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    • 3. 发明授权
    • Process for producing patterned film and photosensitive resin composition
    • 图案化膜和感光性树脂组合物的制造方法
    • US08119323B2
    • 2012-02-21
    • US12304262
    • 2006-10-19
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • G03F7/00G03F7/004
    • G03F7/36G03F7/0045G03F7/038
    • A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate (2) with the photosensitive resin composition to thereby form photosensitive resin composition layer (1) of given thickness; and exposing the photosensitive resin composition layer (1) selectively through mask (3) to light so as to travel at least portion of the photosensitive resin composition at unexposed regions toward the exposed regions and further effect hardening thereof, thereby obtaining patterned film (1A) furnished on its surface with protrusion/depression pattern.
    • 一种薄膜图案的制造方法,其中在基板上形成感光性树脂组合物层,并且通过掩模选择性地曝光于光,从而获得在其表面上设置有突起和凹陷的膜图案,而不需要去除层 感光性树脂组合物在未曝光区域或曝光区域的显影; 以及用于上述制造薄膜图案的方法的感光性树脂组合物。 提供一种图案化膜的制造方法,包括以下步骤:制备在光照射时产生酸或碱并被硬化的感光性树脂组合物; 用感光性树脂组合物涂布基材(2),形成规定厚度的感光性树脂组合物层(1) 通过掩模(3)选择性地使感光性树脂组合物层(1)发光,使未曝光区域的感光性树脂组合物的至少一部分向露出区域移动,进一步进行硬化,得到图案化膜(1A) 其表面上具有突起/凹陷图案。
    • 5. 发明申请
    • PROCESS FOR PRODUCING PATTERNED FILM AND PHOTOSENSITIVE RESIN COMPOSITION
    • 生产图案薄膜和感光树脂组合物的方法
    • US20090202942A1
    • 2009-08-13
    • US12304262
    • 2006-10-19
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • G03F7/20G03F7/004
    • G03F7/36G03F7/0045G03F7/038
    • A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate (2) with the photosensitive resin composition to thereby form photosensitive resin composition layer (1) of given thickness; and exposing the photosensitive resin composition layer (1) selectively through mask (3) to light so as to travel at least portion of the photosensitive resin composition at unexposed regions toward the exposed regions and further effect hardening thereof, thereby obtaining patterned film (1A) furnished on its surface with protrusion/depression pattern.
    • 一种薄膜图案的制造方法,其中在基板上形成感光性树脂组合物层,并通过掩模选择性地曝光于光,从而获得在其表面上设置有突起和凹陷的膜图案,而不需要去除层 感光性树脂组合物在未曝光区域或曝光区域的显影; 以及用于上述制造薄膜图案的方法的感光性树脂组合物。 提供一种图案化膜的制造方法,包括以下步骤:制备在光照射时产生酸或碱并被硬化的感光性树脂组合物; 用感光性树脂组合物涂布基材(2),形成规定厚度的感光性树脂组合物层(1) 通过掩模(3)选择性地使感光性树脂组合物层(1)发光,使未曝光区域的感光性树脂组合物的至少一部分向露出区域移动,进一步进行硬化,得到图案化膜(1A) 其表面上具有突起/凹陷图案。