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1. 发明授权

US4744047A Pattern test apparatus including a plurality of pattern generators 失效
标题翻译：图案测试装置，包括多个图案发生器
公开(公告)号：US4744047A
公开(公告)日：1988-05-10
申请号：US793219
申请日：1985-10-31
申请人： Keiichi Okamoto , Toshimitsu Hamada , Mineo Nomoto
发明人： Keiichi Okamoto , Toshimitsu Hamada , Mineo Nomoto
IPC分类号： G06K9/00 , G01R31/28 , G06F11/00 , G06F15/70
CPC分类号： G01R31/281
摘要： An apparatus for testing printed wiring patterns for use in combination with an apparatus including a plurality of dedicated pattern generators for generating arcuate wiring patterns. In contrast to the conventional LSI pattern inspection effected with design data being inputted, the apparatus can inspect the pattern including curved portions peculiar to the printed wiring pattern. Although the conventional LSI inspection technique involves an impracticably increased amount of design data, the invention allows the test or inspection to be performed at a high speed with an improved reliability and can be applied to the inspection of any pattern including arcuate patterns. By inputting graphic data in conformance with the order for generating patterns, pattern generation can be accomplished not only through ordinary raster scan but also by other various scanning methods.
摘要翻译：一种用于测试印刷布线图案的装置，用于与包括用于产生弓形布线图案的多个专用图案发生器的装置组合使用。与通过输入设计数据进行的常规LSI图案检查相反，该设备可以检查包括印刷布线图案特有的弯曲部分的图案。虽然传统的LSI检测技术涉及到不切实际地增加的设计数据量，但是本发明允许以高速度提高测试或检查的可靠性，并且可以应用于包括弧形图案的任何图案的检查。通过根据生成图案的顺序输入图形数据，不仅可以通过普通光栅扫描也可以通过其他各种扫描方法来实现图案生成。

2. 发明授权

US4776023A Pattern inspection method 失效
标题翻译：图案检验方法
公开(公告)号：US4776023A
公开(公告)日：1988-10-04
申请号：US850681
申请日：1986-04-11
申请人： Toshimitsu Hamada , Mineo Nomoto , Kozo Nakahata
发明人： Toshimitsu Hamada , Mineo Nomoto , Kozo Nakahata
IPC分类号： H04N7/18 , G01N21/956 , G06T7/00 , H01L51/00 , G06K9/64
CPC分类号： G06T7/001 , G01N21/95607 , G06T2207/30148
摘要： Two kinds of image corresponding to a reference pattern and a pattern to be inspected are converted into binary images and local images cut out from the binary images are compared with each other to detect differences between the cut out images and recognize these differences as a defect. One of the main subjects of the inspecting method is to moderate excess sensitivity to the different portions to the extent of allowing non-serious actual defects. By setting don't care areas each of which consists of one pixel row neighboring on a binary boundary line in the image, and comparing the remaining portions of the images other than the don't care areas by logical processing it is possible to detect various defects without regarding the quantization error as a defect.
摘要翻译：对应于参考图案和待检查图案的两种图像被转换为二进制图像，并且将从二进制图像切出的局部图像彼此进行比较，以检测切出的图像之间的差异并将这些差异识别为缺陷。检查方法的主要课题之一是对不同部位的过度敏感度进行调节，使得不严重的实际缺陷达到程度。通过设置不关心区域，每个区域由图像中的二进制边界线上相邻的一个像素行组成，并且通过逻辑处理比较除了无关区域之外的图像的剩余部分，可以检测各种缺陷而不考虑量化误差作为缺陷。

