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1. 发明授权

US06807864B2 Pressure sensor with water repellent filter 失效
标题翻译：带防水滤芯的压力传感器
公开(公告)号：US06807864B2
公开(公告)日：2004-10-26
申请号：US09824708
申请日：2001-04-04
申请人： Masaki Takakuwa , Masahito Imai
发明人： Masaki Takakuwa , Masahito Imai
IPC分类号： G01L700
CPC分类号： G01L19/0654 , G01L19/0038 , G01L19/0636 , G01L19/141 , G01L19/147 , H01L2224/48091 , H01L2224/73265 , H01L2924/00014
摘要： A case of a pressure sensor has an atmospheric pressure introduction port for introducing atmospheric pressure into the case, and a water repellent filter that is attached to the atmospheric pressure introduction port to prevent passage of moisture, dust and the like while allowing flow of air. The filter is disposed to have a filter surface extending along a gravitational direction when the pressure sensor is used.
摘要翻译：压力传感器的壳体具有用于将大气压引入壳体的大气压引入口，以及附着于大气压导入口的防水过滤器，以防止湿气，灰尘等在允许空气流动的同时进行。过滤器设置成当使用压力传感器时具有沿重力方向延伸的过滤器表面。

2. 发明授权

US06768118B2 Electron beam monitoring sensor and electron beam monitoring method 有权
标题翻译：电子束监测传感器和电子束监测方法
公开(公告)号：US06768118B2
公开(公告)日：2004-07-27
申请号：US10350188
申请日：2003-01-24
申请人： Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
发明人： Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
IPC分类号： H01J326
CPC分类号： H01J37/244 , H01J2237/24405 , H01J2237/31774
摘要： The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.
摘要翻译：本发明提供了一种能够在多电子束书写系统中提供远光监测精度和高速监测的光束监测传感器以及使用其的监测方法。在用于电子束监测的法拉第杯中，钽或重金属使用原子序数大于钽的材料来提供具有高纵横比的法拉第杯结构。微法拉第杯允许电子束监测具有较少的光束泄漏到高加速度电子束。

3. 发明申请

US20050023486A1 Electron beam exposure apparatus and electron beam measurement module 失效
标题翻译：电子束曝光装置和电子束测量模块
公开(公告)号：US20050023486A1
公开(公告)日：2005-02-03
申请号：US10624423
申请日：2003-07-21
申请人： Masaki Takakuwa , Yoshinori Nakayama , Gen Nakamura
发明人： Masaki Takakuwa , Yoshinori Nakayama , Gen Nakamura
IPC分类号： G03F7/20 , H01J37/04 , H01J37/18 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027 , A61N5/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174
摘要： An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.
摘要翻译：用于通过使用电子束曝光晶片的电子束曝光装置包括：用于产生电子束的电子束发生器; 用于保持要暴露的晶片的晶片台; 设置在晶片台上的电流检测器，用于检测电子束的电流; 以及设置在晶片台上的用于存储指示由电流检测器检测到的电流的信息的存储单元。

4. 发明授权

US06575038B1 Pressure sensor and method for assembling the same 有权
标题翻译：压力传感器及其组装方法
公开(公告)号：US06575038B1
公开(公告)日：2003-06-10
申请号：US09550017
申请日：2000-04-14
申请人： Masaki Takakuwa , Michitaka Hayashi , Hironobu Baba , Masahito Imai
发明人： Masaki Takakuwa , Michitaka Hayashi , Hironobu Baba , Masahito Imai
IPC分类号： G01L700
CPC分类号： G01L19/141 , G01L19/003 , G01L19/0038 , H01L2224/48091 , H01L2224/73265 , H01L2924/00014
摘要： A pressure sensor has a sensor element portion for detecting pressure, and a pressure conduction portion connectable to a detected member and defining therein a conduction passage for conducting pressure from the detected member to the sensor element portion. A protective cap is detachably attached to the pressure conduction portion to cover a sealed portion where the pressure conduction portion is to be sealed to the detected member until before the pressure sensor is connected to the detected member. The protective cap has an opening portion through which the conduction passage communicates with an outside thereof. Accordingly, pressure characteristics can be checked without detaching the protective cap from the pressure conduction portion.
摘要翻译：压力传感器具有用于检测压力的传感器元件部分和可连接到被检测部件的压力传导部分，并且在其中限定用于传导压力从被检测部件传递到传感器元件部分的传导通道。保护盖可拆卸地附接到压力传导部分，以覆盖密封部分，其中压力传导部分被密封到检测到的部件，直到压力传感器连接到检测到的部件为止。保护盖具有开口部，导通路与外部连通。因此，可以在不将保护盖从压力传导部分分离的情况下检查压力特性。

