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1. 发明授权

US07356177B2 Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus 有权
标题翻译：基于该方法和装置的缺陷图像分类方法和装置以及半导体器件制造方法
公开(公告)号：US07356177B2
公开(公告)日：2008-04-08
申请号：US11506310
申请日：2006-08-17
申请人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiko Ozawa , Toshiei Kurosaki , Seiji Isogai
发明人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiko Ozawa , Toshiei Kurosaki , Seiji Isogai
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object. Next the defect images are classified into a plurality of categories and at least two information items for example, a defect distribution diagram showing locations of defects in the inspected object, information associated with a category of the plurality of categories, and a defect size distribution, are displayed.
摘要翻译：根据本发明，提供包括用于分类和显示图像的方法和装置的技术。在本发明的一个实施例中，提供了使用检查对象的缺陷图像分类方法。该方法包括从至少一个检查对象获得的缺陷图像。接下来，一组缺陷图像被分类为具有特征的指定类别。故障图像根据特征进行显示，然后显示。缺陷图像的布置也可以基于每个缺陷图像的评估值。另一实施例提供使用检查对象的缺陷图像分类方法。从至少一个检查对象获得缺陷图像。接下来，将缺陷图像分为多个类别和至少两个信息项，例如，示出被检查对象中的缺陷的位置的缺陷分布图，与多个类别的类别相关联的信息以及缺陷尺寸分布，被显示。

2. 发明授权

US06476388B1 Scanning electron microscope having magnification switching control 有权
标题翻译：具有倍率切换控制的扫描电子显微镜
公开(公告)号：US06476388B1
公开(公告)日：2002-11-05
申请号：US09421093
申请日：1999-10-19
申请人： Ryo Nakagaki , Yuji Takagi , Atsushi Shimoda , Kenji Obara , Yasuhiko Ozawa , Hideka Bamba , Seiji Isogai , Kenji Watanabe , Chie Shishido , Toshiei Kurosaki
发明人： Ryo Nakagaki , Yuji Takagi , Atsushi Shimoda , Kenji Obara , Yasuhiko Ozawa , Hideka Bamba , Seiji Isogai , Kenji Watanabe , Chie Shishido , Toshiei Kurosaki
IPC分类号： G21K700
CPC分类号： G01N23/225 , H01J37/222 , H01J37/265 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The invention is a scanning electron microscope including a switching control unit for controlling to switch at least scanning unit to switch a digital image signal of a low magnification based on a wide image taking field of view to and from a digital image signal of a high magnification based on a narrow image taking field of view from an A/D conversion unit and a beam spot diameter control unit for controlling to switch a spot diameter of electron beam on a surface of an object substrate in controlling to switch the signals by the switching control unit and a defect portion analyzing method using the scanning electron microscope.
摘要翻译：本发明是一种扫描电子显微镜，其特征在于，具备切换控制部，该切换控制部基于与高倍率的数字图像信号相对应的宽拍摄视场，至少切换扫描部，切换低倍率的数字图像信号基于来自A / D转换单元的窄图像拍摄视场和光束光斑直径控制单元，用于控制通过切换控制切换信号来控制在对象基板的表面上切换电子束的光斑直径单元和使用扫描电子显微镜的缺陷部分析方法。

3. 发明申请

US20060274933A1 Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus 有权
标题翻译：基于该方法和装置的缺陷图像分类方法和装置以及半导体器件制造方法
公开(公告)号：US20060274933A1
公开(公告)日：2006-12-07
申请号：US11506310
申请日：2006-08-17
申请人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
发明人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object. Next the defect images are classified into a plurality of categories and at least two information items for example, a defect distribution diagram showing locations of defects in the inspected object, information associated with a category of the plurality of categories, and a defect size distribution, are displayed.
摘要翻译：根据本发明，提供了包括用于分类和显示图像的方法和装置的技术。在本发明的一个实施例中，提供了使用检查对象的缺陷图像分类方法。该方法包括从至少一个检查对象获得的缺陷图像。接下来，一组缺陷图像被分类为具有特征的指定类别。故障图像根据特征进行显示，然后显示。缺陷图像的布置也可以基于每个缺陷图像的评估值。另一实施例提供使用检查对象的缺陷图像分类方法。从至少一个检查对象获得缺陷图像。接下来，将缺陷图像分为多个类别和至少两个信息项，例如，示出被检查对象中的缺陷的位置的缺陷分布图，与多个类别的类别相关联的信息以及缺陷尺寸分布，被显示。

4. 发明授权

US07113628B1 Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus 有权
公开(公告)号：US07113628B1
公开(公告)日：2006-09-26
申请号：US09716077
申请日：2000-11-17
申请人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
发明人： Kenji Obara , Yuji Takagi , Ryo Nakagaki , Yasuhiro Ozawa , Toshiei Kurosaki , Seiji Isogai
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： According to the present invention, techniques including a method and apparatus for classifying and displaying images are provided. In an embodiment of the present invention a defect image classification method using inspected objects is provided. The method includes defect images obtained from at least one inspected object. Next a set of defect images is classified into a specified category, which has a feature. The defect images are arranged for display according to the feature and then displayed. The arranging of the defect images may also be based on an evaluation value for each defect image. Another embodiment provides a defect image classification method using inspected objects. Defect images are obtained from at least one inspected object. Next the defect images are classified into a plurality of categories and at least two information items for example, a defect distribution diagram showing locations of defects in the inspected object, information associated with a category of the plurality of categories, and a defect size distribution, are displayed.