3. 发明授权

US4872187A X-ray tomographic imaging system and method 失效
标题翻译： X射线断层成像系统及方法
公开(公告)号：US4872187A
公开(公告)日：1989-10-03
申请号：US156179
申请日：1988-02-16
申请人： Kozo Nakahata , Toshimitsu Hamada , Yasuo Nakagawa , Mineo Nomoto
发明人： Kozo Nakahata , Toshimitsu Hamada , Yasuo Nakagawa , Mineo Nomoto
IPC分类号： G01N23/04 , G01N23/18
CPC分类号： G01N23/18 , G01N23/046 , G01N2223/419
摘要： In an X-ray tomographic imaging system and method, an object to be inspected is irradiated with X-rays from an X-ray source to obtain an X-ray transmission image of the object. The X-ray transmission image is converted by an X-ray fluorescence image intensifier into a detection image. The intensity of the detection image is also intensified by the X-ray fluorescence image intensifier. A photo-electric converter converts the intensified detection image from the X-ray fluorescence image intensifier into an electrical signal. The object to be inspected is held by an object holder rotatably at a position in proximity to the X-ray source and movably in a direction of the axis of rotation of the object and a direction perpendicular to the rotation axis. The electrical signal from the photo-electric converter is processed to a cross-sectional image.
摘要翻译：在X射线层析成像系统和方法中，从X射线源照射X射线检查对象物，得到被检体的X射线透过图像。通过X射线荧光图像增强器将X射线透射图像转换成检测图像。 X射线荧光图像增强器也增强了检测图像的强度。光电转换器将强化的检测图像从X射线荧光图像增强器转换成电信号。待检查对象由物体保持器可旋转地保持在靠近X射线源的位置，并且可沿物体的旋转轴线和垂直于旋转轴线的方向移动。来自光电转换器的电信号被处理成横截面图像。

4. 发明授权

US5015097A Method for inspecting filled state of via-holes filled with fillers and apparatus for carrying out the method 失效
标题翻译：用于检查填充有填充物的通孔的填充状态的方法和用于执行该方法的装置
公开(公告)号：US5015097A
公开(公告)日：1991-05-14
申请号：US416934
申请日：1989-10-04
申请人： Mineo Nomoto , Takanori Ninomiya , Hiroya Koshishiba , Toshimitsu Hamada , Yasuo Nakagawa
发明人： Mineo Nomoto , Takanori Ninomiya , Hiroya Koshishiba , Toshimitsu Hamada , Yasuo Nakagawa
IPC分类号： G01N21/88 , G01N21/956 , G06T7/00 , H05K3/00 , H05K3/40
CPC分类号： G06T7/0004 , G01N21/95692 , G06T7/604 , G01N2021/95653 , G01N21/8806 , G06T2207/30141
摘要： A method for inspecting the filled state of a plurality of via-holes which pass through a non-conductive circuit board and are filled with a conductive substance and an apparatus for carrying out the method are disclosed.The surface of the circuit board is illuminated in two directions to generate shadows depending on the concave or convex state of the fillers in a plurality of via-holes. An optical image of the illuminated surface of the circuit board is detected. Each edge of the two shadow areas, which exist in the detected optical image and are generated in one via-hole by light irradiation in two directions, is detected. Whether the filler in this one via-hole is in the concave state or convex state is identified according to the mutual position relationship of the detected edges. The length of each shadow area is detected, and whether the concave state or convex state of the filler is within a predetermined allowance is decided according to the detection results. The area of the image of the filler is detected according to differences between the brightness of the board surface or of the via-hole wall and the brightness of the filler in the via-hole in the detected optical image, and whether the filler is lacking or not is decided according to the detection result.
摘要翻译：公开了一种用于检查通过非导电电路板并填充有导电物质的多个通孔的填充状态的方法和用于实施该方法的装置。电路板的表面在两个方向上被照亮，以产生取决于多个通孔中的填料的凹凸状态的阴影。检测电路板的被照射表面的光学图像。检测存在于所检测的光学图像中并且在两个方向上通过光照射在一个通孔中产生的两个阴影区域的每个边缘。根据检测到的边缘的相互位置关系来识别该通孔中的填充物是处于凹状还是凸状状态。检测每个阴影区域的长度，根据检测结果确定填料的凹状或凸状状态是否处于预定的余量内。根据检测到的光学图像中的基板表面或通孔壁的亮度与通孔中的填充物的亮度之间的差异来检测填充物的图像的面积，以及填充材料是否缺乏是否根据检测结果决定。

