08906594B2
公开(公告)日：2014-12-09
申请号：US13524811
申请日：2012-06-15
申请人： Chunwei Chen , PingHung Lu , Weihong Liu , Medhat Toukhy , SangChul Kim , SookMee Lai
发明人： Chunwei Chen , PingHung Lu , Weihong Liu , Medhat Toukhy , SangChul Kim , SookMee Lai
IPC分类号： G03F7/028 , G03F7/075 , G03F7/40 , G03F7/30
CPC分类号： G03F7/028 , C08F220/18 , G03F7/027 , G03F7/033 , G03F7/0755 , G03F7/0757 , G03F7/30 , G03F7/40 , C08F2220/185 , C08F220/20 , C08F2220/281 , C08F220/06 , C08F2220/1825 , C08F212/08
摘要： Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
摘要翻译：公开了基于丙烯酸共聚物的负性厚膜光致抗蚀剂的组合物。还包括使用组合物的方法。

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