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    • 1. 发明授权
    • X-ray localizer light system
    • X光定位器灯系统
    • US06779920B2
    • 2004-08-24
    • US09683895
    • 2002-02-28
    • Ljubisa Dragoljub StevanovicEugene George OlczakFrank Jacob John MuellerDietmar Karl Sundermann
    • Ljubisa Dragoljub StevanovicEugene George OlczakFrank Jacob John MuellerDietmar Karl Sundermann
    • G21K700
    • G03B42/08
    • An X-ray localizer light system comprises: a long life X-ray localizer light source; an optical concentrator, the light source being situated at a first focal spot, the optical concentrator being configured for concentrating X-ray localizer light from the light source to a second focal spot; and an opaque shield having an aperture therein situated proximate to the second focal spot and being of such a geometrical shape so as to maximize light throughput while meeting light field edge contrast requirements. In another light system, the optical concentrator comprises a reflector comprising a quasi-ellipsoidal portion within which the light source is situated, a cylindrical portion situated between the quasi-ellipsoidal portion and the shield for reflecting stray light, a back reflector portion situated proximate to the shield, and a centrally-mounted portion situated between the aperture and the light source for directing back-reflected light in the direction of the aperture.
    • X射线定位器光系统包括:长寿命X射线定位器光源; 所述光源位于第一焦斑处,所述光集中器被配置为将来自所述光源的X射线定位器光聚焦到第二焦点; 以及不透明屏蔽,其中具有孔,其中位于第二焦点附近并且具有这种几何形状,以便在满足光场边缘对比度要求的同时最大化光通量。 在另一个光系统中,光集中器包括反射器,该反射器包括准椭圆体部分,光源位于该准椭圆体部分内,位于准椭球部分和屏蔽之间的圆柱部分用于反射杂散光, 屏蔽件和位于孔和光源之间的中心安装部分,用于沿着孔的方向引导反射反射光。
    • 2. 发明授权
    • Positron lifetime spectrometer using a DC positron beam
    • 正电子寿命光谱仪使用直流正电子束
    • US06635871B2
    • 2003-10-21
    • US09894776
    • 2001-06-28
    • Jun XuJeremy Moxom
    • Jun XuJeremy Moxom
    • G21K700
    • G01N23/22
    • An entrance grid is positioned in the incident beam path of a DC beam positron lifetime spectrometer. The electrical potential difference between the sample and the entrance grid provides simultaneous acceleration of both the primary positrons and the secondary electrons. The result is a reduction in the time spread induced by the energy distribution of the secondary electrons. In addition, the sample, sample holder, entrance grid, and entrance face of the multichannel plate electron detector assembly are made parallel to each other, and are arranged at a tilt angle to the axis of the positron beam to effectively separate the path of the secondary electrons from the path of the incident positrons.
    • 入射栅格位于DC光束正电子寿命光谱仪的入射光束路径中。 样品和入口网格之间的电位差提供了初级正电子和二次电子的同时加速。 结果是由二次电子的能量分布引起的时间扩展的减少。 此外,多通道板电子检测器组件的样品,样品保持器,入口格栅和入射面彼此平行,并且以与正电子束的轴成倾斜的角度布置,以有效地分离 来自事件正电子路径的二次电子。
    • 6. 发明授权
    • Autoadjusting electron microscope
    • 自动调整电子显微镜
    • US06570156B1
    • 2003-05-27
    • US09571976
    • 2000-05-16
    • Ruriko TsunetaMasanari KoguchiIsao NagaokiHiroyuki Kobayashi
    • Ruriko TsunetaMasanari KoguchiIsao NagaokiHiroyuki Kobayashi
    • G21K700
    • H01J37/26H01J37/28H01J2237/216H01J2237/221H01J2237/2487Y10S977/869Y10S977/881
    • An autoadjusting electron microscope in which an image processor derives a third image constituting an analysis image from first and second images of a specimen by Fourier-transforming the first and second images to produce Fourier-transformed first and second images, computing a phase variant image from the Fourier-transformed first and second images, and Fourier-transforming or inverse Fourier-transforming the phase variant image to obtain the third image. A computer determines an amount of displacement between the first image and the second image based on a peak appearing in the third image. An identifier determines whether a consistency between the first image and the second image is within a predetermined range based on a magnitude of the peak appearing in the third image. A transformer transforms results obtained by the computer and the identifier into an amount of defocus of an electron lens relative to the specimen.
    • 一种自动调整电子显微镜,其中图像处理器通过对第一和第二图像进行傅立叶变换来产生构图分析图像的第一图像和第二图像,以产生经傅立叶变换的第一和第二图像,计算来自 傅里叶变换的第一和第二图像,以及傅里叶变换或逆傅里叶变换相变图像以获得第三图像。 计算机基于出现在第三图像中的峰值来确定第一图像和第二图像之间的位移量。 标识符基于出现在第三图像中的峰值的大小来确定第一图像和第二图像之间的一致性是否在预定范围内。 变压器将由计算机和标识符获得的结果转换成电子透镜相对于样本的散焦量。
    • 8. 发明授权
    • Method for detecting over-etch defects
    • 检测过蚀刻缺陷的方法
    • US06727501B1
    • 2004-04-27
    • US10052852
    • 2001-11-02
    • Yong-Hui FanJay Rathert
    • Yong-Hui FanJay Rathert
    • G21K700
    • G01N23/2251
    • An over-etched defect in a semiconductor wafer is detected by applying an electrical field to the contacts in a first area and comparing the intensity measured with the intensity from a reference area. In one embodiment, one of the contacts in each of the first and reference areas is a gate contact in an MOS device and a second contact is either a source or drain contact. The selected charging field forward biases the pn junctions between the source and drain regions and the well in which they are formed. As a result, defects caused by gate contacts shorted to one of the source and drain contacts are visible using voltage contrast imaging techniques.
