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    • 3. 发明专利
    • Nail polish and nail polish set
    • 指甲抛光和指甲抛光
    • JP2010195689A
    • 2010-09-09
    • JP2009038869
    • 2009-02-23
    • Toshio Enami利男 榎並
    • ENAMI TOSHIOHATA TOSHISUKEYOSHIMURA SHUICHI
    • A61K8/98A61K8/04A61Q3/00
    • PROBLEM TO BE SOLVED: To provide a nail polish which is odorless, safe and free of an organic solvent.
      SOLUTION: A fine shell powder or a water solution containing the fine shell powder is mixed with an aqueous emulsion acting as an organic binder in place of an organic solvent. This formulation gives a nail polish having no irritating smell. The nail polish is harmless, safe, and hygienic, because of the use of shells. Pregnant women, mothers raising babies, the aged, and persons having a predisposition to allergic reactions may use the nail polish with ease.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供无臭,安全且无有机溶剂的指甲油。 解决方案:将含有细壳粉末的细壳粉末或水溶液与用作有机粘合剂的水性乳液代替有机溶剂混合。 该配方给出了没有刺激性气味的指甲油。 指甲油是无害的,安全的和卫生的,因为使用贝壳。 孕妇,养育婴儿的母亲,老年人和患有过敏反应倾向的人可以轻松使用指甲油。 版权所有(C)2010,JPO&INPIT
    • 5. 发明授权
    • Process for producing patterned film and photosensitive resin composition
    • 图案化膜和感光性树脂组合物的制造方法
    • US08119323B2
    • 2012-02-21
    • US12304262
    • 2006-10-19
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • G03F7/00G03F7/004
    • G03F7/36G03F7/0045G03F7/038
    • A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate (2) with the photosensitive resin composition to thereby form photosensitive resin composition layer (1) of given thickness; and exposing the photosensitive resin composition layer (1) selectively through mask (3) to light so as to travel at least portion of the photosensitive resin composition at unexposed regions toward the exposed regions and further effect hardening thereof, thereby obtaining patterned film (1A) furnished on its surface with protrusion/depression pattern.
    • 一种薄膜图案的制造方法,其中在基板上形成感光性树脂组合物层,并且通过掩模选择性地曝光于光,从而获得在其表面上设置有突起和凹陷的膜图案,而不需要去除层 感光性树脂组合物在未曝光区域或曝光区域的显影; 以及用于上述制造薄膜图案的方法的感光性树脂组合物。 提供一种图案化膜的制造方法,包括以下步骤:制备在光照射时产生酸或碱并被硬化的感光性树脂组合物; 用感光性树脂组合物涂布基材(2),形成规定厚度的感光性树脂组合物层(1) 通过掩模(3)选择性地使感光性树脂组合物层(1)发光,使未曝光区域的感光性树脂组合物的至少一部分向露出区域移动,进一步进行硬化,得到图案化膜(1A) 其表面上具有突起/凹陷图案。
    • 7. 发明申请
    • PROCESS FOR PRODUCING PATTERNED FILM AND PHOTOSENSITIVE RESIN COMPOSITION
    • 生产图案薄膜和感光树脂组合物的方法
    • US20090202942A1
    • 2009-08-13
    • US12304262
    • 2006-10-19
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • Hiroji FukuiKenichi AokiKunihiro IchimuraMinoru SuezakiToshio EnamiHideaki IshizawaTakao UnateHiroshi Kobayashi
    • G03F7/20G03F7/004
    • G03F7/36G03F7/0045G03F7/038
    • A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate (2) with the photosensitive resin composition to thereby form photosensitive resin composition layer (1) of given thickness; and exposing the photosensitive resin composition layer (1) selectively through mask (3) to light so as to travel at least portion of the photosensitive resin composition at unexposed regions toward the exposed regions and further effect hardening thereof, thereby obtaining patterned film (1A) furnished on its surface with protrusion/depression pattern.
    • 一种薄膜图案的制造方法,其中在基板上形成感光性树脂组合物层,并通过掩模选择性地曝光于光,从而获得在其表面上设置有突起和凹陷的膜图案,而不需要去除层 感光性树脂组合物在未曝光区域或曝光区域的显影; 以及用于上述制造薄膜图案的方法的感光性树脂组合物。 提供一种图案化膜的制造方法,包括以下步骤:制备在光照射时产生酸或碱并被硬化的感光性树脂组合物; 用感光性树脂组合物涂布基材(2),形成规定厚度的感光性树脂组合物层(1) 通过掩模(3)选择性地使感光性树脂组合物层(1)发光,使未曝光区域的感光性树脂组合物的至少一部分向露出区域移动,进一步进行硬化,得到图案化膜(1A) 其表面上具有突起/凹陷图案。