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1. 发明授权

US4530746A Photosensitive resin composition 失效
标题翻译：感光树脂组合物
公开(公告)号：US4530746A
公开(公告)日：1985-07-23
申请号：US496591
申请日：1983-05-20
申请人： Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani , Hitoshi Yokono , Takeshi Endo
发明人： Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani , Hitoshi Yokono , Takeshi Endo
IPC分类号： C08F24/00 , C08F2/50 , C08F290/00 , C08F299/00 , C08F299/02 , C08G65/00 , C08G67/00 , C09D4/00 , C09D5/00 , G03F7/027
CPC分类号： C08F299/024 , G03F7/027
摘要： A photosensitive resin composition comprising (a) 10 to 90 parts by weight of at least one polymerizable monomer of the formula: ##STR1## (R is defined in the specification), (b) 90 to 10 parts by weight of at least one compound selected from the group consisting of epoxy-acrylate resins, 1,2-polybutadiene resins, polyester resins and organopolysiloxanes, all having one or more acryloyloxy or methacryloyloxy groups in their molecular end or ends, and (c) 0.05 to 5 parts by weight of a photosensitizer based on 100 parts by weight of the sum of the components (a) and (b) shows slight shrinkage and the resulting coating film is good in adhesive properties and mechanical strength.
摘要翻译：一种感光性树脂组合物，其包含（a）10至90重量份的至少一种下式的可聚合单体：（R在说明书中定义），（b）90至10重量份的至少一种化合物选自在其分子末端或末端具有一个或多个丙烯酰氧基或甲基丙烯酰氧基的环氧丙烯酸酯树脂，1,2-聚丁二烯树脂，聚酯树脂和有机聚硅氧烷，以及（c）0.05至5重量份的基于100重量份的组分（a）和（b）的总和的光敏剂显示出轻微的收缩，并且所得的涂膜具有良好的粘合性能和机械强度。

2. 发明授权

US4495218A Process for forming thin film 失效
标题翻译：薄膜成膜工艺
公开(公告)号：US4495218A
公开(公告)日：1985-01-22
申请号：US534686
申请日：1983-09-22
申请人： Kazufumi Azuma , Mitsuo Nakatani , Kazuo Nate , Masaaki Okunaka , Hitoshi Yokono
发明人： Kazufumi Azuma , Mitsuo Nakatani , Kazuo Nate , Masaaki Okunaka , Hitoshi Yokono
IPC分类号： C23C16/48 , C23C16/24 , C23C16/34 , C23C16/40 , H01L21/205 , H01L21/268 , H01L21/31 , H01L21/314 , H01L21/316 , H01L21/318 , H01L31/04 , C23C17/00
CPC分类号： H01L21/02164 , C23C16/24 , C23C16/345 , C23C16/402 , H01L21/0217 , H01L21/02211 , H01L21/02277 , H01L21/02381 , H01L21/02422 , H01L21/02425 , H01L21/02532 , H01L21/0262 , H01L21/268 , H01L21/2686 , H01L21/31612 , H01L21/3185 , Y10S148/093
摘要： A thin film of a-Si, SiO.sub.2 or Si.sub.3 N.sub.4 can be formed on a substrate using a starting material gas containing at least a polysilane of the formula Si.sub.n H.sub.2n+2 (n=2, 3 or 4) by a chemical vapor deposition method with irradiation with light with high film forming rate at lower temperatures.
摘要翻译：可以通过化学气相沉积法使用至少含有式SinH2n + 2（n = 2,3或4）的聚硅烷的原料气体在基板上形成a-Si，SiO 2或Si 3 N 4的薄膜具有在较低温度下具有高成膜速率的光。

