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1. 发明申请

US20060149042A1 Process for concentration of macromolecules 有权
标题翻译：高分子浓缩方法
公开(公告)号：US20060149042A1
公开(公告)日：2006-07-06
申请号：US10532998
申请日：2003-11-01
申请人： Konstantin Konstantinov , Huong Nguyen , Jens Vogel
发明人： Konstantin Konstantinov , Huong Nguyen , Jens Vogel
IPC分类号： C07K1/14
CPC分类号： C07K14/55 , C07K1/34 , C07K1/36
摘要： The invention provides methods for concentrating a macromolecule from a solution comprising the macromolecule and an organic polymer by first subjecting the solution to ultrafiltration to produce a first retentate solution, then adjusting the conductivity of the first retentate solution such that any protein precipitation induced by the organic polymer is essentially prevented to produce a second retentate solution, and then subjecting the second retentate solution to ultrafiltration. In a preferred embodiment, the conductivity is adjusted by diafiltration against water, suitable diluent or buffer. Preferably, the invention pertains to the concentration of solutions of native or recombinant proteins. The invention further pertains preferably to methods for the concentration of cell culture supernatant comprising a product protein and organic polymers of the Pluronic family of block co-polymers, and more preferably comprising Pluronic F-68 block co-polymer.
摘要翻译：本发明提供了从包含大分子和有机聚合物的溶液中浓缩高分子的方法，首先使溶液经过超滤以产生第一滞留物溶液，然后调节第一渗余溶液的电导率，使得由有机物诱导的任何蛋白质沉淀基本上防止聚合物产生第二滞留物溶液，然后使第二滞留物溶液经过超滤。在优选的实施方案中，通过对水，合适的稀释剂或缓冲液进行渗滤来调节电导率。优选地，本发明涉及天然或重组蛋白质的溶液的浓度。本发明还优选地涉及浓缩包含产物蛋白质的细胞培养上清液和Pluronic族嵌段共聚物的有机聚合物，更优选包含Pluronic F-68嵌段共聚物的方法。

2. 发明授权

US07674885B2 Process for concentration of macromolecules 有权
标题翻译：高分子浓缩方法
公开(公告)号：US07674885B2
公开(公告)日：2010-03-09
申请号：US10532998
申请日：2003-11-01
申请人： Konstantin Konstantinov , Huong Nguyen , Jens H. Vogel
发明人： Konstantin Konstantinov , Huong Nguyen , Jens H. Vogel
IPC分类号： A23J1/00 , C07K1/00
CPC分类号： C07K14/55 , C07K1/34 , C07K1/36
摘要： The invention provides methods for concentrating a macromolecule from a solution comprising the macromolecule and an organic polymer by first subjecting the solution to ultrafiltration to produce a first retentate solution, then adjusting the conductivity of the first retentate solution such that any protein precipitation induced by the organic polymer is essentially prevented to produce a second retentate solution, and then subjecting the second retentate solution to ultrafiltration. In a preferred embodiment, the conductivity is adjusted by diafiltration against water, suitable diluent or buffer.Preferably, the invention pertains to the concentration of solutions of native or recombinant proteins. The invention further pertains preferably to methods for the concentration of cell culture supernatant comprising a product protein and organic polymers of the PLURONIC family of nonionic block co-polymers, and more preferably comprising PLURONIC F-68 nonionic block co-polymer.
摘要翻译：本发明提供了从包含大分子和有机聚合物的溶液中浓缩高分子的方法，首先使溶液经过超滤以产生第一滞留物溶液，然后调节第一渗余溶液的电导率，使得由有机物诱导的任何蛋白质沉淀基本上防止聚合物产生第二滞留物溶液，然后使第二滞留物溶液经过超滤。在优选的实施方案中，通过对水，合适的稀释剂或缓冲液进行渗滤来调节电导率。优选地，本发明涉及天然或重组蛋白质的溶液的浓度。本发明还优选地涉及浓缩包含产物蛋白质和PLURONIC系列非离子嵌段共聚物的有机聚合物的细胞培养上清液的方法，更优选包含PLURONIC F-68非离子嵌段共聚物。

3. 发明公开

US20230285456A1 TUMOR THERAPY COMPOSITIONS AND METHODS 审中-公开
公开(公告)号：US20230285456A1
公开(公告)日：2023-09-14
申请号：US17625896
申请日：2020-07-17
申请人： Fu-Sen Liang , Wei Wang , Judy Cannon , Alex Huang , Huong Nguyen , UNM RAINFOREST INNOVATIONS , CASE WESTERN RESERVE UNIVERSITY
发明人： Fu-Sen Liang , Wei Wang , Judy Cannon , Alex Huang , Huong Nguyen
IPC分类号： A61K35/17 , C12N15/62 , A61P35/00 , A61K47/66 , A61K38/17
CPC分类号： A61K35/17 , A61K38/177 , A61K47/66 , A61P35/00 , C12N15/62
摘要： A modified T cell includes exogenous polynucleotides that encode components of a therapeutic expression system. A first exogenous polynucleotide encodes a therapeutic polypeptide operably linked to a regulatory region inducible by inducer. A second exogenous polynucleotide encodes polypeptide components of a chemical induced proximity (CIP) complex. A third exogenous polynucleotide that encodes a chimeric antigen receptor that specifically binds to an antigen.