5. 发明授权

US4628531A Pattern checking apparatus 失效
标题翻译：图案检查装置
公开(公告)号：US4628531A
公开(公告)日：1986-12-09
申请号：US583867
申请日：1984-02-27
申请人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
发明人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G01B11/24 , G01N21/88 , G01N21/956 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/956 , G06T2207/10056 , G06T2207/30148
摘要： A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
摘要翻译：模式检查装置通过具有足够高的灵敏度的主要选择来执行候选缺陷的检测，以检测任何现有缺陷，然后通过控制处理器对包括检测到的候选缺陷的外围的图案进行详细分析，通过从候选者中删除不是实际意义上的缺陷的候选缺陷的次要选择，从而仅检测到真实的缺陷。

6. 发明申请

US20070041410A1 Apparatus for fabricating a display device 审中-公开
标题翻译：用于制造显示装置的装置
公开(公告)号：US20070041410A1
公开(公告)日：2007-02-22
申请号：US11588387
申请日：2006-10-27
申请人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
发明人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
IPC分类号： H01S3/10 , G02B27/10
CPC分类号： H01L21/02683 , H01L21/0268 , H01L21/02691 , H01L21/2026 , H01L21/268 , H01L27/1285 , H01L29/04 , H01L29/66757
摘要： Apparatus for fabricating a display device includes a stage capable of mounting an insulating substrate of the display device and moving the insulating substrate, linear scales which detect a position or moving distance of the substrate, a laser oscillator which generates continuous-waves laser light, a modulator which turns ON/OFF the continuous-wave laser light, a beam forming optic which shapes the continuous-wave laser light passing through the modulator into a linear or rectangular form, an objective lens which projects the at least one of the laser light on the insulating substrate so as to irradiate the insulating substrate with the laser light. The controller counts signals generated by the linear scales for every movement of the stage for a given distance, causes the modulator to turn the generated continuous-wave laser light in an ON state at time when a position of the insulating substrate on which the laser light irradiation is to be started reaches an area on which the laser light is projected, and causes the modulator to turn the generated continuous-wave laser light in an OFF state at another time.
摘要翻译：用于制造显示装置的装置包括能够安装显示装置的绝缘基板并移动绝缘基板的台，检测基板的位置或移动距离的线性标尺，产生连续波激光的激光振荡器，将连续波激光切换为ON / OFF的调制器，将通过调制器的连续波激光成形为直线或矩形的光束形成光学器件，将至少一个激光投射到的物镜绝缘基板，以激光照射绝缘基板。控制器对于给定距离的级的每次移动来对由线性标尺产生的信号进行计数，使得调制器将产生的连续波激光在其上的激光的绝缘基板的位置处于接通状态照射开始到达投射激光的区域，并且使得调制器在另一时间将所产生的连续波激光转为OFF状态。

7. 发明申请

US20060215171A1 Method and apparatus for measuring displacement of a sample 有权
公开(公告)号：US20060215171A1
公开(公告)日：2006-09-28
申请号：US11188732
申请日：2005-07-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

8. 发明授权

US06950545B1 Nondestructive inspection method and apparatus 失效
公开(公告)号：US06950545B1
公开(公告)日：2005-09-27
申请号：US09698810
申请日：2000-10-26
申请人： Mineo Nomoto , Daiske Katsuta , Toshio Asano , Kaoru Sakai , Tetsuo Taguchi , Isao Tanaka
发明人： Mineo Nomoto , Daiske Katsuta , Toshio Asano , Kaoru Sakai , Tetsuo Taguchi , Isao Tanaka
IPC分类号： G01N27/82 , G01N21/91 , G06K9/00 , G01J4/00 , G01N21/00
CPC分类号： G06K9/4652 , G01N21/91
摘要： The present invention relates to a method for inspecting a crack in a metal surface or the like, and, particularly, to an inspection method and apparatus for nondestructive inspection such as liquid penetrant inspection and magnetic particle testing. The present invention provides a flaw inspection method that essentially comprises the steps of illuminating a surface of a sample to be inspected, obtaining an image of the surface, characterizing a potential flaw on the inspected surface by processing the obtained image, displaying an image of the potential flaw, verifying that the potential flaw is a true flaw, and storing an image of the verified flaw in memory.