3. 发明授权

US4604294A Process for forming an organic thin film 失效
标题翻译：用于形成有机薄膜的方法
公开(公告)号：US4604294A
公开(公告)日：1986-08-05
申请号：US660230
申请日：1984-10-12
申请人： Masahiro Tanaka , Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani
发明人： Masahiro Tanaka , Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani
IPC分类号： G03C1/76 , B05D3/06 , B05D7/24
CPC分类号： B05D1/60 , B05D3/06
摘要： An organic thin film consisting essentially of an organic compound is formed on a substrate surface by vacuum vapor deposition by exposing the organic compound as a vapor source to a laser beam having an energy level corresponding to that of the chemical bond of the organic compound, thereby sputtering the organic compound onto a substrate surface in vacuum and forming the organic thin film thereon. When a light or radiation-sensitive organic compound is used as the vapor source, a light or radiation-sensitive resist film is formed. The thin film thus formed retains the original chemical structure of the vapor source, and has a good flatness. Resolvability of resist film is improved owing to the absence of pin holes and particulate matters. A resist film having a higher sensitivity and a better contrast is formed by heating the substrate during the vapor deposition.
摘要翻译：通过将有机化合物作为蒸汽源暴露于具有与有机化合物的化学键的能级对应的能级的激光束，通过真空汽相沉积在基板表面上形成基本上由有机化合物构成的有机薄膜，由此在真空中将有机化合物溅射到基板表面上并在其上形成有机薄膜。当使用光或辐射敏感的有机化合物作为蒸气源时，形成光或辐射敏感的抗蚀剂膜。由此形成的薄膜保持蒸气源的原始化学结构，并且具有良好的平坦度。由于没有针孔和颗粒物质，抗蚀剂膜的可分离性得到改善。通过在气相沉积期间加热基底来形成具有更高灵敏度和更好对比度的抗蚀剂膜。

4. 发明授权

US4420500A Composition and process for preparing transparent conducting film 失效
标题翻译：制备透明导电薄膜的组成和工艺
公开(公告)号：US4420500A
公开(公告)日：1983-12-13
申请号：US344973
申请日：1982-02-02
申请人： Mitsuo Nakatani , Mitsuo Yamazaki , Masaaki Okunaka , Ryoichi Sudo , Kenji Tochigi , Hitoshi Yokono
发明人： Mitsuo Nakatani , Mitsuo Yamazaki , Masaaki Okunaka , Ryoichi Sudo , Kenji Tochigi , Hitoshi Yokono
IPC分类号： B01J19/12 , C03C17/25 , C07F5/00 , C07F7/22 , G02F1/1343 , H01B13/00 , H01L31/18 , B05D3/02 , B05D3/06 , H01B1/06
CPC分类号： G02F1/13439 , C03C17/253 , C07F5/003 , C07F7/2204 , H01L31/1884 , C03C2217/231 , C03C2218/11 , Y02E10/50
摘要： A transparent conducting film is prepared from a composition comprising an indium compound, a tin compound, and a solvent as essential components, the tin compound being a compound represented by the following general formula:(R).sub.a Sn(NO.sub.3).sub.b (X).sub.4-a-b (1)wherein R is an alkyl group having 1 to 4 carbon atoms, X is a hydroxyl group, a halogen atom, or a carboxyl group, and a and b are integers of 1.about.3, and a+b.ltoreq.4 by coating a substrate with the said composition, subjecting the coated substrate to ultraviolet irradiation at a substrate temperature of 200.degree. C. or higher, and heating the substrate at 400.degree. C. or higher. The composition has a long pot life and the film has a low resistance and distinguished mechanical strength, chemical resistance and etching susceptibility.
摘要翻译：由含有铟化合物，锡化合物和溶剂作为必要成分的组合物制备透明导电膜，该锡化合物是由以下通式表示的化合物：（R）aSn（NO 3）b（X）4 -ab（1）其中R是具有1至4个碳原子的烷基，X是羟基，卤素原子或羧基，a和b是1的整数3和a + b < = 4，通过用所述组合物涂布基材，在200℃或更高的基板温度下对涂覆的基材进行紫外线照射，并在400℃或更高温度下加热基材。该组合物具有长的适用期，该膜具有低电阻和显着的机械强度，耐化学性和蚀刻敏感性。

