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1. 发明申请

US20100102224A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20100102224A1
公开(公告)日：2010-04-29
申请号：US12651209
申请日：2009-12-31
申请人： Atsushi TAKANE , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Atsushi TAKANE , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译：一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

2. 发明授权

US07652249B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07652249B2
公开(公告)日：2010-01-26
申请号：US11699065
申请日：2007-01-29
申请人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
摘要翻译：一种带电粒子束装置，用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息，测量从样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

3. 发明授权

US07352890B2 Method for analyzing circuit pattern defects and a system thereof 失效
标题翻译：电路图形缺陷分析方法及其系统
公开(公告)号：US07352890B2
公开(公告)日：2008-04-01
申请号：US11356210
申请日：2006-02-17
申请人： Atsushi Shimoda , Ichirou Ishimaru , Yuji Takagi , Takuo Tamura , Yuichi Hamamura , Kenji Watanabe , Yasuhiko Ozawa , Seiji Isogai
发明人： Atsushi Shimoda , Ichirou Ishimaru , Yuji Takagi , Takuo Tamura , Yuichi Hamamura , Kenji Watanabe , Yasuhiko Ozawa , Seiji Isogai
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148 , H01L22/20
摘要： A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.
摘要翻译：一种用于分析电子电路图案缺陷的系统，包括：将结构缺陷的位置信息与电气故障的位置信息进行比较，并提取在结构缺陷和电气故障之间具有共同位置信息的证实缺陷; 基于预先存储的分类规则将提取的确证缺陷的图像分类为关键缺陷图像和非关键缺陷图像，该分类规则通过参考缺陷图像，缺陷位置信息和执行电子化的结果来定义关键和非关键缺陷测试; 通过校正显示在屏幕上的分类缺陷图像的分类来修改预先存储的分类规则; 并对每个后续对象重复操作，其中对于被检查的每个当前对象，使用关于先前对象的经修改的预先存储的分类规则作为关于本对象的操作的预先存储的分类规则。

4. 发明授权

US07235782B2 Semiconductor inspection system 有权
标题翻译：半导体检测系统
公开(公告)号：US07235782B2
公开(公告)日：2007-06-26
申请号：US10082286
申请日：2002-02-26
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： H01J37/28
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.
摘要翻译：实现了高吞吐量的无操作员和全自动半导体检测系统。捕获和检查所需的所有条件都是从CAD数据等设计信息生成的。为了在条件下进行实际检查，半导体检查系统由用于从设计信息产生捕获和检查所需的所有条件的导航系统和用于实际执行捕获和检查的扫描电子显微镜系统组成。此外，在进行设计数据和SEM图像之间的匹配处理的情况下，通过使用根据多个方向的边缘信息和平滑来校正变形部分。此外，将与检测位置对应的SEM图像重新登记为模板，由此进行匹配处理。

5. 发明申请

US20060140472A1 Method for analyzing circuit pattern defects and a system thereof 失效
标题翻译：电路图形缺陷分析方法及其系统
公开(公告)号：US20060140472A1
公开(公告)日：2006-06-29
申请号：US11356210
申请日：2006-02-17
申请人： Atsushi Shimoda , Ichirou Ishimaru , Yuji Takagi , Takuo Tamura , Yuichi Hamamura , Kenji Watanabe , Yasuhiko Ozawa , Seiji Isogai
发明人： Atsushi Shimoda , Ichirou Ishimaru , Yuji Takagi , Takuo Tamura , Yuichi Hamamura , Kenji Watanabe , Yasuhiko Ozawa , Seiji Isogai
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148 , H01L22/20
摘要： A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.
摘要翻译：一种用于分析电子电路图案缺陷的系统，包括：将结构缺陷的位置信息与电气故障的位置信息进行比较，并提取在结构缺陷和电气故障之间具有共同位置信息的证实缺陷; 基于预先存储的分类规则将提取的确证缺陷的图像分类为关键缺陷图像和非关键缺陷图像，该分类规则通过参考缺陷图像，缺陷位置信息和执行电子化的结果来定义关键和非关键缺陷测试; 通过校正显示在屏幕上的分类缺陷图像的分类来修改预先存储的分类规则; 并对每个后续对象重复操作，其中对于被检查的每个当前对象，使用关于先前对象的经修改的预先存储的分类规则作为关于本对象的操作的预先存储的分类规则。

6. 发明申请

US20060097158A1 Scanning electron microscope 有权
公开(公告)号：US20060097158A1
公开(公告)日：2006-05-11
申请号：US11292002
申请日：2005-12-02
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

