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1. 发明授权

US06844131B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US06844131B2
公开(公告)日：2005-01-18
申请号：US10042532
申请日：2002-01-09
申请人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
发明人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
IPC分类号： G03F7/11 , A61P29/00 , G03F7/004 , G03F7/039 , G03F7/09
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
摘要翻译：本发明涉及一种新颖的吸收光可成像和水性显影正性抗反射涂料组合物，其包含光酸产生剂和包含至少一个具有酸不稳定基团的单元和至少一个具有吸收发色团的单元的聚合物。本发明还涉及一种使用这种组合物的方法。本发明还涉及一种新型的吸收，可光成像和水性碱显影正性抗反射涂料组合物，其包含含有至少一个具有酸不稳定基团的单元，染料和光致酸产生剂的聚合物。本发明还涉及使用这种组合物的方法。本发明还涉及一种用正性光致抗蚀剂形成正像的新方法，以及一种新型可光成像和水性可显影正性抗反射涂料组合物，其中抗反射涂层包含含酸不稳定基团的聚合物。本发明还涉及这种组合物。本发明还涉及一种用于对可光成象抗反射涂层组合物进行成像的方法。

2. 发明授权

US07070914B2 Process for producing an image using a first minimum bottom antireflective coating composition 有权
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US07070914B2
公开(公告)日：2006-07-04
申请号：US10042878
申请日：2002-01-09
申请人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark O. Neisser , Joseph E. Oberlander , Medhat A. Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 ⁢ n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARC）组合物，并且涂覆的基材的最大涂层厚度为 $λ2n其中λ是步骤（c）的光化辐射的波长，n是BARC的折射率组成。$

3. 发明授权

US5239122A Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions 失效
标题翻译：选择的羟甲基取代的三羟基二苯甲酮及其在酚醛树脂组合物中的用途
公开(公告)号：US5239122A
公开(公告)日：1993-08-24
申请号：US953367
申请日：1992-09-30
申请人： Medhat A. Toukhy
发明人： Medhat A. Toukhy
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： A methylol-substituted trihydroxybenzophenone of the formula (I): ##STR1## This methylol-substituted trihydroxybenzophenone may be reacted with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): ##STR2## wherein R and R.sub.1 are individually selected from hydrogen, a lower alkyl group having 1 to 4 carbon atoms or a lower alkoxy group having 1 to 4 carbon atoms.
摘要翻译：式（I）的羟甲基取代的三羟基二苯甲酮：（I）在酚醛清漆树脂形成过程中或之后，该羟甲基取代的三羟基二苯甲酮可与选择的酚类单体反应，从而所述树脂具有至少一个式（II）：其中R和R 1分别选自氢，具有1至4个碳原子的低级烷基或具有1至4个碳原子的低级烷氧基。

4. 发明授权

US5219714A Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures 失效
标题翻译：选择的三羟基二苯甲酮化合物及其在光敏化合物和辐射敏感混合物中的应用
公开(公告)号：US5219714A
公开(公告)日：1993-06-15
申请号：US944621
申请日：1992-09-14
申请人： Medhat A. Toukhy , Alfred T. Jeffries, III
发明人： Medhat A. Toukhy , Alfred T. Jeffries, III
IPC分类号： C07C45/71 , C07C45/75 , C07C49/83 , C07C49/84 , G03F7/022
CPC分类号： G03F7/022 , C07C45/71 , C07C45/75 , C07C49/83 , C07C49/84
摘要： A process of developing an image-wise exposed photoresist-coated substrate comprising: coating a substrate with a positive working photoresist comprising an admixture of an alkali soluble binder resin and photoactive formula (V): ##STR1## wherein R.sub.2 is selected from the group consisting of an OD group, a halide group, a lower alkyl group having 1 or 4 carbon atoms and a lower alkoxy group having 1 to 4 carbon atoms, and D is selected from the group consisting of o-naphthoquinone diazide sulfonyl group and hydrogen; with the proviso that at least four D's are o-naphthoquinone diazide sulfonyl groups; subjecting the coating on the substrate to an image-wise exposure of radiation; and subjecting the image-wise coated substrate to a developing solution to remove the exposed areas of the radiation-exposed coating, leaving a positive image pattern.
摘要翻译：一种显影图像曝光的光致抗蚀剂涂覆的基底的方法，包括：用含有碱溶性粘合剂树脂和光敏式（V）的混合物的正性光致抗蚀剂涂覆基底：其中R 2选自由OD基团，卤化物基团，具有1或4个碳原子的低级烷基和具有1至4个碳原子的低级烷氧基组成的组，D选自邻 - 萘醌二叠氮基磺酰基和氢; 条件是至少四个D是邻萘醌二叠氮基磺酰基; 使基板上的涂层经受图像曝光的辐射; 并将成像方式涂布的基材经受显影液去除曝光后的涂层的曝光区域，留下正像。