5. 发明授权

US06553323B1 Method and its apparatus for inspecting a specimen 有权
标题翻译：检测样本的方法及其装置
公开(公告)号：US06553323B1
公开(公告)日：2003-04-22
申请号：US09661182
申请日：2000-09-13
申请人： Kenji Obara , Yuji Takagi , Toshifumi Honda , Ryo Nakagaki , Toshiei Kurosaki , Yasuhiko Ozawa
发明人： Kenji Obara , Yuji Takagi , Toshifumi Honda , Ryo Nakagaki , Toshiei Kurosaki , Yasuhiko Ozawa
IPC分类号： G01B528
CPC分类号： H01L22/20 , G01N21/88 , G01N2021/8861
摘要： The present invention improves inspection efficiency in detailed inspections of defects performed based on inspection information from a defect inspection. Particles and defects are detected by a defect inspection device 1. If the cause of the particles and defects are to be determined by performing a detailed inspection with a details inspection device 3 using an SEM or the like, attributes are determined on the particles and defects detected by the defects inspection device 1 before the detailed inspection is performed. The attributes are determined with an attribute inspection device using an optical microscope or the like. Based on these attributes, the defects and particles are separated into those that require detailed inspection and those that do not require detailed inspection or that cannot be inspected in detail. A details inspection device 3 is used to inspect the particles and defects requiring detailed inspection.
摘要翻译：本发明基于来自缺陷检查的检查信息进行的缺陷的详细检查，提高了检查效率。通过缺陷检查装置1检测颗粒和缺陷。如果通过使用SEM等的细节检查装置3进行详细检查来确定颗粒和缺陷的原因，则根据颗粒和缺陷确定属性在执行详细检查之前由缺陷检查装置1检测到。属性由使用光学显微镜等的属性检查装置确定。基于这些属性，缺陷和颗粒被分成需要详细检查的那些和不需要详细检查或者不能被详细检查的那些。细节检查装置3用于检查需要详细检查的颗粒和缺陷。

6. 发明申请

US20060100804A1 Method for inspecting defect and system therefor 有权
公开(公告)号：US20060100804A1
公开(公告)日：2006-05-11
申请号：US11302145
申请日：2005-12-14
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G06F19/00
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

7. 发明授权

US07558683B2 Method for inspecting defect and system therefor 有权
公开(公告)号：US07558683B2
公开(公告)日：2009-07-07
申请号：US11976015
申请日：2007-10-19
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G01B5/28 , G06F19/00
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

8. 发明授权

US07305314B2 Method for inspecting defect and system therefor 有权
标题翻译：检查缺陷的方法和系统
公开(公告)号：US07305314B2
公开(公告)日：2007-12-04
申请号：US11302145
申请日：2005-12-14
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G06F19/00
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.
摘要翻译：基于检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测到的缺陷。利用这些选择的缺陷作为指标，观察装置检测并观察缺陷。此外，创建用于表示两个装置之间的缺陷位置坐标中的相关关系的坐标变换公式，观察装置转换缺陷位置坐标以观察缺陷。

9. 发明申请

US20080059083A1 Method for inspecting defect and system therefor 有权
标题翻译：检查缺陷的方法和系统
公开(公告)号：US20080059083A1
公开(公告)日：2008-03-06
申请号：US11976015
申请日：2007-10-19
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G01B11/30
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.
摘要翻译：基于检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测到的缺陷。利用这些选择的缺陷作为指标，观察装置检测并观察缺陷。此外，创建用于表示两个装置之间的缺陷位置坐标中的相关关系的坐标变换公式，观察装置转换缺陷位置坐标以观察缺陷。

10. 发明授权

US07010447B2 Method for inspecting defect and system therefor 有权
公开(公告)号：US07010447B2
公开(公告)日：2006-03-07
申请号：US10888021
申请日：2004-07-12
申请人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
发明人： Takanori Ninomiya , Seiji Isogai , Shigeru Matsui , Toshiei Kurosaki
IPC分类号： G01B5/28 , G01B5/30 , G06F19/00
CPC分类号： H01L21/67288 , G01N21/9501 , G01N23/22 , G01N2021/8861 , G06T7/0004 , G06T7/73 , G06T2207/30148 , H01J37/28 , H01J2237/24592
摘要： Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

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