4. 发明授权

US07914287B2 System and method of teaching and learning mathematics 有权
标题翻译：教与学数学系统与方法
公开(公告)号：US07914287B2
公开(公告)日：2011-03-29
申请号：US11955315
申请日：2007-12-12
申请人： Huong Nguyen
发明人： Huong Nguyen
IPC分类号： G09B19/02
CPC分类号： G09B1/02 , G09B19/02
摘要： Numero Cubes and the Whole Number System are disclosed. In one embodiment, the system may comprise cubes, pegs, magnets, dividers, shafts, and a number placement panel. The shafts may comprise individual marks representing the base ten number system. The system may provide a method of learning mathematics through a cognitively authentic learning experience in constructing and building numbers.
摘要翻译：数字立方体和全数字系统被公开。在一个实施例中，系统可以包括立方体，钉，磁体，分隔件，轴和数字安置面板。轴可以包括表示基础十号系统的单独标记。该系统可以通过在构建和建立数字方面的认知学习体验来提供学习数学的方法。

5. 发明申请

US20070026367A1 SYSTEM AND METHOD OF TEACHING AND LEARNING MATHEMATICS 有权
标题翻译：教学与学习数学系统与方法
公开(公告)号：US20070026367A1
公开(公告)日：2007-02-01
申请号：US11381964
申请日：2006-05-05
申请人： Huong Nguyen
发明人： Huong Nguyen
IPC分类号： G09B19/02
CPC分类号： G09B19/02 , G09B1/02
摘要： Numero Cubes and the Whole Number System are disclosed. In one embodiment, the system may comprise cubes, pegs, magnets, dividers, shafts, and a number placement panel. The shafts may comprise individual marks representing the base ten number system. The system may provide a method of learning mathematics through a cognitively authentic learning experience in constructing and building numbers.
摘要翻译：数字立方体和全数字系统被公开。在一个实施例中，系统可以包括立方体，钉，磁体，分隔件，轴和数字安置面板。轴可以包括表示基础十号系统的单独标记。该系统可以通过在构建和建立数字方面的认知正确的学习经验来提供一种学习数学的方法。

6. 发明申请

US20050241762A1 Alternating asymmetrical plasma generation in a process chamber 审中-公开
标题翻译：处理室中的交替不对称等离子体产生
公开(公告)号：US20050241762A1
公开(公告)日：2005-11-03
申请号：US11060980
申请日：2005-02-18
申请人： Alexander Paterson , Elizabeth Pavel , Valentin Todorow , Huong Nguyen , Thomas Kropewnicki , Brian Hatcher , John Holland
发明人： Alexander Paterson , Elizabeth Pavel , Valentin Todorow , Huong Nguyen , Thomas Kropewnicki , Brian Hatcher , John Holland
IPC分类号： C23F1/00 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165
摘要： Embodiments of the invention generally provide etch or CVD plasma processing methods and apparatus used to generate a uniform plasma across the surface of a substrate by modulation pulsing the power delivered to a plurality of plasma controlling devices found in a plasma processing chamber. The plasma generated and/or sustained in the plasma processing chamber is created by the one or more plasma controlling devices that are used to control, generate, enhance, and/or shape the plasma during the plasma processing steps by use of energy delivered from a RF power source. Plasma controlling devices may include, for example, one or more coils (inductively coupled plasma), one or more electrodes (capacitively coupled plasma), and/or any other energy inputting device such as a microwave source.
摘要翻译：本发明的实施例通常提供蚀刻或CVD等离子体处理方法和装置，用于通过调制脉冲输送到在等离子体处理室中发现的多个等离子体控制装置的功率来在衬底的表面上产生均匀的等离子体。在等离子体处理室中产生和/或维持的等离子体是由一个或多个等离子体控制装置产生的，这些等离子体控制装置用于在等离子体处理步骤期间通过使用从等离子体处理室输送的能量来控制，产生，增强和/或形成等离子体射频电源。等离子体控制装置可以包括例如一个或多个线圈（电感耦合等离子体），一个或多个电极（电容耦合等离子体）和/或任何其它能量输入装置，例如微波源。

7. 发明授权

US06184158B2 Inductively coupled plasma CVD 失效
公开(公告)号：US06184158B2
公开(公告)日：2001-02-06
申请号：US08772374
申请日：1996-12-23
申请人： Paul Kevin Shufflebotham , Brian McMillin , Alex Demos , Huong Nguyen , Butch Berney , Monique Ben-Dor
发明人： Paul Kevin Shufflebotham , Brian McMillin , Alex Demos , Huong Nguyen , Butch Berney , Monique Ben-Dor
IPC分类号： H01J3732
CPC分类号： H01J37/321 , C23C16/402 , C23C16/507 , H01L21/02126 , H01L21/02164 , H01L21/02211 , H01L21/02274 , H01L21/02301 , H01L21/02315 , H01L21/02362 , H01L21/31612 , H01L21/76837 , Y10S438/902 , Y10S438/906
摘要： A method of depositing a dielectric film on a substrate in a process chamber of an inductively coupled plasma-enhanced chemical vapor deposition reactor. Gap filling between electrically conductive lines on a semiconductor substrate and depositing a cap layer are achieved. Films having significantly improved physical characteristics including reduced film stress are produced by heating the substrate holder on which the substrate is positioned in the process chamber.