7. 发明授权

US07026615B2 Semiconductor inspection system 有权
公开(公告)号：US07026615B2
公开(公告)日：2006-04-11
申请号：US10365383
申请日：2003-02-13
申请人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
发明人： Atsushi Takane , Haruo Yoda , Shoji Yoshida , Mitsuji Ikeda , Yasuhiko Ozawa
IPC分类号： G21K7/00
CPC分类号： H01J37/28
摘要： An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

8. 发明申请

US20050151078A1 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor 有权
标题翻译：用于确定样品和带电粒子束装置的凹陷/突起的方法
公开(公告)号：US20050151078A1
公开(公告)日：2005-07-14
申请号：US11056191
申请日：2005-02-14
申请人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
发明人： Atsushi Takane , Satoru Yamaguchi , Osamu Komuro , Yasuhiko Ozawa , Hideo Todokoro
IPC分类号： G01B15/04 , G01B15/08 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/2815
摘要： A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.
摘要翻译：用于确定凹陷/突起的方法，特别是用于形成在样本上的线和空间图案及其装置。扫描带电粒子束的方向与带电粒子束的原始光轴倾斜，或者样品台倾斜，测量带电粒子束的扫描方向上的检测信号的变宽，比较加宽其中当带电粒子束的扫描方向平行于带电粒子束的原始光轴时，并且基于增宽的增加/减小来确定扫描部分的凹陷/突起。

9. 发明授权

US4844077A NMR imaging method 失效
标题翻译： NMR成像方法
公开(公告)号：US4844077A
公开(公告)日：1989-07-04
申请号：US170695
申请日：1988-03-14
申请人： Koichi Sano , Tetsuo Yokoyama , Ryuzaburo Takeda , Yasuhiko Ozawa , Shinichi Sato , Hideaki Koizumi
发明人： Koichi Sano , Tetsuo Yokoyama , Ryuzaburo Takeda , Yasuhiko Ozawa , Shinichi Sato , Hideaki Koizumi
IPC分类号： G01F1/716 , G01R33/563
CPC分类号： G01F1/716 , G01R33/56308 , G01R33/56316
摘要： A slice selection gradient magnetic field used in a pulse sequence for generating a spin echo signal is applied in such a fashion that its polarity at the time of a 90.degree. pulse becomes opposite to the one at the time of 180 .degree. pulse, in order to expand a dynamic range of blood flow speed measurement. When the blood flow speed contains a component in a slice vertical direction, the gradient magnetic field in the slice vertical direction is adjusted so that the phase changes of two sets of flow encoded pulses contained in the slice vertical direction are opposite to each other.The flow speed in the direction of the readout gradient magnetic field, which is a lateral direction of the slice plane, is purely measured by cancelling influences of the flow in the slice vertical direction.
摘要翻译：施加用于产生自旋回波信号的脉冲序列中的切片选择梯度磁场，使得其在90度脉冲时的极性与180度脉冲时的极性相反，以便扩大血流速度测量的动态范围。当血流速度包含切片垂直方向上的分量时，调整切片垂直方向上的梯度磁场，使得包含在切片垂直方向上的两组流动编码脉冲的相位变化彼此相反。通过消除切片垂直方向上的流动的影响，纯粹地测量作为切片平面的横向的读出梯度磁场的方向上的流速。

10. 发明授权

US4681422A Paper supply device for an electrostatic photographic printer 失效
标题翻译：静电照相打印机供纸装置
公开(公告)号：US4681422A
公开(公告)日：1987-07-21
申请号：US791433
申请日：1985-10-25
申请人： Harutaro Oba , Yasuhiko Ozawa , Yasuyoshi Yamaguchi , Osamu Mimoto
发明人： Harutaro Oba , Yasuhiko Ozawa , Yasuyoshi Yamaguchi , Osamu Mimoto
IPC分类号： G03G15/00 , G03G21/18
CPC分类号： G03G15/6502 , G03G21/1628 , G03G21/1647 , G03G2221/1651 , G03G2221/1654 , G03G2221/1657 , G03G2221/1672 , G03G2221/1684 , G03G2221/1687 , G03G2221/183
摘要： A paper supply device for an electrostatic photographic printer which can significantly reduce the area for installation of the printer. A housing of the printer includes a base and a cover connected for pivotal motion in a vertical plane relative to each other. A picture image forming means including a photosensitive member and so on is mounted on the base. A paper supply cassette is mounted on the cover. Paper is drawn out from the paper supply cassette by means of a paper supply roller and then guided to the picture image forming means by a paper guide which includes a guide plate mounted on the cover and another guide plate mounted on the base and disposed in opposing relationship to the guide plate on the cover. A gear wheel connected to the paper supply roll is meshed, when the cover is closed, with another driving gear wheel mounted on the base and connected to a motor. An engaging member is also provided on the cover and urged to engage with and hold the paper supply cassette from dropping off the cover.

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