5. 发明授权

US4486232A Electrode material for semi-conductor devices 失效
标题翻译：半导体器件用电极材料
公开(公告)号：US4486232A
公开(公告)日：1984-12-04
申请号：US523857
申请日：1983-08-17
申请人： Mitsuo Nakatani , Haruhiko Matsuyama , Masaaki Okunaka , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Sumiyuki Midorikawa
发明人： Mitsuo Nakatani , Haruhiko Matsuyama , Masaaki Okunaka , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Sumiyuki Midorikawa
IPC分类号： H01L31/04 , H01L21/28 , H01L21/283 , H01L21/288 , H01L29/43 , H01L31/0224 , H01B1/02
CPC分类号： H01L31/022408 , H01L31/022425 , Y02E10/50
摘要： An electrode material for semi-conductor device such as solar cells comprises Ag powders, at least one metal of zirconium, hafnium, vanadium, niobium, and tantalum, an organic binder, and an organic solvent, and, if necessary, glass, Pd powders and Pt powders.The electrodes are prepared from the electrode material by printing, drying and firing at a low temperature and have a low contact resistance without any junction breakage or increase in leak current.
摘要翻译：用于半导体器件如太阳能电池的电极材料包括Ag粉末，至少一种锆，铪，钒，铌和钽金属，有机粘合剂和有机溶剂，并且如果需要，玻璃，Pd粉末和Pt粉末。电极由电极材料通过在低温下进行印刷，干燥和烧制而制备，并且具有低接触电阻而没有任何断裂或漏电流增加。

6. 发明授权

US4347304A Process for forming metallic image 失效
标题翻译：金属图像形成工艺
公开(公告)号：US4347304A
公开(公告)日：1982-08-31
申请号：US277049
申请日：1981-06-24
申请人： Hideki Sakurai , Mitsuo Nakatani , Hitoshi Oka , Hitoshi Yokono , Tokio Isogai
发明人： Hideki Sakurai , Mitsuo Nakatani , Hitoshi Oka , Hitoshi Yokono , Tokio Isogai
IPC分类号： G03C5/58 , G03F7/004 , H05K3/18 , G03C5/00
CPC分类号： H05K3/185 , G03C5/58 , G03F7/0043 , Y10S430/143
摘要： Metallic images of uniform quality can be formed on substrates having through-holes by a process using a positive type resist characterized by using as a coating solution for the substrate a solution of a photosensitive material of (a) at least one organic compound having at least one linkage of --M--M--M ).sub.n (M=Si, Ge or Sn; n=0, 1 or more) in the molecule or (b) a mixture of at least one organic compound (a) mentioned above and at least one photosensitizer, dissolved in a solvent such as a halogenated hydrocarbon, an aromatic hydrocarbon, a heterocyclic compound, or a mixture thereof, followed by irradiation with an actinic light through a photomask and electroless plating.
摘要翻译：可以通过使用正型抗蚀剂的方法在具有通孔的基板上形成具有均匀质量的金属图像，其特征在于使用作为基底的涂布溶液的（a）至少一种有机化合物的感光材料的溶液，所述有机化合物至少具有分子中nMM（M = Si，Ge或Sn; n = 0,1或更多）的一个连接，或（b）上述至少一种有机化合物（a）和至少一种光敏剂的混合物，溶解在溶剂如卤代烃，芳族烃，杂环化合物或其混合物中，然后通过光掩模和化学镀被光化的光照射。

