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    • 4. 发明授权
    • Pressure-adjusting device for adjusting output of integrated pressure
sensor
    • 用于调节集成压力传感器输出的调压装置
    • US5528214A
    • 1996-06-18
    • US364993
    • 1994-12-28
    • Kazuhiko KogaMichitaka HayashiKazuhisa Ikeda
    • Kazuhiko KogaMichitaka HayashiKazuhisa Ikeda
    • G01L9/00G01L27/00G01L1/22
    • G01L9/0042G01L19/0038G01L19/0084G01L19/141G01L27/005G01L9/0054Y10S148/028
    • A pressure-adjusting device for adjusting an output of an integrated pressure sensor in which a silicon wafer is joined onto a seat that has pressure-adjusting passages formed therein, and which has formed in the silicon wafer a signal processing circuit with an adjusting resistor for each chip, a thin diaphragm for each chip and a piezo-resistance layer for each chip. The pressure-adjusting device includes a pressure-setting stage on which the seat is placed, the pressure setting stage having pressure-adjusting passages formed therein to adjust a pressure exerted on the respective thin diaphragm via the pressure-adjusting passages formed in the seat. A holding member is arranged on the pressure-setting stage as to surround at least an outer periphery of the seat. A first elastic air-tight member is arranged on the pressure-setting stage as to surround the outer periphery of the seat and be held compressed by the pressure-setting stage and by the holding member. A second elastic air-tight member is arranged to surround the outer periphery on an upper surface of said silicon wafer or to surround the outer periphery of either the seat or the silicon wafer, and be held compressed by the seat or by the silicon wafer and the holding member.
    • 一种压力调节装置,用于调节其中硅晶片与其中形成有压力调节通道的座上接合的集成压力传感器的输出,并且在硅晶片中形成具有调节电阻器的信号处理电路 每个芯片,每个芯片的薄膜片和每个芯片的压电层。 压力调节装置包括设置座椅的压力调节阶段,压力调节阶段具有形成在其中的压力调节通道,以经由形成在座椅中的压力调节通道来调节施加在各个薄隔膜上的压力。 保持构件布置在压力设定台上,以至少围绕座椅的外周。 第一弹性气密构件布置在压力设定台上,以围绕座椅的外周并通过压力稳定阶段和保持构件保持压缩。 第二弹性气密构件被布置成围绕所述硅晶片的上表面的外周围或者围绕座或硅晶片的外周,并被座椅或硅晶片压缩, 持有成员。