    • 通过对第一区域中的触点施加电场并将测量的强度与来自参考区域的强度进行比较来检测半导体晶片中的过蚀刻缺陷。 在一个实施例中,第一参考区域和参考区域中的每一个中的触点之一是MOS器件中的栅极接触,第二触点是源极或漏极接触。 所选择的充电场向前偏置源极和漏极区域之间的pn结以及形成它们的阱。 结果,使用电压对比成像技术可以看到由栅极接触短路到源触点和漏极触点之一的缺陷。
    • 9. 发明授权
    • Scanning probe microscope
    • 扫描探针显微镜
    • US06710339B2
    • 2004-03-23
    • US09814520
    • 2001-03-22
    • Akira EgawaTatsuya Miyatani
    • Akira EgawaTatsuya Miyatani
    • G21K700
    • G01N23/04G01Q30/06G01Q60/10G01Q60/24Y10S977/85Y10S977/851Y10S977/86
    • A scanning probe microscope capable of producing high precision sample images repeatedly has a driving unit for driving a sample or probe relative to the other microscopically in X, Y and Z directions, displacement detectors for measuring displacement of the driving unit in each of the X, Y and Z directions, and an image correction unit for storing output values of the displacement detectors as a data array for each of the X, Y and Z directions, performing a correction process on the data arrays, and producing an image of the sample based on the corrected data. A controller controls a measuring unit and output values of the displacement detectors are supplied to an operation/display unit connected to the controller and then supplied to an image correction device for image correction.
    • 能够重复地产生高精度样本图像的扫描探针显微镜具有用于在X,Y和Z方向上相对于其他显微镜驱动样品或探针的驱动单元,用于测量驱动单元在X,Y和Z方向上的位移的位移检测器, Y方向和Z方向,以及图像校正单元,用于存储位移检测器的输出值作为X,Y和Z方向中的每一个的数据阵列,对数据阵列执行校正处理,并且基于样本的图像生成 对纠正的数据。 控制器控制测量单元,并且将位移检测器的输出值提供给连接到控制器的操作/显示单元,然后提供给用于图像校正的图像校正装置。
    • 10. 发明授权
    • Selective deposition of a particle beam based on charging characteristics of a sample
    • 基于样品的充电特性选择性沉积粒子束
    • US06608305B1
    • 2003-08-19
    • US09629409
    • 2000-08-01
    • Wong Wai KinJacob C. H. PhangJohn Thong
    • Wong Wai KinJacob C. H. PhangJohn Thong
    • G21K700
    • H01J37/28H01J37/222H01J2237/226
    • A method of preparation of a map of areas on a sample that collects charge, and a method for using the map to selectively scan and modulate the intensity of the electron beam of a SEM so as to discriminate between the charging and non-charging areas of the sample. To generate the charging map, an image is first checked for saturation. The frame for the image is acquired by using digital scan control coupled with digital acquisition of the secondary electron detector signal. The next step is to perform a “fast scan” where the first frame is taken at the maximum frame rate that the system is capable of. A fast scan does not allow time for significant charge to collect on surfaces, and this provides a base level to subtract from a slower scan that allows charge to accumulate. Areas where the difference between the two is larger indicate areas of charge collection. A “slow scan” is then performed. The frames are then subtracted pixel-by-pixel in order to isolate the charging component of the image. After the pixel-by-pixel subtraction, the charging map is created. To obtain a more ideal charging map, further image processing is performed to reduce the noise level as well as to merge pixels together to form a fuller representation of a charging feature. The selective deposition process for charging reduction is accomplished by modulating the electron beam intensity to adjust the dosage on a sample based on the charging map. The total charge build-up on the charging areas is controlled by depositing the beam on the charging areas only on selected scans. The non-charging areas are preferably exposed to the beam during every scan, which, together with averaging performed using a plurality of scans, maximizes the S/N (signal-to-noise) ratio.
    • 一种制备收集电荷的样品上的区域的图的方法,以及使用该图来选择性地扫描和调制SEM的电子束的强度的方法,以区分充电区域和非充电区域 例子。 要生成充电图,首先检查图像的饱和度。 通过使用与二次电子检测器信号的数字采集相结合的数字扫描控制来获取图像的帧。 下一步是执行“快速扫描”,其中以系统能够实现的最大帧速率拍摄第一帧。 快速扫描不允许在表面上收集大量电荷的时间,这提供了从允许电荷累积的较慢扫描中减去的基准电平。 两者之间差异较大的地区表明收费领域。 然后执行“慢扫描”。 然后逐帧减去帧以隔离图像的计费组件。 逐像素减法之后,创建充电图。为了获得更理想的充电图,执行进一步的图像处理以降低噪声水平以及将像素合并在一起以形成充电特征的更充分的表示。 用于充电还原的选择性沉积方法是通过调节电子束强度来实现的,以根据充电图调整样品上的剂量。 充电区域上的总电荷积聚通过仅在所选择的扫描上将光束放置在充电区域上来控制。 在每次扫描期间,非充电区域优选地暴露于光束,其与使用多个扫描进行的平均一起使S / N(信噪比)最大化。