7. 发明授权

US4643913A Process for producing solar cells 失效
标题翻译：太阳能电池生产工艺
公开(公告)号：US4643913A
公开(公告)日：1987-02-17
申请号：US687162
申请日：1984-12-28
申请人： Masaaki Okunaka , Mitsuo Nakatani , Haruhiko Matsuyama , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Kunihiro Matsukuma , Sumiyuki Midorikawa , Satoru Suzuki
发明人： Masaaki Okunaka , Mitsuo Nakatani , Haruhiko Matsuyama , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Kunihiro Matsukuma , Sumiyuki Midorikawa , Satoru Suzuki
IPC分类号： H01L31/04 , C07F7/00 , H01L21/283 , H01L21/288 , H01L31/0216 , H01L31/0224 , H01L31/18
CPC分类号： C07F7/006 , H01L31/02168 , H01L31/022425 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A process for producing solar cells which comprises applying a composition for anti-reflection coating formation on one side of a silicon base plate having a p-n junction therein, printing an Ag paste for contact formation on predetermined areas of the coat, and heat-treating the resulting plate at a temperature of 400.degree. to 900.degree. C. to complete anti-reflection coating and a light-receiving side contact, the process being characterized in that the composition for anti-reflection coating formation contains as essential component, (a) at least one member selected from the metal-organic ligand complex compounds represented by the general formula M(OR.sub.1).sub.n (L).sub.a-n wherein M is a metal selected from Zn, Al, Ga, In, Ti, Zr, Sn, V, Nb, Ta, Mo, and W; R.sub.1 is a C.sub.1 -C.sub.18 alkyl group; L is an organic ligand which forms an non-hydrolyzable bond with the metal ion; a is the valency of the metal M; and n is an integer satisfying 1.ltoreq.n
摘要翻译：一种太阳能电池的制造方法，其特征在于，在具有pn结的硅基板的一面上涂布抗反射涂层用组合物，在所述涂层的规定区域印刷用于接触形成的Ag浆料，并对所述涂料进行热处理得到的板在400-900℃的温度下完成防反射涂层和光接收侧接触，其特征在于用于防反射涂层形成的组合物包含作为必要组分的（a）在选自由通式M（OR1）n（L）a表示的金属 - 有机配体络合物中的至少一种成分其中M是选自Zn，Al，Ga，In，Ti，Zr，Sn，V，Nb ，Ta，Mo和W; R1是C1-C18烷基; L是与金属离子形成不可水解键的有机配体; a为金属M的化合价; n为1，n为1的整数，通式（OR 1）n-1M（L）anOM（OR 1）n-1（L）a表示的水解缩合物，（b）化合物，和（c）溶剂。

8. 发明授权

US07530184B2 Working machine 失效
标题翻译：工作机
公开(公告)号：US07530184B2
公开(公告)日：2009-05-12
申请号：US11470942
申请日：2006-09-07
申请人： Hiroyoshi Ishihama , Mitsuo Nakatani , Yasunari Watanabe
发明人： Hiroyoshi Ishihama , Mitsuo Nakatani , Yasunari Watanabe
IPC分类号： E01H5/06
CPC分类号： E02F3/815
摘要： A working machine having a blade is disclosed, the blade comprising a body blade and an extension blade, the body blade having a body-side mounting portion having a body-side mounting hole and the extension blade having an extension-side mounting portion having an extension-side mounting hole, the body-side mounting hole and the extension-side mounting hole being formed vertically through the body-side mounting portion and the extension-side mounting portion, respectively. Further provided are mounting members adapted to be inserted into the mounting holes to connect the body blade and the extension blade with each other, and positioning members and a cutout portion for aligning the positions of the body-side mounting hole and the extension-side mounting hole vertically with each other and inhibiting the body-side mounting portion and the extension-side mounting portion from pivoting around the mounting members.
摘要翻译：公开了一种具有叶片的工作机，所述叶片包括主体叶片和延伸叶片，所述主体叶片具有主体侧安装部分，所述主体侧安装部分具有主体侧安装孔，所述延伸叶片具有延伸侧安装部分，延伸侧安装孔，主体侧安装孔和延伸侧安装孔分别垂直地形成在主体侧安装部和延伸侧安装部上。还提供了适于插入到安装孔中以将主体叶片和延伸叶片彼此连接的安装构件，以及用于使主体侧安装孔和延伸侧安装件的位置对准的定位构件和切口部并且禁止体侧安装部和延伸侧安装部围绕安装构件枢转。