8. 发明授权

US6013155A Gas injection system for plasma processing 失效
标题翻译：用于等离子体处理的气体注入系统
公开(公告)号：US6013155A
公开(公告)日：2000-01-11
申请号：US885353
申请日：1997-06-30
申请人： Brian McMillin , Huong Nguyen , Michael Barnes , Tom Ni
发明人： Brian McMillin , Huong Nguyen , Michael Barnes , Tom Ni
IPC分类号： C23C16/50 , C23C16/44 , C23C16/455 , C23C16/507 , C30B25/10 , C30B25/14 , H01J37/32 , H01L21/205 , H01L21/302 , H05H1/00
CPC分类号： H01J37/3244 , C23C16/455 , C23C16/45565 , C23C16/45572 , C23C16/45578 , C23C16/507 , C30B25/105 , C30B25/14 , H01J37/321
摘要： A plasma processing system for plasma processing of substrates such as semiconductor wafers. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate support, the dielectric member forming a wall of the processing chamber, a gas supply comprising one or more injector tubes extending rectilinearly in the plasma processing chamber and having one or more orifices in a sidewall for supplying gas into the chamber, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas is supplied through orifices located outside of regions at the distal tip of the injector tubes where electric field lines are concentrated. The arrangement minimizes clogging of the orifices since the orifices are located away from areas where most build-up of process byproducts occur on the injector tube.
摘要翻译：用于诸如半导体晶片的衬底等离子体处理的等离子体处理系统。该系统包括等离子体处理室，用于在处理室内支撑衬底的衬底支撑件，具有面向衬底支撑件的内表面的电介质构件，形成处理室壁的电介质构件，包括一个或多个喷射器管在等离子体处理室中直线延伸并且在侧壁中具有一个或多个孔以将气体供应到室中;以及RF能量源，例如平面线圈，其通过电介质构件将RF能量感应耦合到腔中以激励工艺气体进入等离子体状态。气体通过位于喷射器管的远端的区域外侧的孔提供，其中电场线集中。该装置使得孔口的堵塞最小化，因为孔口远离喷射器管上发生过程副产物的最多的区域。

9. 发明授权

US5835334A Variable high temperature chuck for high density plasma chemical vapor deposition 失效
标题翻译：用于高密度等离子体化学气相沉积的可变高温卡盘
公开(公告)号：US5835334A
公开(公告)日：1998-11-10
申请号：US724005
申请日：1996-09-30
申请人： Brian McMillin , Michael Barnes , Butch Berney , Huong Nguyen
发明人： Brian McMillin , Michael Barnes , Butch Berney , Huong Nguyen
IPC分类号： H01L21/68 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , Y10T279/23
摘要： An electrostatic chuck comprises an electrode cap with a dielectric layer for attracting and holding the back side of a semiconductor wafer positioned on the top surface of the dielectric layer, and a lower electrode. The electrostatic chuck is heated by resistive heating elements attached to or embedded within the chuck. The electrostatic chuck is cooled by circulating liquid coolant through the body of the chuck. Coolant gas is provided at the back side of the semiconductor wafer to improve thermal transfer. A feedback control mechanism maintains the chuck, and consequently the wafer, at a predetermined temperature by actively controlling both the heating and the cooling functions.
摘要翻译：静电卡盘包括具有用于吸引并保持位于电介质层的顶表面上的半导体晶片的背面的电介质层的电极帽和下电极。静电卡盘被附着在卡盘内或嵌入卡盘内的电阻加热元件加热。通过将液体冷却剂循环通过卡盘的主体来冷却静电卡盘。冷却剂气体设置在半导体晶片的背面，以改善热转印。反馈控制机构通过主动地控制加热和冷却功能来将卡盘以及因此的晶片维持在预定温度。

10. 发明申请

US20120266574A1 Pre-Stretched Coreless Film Roll Products 审中-公开
标题翻译：预拉伸无芯膜卷产品
公开(公告)号：US20120266574A1
公开(公告)日：2012-10-25
申请号：US13164389
申请日：2011-06-20
申请人： Huong Nguyen , Hai Nguyen
发明人： Huong Nguyen , Hai Nguyen
IPC分类号： B65B11/02
CPC分类号： B65H75/185 , B65H75/10 , B65H2701/1944
摘要： A coreless film roll product which may be used for both hand wrapping and machines wrapping with or without retrofitting stabilizing components.
摘要翻译：无芯胶卷产品，可用于手提包装和机器包装，带或不带改装稳定组件。

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