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    • 5. 发明申请
    • Process for concentration of macromolecules
    • 高分子浓缩方法
    • US20060149042A1
    • 2006-07-06
    • US10532998
    • 2003-11-01
    • Konstantin KonstantinovHuong NguyenJens Vogel
    • Konstantin KonstantinovHuong NguyenJens Vogel
    • C07K1/14
    • C07K14/55C07K1/34C07K1/36
    • The invention provides methods for concentrating a macromolecule from a solution comprising the macromolecule and an organic polymer by first subjecting the solution to ultrafiltration to produce a first retentate solution, then adjusting the conductivity of the first retentate solution such that any protein precipitation induced by the organic polymer is essentially prevented to produce a second retentate solution, and then subjecting the second retentate solution to ultrafiltration. In a preferred embodiment, the conductivity is adjusted by diafiltration against water, suitable diluent or buffer. Preferably, the invention pertains to the concentration of solutions of native or recombinant proteins. The invention further pertains preferably to methods for the concentration of cell culture supernatant comprising a product protein and organic polymers of the Pluronic family of block co-polymers, and more preferably comprising Pluronic F-68 block co-polymer.
    • 本发明提供了从包含大分子和有机聚合物的溶液中浓缩高分子的方法,首先使溶液经过超滤以产生第一滞留物溶液,然后调节第一渗余溶液的电导率,使得由有机物诱导的任何蛋白质沉淀 基本上防止聚合物产生第二滞留物溶液,然后使第二滞留物溶液经过超滤。 在优选的实施方案中,通过对水,合适的稀释剂或缓冲液进行渗滤来调节电导率。 优选地,本发明涉及天然或重组蛋白质的溶液的浓度。 本发明还优选地涉及浓缩包含产物蛋白质的细胞培养上清液和Pluronic族嵌段共聚物的有机聚合物,更优选包含Pluronic F-68嵌段共聚物的方法。
    • 8. 发明授权
    • Gas injection system for plasma processing
    • 用于等离子体处理的气体注入系统
    • US6013155A
    • 2000-01-11
    • US885353
    • 1997-06-30
    • Brian McMillinHuong NguyenMichael BarnesTom Ni
    • Brian McMillinHuong NguyenMichael BarnesTom Ni
    • C23C16/50C23C16/44C23C16/455C23C16/507C30B25/10C30B25/14H01J37/32H01L21/205H01L21/302H05H1/00
    • H01J37/3244C23C16/455C23C16/45565C23C16/45572C23C16/45578C23C16/507C30B25/105C30B25/14H01J37/321
    • A plasma processing system for plasma processing of substrates such as semiconductor wafers. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate support, the dielectric member forming a wall of the processing chamber, a gas supply comprising one or more injector tubes extending rectilinearly in the plasma processing chamber and having one or more orifices in a sidewall for supplying gas into the chamber, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas is supplied through orifices located outside of regions at the distal tip of the injector tubes where electric field lines are concentrated. The arrangement minimizes clogging of the orifices since the orifices are located away from areas where most build-up of process byproducts occur on the injector tube.
    • 用于诸如半导体晶片的衬底等离子体处理的等离子体处理系统。 该系统包括等离子体处理室,用于在处理室内支撑衬底的衬底支撑件,具有面向衬底支撑件的内表面的电介质构件,形成处理室壁的电介质构件,包括一个或多个 喷射器管在等离子体处理室中直线延伸并且在侧壁中具有一个或多个孔以将气体供应到室中;以及RF能量源,例如平面线圈,其通过电介质构件将RF能量感应耦合到腔中以激励 工艺气体进入等离子体状态。 气体通过位于喷射器管的远端的区域外侧的孔提供,其中电场线集中。 该装置使得孔口的堵塞最小化,因为孔口远离喷射器管上发生过程副产物的最多的区域。
    • 10. 发明授权
    • Contention resolution scheme for communications systems
    • 通信系统竞争解决方案
    • US5539746A
    • 1996-07-23
    • US422750
    • 1995-04-14
    • Gang HuangMai-Huong NguyenJean-Jacques Werner
    • Gang HuangMai-Huong NguyenJean-Jacques Werner
    • G06F13/00G06F13/374G06F15/16G06F15/177H04L29/06H04J3/14G06F9/46
    • H04L29/06G06F13/374
    • Timing control resolution between two communications devices is provided by assigning each device to one of a plurality of priorities and by transmitting an identification of this priority to the other communications device. The determination of which device is the master and which device is the slave is then resolved by comparing the received and transmitted identifications from the contending devices to a predetermined ranking of identification signals. When such identifications signals are the same, each device randomly selects an identification signal from a group of such signals. Preferably this group includes all of the identification signals except that transmitted in the immediately prior contention round. The received and transmitted identifications signals from the contending devices are then compared to the predetermined ranking of identification signals. This random selection of identification signals, transmission and comparison are repeated until the transmitted and received identifications signals are different and contention is resolved or a predetermined number of contention rounds is reached.
    • 通过将每个设备分配给多个优先级中的一个并且通过将该优先级的标识发送给另一个通信设备来提供两个通信设备之间的定时控制分辨率。 然后,通过将来自竞争装置的接收和发送的标识与标识信号的预定等级进行比较,来解析哪个装置是主装置和哪个装置是从装置的确定。 当这种标识信号相同时,每个设备从一组这样的信号中随机选择一个识别信号。 优选地,该组包括除了在紧接在前的争用轮中传送的所有识别信号。 然后将来自竞争装置的接收和发送的标识信号与预定的识别信号等级进行比较。 重复这种随机选择的识别信号,传输和​​比较,直到发送和接收的标识信号不同并且争用解决或达到预定数量的争用轮次。