9. 发明授权

US06903786B2 Liquid crystal display device, manufacturing method thereof, and fabrication apparatus therefor 失效
标题翻译：液晶显示装置及其制造方法及其制造装置
公开(公告)号：US06903786B2
公开(公告)日：2005-06-07
申请号：US10865779
申请日：2004-06-14
申请人： Tomoaki Takahashi , Sakari Kaneku , Hideaki Yamamoto , Mitsuo Nakatani , Hiroshi Sasaki
发明人： Tomoaki Takahashi , Sakari Kaneku , Hideaki Yamamoto , Mitsuo Nakatani , Hiroshi Sasaki
IPC分类号： G02F1/136 , C23C28/02 , C25F3/02 , G02F1/1343 , G02F1/1362 , G02F1/1368 , G09F9/30 , H01L21/3063 , H01L21/336 , H01L29/786
CPC分类号： G02F1/13458 , G02F1/134363 , G02F1/136286 , G02F2001/13629
摘要： A method of manufacturing an LCD device which includes a gate line having an effective display area which includes an aluminum alloy layer and an aluminum oxide layer. The gate line also includes a gate terminal portion which is made up of the same aluminum alloy layer with a molybdenum alloy layer formed thereon. To form this structure, an insulating substrate of the LCD device, with the laminated structure of the aluminum alloy layer and the molybdenum layer, is immersed in an electrolytic solution. During the immersion, the molybdenum layer is etched off the aluminum alloy in the effective displaying area, while the etching is prevented in the gate terminal area by a protective layer. Following this, the aluminum oxide layer is formed over the aluminum alloy in the effected display area while the device is still immersed in the electrolytic solution.
摘要翻译：一种制造LCD装置的方法，其包括具有包括铝合金层和氧化铝层的有效显示区域的栅极线。栅极线还包括由形成有钼合金层的相同的铝合金层构成的栅极端子部。为了形成该结构，将具有铝合金层和钼层的层叠结构的LCD装置的绝缘基板浸渍在电解液中。在浸渍期间，在有效显示区域中，钼层被蚀刻掉铝合金，同时通过保护层在栅极端子区域中防止蚀刻。接下来，在受影响的显示区域中在铝合金上形成氧化铝层，同时该装置仍然浸没在电解液中。

10. 发明授权

US5493129A Thin film transistor structure having increased on-current 失效
公开(公告)号：US5493129A
公开(公告)日：1996-02-20
申请号：US372289
申请日：1989-06-27
申请人： Eiji Matsuzaki , Akihiro Kenmotsu , Yoshifumi Yoritomi , Toshiyuki Koshita , Takao Takano , Mitsuo Nakatani
发明人： Eiji Matsuzaki , Akihiro Kenmotsu , Yoshifumi Yoritomi , Toshiyuki Koshita , Takao Takano , Mitsuo Nakatani
IPC分类号： H01L29/417 , H01L29/786 , H01L29/04
CPC分类号： H01L29/78696 , H01L29/41733 , H01L29/78669 , H01L29/78687
摘要： A thin film transistor structure for use in driving liquid crystal display elements has a semiconductor active layer, a control electrode layer underlying the active layer with an insulating layer interposed therebetween and first and second main electrode layers formed on or above the active layer in a spaced relation with each other to define a channel in the active layer in cooperation with the control electrode layer between the main electrode layers. The active layer has a first peripheral edge portion generally perpendicular to the direction of the channel and a second peripheral edge portion generally not perpendicular to the direction of the channel. The first and/or second main electrode layer extends over the first and/or second peripheral edge portion of the active layer such that at least a part of the first peripheral edge portion and/or at least part of the second peripheral edge portion of the active layer has its side face directly covered with the main electrode layer.

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