5. 发明授权

US6085598A Pressure sensor device having breakable mounting member 有权
标题翻译：压力传感器装置具有可拆卸的安装构件
公开(公告)号：US6085598A
公开(公告)日：2000-07-11
申请号：US342624
申请日：1999-06-29
申请人： Hironobu Baba , Michitaka Hayashi , Masaki Takakuwa , Masahito Imai , Akiteru Takae , Tokuhisa Nomura , Akira Ishimaru
发明人： Hironobu Baba , Michitaka Hayashi , Masaki Takakuwa , Masahito Imai , Akiteru Takae , Tokuhisa Nomura , Akira Ishimaru
IPC分类号： G01D11/30 , G01L9/00 , G01L19/00 , G01L7/00 , G01L7/08
CPC分类号： G01L19/003 , G01L19/0038 , G01L19/143
摘要： A pressure sensor portion having a pressure-responsive element for detecting gas pressure in reference to the atmospheric pressure is connected to a mounting body such as a canister mounted on a vehicle by means of a fragile connecting member. The connecting member breaks off to dismount the sensor device from the mounting body when a high impact due to an accidental collision or crash is imposed on the sensor device, and thereby an inlet port connected to the sensor portion for introducing gas pressure thereinto is prevented from being broken or damaged by such a collision impact. The fragile connecting member may include a tubular pipe formed integrally with a cover that hermetically closes an inner cavity of the sensor portion. A mounting bracket connected to the sensor portion via the fragile connecting member may be used to mount the sensor device on the mounting body.
摘要翻译：具有用于相对于大气压检测气体压力的压力响应元件的压力传感器部分通过脆弱的连接部件连接到安装在车辆上的罐的安装体。当由于意外碰撞或碰撞引起的高冲击施加在传感器装置上时，连接构件断开以将传感器装置从安装体上拆下，从而防止连接到传感器部分的用于引入气体压力的入口被这种碰撞冲击破坏或损坏。脆弱的连接构件可以包括与盖形成一体的管状管，其密封地封闭传感器部分的内腔。通过脆弱的连接构件连接到传感器部分的安装支架可用于将传感器装置安装在安装体上。

6. 发明授权

US06969862B2 Charged-particle-beam exposure apparatus and method of controlling same 有权
标题翻译：带电粒子束曝光装置及其控制方法
公开(公告)号：US06969862B2
公开(公告)日：2005-11-29
申请号：US10730814
申请日：2003-12-08
申请人： Masato Muraki , Osamu Kamimura , Masaki Takakuwa
发明人： Masato Muraki , Osamu Kamimura , Masaki Takakuwa
IPC分类号： G03F7/20 , H01J37/04 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/30433
摘要： In a charged-particle-beam exposure apparatus for exposing a wafer using a charged-particle beam, an electron beam emitted from an electron source serving as a source of charged particles is substantially collimated by a collimator lens and irradiates an aperture array (3), which has apertures for forming a plurality of electron beams used to expose a wafer. A current detector array has current detectors for measuring the intensities (currents) of electron beams at portions of the-aperture array other than where the apertures are present. During the wafer exposure operation, each current detector of the current detector array measures the intensity of the electron beam. The electron-beam intensity distribution is evaluated based upon the results of measurement and, when necessary, the optical power of electrostatic lenses that construct the collimator lens (2) is adjusted to uniformalize the electron-beam intensity distribution.
摘要翻译：在使用带电粒子束曝光晶片的带电粒子束曝光装置中，从作为带电粒子源的电子源发射的电子束基本上被准直透镜准直，并照射孔径阵列（3），其具有用于形成用于暴露晶片的多个电子束的孔。电流检测器阵列具有电流检测器，用于测量孔径阵列除存在孔的部分之外的电子束的强度（电流）。在晶片曝光操作期间，电流检测器阵列的每个电流检测器测量电子束的强度。基于测量结果评价电子束强度分布，并且根据需要调整构成准直透镜（2）的静电透镜的光学功率，使电子束强度分布均匀化。

7. 发明授权

US06946662B2 Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method 有权
标题翻译：多光束透镜，使用其的带电粒子束曝光装置及其制造方法
公开(公告)号：US06946662B2
公开(公告)日：2005-09-20
申请号：US10615955
申请日：2003-07-10
申请人： Haruhito Ono , Kenichi Nagae , Masaki Takakuwa , Yoshinori Nakayama , Harunobu Muto
发明人： Haruhito Ono , Kenichi Nagae , Masaki Takakuwa , Yoshinori Nakayama , Harunobu Muto
IPC分类号： G21K1/08 , H01J3/14 , H01J37/12 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/3177 , H01J2237/1205
摘要： There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.
摘要翻译：提供了一种多带电波束透镜，其通过沿着带电波束的光路用作绝缘体构件的光纤芯片堆叠，具有形成有多个带电束孔的带电光束通过区域的多个电极构成。电极在带电光束通过区域和光纤芯片之间具有屏蔽孔。导电屏蔽层不会接触电极而延伸通过屏蔽孔，并且切断连接充电光束通过区域和用作绝缘体构件的光纤芯片的直线路径。这样可以防止绝缘体的充电对多电荷束透镜中的电子束的影响。