5. 发明授权

US4992356A Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group 失效
标题翻译：用具有邻萘醌二叠氮基磺酰基的三核酚醛清漆低聚物开发辐射成像产物的方法
公开(公告)号：US4992356A
公开(公告)日：1991-02-12
申请号：US534909
申请日：1990-06-08
申请人： Alfred T. Jeffries, III , Andrew J. Blakeney , Medhat A. Toukhy
发明人： Alfred T. Jeffries, III , Andrew J. Blakeney , Medhat A. Toukhy
IPC分类号： C07C39/15 , C07C309/76 , C08G8/08 , C08G8/28 , G03F7/022
CPC分类号： G03F7/022 , C07C309/76 , C07C39/15 , C08G8/08 , C08G8/28
摘要： A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a lower alkyl group having 1-4 carbon atoms and halogen atom.
摘要翻译：式（I）的三核酚醛清漆低聚物：其中每个X选自羟基和卤化物基团，Y选自具有1-4个碳原子的低级烷基原子和卤原子。

6. 发明授权

US4957846A Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group 失效
标题翻译：辐射敏感化合物与三核酚醛清漆低聚物与邻萘醌二叠氮磺酰基的混合物
公开(公告)号：US4957846A
公开(公告)日：1990-09-18
申请号：US290009
申请日：1988-12-27
申请人： Alfred T. Jeffries, III , Andrew J. Blakeney , Medhat A. Toukhy
发明人： Alfred T. Jeffries, III , Andrew J. Blakeney , Medhat A. Toukhy
IPC分类号： C07C39/15 , C07C39/16 , C07C39/367 , C07C309/76 , C08G8/08 , C08G8/20 , C08G8/22 , C08G8/28 , C08L61/04 , C08L61/14 , C09D5/00 , C09D5/32 , C09D161/04 , C09D161/14 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： C07C39/367 , C07C309/76 , C07C39/15 , C08G8/08 , C08G8/28 , G03F7/022
摘要： A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a lower alkyl group having 1-4 carbon atoms and halogen atom.
摘要翻译：式（I）的三核酚醛清漆低聚物：其中每个X选自羟基和卤化物基团，Y选自具有1-4个碳原子的低级烷基原子和卤原子。

7. 发明授权

US5547814A O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images 失效
标题翻译：酚类化合物的O-醌二叠氮磺酸酯及其在形成正像中的应用
公开(公告)号：US5547814A
公开(公告)日：1996-08-20
申请号：US451599
申请日：1995-05-26
申请人： Andrew J. Blakeney , Arturo N. Medina , Medhat A. Toukhy , Lawrence Ferreira , Sobhy Tadros
发明人： Andrew J. Blakeney , Arturo N. Medina , Medhat A. Toukhy , Lawrence Ferreira , Sobhy Tadros
IPC分类号： G03F7/039 , C07C39/15 , C07C39/17 , C07C43/23 , C07C47/575 , C07C309/76 , C07D307/80 , C07D317/54 , C07D319/18 , C08G8/00 , C08G8/10 , G03F7/022 , G03F7/30 , G03F7/023
CPC分类号： C07C43/23 , C07C309/76 , C07C47/575 , C07C2102/10
摘要： A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formulae (IB) and (IIB): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.
摘要翻译：一种包含至少一种酚类化合物的邻醌二叠氮磺酸酯的光敏化合物，所述酯选自式（IB）和（IIB）：（ⅠB）其中光敏化合物用于辐射敏感组合物和形成正图案化图像的方法。