9. 发明授权

US5301248A Method for pattern inspection and apparatus therefor 失效
标题翻译：图案检查方法及其设备
公开(公告)号：US5301248A
公开(公告)日：1994-04-05
申请号：US904892
申请日：1992-06-25
申请人： Ninomiya Takanori , Kazushi Yoshimura , Mineo Nomoto
发明人： Ninomiya Takanori , Kazushi Yoshimura , Mineo Nomoto
IPC分类号： G01R31/308 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01R31/308 , G06T7/0006 , G06T2207/20036 , G06T2207/20144 , G06T2207/30141
摘要： A detected pattern is binarized, the binarized pattern is expanded, an image size is reduced while a connectivity of the expanded pattern is preserved and stored in a first memory. In turn, the binarized pattern is contracted, the image size is reduced while a connectivity of the contracted pattern is preserved and stored in a second memory. Then the expanded pattern is read out from the first memory and a connectivity of the pattern is selected. The contracted pattern is read out from the second pattern and the connectivity of the pattern is extracted. The selected connectivities are compared with the connectivity of a normal pattern to detect a non-coincidence. The circuit pattern having a short circuit or a semi-short circuit defect and a circuit pattern having an open circuit or a semi-open circuit defect are classified and selected in response to these non-coincidences. Further, a pattern shape stored in the first memory is analyzed to specify the position where the short circuit or a semi-short circuit defect is present.
摘要翻译：检测到的图案被二值化，二值化图案被扩展，图像尺寸减小，而扩展图案的连接被保存并存储在第一存储器中。反过来，二进制图案被缩小，图像尺寸减小，而合同图案的连接被保存并存储在第二存储器中。然后，从第一存储器读出扩展模式，并且选择模式的连接。从第二模式读出收缩模式，并提取模式的连接。将所选择的连接性与正常模式的连接进行比较以检测不重合。具有短路或半短路缺陷的电路图案以及具有开路或半开路缺陷的电路图案被分类并响应于这些非重合而选择。此外，分析存储在第一存储器中的图案形状以指定存在短路或半短路缺陷的位置。

10. 发明授权

US4420233A Projecting apparatus 失效
标题翻译：投影仪
公开(公告)号：US4420233A
公开(公告)日：1983-12-13
申请号：US381675
申请日：1982-05-24
申请人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
发明人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
IPC分类号： G03B13/36 , G02B7/28 , G03B3/10 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/34 , G03B21/28
CPC分类号： G03F7/70891 , G03B3/10 , G03F9/70
摘要： A projecting apparatus for forming an image of a mask on a wafer by a projector of a unit magnification reflection system having a concave spherical mirror and a convex spherical mirror. The distance from the projector to the mask or the upper side of a mask holder for holding the mask and the distance from the projector to the wafer are measured. An error of the image-forming position is computed from the distance measurements. At least one of the mask, the wafer and the projector is moved along the direction of projection in a manner to eliminate the error of the image-forming position computed, thus attaining automatic focus adjustment.
摘要翻译：一种用于通过具有凹球面镜和凸球面镜的单元放大反射系统的投影仪在晶片上形成掩模图像的投影设备。测量从投影仪到掩模的距离或用于保持面罩的掩模支架的上侧以及从投影仪到晶片的距离。从距离测量计算图像形成位置的误差。掩模，晶片和投影仪中的至少一个沿着投影方向移动，以消除所计算的图像形成位置的误差，从而获得自动聚焦调整。

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