8. 发明授权

US06870310B2 Multibeam generating apparatus and electron beam drawing apparatus 失效
标题翻译：多光束发生装置和电子束描绘装置
公开(公告)号：US06870310B2
公开(公告)日：2005-03-22
申请号：US10618008
申请日：2003-07-14
申请人： Masahiko Okunuki , Hiroya Ohta , Norio Saito , Masaki Takakuwa , Sayaka Tanimoto , Takeshi Haraguchi
发明人： Masahiko Okunuki , Hiroya Ohta , Norio Saito , Masaki Takakuwa , Sayaka Tanimoto , Takeshi Haraguchi
IPC分类号： G03F7/20 , H01J1/46 , H01J3/02 , H01J29/46 , H01J37/06 , H01J37/07 , H01J37/09 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J3/027 , H01J3/029 , H01J37/07 , H01J37/09
摘要： This invention provides a multielectron gun which generates a plurality of electron beams having uniform characteristics. A multielectron gun (2) is formed of a plurality of electron guns (2a-2c). The electron gun (2a) has, in addition to an electron source (21a), Wehnelt electrode (22a), and anode electrode (23), a shield electrode (24) between the Wehnelt electrode (22a) and anode electrode (23). The shield electrode reduces field interference among the electron guns.
摘要翻译：本发明提供一种多电子枪，其产生具有均匀特性的多个电子束。多电子枪（2）由多个电子枪（2a-2c）形成。电子枪（2a）除了电子源（21a），Wehnelt电极（22a）和阳极电极（23）之外还具有在Wehnelt电极（22a）和阳极电极（23）之间的屏蔽电极（24）。屏蔽电极减少电子枪之间的场干扰。

9. 发明授权

US5747694A Pressure sensor with barrier in a pressure chamber 失效
标题翻译：带压力传感器的压力传感器
公开(公告)号：US5747694A
公开(公告)日：1998-05-05
申请号：US686601
申请日：1996-07-26
申请人： Horonobu Baba , Tiaki Mizuno , Masahito Imai , Yuichi Yokoyama , Masaki Takakuwa , Yasuki Shimoyama
发明人： Horonobu Baba , Tiaki Mizuno , Masahito Imai , Yuichi Yokoyama , Masaki Takakuwa , Yasuki Shimoyama
IPC分类号： G01L9/00
CPC分类号： G01L19/147 , G01L19/0038 , G01L19/0084 , G01L19/0636 , G01L19/143
摘要： A pressure sensor has a resin housing containing a pressure sensor positioned between a reference pressure chamber and a pressure to be measured. A terminal extends through the housing toward the sensor. A wire connects the terminal to the sensor. When a connector is connected to the terminal, it may compress air around the terminal. The compressed air may travel along the terminal and break the wire connected to the sensor. To prevent such breakage, a barrier wall is provided to block the compressed air from penetrating toward the wire. The reference pressure chamber is divided into a main chamber and a subchamber by the barrier wall. Since the barrier wall blocks the compressed air, the compressed air can not reach a silicon gel on the sensor and the wire in the main chamber. Therefore, the wire is protected.
摘要翻译：压力传感器具有树脂壳体，其包含位于参考压力室和待测量压力之间的压力传感器。端子延伸穿过壳体朝向传感器。导线将端子连接到传感器。当连接器连接到终端时，可能会压缩终端周围的空气。压缩空气可以沿着端子行进并断开连接到传感器的电线。为了防止这种破裂，设置阻挡壁以阻止压缩空气渗透到线。基准压力室由隔离壁分为主室和副室。由于阻隔壁阻挡压缩空气，压缩空气不能到达传感器上的硅凝胶和主室中的导线。因此，电线被保护。

10. 发明授权

US07034321B2 Electron beam exposure apparatus and electron beam measurement module 失效
标题翻译：电子束曝光装置和电子束测量模块
公开(公告)号：US07034321B2
公开(公告)日：2006-04-25
申请号：US10624423
申请日：2003-07-21
申请人： Masaki Takakuwa , Yoshinori Nakayama , Gen Nakamura
发明人： Masaki Takakuwa , Yoshinori Nakayama , Gen Nakamura
IPC分类号： H01J37/304 , H01J37/244 , G01R29/24
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174
摘要： An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.
摘要翻译：用于通过使用电子束曝光晶片的电子束曝光装置包括：用于产生电子束的电子束发生器; 用于保持要暴露的晶片的晶片台; 设置在晶片台上的电流检测器，用于检测电子束的电流; 以及设置在晶片台上的用于存储指示由电流检测器检测到的电流的信息的存储单元。

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