8. 发明授权

US5328806A Positive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancers 失效
标题翻译：使用含有二聚或三聚体芝麻酚/醛缩合产物作为灵敏度增强剂的辐射敏感混合物的正图像形成
公开(公告)号：US5328806A
公开(公告)日：1994-07-12
申请号：US134448
申请日：1993-10-12
申请人： Medhat A. Toukhy
发明人： Medhat A. Toukhy
IPC分类号： G03F7/022 , G03F7/30 , G03F7/023
CPC分类号： G03F7/0226
摘要： A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one dimeric or trimeric unit formed by the condensation reaction of an aldehyde with sesamol; the amount of said binder resin being about 60 to 95% by weight, the amount 40% of said photoactive component being about 5% to about by weight, based on the total solids content of said radiation-sensitive composition.
摘要翻译：一种辐射敏感性组合物，其包含在以下溶剂中的混合物：至少一种碱溶性粘合剂树脂，至少一种光敏化合物和通过醛与缩合反应形成的至少一种二聚体或三聚体单元的有效灵敏度增加量芝麻基于所述辐射敏感组合物的总固体含量，所述粘合剂树脂的量为约60至95重量％，所述光活性组分的40重量％为约5重量％至约重量百分比。

9. 发明授权

US5220073A Selected trihydroxybenzophenone compounds 失效
标题翻译：选择的三羟基二苯甲酮化合物
公开(公告)号：US5220073A
公开(公告)日：1993-06-15
申请号：US979849
申请日：1992-11-23
申请人： Medhat A. Toukhy , Alfred T. Jeffries, III
发明人： Medhat A. Toukhy , Alfred T. Jeffries, III
IPC分类号： C07C45/71 , C07C45/75 , C07C49/83 , C07C49/84 , G03F7/022
CPC分类号： G03F7/022 , C07C45/71 , C07C45/75 , C07C49/83 , C07C49/84
摘要： A trihydroxybenzophenone compound of the formula (I): ##STR1## wherein R.sub.1 is selected from the group consisting of hydroxyl group, halide group, a lower alkyl group having 1 to 4 carbon atoms, and a lower alkoxy group having 1 to 4 carbon atoms.
摘要翻译：式（I）的三羟基二苯甲酮化合物：其中R 1选自羟基，卤化物基团，具有1至4个碳原子的低级烷基和具有1至4个碳原子的低级烷氧基的式 4个碳原子。

10. 发明授权

US4529682A Positive photoresist composition with cresol-formaldehyde novolak resins 失效
标题翻译：具有甲酚 - 甲醛酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US4529682A
公开(公告)日：1985-07-16
申请号：US403935
申请日：1982-08-02
申请人： Medhat A. Toukhy
发明人： Medhat A. Toukhy
IPC分类号： C08G8/24 , C08K5/41 , G03F7/023 , G03C1/54 , G03F7/26
CPC分类号： G03F7/0236 , C08G8/24 , C08K5/41
摘要： Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.
摘要翻译：甲磺醛酚醛清漆树脂由含有间 - 和对甲酚或邻 - 间 - 和对羟基苯甲酸酯的混合物制成，其比例选自用于快速正性光致抗蚀剂组合物与一种或多种增感化合物的给定范围。当溶解在有机溶剂的混合物中时，光致抗蚀剂组合物适合作为薄涂层施用于基底。在涂层干燥后，涂覆的基底可以暴露于成像调制的光化辐射并在碱性溶液中显影，产生可用于多种应用的底物上的抗蚀剂的浮雕图案。

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